Heterogeneous 2.5D integration on through silicon interposer

© 2015 AIP Publishing LLC. Driven by the need to reduce the power consumption of mobile devices, and servers/data centers, and yet continue to deliver improved performance and experience by the end consumer of digital data, the semiconductor industry is looking for new technologies for manufacturing integrated circuits (ICs). In this quest, power consumed in transferring data over copper interconnects is a sizeable portion that needs to be addressed now and continuing over the next few decades. 2.5D Through-Si-Interposer (TSI) is a strong candidate to deliver improved performance while consuming lower power than in previous generations of servers/data centers and mobile devices. These low-power/high-performance advantages are realized through achievement of high interconnect densities on the TSI (higher than ever seen on Printed Circuit Boards (PCBs) or organic substrates), and enabling heterogeneous integration on the TSI platform where individual ICs are assembled at close proximity

Ultra thin ultrafine-pitch chip-package interconnections for embedded chip last approach

Ever growing demands for portability and functionality have always governed the electronic technology innovations. IC downscaling with Moore s law and system miniaturization with System-On-Package (SOP) paradigm has resulted and will continue to result in ultraminiaturized systems with unprecedented functionality at reduced cost. The trend towards 3D silicon system integration is expected to downscale IC I/O pad pitches from 40µm to 1- 5 µm in future. Device- to- system board interconnections are typically accomplished today with either wire bonding or solders. Both of these are incremental and run into either electrical or mechanical barriers as they are extended to higher density of interconnections. Alternate interconnection approaches such as compliant interconnects typically require lengthy connections and are therefore limited in terms of electrical properties, although expected to meet the mechanical requirements. As supply currents will increase upto 220 A by 2012, the current density will exceed the maximum allowable current density of solders. The intrinsic delay and electromigration in solders are other daunting issues that become critical at nanometer size technology nodes. In addition, formation of intermetallics is also a bottleneck that poses significant mechanical issues. Recently, many research groups have investigated various techniques for copper-copper direct bonding. Typically, bonding is carried out at 400oC for 30 min followed by annealing for 30 min. High thermal budget in such process makes it less attractive for integrated systems because of the associated process incompatibilities. In the present study, copper-copper bonding at ultra fine-pitch using advanced nano-conductive and non-conductive adhesives is evaluated. The proposed copper-copper based interconnects using advanced conductive and non-conductive adhesives will be a new fundamental and comprehensive paradigm to solve all the four barriers: 1) I/O pitch 2) Electrical performance 3) Reliability and 4) Cost. This thesis investigates the mechanical integrity and reliability of copper-copper bonding using advanced adhesives through test vehicle fabrication and reliability testing. Test vehicles were fabricated using low cost electro-deposition techniques and assembled onto glass carrier. Experimental results show that proposed copper-copper bonding using advanced adhesives could potentially meet all the system performance requirements for the emerging micro/nano-systems.M.S.Committee Chair: Prof. Rao R Tummala; Committee Member: Dr. Jack Moon; Committee Member: Dr. P M Ra

Microstructural and mechanical characteristics of micro-scale intermetallic compounds interconnections

Following the continually increasing demand for high-density interconnection and multilayer packaging for chips, solder bump size has decreased significantly over the years, this has led to some challenges in the reliability of interconnects. This thesis presents research into the resulting effects of miniaturization on the interconnection with Sn-solder, especially focusing on the full intermetallics (IMCs) micro-joints which appear in the 3D IC stacking packaging. Thereby, systematic studies have been conducted to study the microstructural evolution and reliability issues of Cu-Sn and Cu-Sn-Ni IMCs micro-joints. (1) Phenomenon of IMCs planar growth: The planar IMCs interlayer was asymmetric and composed of (Cu,Ni)6Sn5 mainly in Ni/Sn (2.5~5 µm)/Cu interconnect. Meanwhile, it was symmetric two-layer structure in Cu/Sn (2.5~5 µm)/Cu interconnect with the Cu3Sn fine grains underneath Cu6Sn5 cobblestone-shape-like grains for each IMCs layer. Besides, it is worth noticing that the appearance of Cu-rich whiskers (the mixture of Cu/Cu2O/SnOx/Cu6Sn5) could potentially lead to short-circuit in the cases of ultra-fine (<10 µm pitch) interconnects for the miniaturization of electronics devices. (2) Microstructural evolution process of Cu-Sn IMCs micro-joint: The simultaneous solidification of IMCs interlayer supressed the scalloped growth of Cu6Sn5 grains in Cu/Sn (2.5 µm)/Cu interconnect during the transient liquid phase (TLP) soldering process. The growth factor of Cu3Sn was in the range of 0.29~0.48 in Cu-Cu6Sn5 diffusion couple at 240~290 °C, which was impacted significantly by the type of substrates. And the subsequent homogenization process of Cu3Sn grains was found to be consistent with the description of flux-driven ripening (FDR) theory. Moreover, Kirkendall voids appeared only in the Cu3Sn layer adjacent to Cu-plated substrate, and this porous Cu3Sn micro-joint was mechanically robust during the shear test. (3) Microstructural evolution of Cu-Sn-Ni IMCs micro-joint: There was obvious inter-reaction between the interfacial reactions in Ni/Sn (1.5 µm)/Cu interconnect. The growth factor of (Cu,Ni)3Sn on Cu side was about 0.36 at 240 °C, and the reaction product on Ni side was changed from Ni3Sn4 into (Cu,Ni)6Sn5 with the increase of soldering temperature. In particular, the segregation of Ni atoms occurred along with phase transformation at 290 °C and thereby stabilized the (Cu,Ni)6Sn5 phase for the high Ni content of 20 at.%. (4) Micro-mechanical characteristics of Cu-Sn-Ni IMCs micro-joint: The Young s modulus and hardness of Cu-Sn-Ni IMCs were measured by nanoindentation test, such as 160.6±3.1 GPa/ 7.34±0.14 GPa for (Cu,Ni)6Sn5 and 183.7±4.0 GPa/ 7.38±0.46 GPa for (Cu,Ni)3Sn, respectively. Besides, in-situ nano-compression tests have been conducted on IMCs micro-cantilevers, the fracture strength turns out to be 2.46 GPa. And also, the ultimate tensile stress was calculated to be 2.3±0.7 GPa from in-situ micro-bending tests, which is not sensitive with the microstructural change of IMCs after dwelling at 290 °C

Heterogeneous Integration on Silicon-Interconnect Fabric using fine-pitch interconnects (≤10 �m)

Today, the ever-growing data-bandwidth demand is pushing the boundaries of the traditional printed circuit board (PCB) based integration schemes. Moreover, with the apparent saturation of semiconductor scaling, commonly called Moore's law, system scaling warrants a paradigm shift in packaging technologies, assembly techniques, and integration methodologies. In this work, a superior alternative to PCBs called the Silicon-Interconnect Fabric (Si-IF) is investigated. The Si-IF is a silicon-based, package-less, fine-pitch, highly scalable, heterogeneous integration platform for wafer-scale systems. In this technology, unpackaged dielets are assembled on the Si-IF at small inter-dielet spacings (≤100 �m) using fine-pitch (≤10 �m) die-to-substrate interconnects. A novel assembly process using a solder-less direct metal-metal (gold-gold and copper-copper) thermal compression bonding was developed. Using this process, sub-10 �m pitch interconnects with a low specific contact resistance of ≤0.7 Ω-�m2 were successfully demonstrated. Because of the tightly packed Si-IF assembly, the communication links between the neighboring dies are short (≤500 �m) with low loss (≤2 dB), comparable to on-chip connections. Consequently, simple buffers can transfer data between dies using a Simple Universal Parallel intERface for chips (SuperCHIPS) at low latency (&lt;30 ps), low energy per bit (≤0.03 pJ/b), and high data-rates (up to 10 Gbps/link), corresponding to an aggregate bandwidth up to 8 Tbps/mm. The benefits of the SuperCHIPS protocol were experimentally demonstrated to provide 5-90X higher data-bandwidth, 8-30X lower latency, and 5-40X lower energy per bit compared to existing integration schemes. This dissertation addresses the assembly technology and communication protocols of the Si-IF technology

MEMS Technologies Enabling the Future Wafer Test Systems

As the form factor of microelectronic systems and chips are continuing to shrink, the demand for increased connectivity and functionality shows an unabated rising trend. This is driving the evolution of technologies that requires 3D approaches for the integration of devices and system design. The 3D technology allows higher packing densities as well as shorter chip-to-chip interconnects. Micro-bump technology with through-silicon vias (TSVs) and advances in flip chip technology enable the development and manufacturing of devices at bump pitch of 14 μm or less. Silicon carrier or interposer enabling 3D chip stacking between the chip and the carrier used in packaging may also offer probing solutions by providing a bonding platform or intermediate board for a substrate or a component probe card assembly. Standard vertical probing technologies use microfabrication technologies for probes, templates and substrate-ceramic packages. Fine pitches, below 50 μm bump pitch, pose enormous challenges and microelectromechanical system (MEMS) processes are finding applications in producing springs, probes, carrier or substrate structures. In this chapter, we explore the application of MEMS-based technologies on manufacturing of advanced probe cards for probing dies with various new pad or bump structures

Copper to copper bonding by nano interfaces for fine pitch interconnections and thermal applications

Ever growing demands for portability and functionality have always governed the electronic technology innovations. IC downscaling with Moore s law at IC level and system miniaturization with System-On-Package (SOP) paradigm at system level, have resulted and will continue to result in ultraminiaturized systems with unprecedented functionality at reduced cost. However, system miniaturization poses several electrical and thermal challenges that demand innovative solutions including advanced materials, bonding and assembly techniques. Heterogeneous material and device integration for thermal structures and IC assembly are limited by the bonding technology and the electrical and thermal impedance of the bonding interfaces. Solder - based bonding technology that is prevalent today is a major limitation to future systems. The trend towards miniaturized systems is expected to drive downscaling of IC I/O pad pitches from 40µm to 1- 5µm in future. Solder technology imposes several pitch, processability and cost restrictions at such fine pitches. Furthermore, according to International Technology Roadmap for Semiconductors (ITRS-2006), the supply current in high performance microprocessors is expected to increase to 220 A by 2012. At such supply current, the current density will exceed the maximum allowable current density of solders. The intrinsic delay and electromigration in solders are other daunting issues that become critical at nanometer sized technology nodes. In addition, formation of intermetallics is also a bottleneck that poses significant mechanical issues. Similarly, thermal power dissipation is growing to unprecedented high with a projected power of 198 W by 2008 (ITRS 2006). Present thermal interfaces are not adequate for such high heat dissipation. Recently, copper based thin film bonding has become a promising approach to address the abovementioned challenges. However, copper-copper direct bonding without using solders has not been studied thoroughly. Typically, bonding is carried out at 400oC for 30 min followed by annealing for 30 min. High thermal budget in such process makes it less attractive for integrated systems because of the associated process incompatibilities. Hence, there is a need to develop a novel low temperature copper to copper bonding process. In the present study, nanomaterials - based copper-to-copper bonding is explored and developed as an alternative to solder-based bonding. To demonstrate fine pitch bonding, the patterning of these nanoparticles is crucial. Therefore, two novel self-patterning techniques based on: 1.) Selective wetting and 2.) Selective nanoparticle deposition, are developed to address this challenge. Nanoparticle active layer facilitates diffusion and, thus, a reliable bond can be achieved using less thermal budget. Quantitative characterization of the bonding revealed good metallurgical bonding with very high bond strength. This has been confirmed by several morphological and structural characterizations. A 30-micron pitch IC assembly test vehicle is used to demonstrate fine pitch patternability and bonding. In conclusion, novel nanoparticle synthesis and patterning techniques were developed and demonstrated for low-impedance and low-cost electrical and thermal interfaces.M.S.Committee Chair: Rao R. Tummala; Committee Member: C. P. Wong; Committee Member: P. M. Ra

Nanowires for 3d silicon interconnection – low temperature compliant nanowire-polymer film for z-axis interconnect

Semiconductor chip packaging has evolved from single chip packaging to 3D heterogeneous system integration using multichip stacking in a single module. One of the key challenges in 3D integration is the high density interconnects that need to be formed between the chips with through-silicon-vias (TSVs) and inter-chip interconnects. Anisotropic Conductive Film (ACF) technology is one of the low-temperature, fine-pitch interconnect method, which has been considered as a potential replacement for solder interconnects in line with continuous scaling of the interconnects in the IC industry. However, the conventional ACF materials are facing challenges to accommodate the reduced pad and pitch size due to the micro-size particles and the particle agglomeration issue. A new interconnect material - Nanowire Anisotropic Conductive Film (NW-ACF), composed of high density copper nanowires of ~ 200 nm diameter and 10-30 µm length that are vertically distributed in a polymeric template, is developed in this work to tackle the constrains of the conventional ACFs and serves as an inter-chip interconnect solution for potential three-dimensional (3D) applications

DENSE 3D HETEROGENEOUS INTEGRATION USING SELECTIVE COBALT ALD DEPOSITION AND RECONSTITUTED TIERS

In this thesis, a new fine-pitch low-temperature bonding technology using selective Cobalt (Co) ALD deposition is presented. The benefits of selective Co ALD bonding are nanometer-scale controllability, low planarity requirement, low bonding temperature (200 oC) and potential for ultra-high-density bonds. To demonstrate selective Co ALD bonding, a Cu/Gap/Cu three-layered structure, which emulates 3D ICs stacking, is fabricated and carefully characterized. The testbed shows seamless Co interconnection between the Cu pads after Co ALD deposition for 1000 cycles. The electrical measurements demonstrate over 90% yield, which prove the Co connectivity between the Cu pads. Moreover, in this thesis, a new type of SiO2-reconstituted-tier stacking technology is proposed. The SiO2-reconstituted-tier stacking technology utilizes low-temperature ICP- PECVD SiO2 to encapsulate multi-sized chiplets. After ICP-PECVD SiO2 encapsulation, the through-oxide-vias and the pads are formed on the SiO2 to complete the reconstituted tier before stacking. Compared with conventional epoxy-molding-compound-based stacking, the SiO2 approach can have smaller loss tangent (10x), lower CTE mismatch (3x) and the higher via density (>400x). The thickness of the proposed technology can be over 10 times smaller than conventional epoxy molding. The two technologies, with further analysis and studies, open up exciting new opportunities for future 3D IC heterogeneous integration.M.S

異種ダイレット積層を用いたフレキシブルハイブリッドデバイスの集積技術に関する研究

Tohoku University福島誉史課

Développement de procédés avancés d'encapsulation de composants microélectroniques basés sur les techniques de thermocompression

L'un des grands défis de la recherche et développement est d'optimiser l'ensemble du cycle de fabrication d'un produit microélectronique, depuis sa conception jusqu’à sa tenue mécanique en service. Un objectif essentiel des entreprises était de réduire le temps de cycles d’assemblage afin de minimiser les coûts de production. La phase d’assemblage des composants microélectroniques est l'une des étapes clé qui doit être bien optimisée afin d’atteindre l’objectif de minimisation du temps de cycle. La méthode d'assemblage traditionnelle des puces par refusion (en anglais mass reflow MR) convenait généralement à une fabrication à grand volume, en particulier pour des puces à pas standard d'environ 150 μm. Cependant, la forte demande du marché pour des interconnexions à pas plus fin, pour permettre un nombre d'entrée/sortie (Input/Output : I/O) plus élevé dans un facteur de forme plus petit, a entraîné une transition du processus de la liaison MR conventionnel à l'assemblage par thermocompression (en anglais ThermoCompression Bonding TCB). Bien que le procédé TCB offre un assemblage de plus grande précision et permet l'utilisation des pas d'interconnexion plus fins, il présente également de nouveaux défis. L'un des problèmes majeurs de l'assemblage TCB est qu'il s'agit d'un processus assez long, dans lequel chaque puce doit être passée indépendamment à travers un cycle TCB complet, incluant le chauffage, le maintien de la température et le refroidissement. Cela entraîne une diminution significative de la productivité par rapport au MR. Le débit de production peut être amélioré en réduisant le temps nécessaire pour atteindre les températures de processus requises. Cependant, des variations thermiques peuvent se produire aux interfaces de liaison, entraînant une mauvaise uniformité de température sur la surface de la puce et conduisant à des régions où le point de fusion de la brasure n'est pas atteint. Ainsi, il est extrêmement important de prévoir et contrôler la température réelle à l'interface de liaison afin d’obtenir une bonne uniformité thermique et des joints de brasure sans défaut. C'est dans cette perspective que s'inscrit les travaux menés dans la première partie de la thèse. Le premier objectif de cette étude était donc de déterminer la durée minimum de temps de chauffe nécessaire assurant une uniformité de température optimal et par conséquent des joints de brasure de bonne qualité. Pour atteindre cet objectif, il fallait alors proposer et valider une nouvelle méthodologie pour estimer la température d'interface lors d'un processus TCB. Une évaluation de l'influence de différentes vitesses de chauffe sur la distribution de température à travers la surface de la puce, ainsi que sur la qualité de liaison résultante, a été réalisée à l’aide d’un capteur de type RTD (). Les résultats ont montré que les défauts de brasure observés aux interfaces de liaison peuvent éventuellement être liés à une mauvaise uniformité de température, liée à des vitesses de chauffe élevées. Des variations thermiques acceptables ont été trouvées à une faible vitesse de chauffage de 80°C/s. Par conséquent, pour surmonter les températures de processus élevées et leurs effets néfastes sur la productivité, le développement d'une nouvelle méthode d’assemblage TCB à basse température devient primordiale. Le développement d’une nouvelle méthode de liaison par thermocompression à l'état solide détecteur de température résistif, Resistance Temperature Detector en anglais était donc notre second objectif dans cette étude. Cette méthode est basée sur la création d'une liaison mécanique temporaire initiale au début du processus de packaging (en utilisant une pression à une température inférieure au point de fusion de la brasure). Les joints de iv brasure seront entièrement refondus à la fin du processus de packaging, lorsque les billes de brasure BGA (ball-grid-array) seront brasées au substrat. Cette nouvelle méthode peut surmonter les limitations associées au processus TCB conventionnel, notamment la température élevée, le processus d'assemblage lent et les contraintes mécaniques élevées. Une investigation a été menée pour déterminer les conditions d'assemblage appropriées à appliquer pendant ce processus. Des investigations supplémentaires ont été également menées pour explorer le mécanisme d'assemblage responsable de l’assemblage mécanique temporaire. Les résultats préliminaires de cette méthode sont prometteurs, montrant des joints de brasure de bonne qualité formés en un temps d'assemblage très court (6 secondes) et à des températures bien inférieures au TCB conventionnel (200°C)