On the characterization of ultra-precise VUV-focusing mirrors by means of slope measuring deflectometry

Slope measuring deflectometry allows the non-contact measuring of curves surfaces like ultra-precise elliptical cylinder shaped mirrors in use for the focusing of Synchrotron light. This paper will report on the measurement of synchrotron mirrors designed to guide and focus Synchrotron light in the variable polarization beamline P04 at the PETRA III synchrotron at DESY (Hamburg). These mirrors were optimized by deterministic finishing technology based on topography data provided by slope measuring deflectometry. We will show the results of the mirror inspection and discuss the expected beamline performance by ray-tracing results

On the characterization of ultra-precise XUV-focusing mirrors by means of high angular resolution slope-measuring deflectometry

Slope-measuring deflectometry allows the non-contact measurement of curved surfaces such as ultra-precise elliptical cylindrical mirrors used for the focusing of synchrotron light. This paper will report on the measurement of synchrotron mirrors designed to guide and focus synchrotron light in the variable polarization beamline P04 at the PETRA III synchrotron at DESY (Hamburg). These mirrors were optimized by deterministic finishing technology based on topography data provided by slope-measuring deflectometry. We will show the results of the mirror inspection and discuss the expected beamline performance by ray-tracing results

Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold

The durability of grazing- and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration. Polycrystalline ruthenium and amorphous carbon 50 nm thin films on silicon substrates were tested at total external reflection angles of 20° and 10° grazing incidence, respectively. Mo/Si periodical multilayer structures were tested in the Bragg reflection condition at 16° off-normal angle of incidence. The exposed areas were analysed post-mortem using differential contrast visible light microscopy, EUV reflectivity mapping and scanning X-ray photoelectron spectroscopy. The analysis revealed that Ru and Mo/Si coatings exposed to the highest dose and fluence level show a few per cent drop in their EUV reflectivity, which is explained by EUV-induced oxidation of the surface

Performance and characterization of the FinEstBeAMS beamline at the MAX IV Laboratory

Abstract FinEstBeAMS (Finnish–Estonian Beamline for Atmospheric and Materials Sciences) is a multidisciplinary beamline constructed at the 1.5 GeV storage ring of the MAX IV synchrotron facility in Lund, Sweden. The beamline covers an extremely wide photon energy range, 4.5–1300 eV, by utilizing a single elliptically polarizing undulator as a radiation source and a single grazing-incidence plane grating monochromator to disperse the radiation. At photon energies below 70 eV the beamline operation relies on the use of optical and thin-film filters to remove higher-order components from the monochromated radiation. This paper discusses the performance of the beamline, examining such characteristics as the quality of the gratings, photon energy calibration, photon energy resolution, available photon flux, polarization quality and focal spot size

Experimental study of EUV mirror radiation damage resistance under long-term free-electron laser exposures below the single-shot damage threshold

The durability of grazing- and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration. Polycrystalline ruthenium and amorphous carbon 50 nm thin films on silicon substrates were tested at total external reflection angles of 20° and 10° grazing incidence, respectively. Mo/Si periodical multilayer structures were tested in the Bragg reflection condition at 16° off-normal angle of incidence. The exposed areas were analysed post-mortem using differential contrast visible light microscopy, EUV reflectivity mapping and scanning X-ray photoelectron spectroscopy. The analysis revealed that Ru and Mo/Si coatings exposed to the highest dose and fluence level show a few per cent drop in their EUV reflectivity, which is explained by EUV-induced oxidation of the surface