Improved Photoelectrical Properties of MoS₂ Films after Laser Micromachining

Direct patterning of ultrathin MoS₂ films with well-defined structures and controllable thickness is appealing since the properties of MoS₂ sheets are sensitive to the number of layer and surface properties. In this work, we employed a facile, effective, and well-controlled technique to achieve micropatterning of MoS₂ films with a focused laser beam. We demonstrated that a direct focused laser beam irradiation was able to achieve localized modification and thinning of as-synthesized MoS₂ films. With a scanning laser beam, microdomains with well-defined structures and controllable thickness were created on the same film. We found that laser modification altered the photoelectrical property of the MoS₂ films, and subsequently, photodetectors with improved performance have been fabricated and demonstrated using laser modified films