A SMART SAMPLING SCHEDULING AND SKIPPING SIMULATOR AND ITS EVALUATION ON REAL DATA SETS

International audienceAs modern manufacturing technology progresses, measurement tools become scarce resources since more and longer control operations are required. It thus becomes critical to decide whether a lot should be measured or not in order to get as much information as possible on production tools or processes, and to avoid ineffective measures. To minimize risks and optimize measurement capacity, a smart sampling algorithm has been proposed to efficiently select and schedule production lots on metrology tools. This algorithm and others have been embedded in a simulator called "Smart Sampling Scheduling and Skipping Simulator" (S5). The characteristics of the simulator will be presented. Simulations performed on several sets of instances from three different semiconductor manufacturing facilities (or fabs) will be presented and discussed. The results show that, by using smart sampling, it is possible to drastically reduce various performance indicators when compared to current fab sampling

Integration of decision support systems to improve decision support performance

Decision support system (DSS) is a well-established research and development area. Traditional isolated, stand-alone DSS has been recently facing new challenges. In order to improve the performance of DSS to meet the challenges, research has been actively carried out to develop integrated decision support systems (IDSS). This paper reviews the current research efforts with regard to the development of IDSS. The focus of the paper is on the integration aspect for IDSS through multiple perspectives, and the technologies that support this integration. More than 100 papers and software systems are discussed. Current research efforts and the development status of IDSS are explained, compared and classified. In addition, future trends and challenges in integration are outlined. The paper concludes that by addressing integration, better support will be provided to decision makers, with the expectation of both better decisions and improved decision making processes

Perspectives on the future of manufacturing within the Industry 4.0 era

The technological choices facing the manufacturing industry are vast and complex as the industry contemplates the increasing levels of digitization and automation in readiness for the modern competitive age. These changes broadly categorized as Industry 4.0, offer significant transformation challenges and opportunities, impacting a multitude of operational aspects of manufacturing organizations. As manufacturers seek to deliver increased levels of productivity and adaptation by innovating many aspects of their business and operational processes, significant challenges and barriers remain. The roadmap toward Industry 4.0 is complex and multifaceted, as manufacturers seek to transition toward new and emerging technologies, whilst retaining operational effectiveness and a sustainability focus. This study approaches many of these significant themes by presenting a critical evaluation of the core topics impacting the next generation of manufacturers, challenges and key barriers to implementation. These factors are further evaluated via the presentation of a new Industry 4.0 framework and alignment of I4.0 themes with the UN Sustainability Goals

Artificial intelligence (AI): multidisciplinary perspectives on emerging challenges, opportunities, and agenda for research and practice

As far back as the industrial revolution, great leaps in technical innovation succeeded in transforming numerous manual tasks and processes that had been in existence for decades where humans had reached the limits of physical capacity. Artificial Intelligence (AI) offers this same transformative potential for the augmentation and potential replacement of human tasks and activities within a wide range of industrial, intellectual and social applications. The pace of change for this new AI technological age is staggering, with new breakthroughs in algorithmic machine learning and autonomous decision making engendering new opportunities for continued innovation. The impact of AI is significant, with industries ranging from: finance, retail, healthcare, manufacturing, supply chain and logistics all set to be disrupted by the onset of AI technologies. The study brings together the collective insight from a number of leading expert contributors to highlight the significant opportunities, challenges and potential research agenda posed by the rapid emergence of AI within a number of domains: technological, business and management, science and technology, government and public sector. The research offers significant and timely insight to AI technology and its impact on the future of industry and society in general

Exploitation dynamique des données de production pour améliorer les méthodes DFM dans l'industrie Microélectronique

La conception pour la fabrication ou DFM (Design for Manufacturing) est une méthode maintenant classique pour assurer lors de la conception des produits simultanément la faisabilité, la qualité et le rendement de la production. Dans l'industrie microélectronique, le Design Rule Manual (DRM) a bien fonctionné jusqu'à la technologie 250nm avec la prise en compte des variations systématiques dans les règles et/ou des modèles basés sur l'analyse des causes profondes, mais au-delà de cette technologie, des limites ont été atteintes en raison de l'incapacité à sasir les corrélations entre variations spatiales. D'autre part, l'évolution rapide des produits et des technologies contraint à une mise à jour dynamique des DRM en fonction des améliorations trouvées dans les fabs. Dans ce contexte les contributions de thèse sont (i) une définition interdisciplinaire des AMDEC et analyse de risques pour contribuer aux défis du DFM dynamique, (ii) un modèle MAM (mapping and alignment model) de localisation spatiale pour les données de tests, (iii) un référentiel de données basé sur une ontologie ROMMII (referential ontology Meta model for information integration) pour effectuer le mapping entre des données hétérogènes issues de sources variées et (iv) un modèle SPM (spatial positioning model) qui vise à intégrer les facteurs spatiaux dans les méthodes DFM de la microélectronique, pour effectuer une analyse précise et la modélisation des variations spatiales basées sur l'exploitation dynamique des données de fabrication avec des volumétries importantes.The DFM (design for manufacturing) methods are used during technology alignment and adoption processes in the semiconductor industry (SI) for manufacturability and yield assessments. These methods have worked well till 250nm technology for the transformation of systematic variations into rules and/or models based on the single-source data analyses, but beyond this technology they have turned into ineffective R&D efforts. The reason for this is our inability to capture newly emerging spatial variations. It has led an exponential increase in technology lead times and costs that must be addressed; hence, objectively in this thesis we are focused on identifying and removing causes associated with the DFM ineffectiveness. The fabless, foundry and traditional integrated device manufacturer (IDM) business models are first analyzed to see coherence against a recent shift in business objectives from time-to-market (T2M) and time-to-volume towards (T2V) towards ramp-up rate. The increasing technology lead times and costs are identified as a big challenge in achieving quick ramp-up rates; hence, an extended IDM (e-IDM) business model is proposed to support quick ramp-up rates which is based on improving the DFM ineffectiveness followed by its smooth integration. We have found (i) single-source analyses and (ii) inability to exploit huge manufacturing data volumes as core limiting factors (failure modes) towards DFM ineffectiveness during technology alignment and adoption efforts within an IDM. The causes for single-source root cause analysis are identified as the (i) varying metrology reference frames and (ii) test structures orientations that require wafer rotation prior to the measurements, resulting in varying metrology coordinates (die/site level mismatches). A generic coordinates mapping and alignment model (MAM) is proposed to remove these die/site level mismatches, however to accurately capture the emerging spatial variations, we have proposed a spatial positioning model (SPM) to perform multi-source parametric correlation based on the shortest distance between respective test structures used to measure the parameters. The (i) unstructured model evolution, (ii) ontology issues and (iii) missing links among production databases are found as causes towards our inability to exploit huge manufacturing data volumes. The ROMMII (referential ontology Meta model for information integration) framework is then proposed to remove these issues and enable the dynamic and efficient multi-source root cause analyses. An interdisciplinary failure mode effect analysis (i-FMEA) methodology is also proposed to find cyclic failure modes and causes across the business functions which require generic solutions rather than operational fixes for improvement. The proposed e-IDM, MAM, SPM, and ROMMII framework results in accurate analysis and modeling of emerging spatial variations based on dynamic exploitation of the huge manufacturing data volumes.SAVOIE-SCD - Bib.électronique (730659901) / SudocGRENOBLE1/INP-Bib.électronique (384210012) / SudocGRENOBLE2/3-Bib.électronique (384219901) / SudocSudocFranceF