Amorphous metallizations for high-temperature semiconductor device applications

The initial results of work on a class of semiconductor metallizations which appear to hold promise as primary metallizations and diffusion barriers for high temperature device applications are presented. These metallizations consist of sputter-deposited films of high T sub g amorphous-metal alloys which (primarily because of the absence of grain boundaries) exhibit exceptionally good corrosion-resistance and low diffusion coefficients. Amorphous films of the alloys Ni-Nb, Ni-Mo, W-Si, and Mo-Si were deposited on Si, GaAs, GaP, and various insulating substrates. The films adhere extremely well to the substrates and remain amorphous during thermal cycling to at least 500 C. Rutherford backscattering and Auger electron spectroscopy measurements indicate atomic diffussivities in the 10 to the -19th power sq cm/S range at 450 C

Negative-Energy Perturbations in Circularly Cylindrical Equilibria within the Framework of Maxwell-Drift Kinetic Theory

The conditions for the existence of negative-energy perturbations (which could be nonlinearly unstable and cause anomalous transport) are investigated in the framework of linearized collisionless Maxwell-drift kinetic theory for the case of equilibria of magnetically confined, circularly cylindrical plasmas and vanishing initial field perturbations. For wave vectors with a non-vanishing component parallel to the magnetic field, the plane equilibrium conditions (derived by Throumoulopoulos and Pfirsch [Phys Rev. E {\bf 49}, 3290 (1994)]) are shown to remain valid, while the condition for perpendicular perturbations (which are found to be the most important modes) is modified. Consequently, besides the tokamak equilibrium regime in which the existence of negative-energy perturbations is related to the threshold value of 2/3 of the quantity $\eta_\nu = \frac {\partial \ln T_\nu} {\partial \ln N_\nu}$, a new regime appears, not present in plane equilibria, in which negative-energy perturbations exist for {\em any} value of $\eta_\nu$. For various analytic cold-ion tokamak equilibria a substantial fraction of thermal electrons are associated with negative-energy perturbations (active particles). In particular, for linearly stable equilibria of a paramagnetic plasma with flat electron temperature profile ($\eta_e=0$), the entire velocity space is occupied by active electrons. The part of the velocity space occupied by active particles increases from the center to the plasma edge and is larger in a paramagnetic plasma than in a diamagnetic plasma with the same pressure profile. It is also shown that, unlike in plane equilibria, negative-energy perturbations exist in force-free reversed-field pinch equilibria with a substantial fraction of active particles.Comment: 31 pages, late

Negative-energy perturbations in cylindrical equilibria with a radial electric field

The impact of an equilibrium radial electric field $E$ on negative-energy perturbations (NEPs) (which are potentially dangerous because they can lead to either linear or nonlinear explosive instabilities) in cylindrical equilibria of magnetically confined plasmas is investigated within the framework of Maxwell-drift kinetic theory. It turns out that for wave vectors with a non-vanishing component parallel to the magnetic field the conditions for the existence of NEPs in equilibria with E=0 [G. N. Throumoulopoulos and D. Pfirsch, Phys. Rev. E 53, 2767 (1996)] remain valid, while the condition for the existence of perpendicular NEPs, which are found to be the most important perturbations, is modified. For $|e_i\phi|\approx T_i$ ($\phi$ is the electrostatic potential) and $T_i/T_e > \beta_c\approx P/(B^2/8\pi)$ ($P$ is the total plasma pressure), a case which is of operational interest in magnetic confinement systems, the existence of perpendicular NEPs depends on $e_\nu E$, where $e_\nu$ is the charge of the particle species $\nu$. In this case the electric field can reduce the NEPs activity in the edge region of tokamaklike and stellaratorlike equilibria with identical parabolic pressure profiles, the reduction of electron NEPs being more pronounced than that of ion NEPs.Comment: 30 pages, late

Mechanisms for conduction via low-frequency noise measurements of High-Tc Thin-film microbridges

We have investigated possible mechanisms for conduction in high-T/sub c/ thin-film microbridges biased into the voltage state via the low-frequency noise properties. Measurements on thinned YBCO microbridges indicate that the voltage noise power spectral density S/sub V/(f) is proportional to the DC voltage.Peer Reviewe

Indoor dampness and molds and development of adult-onset asthma: a population-based incident case-control study.

Previous cross-sectional and prevalent case-control studies have suggested increased risk of asthma in adults related to dampness problems and molds in homes. We conducted a population-based incident case-control study to assess the effects of indoor dampness problems and molds at work and at home on development of asthma in adults. We recruited systematically all new cases of asthma during a 2.5-year study period (1997-2000) and randomly selected controls from a source population consisting of adults 21-63 years old living in the Pirkanmaa Hospital district, South Finland. The clinically diagnosed case series consisted of 521 adults with newly diagnosed asthma and the control series of 932 controls, after we excluded 76 (7.5%) controls with a history of asthma. In logistic regression analysis adjusting for confounders, the risk of asthma was related to the presence of visible mold and/or mold odor in the workplace (odds ratio, 1.54; 95% confidence interval, 1.01-2.32) but not to water damage or damp stains alone. We estimated the fraction of asthma attributable to workplace mold exposure to be 35.1% (95% confidence interval, 1.0-56.9%) among the exposed. Present results provide new evidence of the relation between workplace exposure to indoor molds and adult-onset asthma

Magnetic field sensitivity of variable thickness microbridges in tbcco, bscco and ybco.

We describe results of a study comparing the magnetic field sensitivities of variable thickness bridge (VTB) arrays fabricated in TBCCO, BSCCO, and YBCO thin films. Identical structures were patterned in a variety of films, and the bridges were thinned by four different methods. Analysis of the data yields experimental evidence as to the suitability of these types of films for devices such as the superconducting flux flow transistor (SFFT) which is based on this geometry. The volt-ampere characteristics of the arrays were measured in low uniform magnetic fields (⩽130 G) and in nonuniform fields (⩽5 G) produced by a nearby control line. For these films in this geometry, no measurable effect of the control line magnetic field was observed. Large values of transresistance and current gain could only be attained through a thermal mechanism when the control line was driven normal. Upper bounds for (magnetically generated) transresistance (⩽5 mΩ) and current gains (⩽0.005) have been inferred from the uniform field data assuming a standard best-case device geometry. All volt-ampere curves followed closely a power law relationship (V~I n), with exponent n ~1.2-10. We suggest materials considerations that may yield improved device performancePeer Reviewe