Fault Modeling of Graphene Nanoribbon FET Logic Circuits

[EN] Due to the increasing defect rates in highly scaled complementary metal-oxide-semiconductor (CMOS) devices, and the emergence of alternative nanotechnology devices, reliability challenges are of growing importance. Understanding and controlling the fault mechanisms associated with new materials and structures for both transistors and interconnection is a key issue in novel nanodevices. The graphene nanoribbon field-effect transistor (GNR FET) has revealed itself as a promising technology to design emerging research logic circuits, because of its outstanding potential speed and power properties. This work presents a study of fault causes, mechanisms, and models at the device level, as well as their impact on logic circuits based on GNR FETs. From a literature review of fault causes and mechanisms, fault propagation was analyzed, and fault models were derived for device and logic circuit levels. This study may be helpful for the prevention of faults in the design process of graphene nanodevices. In addition, it can help in the design and evaluation of defect- and fault-tolerant nanoarchitectures based on graphene circuits. Results are compared with other emerging devices, such as carbon nanotube (CNT) FET and nanowire (NW) FET.This work was supported in part by the Spanish Government under the research project TIN2016-81075-R and by Primeros Proyectos de Investigacion (PAID-06-18), Vicerrectorado de Investigacion, Innovacion y Transferencia de la Universitat Politecnica de Valencia (UPV), under the project 200190032.Gil Tomás, DA.; Gracia-Morán, J.; Saiz-Adalid, L.; Gil, P. (2019). Fault Modeling of Graphene Nanoribbon FET Logic Circuits. Electronics. 8(8):1-18. https://doi.org/10.3390/electronics8080851S11888International Technology Roadmap for Semiconductors (ITRS) 2013http://www.itrs2.net/2013-itrs.htmlSchuegraf, K., Abraham, M. C., Brand, A., Naik, M., & Thakur, R. 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Device and circuit-level models for carbon nanotube and graphene nanoribbon transistors

Metal-oxide semiconductor field-effect transistor (MOSFET) scaling throughout the years has enabled us to pack million of MOS transistors on a single chip to keep in pace with Moore’s Law. After forty years of advances in integrated circuit (IC) technology, the scaling of silicon (Si) MOSFET has entered the nanometer dimension with the introduction of 90 nm high volume manufacturing in 2004. The latest technological advancement has led to a low power, high-density and high-speed generation of processor. Nevertheless, the scaling of the Si MOSFET below 22 nm may soon meet its’ fundamental physical limitations. This threshold makes the possible use of novel devices and structures such as carbon nanotube field-effect transistors (CNTFETs) and graphene nanoribbon field-effect transistors (GNRFETs) for future nanoelectronics. The investigation explores the potential of these amazing carbon structures that exceed MOSFET capabilities in term of speed, scalability and power consumption. The research findings demonstrate the potential integration of carbon based technology into existing ICs. In particular, a simulation program with integrated circuit emphasis (SPICE) model for CNTFET and GNRFET in digital logic applications is presented. The device performance of these circuit models and their design layout are then compared to 45 nm and 90 nm MOSFET for benchmarking. It is revealed through the investigation that CNT and GNR channels can overcome the limitations imposed by Si channel length scaling and associated short channel effects while consuming smaller channel area at higher current density

Modeling Of Two Dimensional Graphene And Non-graphene Material Based Tunnel Field Effect Transistors For Integrated Circuit Design

The Moore’s law of scaling of metal oxide semiconductor field effect transistor (MOSFET) had been a driving force toward the unprecedented advancement in development of integrated circuit over the last five decades. As the technology scales down to 7 nm node and below following the Moore’s law, conventional MOSFETs are becoming more vulnerable to extremely high off-state leakage current exhibiting a tremendous amount of standby power dissipation. Moreover, the fundamental physical limit of MOSFET of 60 mV/decade subthreshold slope exacerbates the situation further requiring current transport mechanism other than drift and diffusion for the operation of transistors. One way to limit such unrestrained amount of power dissipation is to explore novel materials with superior thermal and electrical properties compared to traditional bulk materials. On the other hand, energy efficient steep subthreshold slope devices are the other possible alternatives to conventional MOSFET based on emerging novel materials. This dissertation addresses the potential of both advanced materials and devices for development of next generation energy efficient integrated circuits. Among the different steep subthreshold slope devices, tunnel field effect transistor (TFET) has been considered as a promising candidate after MOSFET. A superior gate control on source-channel band-to-band tunneling providing subthreshold slopes well below than 60 mV/decade. With the emergence of atomically thin two-dimensional (2D) materials, interest in the design of TFET based on such novel 2D materials has also grown significantly. Graphene being the first and the most studied among 2D materials with exotic electronic and thermal properties. This dissertation primarily considers current transport modeling of graphene based tunnel devices from transport phenomena to energy efficient integrated circuit design. Three current transport models: semi-classical, semi-quantum and numerical simulations are described for the modeling of graphene nanoribbon tunnel field effect transistor (GNR TFET) where the semi-classical model is in close agreement with the quantum transport simulation. Moreover, the models produced are also extended for integrated circuit design using Verilog-A hardware description language for logic design. In order to overcome the challenges associated with the band gap engineering for making graphene transistor for logic operation, the promise of graphene based interlayer tunneling transistors are discussed along with their existing fundamental physical limitation of subthreshold slope. It has been found that such interlayer tunnel transistor has very poor electrostatic gate control on drain current. It gives subthreshold slope greater than the thermionic limit of 60 mV/decade at room temperature. In order to resolve such limitation of interlayer tunneling transistors, a new type of transistor named “junctionless tunnel effect transistor (JTET)” has been invented and modeled for the first time considering graphene-boron nitride (BN)-graphene and molybdenum disulfide (MoS2)-boron nitride (BN) heterostructures, where the interlayer tunneling mechanism controls the source-drain ballistic transport instead of depleting carriers in the channel. Steep subthreshold slope, low power and high frequency THz operation are few of the promising features studied for such graphene and MoS2 JTETs. From current transport modeling to energy efficient integrated circuit design using Verilog-A has been carried out for these new devices as well. Thus, findings in this dissertation would suggest the exciting opportunity of a new class of next generation energy efficient material based transistors as switches

Two-Dimensional Electronics - Prospects and Challenges

During the past 10 years, two-dimensional materials have found incredible attention in the scientific community. The first two-dimensional material studied in detail was graphene, and many groups explored its potential for electronic applications. Meanwhile, researchers have extended their work to two-dimensional materials beyond graphene. At present, several hundred of these materials are known and part of them is considered to be useful for electronic applications. Rapid progress has been made in research concerning two-dimensional electronics, and a variety of transistors of different two-dimensional materials, including graphene, transition metal dichalcogenides, e.g., MoS2 and WS2, and phosphorene, have been reported. Other areas where two-dimensional materials are considered promising are sensors, transparent electrodes, or displays, to name just a few. This Special Issue of Electronics is devoted to all aspects of two-dimensional materials for electronic applications, including material preparation and analysis, device fabrication and characterization, device physics, modeling and simulation, and circuits. The devices of interest include, but are not limited to transistors (both field-effect transistors and alternative transistor concepts), sensors, optoelectronics devices, MEMS and NEMS, and displays

Graphene nano-ribbon and transition metal dichalcogenide field-effect transistor modeling and circuit simulation

This dissertation presents a modeling and simulation study of graphene nano-ribbon and transition metal dichalcogenide field-effect transistors. Through compact modeling, SPICE implementation of the transistors is realized, and circuit-level simulation is enabled. Extensive simulation studies are performed to evaluate the performance of these two emerging devices

Investigation of Interconnect and Device Designs for Emerging Post-MOSFET and Beyond Silicon Technologies

Title from PDF of title page viewed May 31, 2017Dissertation advisor: Masud H. ChowdhuryVitaIncludes bibliographical references (pages 94-108)Thesis (Ph.D.)--School of Computing and Engineering and Department of Physics and Astronomy. University of Missouri--Kansas City, 2016The integrated circuit industry has been pursuing Moore’s curve down to deep nanoscale dimensions that would lead to the anticipated delivery of 100 billion transistors on a 300 mm² die operating below 1V supply in the next 5-10 years. However, the grand challenge is to reliably and efficiently take the full advantage of the unprecedented computing power offered by the billions of nanoscale transistors on a single chip. To mitigate this challenge, the limitations of both the interconnecting wires and semiconductor devices in integrated circuits have to be addressed. At the interconnect level, the major challenge in current high density integrated circuit is the electromagnetic and electrostatic impacts in the signal carrying lines. Addressing these problems require better analysis of interconnect resistance, inductance, and capacitance. Therefore, this dissertation has proposed a new delay model and analyzed the time-domain output response of complex poles, real poles, and double poles for resistance-inductance capacitance interconnect network based on a second order approximate transfer function. Both analytical models and simulation results show that the real poles model is much faster than the complex poles model, and achieves significantly higher accuracy in order to characterize the overshoot and undershoot of the output responses. On the other hand, the semiconductor industry is anticipating that within a decade silicon devices will be unable to meet the demands at nanoscale due to dimension and material scaling. Recently, molybdenum disulfide (MoS₂) has emerged as a new super material to replace silicon in future semiconductor devices. Besides, conventional field effect transistor technology is also reaching its thermodynamic limit. Breaking this thermal and physical limit requires adoption of new devices based on tunneling mechanism. Keeping the above mentioned trends, this dissertation also proposed a multilayer MoS₂ channel-based tunneling transistor and identifies the fundamental parameters and design specifications that need to be optimized in order to achieve higher ON-currents. A simple analytical model of the proposed device is derived by solving the time-independent Schrodinger equation. It is analytically proven that the proposed device can offer an ON-current of 80 A/m, a subthreshold swing (S) of 9.12 mV/decade, and a / ratio of 10¹².Introduction -- Previous models on interconnect designs -- Proposed delay model for interconnect design -- Investigation of tunneling for field effect transistor -- Study of molybdenum disulfide for FET applications -- Proposed molybdenum disulfide based tunnel transistor -- Conclusion -- Appendix A. Derivation of time delay model -- Appendix B. Derivation of tunneling current model Appendix C. Derivation of subthreshold swing mode

Phase Noise Analyses and Measurements in the Hybrid Memristor-CMOS Phase-Locked Loop Design and Devices Beyond Bulk CMOS

Phase-locked loop (PLLs) has been widely used in analog or mixed-signal integrated circuits. Since there is an increasing market for low noise and high speed devices, PLLs are being employed in communications. In this dissertation, we investigated phase noise, tuning range, jitter, and power performances in different architectures of PLL designs. More energy efficient devices such as memristor, graphene, transition metal di-chalcogenide (TMDC) materials and their respective transistors are introduced in the design phase-locked loop. Subsequently, we modeled phase noise of a CMOS phase-locked loop from the superposition of noises from its building blocks which comprises of a voltage-controlled oscillator, loop filter, frequency divider, phase-frequency detector, and the auxiliary input reference clock. Similarly, a linear time-invariant model that has additive noise sources in frequency domain is used to analyze the phase noise. The modeled phase noise results are further compared with the corresponding phase-locked loop designs in different n-well CMOS processes. With the scaling of CMOS technology and the increase of the electrical field, the problem of short channel effects (SCE) has become dominant, which causes decay in subthreshold slope (SS) and positive and negative shifts in the threshold voltages of nMOS and pMOS transistors, respectively. Various devices are proposed to continue extending Moore\u27s law and the roadmap in semiconductor industry. We employed tunnel field effect transistor owing to its better performance in terms of SS, leakage current, power consumption etc. Applying an appropriate bias voltage to the gate-source region of TFET causes the valence band to align with the conduction band and injecting the charge carriers. Similarly, under reverse bias, the two bands are misaligned and there is no injection of carriers. We implemented graphene TFET and MoS2 in PLL design and the results show improvements in phase noise, jitter, tuning range, and frequency of operation. In addition, the power consumption is greatly reduced due to the low supply voltage of tunnel field effect transistor

Demonstration of monolithically integrated graphene interconnects for low-power CMOS applications

Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2011.Cataloged from PDF version of thesis.Includes bibliographical references (p. 129-141).In recent years, interconnects have become an increasingly difficult design challenge as their relative performance has not improved at the same pace with transistor scaling. The specifications for complex features, clock frequency, supply current, and number of I/O resources have added even greater demands for interconnect performance. Furthermore, the resistivity of copper begins to degrade at smaller line widths due to increased scattering effects. Graphene has gathered much interest as an interconnect material due to its high mobility, high current carrying capacity, and high thermal conductivity. DC characterization of sub-50 nm graphene interconnects has been reported but very few studies exist on evaluating their performance when integrated with CMOS. Integrating graphene with CMOS is a critical step in establishing a path for graphene electronics. In this thesis, we characterize the performance of integrated graphene interconnects and demonstrate two prototype CMOS chips. A 0.35 prm CMOS chip implements an array of transmitter/receivers to analyze end-to-end data communication on graphene wires. Graphene sheets are synthesized by chemical vapor deposition, which are then subsequently transferred and patterned into narrow wires up to 1 mm in length. A low-swing signaling technique is applied, which results in a transmitter energy of 0.3-0.7 pJ/bit/mm, and a total energy of 2.4-5.2 pJ/bit/mm. We demonstrate a minimum voltage swing of 100 mV and bit error rates below 2x10-10. Despite the high sheet resistivity of graphene, integrated graphene links run at speeds up to 50 Mbps. Finally, a subthreshold FPGA was implemented in 0.18 pm CMOS. We demonstrate reliable signal routing on 4-layer graphene wires which replaces parts of the interconnect fabric. The FPGA test chip includes a 5x5 logic array and a TDC-based tester to monitor the delay of graphene wires. The graphene wires have 2.8x lower capacitance than the reference metal wires, resulting in up to 2.11x faster speeds and 1.54x lower interconnect energy when driven by a low-swing voltage of 0.4 V. This work presents the first graphene-based system application and demonstrates the potential of using low capacitance graphene wires for ultra-low power electronics.by Kyeong-Jae Lee.Ph.D

Emerging Nanophotonic Applications Explored with Advanced Scientific Parallel Computing

The domain of nanoscale optical science and technology is a combination of the classical world of electromagnetics and the quantum mechanical regime of atoms and molecules. Recent advancements in fabrication technology allows the optical structures to be scaled down to nanoscale size or even to the atomic level, which are far smaller than the wavelength they are designed for. These nanostructures can have unique, controllable, and tunable optical properties and their interactions with quantum materials can have important near-field and far-field optical response. Undoubtedly, these optical properties can have many important applications, ranging from the efficient and tunable light sources, detectors, filters, modulators, high-speed all-optical switches; to the next-generation classical and quantum computation, and biophotonic medical sensors. This emerging research of nanoscience, known as nanophotonics, is a highly interdisciplinary field requiring expertise in materials science, physics, electrical engineering, and scientific computing, modeling and simulation. It has also become an important research field for investigating the science and engineering of light-matter interactions that take place on wavelength and subwavelength scales where the nature of the nanostructured matter controls the interactions. In addition, the fast advancements in the computing capabilities, such as parallel computing, also become as a critical element for investigating advanced nanophotonic devices. This role has taken on even greater urgency with the scale-down of device dimensions, and the design for these devices require extensive memory and extremely long core hours. Thus distributed computing platforms associated with parallel computing are required for faster designs processes. Scientific parallel computing constructs mathematical models and quantitative analysis techniques, and uses the computing machines to analyze and solve otherwise intractable scientific challenges. In particular, parallel computing are forms of computation operating on the principle that large problems can often be divided into smaller ones, which are then solved concurrently. In this dissertation, we report a series of new nanophotonic developments using the advanced parallel computing techniques. The applications include the structure optimizations at the nanoscale to control both the electromagnetic response of materials, and to manipulate nanoscale structures for enhanced field concentration, which enable breakthroughs in imaging, sensing systems (chapter 3 and 4) and improve the spatial-temporal resolutions of spectroscopies (chapter 5). We also report the investigations on the confinement study of optical-matter interactions at the quantum mechanical regime, where the size-dependent novel properties enhanced a wide range of technologies from the tunable and efficient light sources, detectors, to other nanophotonic elements with enhanced functionality (chapter 6 and 7)