Metrologie in fünfachsigen Nanomess- und Nanopositioniermaschinen

Die vorliegende Arbeit stellt ein neuartiges Konzept für eine fünfachsige Nanomessmaschine zur Messung von Formabweichungen auf stark gekrümmten Asphären oder Freiform-Flächen vor. Bis zu einem Anstieg von bis zu 60° der Messobjektoberfläche kann der Sensor orthogonal zu dieser ausgerichtet werden. Unter vollständiger Einhaltung des Abbe-Komparatorprinzips wird das Messobjekt translatorisch in einem Bereich von 25mm 25mm 5mm relativ zu dem um zwei Rotationsachsen drehbaren Sensor bewegt. Die Messachsen der translatorischen Positionsmessung schneiden sich im so genannten Abbe-Punkt. Dieser Abbe-Punkt ist gleichzeitig auch der Antastpunkt des Sensors und der konstante Momentanpol der beiden Rotationsachsen zur Sensorrotation, die sich rechtwinklig in dem Abbe-Punkt schneiden. Zur Bestimmung der zufälligen und systematischen Positionsabweichungen des Sensors in Folge seiner Rotation wird ein Referenzmesssystem vorgestellt. Dieses besteht aus drei fest mit dem Sensor verbundenen, kartesisch angeordneten Fabry-Pérot-Interferometern, die kontinuierlich den Abstand des Sensors zu der Innenfläche einer Referenzhemisphäre messen. Die Messstrahlen der Fabry-Pérot-Interferometer schneiden sich dabei virtuell im Abbe-Punkt. Um die Formabweichung dieser Referenzhemisphäre zu bestimmen, wird ein in-situ-Kalibrierverfahren beschrieben, das die Bestimmung der Formabweichung mit den im System vorhanden Sensoren im Einbauzustand erlaubt. Dazu wird der Sensor durch einen Kugelreflektor im Abbe-Punkt (Kugellinse n=2) ersetzt. Dessen Positionsabweichung wird während der Rotation gemessen und zur Bestimmung der Formabweichung der Referenzhemisphäre genutzt. Basierend auf diesen Erkenntnissen wurde ein Prototyp des vorgestellten Konzepts aufgebaut und die Funktion des Referenzmesssystems verifiziert. Über einen großen translatorischen Verschiebungsbereich von 80 μm, kann die Verschiebung des Antastpunktes mit Hilfe des Referenzmesssystems auf +-200nm erfasst werden. Eine Wiederholungsmessung zwischen zwei Stellungen des Rotationssystems zeigte, dass die Antastpunktposition mit einer maximalen Abweichung von 27nm bestimmt werden kann. Die ausführliche theoretische Messunsicherheitsbetrachtung auf Grundlage von sechs Untermodellen ergibt eine Messunsicherheit für die Bestimmung des Antastpunktes von maximal 18nm p = 68%.This thesis presents a novel concept for a five-axes nano coordinate measuring machine which is designed to measure form deviations of strongly curved aspheres and freeform-surfaces. Up to a surface inclination of 60° of the sample, the sensor can be aligned perpendicularly to the local surface. In strict compliance with the Abbe-comparator principle, the sample is moved in a measuring volume of 25mm 25mm 5mm relative to the sensor which can be rotated in two axes. Those two axes of rotation cross perpendicular at the so-called Abbe-point which is also the intersection of the measurement axes of the linear movement. This Abbe point coincides with the measuring point of the sensor and is the constant instantaneous center of rotation of the sensor. To measure the position deviation of the sensor caused by the rotation, a reference-measuringsystem is shown. It consists of three cartesian arranged Fabry-Pérot-Interferometers connected to the sensor which are measuring the distance to the inner surface of the reference hemisphere. The measuring axes of those Fabry-Pérot-Interferometers virtually cross in the Abbe-point. To specify the form deviations of the reference-hemisphere an in-situ-calibration process is described. Therefore, the sensor is replaced by spherical reflector (ball lens n=2) whose position deviation is measured during the rotation and used to determine the form deviation of the reference hemisphere. Based on this concept, a prototype of the five-axes nano coordinate measuring machine was built and the functionality of the reference-measuring-system is verified. For a linear movement of 80 μm the sensors measurement point can be measured with a maximum deviation of +-200nm. Repeated measurements between two positions of the rotation-axes show that the measurement point can be determined with a maximum deviation of 27nm. The detailed theoretical measurement uncertainty budget based on six sub-models shows a maximum measurement uncertainty of the measurement point of 17nm p = 68%

Development and implementation of a rotating nanoimprint lithography tool for orthogonal imprinting on edges of curved surfaces

Uniform molding and demolding of structures on highly curved surfaces through conformal contact is a crucial yet often-overlooked aspect of nanoimprint lithography (NIL). This study describes the development of a NIL tool and its integration into a nanopositioning and nanomeasuring machine to achieve high-precision orthogonal molding and demolding for soft ultraviolet-assisted NIL (soft UV-NIL). The process was implemented primarily on the edges of highly curved plano-convex substrates to demonstrate structure uniformity on the edges. High-resolution nanostructures of sub-200-nm lateral dimension and microstructures in the range of tens of microns were imprinted. However, the nanostructures on the edges of the large, curved substrates were difficult to characterize precisely. Therefore, microstructures were used to measure the structure fidelity and were characterized using profilometry, white light interferometry, and confocal laser scanning microscopy. Regardless of the restricted imaging capabilities at high inclinations for high-resolution nanostructures, the scanning electron microscope (SEM) imaging of the structures on top of the lens substrate and at an inclination of 45° was performed. The micro and nanostructures were successfully imprinted on the edges of the plano-convex lens at angles of 45°, 60°,and 90° from the center of rotation of the rotating NIL tool. The method enables precise imprinting at high inclinations, thereby presenting a different approach to soft UV-NIL on curved surfaces

Fundamental investigations in the design of five-axis nanopositioning machines for measurement and fabrication purposes

The majority of nanopositioning and nanomeasuring machines (NPMMs) are based on three independent linear movements in a Cartesian coordinate system. This in combination with the specific nature of sensors and tools limits the addressable part geometries. An enhancement of an NPMM is introduced by the implementation of rotational movements while keeping the precision in the nanometer range. For this purpose, a parameter-based dynamic evaluation system with quantifiable technological parameters has been set up and employed to identify and assess general solution concepts and adequate substructures. Evaluations taken show high potential for three linear movements of the object in combination with two angular movements of the tool. The influence of the additional rotation systems on the existing structure of NPMMs has been investigated further on. Test series on the repeatability of an NPMM enhanced by a chosen combination of a rotary stage and a goniometer setup are realized. As a result of these test series, the necessity of in situ position determination of the tool became very clear. The tool position is measured in situ in relation to a hemispherical reference mirror by three Fabry-Pérot interferometers. FEA optimization has been used to enhance the overall system structure with regard to reproducibility and long-term stability. Results have been experimentally investigated by use of a retroreflector as a tool and the various laser interferometers of the NPMM. The knowledge gained has been formed into general rules for the verification and optimization of design solutions for multiaxial nanopositioning machines

Efficient empirical determination of maximum permissible error in coordinate metrology

Maximum permissible errors (MPEs) are an important measurement system specification and form the basis of periodic verification of a measurement system's performance. However, there is no standard methodology for determining MPEs, so when they are not provided, or not suitable for the measurement procedure performed, it is unclear how to generate an appropriate value with which to verify the system. Whilst a simple approach might be to take many measurements of a calibrated artefact and then use the maximum observed error as the MPE, this method requires a large number of repeat measurements for high confidence in the calculated MPE. Here, we present a statistical method of MPE determination, capable of providing MPEs with high confidence and minimum data collection. The method is presented with 1000 synthetic experiments and is shown to determine an overestimated MPE within 10 % of an analytically true value in 99.2 % of experiments, while underestimating the MPE with respect to the analytically true value in 0.8 % of experiments (overestimating the value, on average, by 1.24 %). The method is then applied to a real test case (probing form error for a commercial fringe projection system), where the efficiently determined MPE is overestimated by 0.3 % with respect to an MPE determined using an arbitrarily chosen large number of measurements

Measurement uncertainty analysis on a five-axis nano coordinate measuring machine NMM-5D following a vectorial approach

Dieser Beitrag zeigt ein Konzept für eine fünfachsige Nano-Koordinatenmessmaschine zur Messung auf stark gekrümmten asphärischen und frei geformten optischen Oberflächen in einem Messvolumen von 25mm × 25mm × 5mm mit einem maximal möglichen Neigungswinkel von bis zu 60° zur Hochachse und einer maximalen Rotation von 360° um die Hochachse. Dabei wird die Probe translatorisch bewegt und der Sensor in seiner Orientierung verändert. Unter Einhaltung des Abbe-Komparatorprinzips für alle Messachsen wird die Bewegungsabweichung des Sensors bei der Rotation durch ein in-situ-Referenzmesssystem erfasst. Dieses besteht aus drei kartesisch angeordneten Fabry-Pérot-Interferometern mit dem Ursprung im Antastpunktes des Sensors, die den Abstand zu einer hemisphärischen Referenzfläche messen. Die Messunsicherheitsbetrachtung des Gesamtsystems erfolgt nach dem guide to the expression of uncertainty in measurement in einem vektoriellen Ansatz und liefert unter konservativen Annahmen eine Unsicherheit des Antastpunktes von maximal 72 nm (k=1).In this paper a novel concept of an five axes nano coordinate measuring machine for the measurement on strongly curved aspheric and freeform optics is shown. Thereby the sample is moved translational in a measuring volume of 25mm×25mm×5mm and the sensor can be tilted up to an angle of 60° and it can be rotated up 360° around the z-axis. By strictly following the abbe comparator principle, the motion error that occurs during the sensor rotation is measured by an in-situ reference measuring system. It consists of three Fabry-Pérot-Interferometers whose measuring directions span a cartesian coordinate system with the origin in the sensors probing point. Those interferometers measure the distance to concentric arranged reference hemisphere. The measurement uncertainty is derived according to the Guide to the expression of uncertainty in measurement. A conservative estimation shows a maximum uncertainty of the probing point of 72 nm (k=1)

Tip- and laser-based 3D nanofabrication in extended macroscopic working areas

The field of optical lithography is subject to intense research and has gained enormous improvement. However, the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional technologies. This effort and the resulting financial requirements can only be tackled by few global companies and thus a paradigm change for the semiconductor industry is conceivable: custom design and solutions for specific applications will dominate future development (Fritze in: Panning EM, Liddle JA (eds) Novel patterning technologies. International society for optics and photonics. SPIE, Bellingham, 2021. https://doi.org/10.1117/12.2593229). For this reason, new aspects arise for future lithography, which is why enormous effort has been directed to the development of alternative fabrication technologies. Yet, the technologies emerging from this process, which are promising for coping with the current resolution and accuracy challenges, are only demonstrated as a proof-of-concept on a lab scale of several square micrometers. Such scale is not adequate for the requirements of modern lithography; therefore, there is the need for new and alternative cross-scale solutions to further advance the possibilities of unconventional nanotechnologies. Similar challenges arise because of the technical progress in various other fields, realizing new and unique functionalities based on nanoscale effects, e.g., in nanophotonics, quantum computing, energy harvesting, and life sciences. Experimental platforms for basic research in the field of scale-spanning nanomeasuring and nanofabrication are necessary for these tasks, which are available at the Technische Universität Ilmenau in the form of nanopositioning and nanomeasuring (NPM) machines. With this equipment, the limits of technical structurability are explored for high-performance tip-based and laser-based processes for enabling real 3D nanofabrication with the highest precision in an adequate working range of several thousand cubic millimeters

Guidelines for the use of flow cytometry and cell sorting in immunological studies (third edition)

The third edition of Flow Cytometry Guidelines provides the key aspects to consider when performing flow cytometry experiments and includes comprehensive sections describing phenotypes and functional assays of all major human and murine immune cell subsets. Notably, the Guidelines contain helpful tables highlighting phenotypes and key differences between human and murine cells. Another useful feature of this edition is the flow cytometry analysis of clinical samples with examples of flow cytometry applications in the context of autoimmune diseases, cancers as well as acute and chronic infectious diseases. Furthermore, there are sections detailing tips, tricks and pitfalls to avoid. All sections are written and peer‐reviewed by leading flow cytometry experts and immunologists, making this edition an essential and state‐of‐the‐art handbook for basic and clinical researchers.DFG, 389687267, Kompartimentalisierung, Aufrechterhaltung und Reaktivierung humaner Gedächtnis-T-Lymphozyten aus Knochenmark und peripherem BlutDFG, 80750187, SFB 841: Leberentzündungen: Infektion, Immunregulation und KonsequenzenEC/H2020/800924/EU/International Cancer Research Fellowships - 2/iCARE-2DFG, 252623821, Die Rolle von follikulären T-Helferzellen in T-Helferzell-Differenzierung, Funktion und PlastizitätDFG, 390873048, EXC 2151: ImmunoSensation2 - the immune sensory syste

Measuring the health-related Sustainable Development Goals in 188 countries : a baseline analysis from the Global Burden of Disease Study 2015

Background In September, 2015, the UN General Assembly established the Sustainable Development Goals (SDGs). The SDGs specify 17 universal goals, 169 targets, and 230 indicators leading up to 2030. We provide an analysis of 33 health-related SDG indicators based on the Global Burden of Diseases, Injuries, and Risk Factors Study 2015 (GBD 2015). Methods We applied statistical methods to systematically compiled data to estimate the performance of 33 health-related SDG indicators for 188 countries from 1990 to 2015. We rescaled each indicator on a scale from 0 (worst observed value between 1990 and 2015) to 100 (best observed). Indices representing all 33 health-related SDG indicators (health-related SDG index), health-related SDG indicators included in the Millennium Development Goals (MDG index), and health-related indicators not included in the MDGs (non-MDG index) were computed as the geometric mean of the rescaled indicators by SDG target. We used spline regressions to examine the relations between the Socio-demographic Index (SDI, a summary measure based on average income per person, educational attainment, and total fertility rate) and each of the health-related SDG indicators and indices. Findings In 2015, the median health-related SDG index was 59.3 (95% uncertainty interval 56.8-61.8) and varied widely by country, ranging from 85.5 (84.2-86.5) in Iceland to 20.4 (15.4-24.9) in Central African Republic. SDI was a good predictor of the health-related SDG index (r(2) = 0.88) and the MDG index (r(2) = 0.2), whereas the non-MDG index had a weaker relation with SDI (r(2) = 0.79). Between 2000 and 2015, the health-related SDG index improved by a median of 7.9 (IQR 5.0-10.4), and gains on the MDG index (a median change of 10.0 [6.7-13.1]) exceeded that of the non-MDG index (a median change of 5.5 [2.1-8.9]). Since 2000, pronounced progress occurred for indicators such as met need with modern contraception, under-5 mortality, and neonatal mortality, as well as the indicator for universal health coverage tracer interventions. Moderate improvements were found for indicators such as HIV and tuberculosis incidence, minimal changes for hepatitis B incidence took place, and childhood overweight considerably worsened. Interpretation GBD provides an independent, comparable avenue for monitoring progress towards the health-related SDGs. Our analysis not only highlights the importance of income, education, and fertility as drivers of health improvement but also emphasises that investments in these areas alone will not be sufficient. Although considerable progress on the health-related MDG indicators has been made, these gains will need to be sustained and, in many cases, accelerated to achieve the ambitious SDG targets. The minimal improvement in or worsening of health-related indicators beyond the MDGs highlight the need for additional resources to effectively address the expanded scope of the health-related SDGs.Peer reviewe

Coordinate transformation and its uncertainty under consideration of a non-orthogonal coordinate base

Nanopositioning and nanomeasuring machines are 3D coordinate measuring systems with nanometer precision at measurement volumes in the cubic centimeter range. The coordinate base is formed by an interferometer system with a common mirror corner. The orthogonality deviations of the mirror corner require a coordinate transformation of the measuring axes. The uncertainty of the coordinate transformation must be taken into account in the overall measurement uncertainty budget. Starting from a complete transformation model, the result of model simplications on the transformation behaviour is analysed and discussed