Electromigration modeling and layout optimization for advanced VLSI

textElectromigration (EM) is a critical problem for interconnect reliability in advanced VLSI design. Because EM is a strong function of current density, a smaller cross-sectional area of interconnects can degrade the EM-related lifetime of IC, which is expected to become more severe in future technology nodes. Moreover, as EM is governed by various factors such as temperature, material property, geometrical shape, and mechanical stress, different interconnect structures can have distinct EM issues and solutions to mitigate them. For example, one of the most prominent technologies, die stacking technology of three-dimensional (3D) ICs, can have different EM problems from that of planer ICs, due to their unique interconnects such as through-silicon vias (TSVs). This dissertation investigates EM in various interconnect structures, and applies the EM models to optimize IC layout. First, modeling of EM is developed for chip-level interconnects, such as wires, local vias, TSVs, and multi-scale vias (MSVs). Based on the models, fast and accurate EM-prediction methods are proposed for the chip-level designs. After that, by utilizing the EM-prediction methods, the layout optimization methods are suggested, such as EM-aware routing for 3D ICs and EM-aware redundant via insertion for the future technology nodes in VLSI. Experimental results show that the proposed EM modeling approaches enable fast and accurate EM evaluation for chip design, and the EM-aware layout optimization methods improve EM-robustness of advanced VLSI designs.Electrical and Computer Engineerin

Green on-chip inductors in three-dimensional integrated circuits

This thesis focuses on the technique for the improvement of quality factor and inductance of the TSV inductors and then on the utilization of TSV inductors in various on-chip applications such as DC-DC converter and resonant clocking. Through-silicon-vias (TSVs) are the enabling technique for three-dimensional integrated circuits (3D ICs). However, their large area significantly reduces the benefits that can be obtained by 3D ICs. On the other hand, a major limiting factor for the implementation of many on-chip circuits such as DC-DC converters and resonant clocking is the large area overhead induced by spiral inductors. Several works have been proposed in the literature to make inductors out of idle TSVs. In this thesis, the technique to improve the quality factor and inductance is proposed and then discusses about two applications utilizing TSV inductors i.e., inductive DC-DC converters and LC resonant clocking. The TSV inductor performs inferior to spiral inductors due to its increases losses. Hence to improve the performance of the TSV inductor, the losses should be reduced. Inductive DC-DC converters become prominent for on-chip voltage conversion because of their high efficiency compared with other types of converters (e.g. linear and capacitive converters). On the other hand, to reduce on-chip power, LC resonant clocking has become an attractive option due to its same amplitude and phases compared to other resonant clocking methods such as standing wave and rotary wave. A major challenge for both applications is associated with the required inductor area. In this thesis, the effectiveness of such TSV inductors in addressing both challenges are demonstrated --Abstract, page iv

Heterogeneous 2.5D integration on through silicon interposer

© 2015 AIP Publishing LLC. Driven by the need to reduce the power consumption of mobile devices, and servers/data centers, and yet continue to deliver improved performance and experience by the end consumer of digital data, the semiconductor industry is looking for new technologies for manufacturing integrated circuits (ICs). In this quest, power consumed in transferring data over copper interconnects is a sizeable portion that needs to be addressed now and continuing over the next few decades. 2.5D Through-Si-Interposer (TSI) is a strong candidate to deliver improved performance while consuming lower power than in previous generations of servers/data centers and mobile devices. These low-power/high-performance advantages are realized through achievement of high interconnect densities on the TSI (higher than ever seen on Printed Circuit Boards (PCBs) or organic substrates), and enabling heterogeneous integration on the TSI platform where individual ICs are assembled at close proximity

Multiphysics modeling and simulation for large-scale integrated circuits

This dissertation is a process of seeking solutions to two important and challenging problems related to the design of modern integrated circuits (ICs): the ever increasing couplings among the multiphysics and the large problem size arising from the escalating complexity of the designs. A multiphysics-based computer-aided design methodology is proposed and realized to address multiple aspects of a design simultaneously, which include electromagnetics, heat transfer, fluid dynamics, and structure mechanics. The multiphysics simulation is based on the finite element method for its unmatched capabilities in handling complicate geometries and material properties. The capability of the multiphysics simulation is demonstrated through its applications in a variety of important problems, including the static and dynamic IR-drop analyses of power distribution networks, the thermal-ware high-frequency characterization of through-silicon-via structures, the full-wave electromagnetic analysis of high-power RF/microwave circuits, the modeling and analysis of three-dimensional ICs with integrated microchannel cooling, the characterization of micro- and nanoscale electrical-mechanical systems, and the modeling of decoupling capacitor derating in the power integrity simulations. To perform the large-scale analysis in a highly efficient manner, a domain decomposition scheme, parallel computing, and an adaptive time-stepping scheme are incorporated into the proposed multiphysics simulation. Significant reduction in computation time is achieved through the two numerical schemes and the parallel computing with multiple processors

Heterogeneous Integration of RF and Microwave Systems Using Multi-layer Low-Temperature Co-fired Ceramics Technology

[eng] The aim of this work is the development of a modelling methodology for the fast analysis of non-radiative multilayer RF passive components without compromising solution accuracy. Instead of following a compact model approach, oftenly used in integrated technologies, the method is based on a specialized quasi-static partial element equivalent circuit (PEEC) numerical solver. Besides speed and accuracy, the solver can be embedded in circuit simulators; thus, models are already available in the schematic entry. Using this framework, model scalability is enhanced in terms of geometry, substrate cross-section, material properties, topology and boundary conditions. The dissertation starts showing the actual performance of the obtained solver and the motivations beneath its development. Then, the description about solver development is splitted in three parts, but all of them are interrelated. First, the PEEC formulation is adapted according to relevant electromagnetic behaviour of the component. It is worth stressing that a different perspective related to the principle of virtual work is used in this formulation. The second part deals with the evaluation of partial elements, the core of the solver. It is carried out using analytical space-domain close-form solutions of the Green’s function (GF) of the substrate. Partial elements are then assembled into a mesh. Therefore, the importance of the mesh up on solution accuracy is discussed in the last part and a basic layout aware mesh generator is proposed. Practical application of the methodology includes the implementation of a library of RF passives for multilayer substrate. For validation, the chosen substrate is a low temperature co-fired ceramics (LTCC) technology. Different set of devices have been fabricated, characterized and compared against model prediction. In addition, the obtained results are also verified using state-of-the-art electromagnetic solvers.[spa] El objetivo de este trabajo es el desarrollo de una metodología de modelado para el análisis rápido, pero sin comprometer la precisión de la solución, de componentes pasivos no radiativos de RF en substratos multicapa. El método se basa en el algoritmo numérico cuasi-estático de los elementos parciales de circuito equivalente (PEEC). Éste puede ser incorporado en simuladores de circuitos; por tanto, los modelos ya están disponibles en la entrada de esquemático de forma transparente para el diseñador de circuitos. Utilizando este marco, la escalabilidad del modelo se mejora en términos de la geometría, la definición del corte tecnológico, las propiedades del material, la topología del componente y las condiciones de contorno electro-magnéticas. Esta disertación comienza mostrando las motivaciones que han llevado a su desarrollo y la capacidad real del método de resolución obtenido. A partir de aquí, se realiza la descripción de todo el desarrollo del marco numérico que se divide en tres partes que están interrelacionadas. En primer lugar, la formulación PEEC se adapta según el comportamiento electromagnético real del componente. Vale la pena subrayar que en esta formulación se utiliza una perspectiva diferente a la habitual y que está relacionada con el principio de los trabajos virtuales de d’Alembert. La segunda parte trata de cómo se evalúan los elementos parciales y constituye el núcleo principal del algoritmo. Se lleva a cabo utilizando soluciones analíticas de la función de Green (GF) del sustrato en el dominio espacial. Los elementos parciales, que forman la malla numérica del modelo, se ensamblan en la matriz del sistema siguiendo un procedimiento de análisis nodal modificado (MNA). En la última parte, se discute la importancia de la malla sobre la precisión de la solución y se propone un generador de malla basado en la física del componente y no sólo en la descripción de la geometría. Como aplicación práctica de la metodología, se realiza la generación de una biblioteca de componentes pasivos RF para sustratos multicapa

Piin läpivientien luotettavuus ja elinikä termisessä rasituksessa

Through-silicon via (TSV) is one of the key technologies for three-dimensional (3D) integrated circuits (ICs). TSVs enable vertical electrical connections between components which greatly reduces interconnection lengths. Regardless of all the promise the technique has shown, there are still major obstacles surrounding reliability and the cost of fabrication of the TSV structure. The first part of the thesis is a literature survey that focuses on different failure mechanisms of TSVs. In addition, different fabrication and design choices of TSVs are presented with the focus being on their effect on reliability. The experimental part of the thesis presents reliability and lifetime assessment of tapered partially copper-filled blind TSVs under thermal cycling. The reliability test was carried out with nine samples. Six of them had 420 vias and three of them had 1400 vias in a daisy chain structure. Finite element method (FEM) was used to predict the critical failure locations of the TSV structure. Lifetime was predicted by Weibull analysis. The cross-sections of the test samples were prepared by molding, mechanical grinding and polishing and analyzed by scanning electron microscope (SEM). Electrical measurements showed almost constant resistance increase in the samples before failures were noticed. The first failed sample was noticed after 200 cycles and the last at 4000 cycles. Lifetime of TSVs under thermal cycling was proven to be acceptable with used failure criterion. According to Weibull analysis, about 10 % of the samples with 420 vias will break after 1000 cycles. Sample preparation for imaging was deemed sufficient although the grinding caused artifacts. The simulation results were compared with SEM micrographs. The images showed that the failures were located at the maximum stress areas, identified with FEM simulations, at the bottom of the via. From the SEM images, it was deduced that the defects initiated from the fabrication process and propagated due to maximum localized stress.Piin läpivienti -rakenteet ovat keskeisessä osassa kolmiulotteisten integroitujen piirien kehityksessä. Piin läpiviennit mahdollistavat komponenttien vertikaalin yhdistämisen toisiinsa, mikä lyhentää huomattavasti niiden välistä etäisyyttä. Kaikista hyvistä puolista huolimatta tekniikalla on vielä haasteita edessään. Niistä suurimmat liittyvät rakenteen luotettavuuteen ja valmistuskustannuksiin. Diplomityön kirjallisessa osuudessa keskitytään piin läpivientien erilaisiin vauriomekanismeihin. Sen lisäksi tutkitaan valmistus- ja suunnitteluratkaisujen vaikutusta läpivientien luotettavuuteen. Kokeellisen osan tarkoituksena on osittain kuparitäytettyjen kaventuvien piin läpivientien luotettavuuden ja eliniän määrittäminen termisessä syklaustestissä. Luotettavuustestaus suoritettiin yhdeksällä näytteellä, joista kuudessa oli 420 läpivientiä ja kolmessa 1400 läpivientiä ketjurakenteessa. Elementtimallintamisen avulla määritettiin kriittiset vauriokohdat läpivientirakenteessa ja elinikä määritettiin Weibull-analyysillä. Näytteiden poikkileikkauksien valmistamiseen käytettiin muovaamista, mekaanista hiomista ja kiillotusta ja analysointi suoritettiin pyyhkäisyelektronimikroskoopilla. Näytteiden resistanssi nousi tasaisesti ennen rikkoutumisten havaitsemista. Ensimmäinen rikkoutuminen huomattiin 200 syklin jälkeen ja viimeinen 4000 syklin kohdalla. Näytteiden luotettavuus osoittautui hyväksi käytetyillä kriteereillä. Weibull-analyysin mukaan 10 % 420 läpiviennin näytteistä rikkoutuu 1000 syklin jälkeen. Karkea arvio voidaan tehdä, että satunnainen läpivienti rikkoutuu 0,024 % todennäköisyydellä 1000 syklin jälkeen. Pyyhkäisyelektronimikroskoopin kuvien perusteella havaittiin, että näytteet rikkoutuivat maksimaalisen rasituksen alueella läpivientien alaosassa. Kuvien perusteella päädyttiin johtopäätökseen, että näytteiden rikkoutumisen aiheuttivat virheet, jotka ovat peräisin valmistusprosessista ja jotka etenivät rakenteessa termisen rasituksen vaikutuksesta

Physical Design Methodologies for Low Power and Reliable 3D ICs

As the semiconductor industry struggles to maintain its momentum down the path following the Moore's Law, three dimensional integrated circuit (3D IC) technology has emerged as a promising solution to achieve higher integration density, better performance, and lower power consumption. However, despite its significant improvement in electrical performance, 3D IC presents several serious physical design challenges. In this dissertation, we investigate physical design methodologies for 3D ICs with primary focus on two areas: low power 3D clock tree design, and reliability degradation modeling and management. Clock trees are essential parts for digital system which dissipate a large amount of power due to high capacitive loads. The majority of existing 3D clock tree designs focus on minimizing the total wire length, which produces sub-optimal results for power optimization. In this dissertation, we formulate a 3D clock tree design flow which directly optimizes for clock power. Besides, we also investigate the design methodology for clock gating a 3D clock tree, which uses shutdown gates to selectively turn off unnecessary clock activities. Different from the common assumption in 2D ICs that shutdown gates are cheap thus can be applied at every clock node, shutdown gates in 3D ICs introduce additional control TSVs, which compete with clock TSVs for placement resources. We explore the design methodologies to produce the optimal allocation and placement for clock and control TSVs so that the clock power is minimized. We show that the proposed synthesis flow saves significant clock power while accounting for available TSV placement area. Vertical integration also brings new reliability challenges including TSV's electromigration (EM) and several other reliability loss mechanisms caused by TSV-induced stress. These reliability loss models involve complex inter-dependencies between electrical and thermal conditions, which have not been investigated in the past. In this dissertation we set up an electrical/thermal/reliability co-simulation framework to capture the transient of reliability loss in 3D ICs. We further derive and validate an analytical reliability objective function that can be integrated into the 3D placement design flow. The reliability aware placement scheme enables co-design and co-optimization of both the electrical and reliability property, thus improves both the circuit's performance and its lifetime. Our electrical/reliability co-design scheme avoids unnecessary design cycles or application of ad-hoc fixes that lead to sub-optimal performance. Vertical integration also enables stacking DRAM on top of CPU, providing high bandwidth and short latency. However, non-uniform voltage fluctuation and local thermal hotspot in CPU layers are coupled into DRAM layers, causing a non-uniform bit-cell leakage (thereby bit flip) distribution. We propose a performance-power-resilience simulation framework to capture DRAM soft error in 3D multi-core CPU systems. In addition, a dynamic resilience management (DRM) scheme is investigated, which adaptively tunes CPU's operating points to adjust DRAM's voltage noise and thermal condition during runtime. The DRM uses dynamic frequency scaling to achieve a resilience borrow-in strategy, which effectively enhances DRAM's resilience without sacrificing performance. The proposed physical design methodologies should act as important building blocks for 3D ICs and push 3D ICs toward mainstream acceptance in the near future

The Development of Novel Interconnection Technologies for 3D Packaging of Wire Bondless Silicon Carbide Power Modules

This dissertation advances the cause for the 3D packaging and integration of silicon carbide power modules. 3D wire bondless approaches adopted for enhancing the performance of silicon power modules were surveyed, and their merits were assessed to serve as a vision for the future of SiC power packaging. Current efforts pursuing 3D wire bondless SiC power modules were investigated, and the concept for a novel SiC power module was discussed. This highly-integrated SiC power module was assessed for feasibility, with a focus on achieving ultralow parasitic inductances in the critical switching loops. This will enable higher switching frequencies, leading to a reduction in the size of the passive devices in the system and resulting in systems with lower weight and volume. The proposed concept yielded an order-of-magnitude reduction in system parasitics, alongside the possibility of a compact system integration. The technological barriers to realizing these concepts were identified, and solutions for novel interconnection schemes were proposed and evaluated. A novel sintered silver preform was developed to facilitate flip-chip interconnections for a bare-die power device while operating in a high ambient temperature. The preform was demonstrated to have 3.75× more bonding strength than a conventional sintered silver bond and passed rigorous thermal shock tests. A chip-scale and flip-chip capable power device was also developed. The novel package combined the ease of assembly of a discrete device with a performance exceeding a wire bonded module. It occupied a 14× smaller footprint than a discrete device, and offered power loop inductances which were less than a third of a conventional wire bonded module. A detailed manufacturing process flow and qualification is included in this dissertation. These novel devices were implemented in various electrical systems—a discrete Schottky barrier diode package, a half-bridge module with external gate drive, and finally a half-bridge with integrated gate driver in-module. The results of these investigations have been reported and their benefits assessed. The wire bondless modules showed \u3c 5% overshoot under all test conditions. No observable detrimental effects due to dv/dt were observed for any of the modules even under aggressive voltage slew rates of 20-25 V/ns

Through-Silicon Vias in SiGe BiCMOS and Interposer Technologies for Sub-THz Applications

Im Rahmen der vorliegenden Dissertation zum Thema „Through-Silicon Vias in SiGe BiCMOS and Interposer Technologies for Sub-THz Applications“ wurde auf Basis einer 130 nm SiGe BiCMOS Technologie ein Through-Silicon Via (TSV) Technologiemodul zur Herstellung elektrischer Durchkontaktierungen für die Anwendung im Millimeterwellen und Sub-THz Frequenzbereich entwickelt. TSVs wurden mittels elektromagnetischer Simulationen modelliert und in Bezug auf ihre elektrischen Eigenschaften bis in den sub-THz Bereich bis zu 300 GHz optimiert. Es wurden die Wechselwirkungen zwischen Modellierung, Fertigungstechnologie und den elektrischen Eigenschaften untersucht. Besonderes Augenmerk wurde auf die technologischen Einflussfaktoren gelegt. Daraus schlussfolgernd wurde das TSV Technologiemodul entwickelt und in eine SiGe BiCMOS Technologie integriert. Hierzu wurde eine Via-Middle Integration gewählt, welche eine Freilegung der TSVs von der Wafer Rückseite erfordert. Durch die geringe Waferdicke von ca. 75 μm wird einen Carrier Wafer Handling Prozess verwendet. Dieser Prozess wurde unter der Randbedingung entwickelt, dass eine nachfolgende Bearbeitung der Wafer innerhalb der BiCMOS Pilotlinie erfolgen kann. Die Rückseitenbearbeitung zielt darauf ab, einen Redistribution Layer auf der Rückseite der BiCMOS Wafer zu realisieren. Hierzu wurde ein Prozess entwickelt, um gleichzeitig verschiedene TSV Strukturen mit variablen Geometrien zu realisieren und damit eine hohe TSV Design Flexibilität zu gewährleisten. Die TSV Strukturen wurden von DC bis über 300 GHz charakterisiert und die elektrischen Eigenschaften extrahiert. Dabei wurde gezeigt, dass TSV Verbindungen mit sehr geringer Dämpfung <1 dB bis 300 GHz realisierbar sind und somit ausgezeichnete Hochfrequenzeigenschaften aufweisen. Zuletzt wurden vielfältige Anwendungen wie das Grounding von Hochfrequenzschaltkreisen, Interposer mit Waveguides und 300 GHz Antennen dargestellt. Das Potential für Millimeterwellen Packaging und 3D Integration wurde evaluiert. TSV Technologien sind heutzutage in vielen Anwendungen z.B. im Bereich der Systemintegration von Digitalschaltkreisen und der Spannungsversorgung von integrierten Schaltkreisen etabliert. Im Rahmen dieser Arbeit wurde der Einsatz von TSVs für Millimeterwellen und dem sub-THz Frequenzbereich untersucht und die Anwendung für den sub-THz Bereich bis 300 GHz demonstriert. Dadurch werden neue Möglichkeiten der Systemintegration und des Packaging von Höchstfrequenzsystemen geschaffen.:Bibliographische Beschreibung List of symbols and abbreviations Acknowledgement 1. Introduction 2. FEM Modeling of BiCMOS & Interposer Through-Silicon Vias 3. Fabrication of BiCMOS & Silicon Interposer with TSVs 4. Characterization of BiCMOS Embedded Through-Silicon Vias 5. Applications 6. Conclusion and Future Work 7. Appendix 8. Publications & Patents 9. Bibliography 10. List of Figures and Table