34 research outputs found

    Ante la ley: Hegel y la filosofía práctica de Jacobi en "Fe y saber"

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    El presente trabajo pretende estudiar el modo en que Hegel presenta la filosofía práctica de Jacobi en su obra Fe y saber. Se busca comprender puntualmente cómo se manifiestan en la filosofía práctica jacobiana los principios de lo que Hegel entiende por "filosofía de la reflexión". Se tienen en cuenta, a tal fin, la noción de "creencia" en la filosofía de Jacobi y la manera en que Hegel entiende que tal filosofía permanece atada a la existencia de lo finito. En la filosofía práctica de Jacobi, la persistencia de lo finito como tal se manifiesta en la incapacidad de reconocer el aspecto objetivo y legal de la eticidad, aspecto al cual Jacobi opone insistentemente la subjetividad del individuo irreductible a leyes. Finalmente, se considera la relación que Hegel establece entre las ideas de Jacobi y las de Schleiermacher como el necesario desenlace de la filosofía práctica jacobiana.Fil: Vicum, Federico. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentina. Universidad Pedagógica Nacional; Argentina. Universidad de Buenos Aires. Facultad de Filosofía y Letras. Instituto de Filosofía "Dr. Alejandro Korn"; Argentin

    Population balance modelling of polydispersed particles in reactive flows

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    Fichte and the Democratic Self According to Walt Whitman

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    The aim of this paper is to study the relationship between Walt Whitman’s work and Fichte’s philosophy from four different perspectives: (1) the influence of Thomas Carlyle in Whitman’s reception of Fichte; (2) Fichte’s philosophy as an appropriate philosophy, according to our interpretation of Whitman, for the United States after the Civil War. That appropriateness is grounded in the fact that with Fichte’s philosophy it is possible to think of a unity greater than all differences, a unity in which writing about the Civil War and the oblivion of that same historical event are articulated; (3) Fichte’s philosophy as an insufficient philosophy, although it was adequate for its historical moment. Its insufficiency is to be found, or so I shall argue, in the very modern radicality of the idealist philosophy; (4) the differences between Fichte and Whitman with respect to their religious conceptions (particularly in their links to the sacred books of the Judeo-Christian tradition), differences interpreted in the light of Hans Blumenberg’s ideas on myth, dogma and German Idealism.Fil: Vicum, Federico. Universidad Pedagogica Nacional. Departamento de Humanidades y Artes.; Argentina. Universidad de Buenos Aires. Facultad de Filosofía y Letras. Departamento de Filosofía; Argentina. Consejo Nacional de Investigaciones Científicas y Técnicas; Argentin

    Local Heating During Electron Beam Patterning of Lithography Masks

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    Under the supervision of Professors William Beckman and John Mitchell; 135pp.The semiconductor industry is constantly seeking to improve the performance of integrated circuits by drastically increasing the density and reducing the pattern feature size. Accurate patterning of advanced lithography masks is a key issue in the production of integrated circuits with sub-0.13 ?m feature size. Predicting and subsequently correcting for the errors produced in writing the pattern is essential. One source of pattern error is the heating of the lithography mask during the electron beam patterning process. Mask heating during writing causes pattern errors through the resist stress relief, local over- or under-development of the resist due to the temperature dependent resist sensitivity, and by thermal distortions. These pattern errors depend upon the transient temperature distribution in the mask during the electron-beam-writing process. In this thesis local mask temperature profiles are predicted for various writing conditions. The local mask heating of an optical reticle during writing of a single electron beam flash is analyzed. The contribution of multiple electron beam flashes on an X-ray mask to global mask heating during writing is determined by calculating the transient mask temperature profile during the patterning process using a finite element software package. Two levels of model are compared. A very detailed small-scale model of pattern writing is developed with the element size that of a pattern shape. An averaging large-scale model in which the electron beam energy is distributed over many elements is also developed. The averaging technique is often used in thermal analyses to reduce computation time. The average temperature rise and local maximum of the two methods are compared. It is found that the averaging technique predicts the average temperature rise accurately, but significantly under-predicts the maximum local temperatures. A procedure for developing thermal models with high accuracy, minimal number of elements, and reasonable calculation time is described. Design rules for finite element models used for the simulation of local mask heating are presented.Sponsored by SEMATECH

    Wunderborer Trom eines Bauers in Uber-Schlasien : welchen mich der Junfer-Schulmester Kluge nach der neuerfungenen Vicumschen kortzschen un leichten Rachenkunst ausgelet hut

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    Heraus gegen vun Hans Daniel HillebrandAutopsie nach Ex. der ULB Sachsen-AnhaltVorlageform des Erscheinungsvermerks: 1782
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