Advanced AlGaN/GaN HEMT technology, design, fabrication and characterization

Nowadays, the microelectronics technology is based on the mature and very well established silicon (Si) technology. However, Si exhibits some important limitations regarding its voltage blocking capability, operation temperature and switching frequency. In this sense, Gallium Nitride (GaN)-based high electron mobility transistors (HEMTs) devices have the potential to make this change possible. The unique combination of the high-breakdown field, the high-channel electron mobility of the two dimensional electron gas (2DEG), and high-temperature of operation has attracted enormous interest from social, academia and industry and in this context this PhD dissertation has been made. This thesis has focused on improving the device performance through the advanced design, fabrication and characterization of AlGaN/GaN HEMTs, primarily grown on Si templates. The first milestone of this PhD dissertation has been the establishment of a know-how on GaN HEMT technology from several points of view: the device design, the device modeling, the process fabrication and the advanced characterization primarily using devices fabricated at Centre de Recherche sur l'Hétéro-Epitaxie (CRHEA-CNRS) (France) in the framework of a collaborative project. In this project, the main workhorse of this dissertation was the explorative analysis performed on the AlGaN/GaN HEMTs by innovative electrical and physical characterization methods. A relevant objective of this thesis was also to merge the nanotechnology approach with the conventional characterization techniques at the device scale to understand the device performance. A number of physical characterization techniques have been imaginatively used during this PhD determine the main physical parameters of our devices such as the morphology, the composition, the threading dislocations density, the nanoscale conductive pattern and others. The conductive atomic force microscopy (CAFM) tool have been widely described and used to understand the conduction mechanisms through the AlGaN/GaN Ohmic contact by performing simultaneously topography and electrical conductivity measurements. As it occurs with the most of the electronic switches, the gate stack is maybe the critical part of the device in terms of performance and longtime reliability. For this reason, how the AlGaN/GaN HEMT gate contact affects the overall HEMT behaviour by means of advanced characterization and modeling has been intensively investigated. It is worth mentioning that the high-temperature characterization is also a cornerstone of this PhD. It has been reported the elevated temperature impact on the forward and the reverse leakage currents for analogous Schottky gate HEMTs grown on different substrates: Si, sapphire and free-standing GaN (FS-GaN). The HEMT' forward-current temperature coefficients (T^a) as well as the thermal activation energies have been determined in the range of 25-300 ºC. Besides, the impact of the elevated temperature on the Ohmic and gate contacts has also been investigated. The main results of the gold-free AlGaN/GaN HEMTs high-voltage devices fabricated with a 4 inch Si CMOS compatible technology at the clean room of the CNM in the framework of the industrial contract with ON semiconductor were presented. We have shown that the fabricated devices are in the state-of-the-art (gold-free Ohmic and Schottky contacts) taking into account their power device figure-of-merit ((VB^2)/Ron) of 4.05×10^8 W/cm^2. Basically, two different families of AlGaN/GaN-on-Si MIS-HEMTs devices were fabricated on commercial 4 inch wafers: (i) using a thin ALD HfO2 (deposited on the CNM clean room) and (ii) thin in-situ grown Si3N4, as a gate insulator (grown by the vendor). The scientific impact of this PhD in terms of science indicators is of 17 journal papers (8 as first author) and 10 contributions at international conferences

Wide Bandgap Based Devices

Emerging wide bandgap (WBG) semiconductors hold the potential to advance the global industry in the same way that, more than 50 years ago, the invention of the silicon (Si) chip enabled the modern computer era. SiC- and GaN-based devices are starting to become more commercially available. Smaller, faster, and more efficient than their counterpart Si-based components, these WBG devices also offer greater expected reliability in tougher operating conditions. Furthermore, in this frame, a new class of microelectronic-grade semiconducting materials that have an even larger bandgap than the previously established wide bandgap semiconductors, such as GaN and SiC, have been created, and are thus referred to as “ultra-wide bandgap” materials. These materials, which include AlGaN, AlN, diamond, Ga2O3, and BN, offer theoretically superior properties, including a higher critical breakdown field, higher temperature operation, and potentially higher radiation tolerance. These attributes, in turn, make it possible to use revolutionary new devices for extreme environments, such as high-efficiency power transistors, because of the improved Baliga figure of merit, ultra-high voltage pulsed power switches, high-efficiency UV-LEDs, and electronics. This Special Issue aims to collect high quality research papers, short communications, and review articles that focus on wide bandgap device design, fabrication, and advanced characterization. The Special Issue will also publish selected papers from the 43rd Workshop on Compound Semiconductor Devices and Integrated Circuits, held in France (WOCSDICE 2019), which brings together scientists and engineers working in the area of III–V, and other compound semiconductor devices and integrated circuits

High-frequency response and thermal effects in GaN diodes and transistors: modeling and experimental characterization

Se han analizado diodos autoconmutantes (SSDs) y transitores de alta movilidad de electrones (HEMTs) de GaN, tanto en el régimen DC como en AC, tanto desde el punto de vista experimental como de simulaciones. Las no linealidades presentes en las curvas corriente-voltaje permiten su operación como detectores de microondas a polarización nula. A pesar de las buenas propiedades del GaN, existen problemas tecnológicos relacionados con defectos, trampas y calentamiento que deben ser investigados para perfeccionar la electrónica de potencia en el futuro. Medidas pulsadas y de transitorios de corriente realizadas sobre el SSD han revelado la influencia de trampas volúmicas y superficiales, observándose anomalías en las características DC e impedancia AC. Los efectos superficiales son relevantes en canales estrechos puesto que la relación superficie-volumen del dispositivo aumenta, mientras que en los dispositivos más anchos prevalece la influencia de las trampas de tipo volúmico. Las medidas muestran un incremento anómalo de la detección a bajas temperaturas, mientras que a altas frecuencias el voltaje detectado muestra una caída que atribuimos a la presencia de trampas de tipo superficial y volúmico. Se ha observado una fuerte dispersión a baja frecuencia tanto de la transconductanciacomo de la conductancia de salida en HEMTs de AlGaN/AlN/GaN en el rango de microondas, que atribuimos a la presencia de trampas y defectos tanto en el volumen de canal de GaN como en los contactos de fuente y drenador. Estos efectos han sido modelados mediante un circuito equivalente (SSEC) modificado, obteniéndose un acuerdo excelente con los parámetros S medidos. La geometría del dispositivo afecta a los valores de los elementos del circuito equivalente y con ello a las frecuencias de corte, siendo la longitud de puerta el parámetro más influyente. Para LG = 75 nm, ft y fmax son 72 y 89 GHz, respectivamente, en los HEMTs estudiados. En los SSDs caracterizados, se ha observado una potencia equivalente del ruido (NEP) de 100 - 500 pW/Hz1=2 y una responsividad de decenas de V/W con una fuente de 50 ohmios. Se ha demostrado una frecuencia de corte de unos 200 GHz junto a una respuesta cuadrática hasta 20 dBm de potencia de entrada. A bajas frecuencias, las medidas RF muestran una responsividad que reproduce bien los cálculos realizados mediante un modelo cuasiestático (QS) basado en la pendiente y la curvatura de las curvas corriente-voltaje. Polarizar los dispositivos aumenta el voltaje detectado a costa del consumo de potencia y la aparición de ruido 1/f. El modelo QS predice que la reducción de la anchura del canal mejora la responsividad, hecho que ha sido confirmado experimentalmente. El aumento del número de diodos en paralelo reduce la impedancia; cuando coincide con el triple de la impedancia de la linea de transmisión o la antena, la NEP alcanza su valor mínimo. Los diodos con puerta (G-SSDs) muestran, en espacio libre a 300 GHz, una responsividad en torno a 600 V/W y una NEP en torno a 50 pW/Hz1=2 cerca del voltaje umbral. De nuevo, se obtiene un buen acuerdo entre los resultados del modelo QS, las medidas a 900 MHz y las medidas en espacio libre a 300 GHz, todo ello por encima de la zona subumbral. La NEP mejora al aumentar el número de canales en paralelo. Se han comparado los resultados de la detección inyectando la señal por el drenador (DCS) y la puerta (GCS) de los HEMTs hasta 40 GHz. Para DCS, se han obtenido una responsividad en torno a 400 V/W y una NEP de 30 pW/Hz1/2, en un HEMT con LG = 150 nm a temperatura ambiente bajo condiciones de polarización nula y puerta polarizada cerca del umbral. Por otro lado, la responsividad se incrementa en GCS hasta 1.4 kV/W, con la desventaja de polarizar con una corriente de drenador de ID = 1.2 mA. Ambas configuraciones muestran una frecuencia de corte, con -3 dB de caída, en torno a 40 GHz. Resulta interesante que en GCS y a unafrecuencia suficientemente alta para cortocircuitar la rama puerta-drenador con la de la no linealidad, se consigue detectar una responsividad no nula. El estudio del autocalentamiento se vuelve relevante cuando los dispositivos trabajan en condiciones de alta potencia. Las simulaciones se han realizado con una herramienta Monte Carlo (MC) desarrollada por el grupo y acoplada con dos modelos térmicos: (i) modelo de resistencia térmica (TRM) y (ii) un modelo electrotérmico avanzado y que se basa en la resolución autoconsistente de la ecuación del calor independiente del tiempo. A temperatura ambiente la herramienta MC se calibró comparando con resultados experimentales de TLMs (transfer length measurement ), lográndose reproducir la densidad supercial de portadores y la movilidad. Incluyendo la resistencia de contactos, la barrera Schottky y la barrera térmica, nuestros resultados se han validado con medidas experimentales de un HEMT de dimensiones LDS = 1.5 micras y LG = 150 nm, encontrándose un acuerdo razonable. El TRM da unos resultados similares al ETM con valores de la resistencia térmica (RTH) bien calibradas. La principal ventaja del ETM es la posibilidad de obtener mapas de temperatura dentro del canal e identificar la localización de los puntos calientes. También se discute el impacto de la polarización en el SSEC y las discrepancias entre los modelos ETM y TRM. Se utilizan medidas pulsadas hasta 500 K para estimar la temperatura del canal y el valor de la RTH. Para T 250 K.Nanoelectrónica de gap ancho y estrecho para la mejora de la eficiencia en aplicaciones de RF y THz (TEC2013-41640-R). Ministerio de Economía y Competitividad (MINECO). Estudio de efectos térmicos en dispositivos de RF. Modelado y caracterización experimental (SA052U13). Consejería de Educación de la Junta de Castilla y León. Emisores y detectores de terahercios basados en nanodiodos semiconductores para comunicaciones e imagen médica y de seguridad (SA022U16). Consejería de Educación de la Junta de Castilla y León. Tecnologías de diodos de GaN para generación y detección en la banda de subterahercios (TEC2017-83910-R). Ministerio de Economía y Competitividad (MINECO). Simulación y caracterización de efectos electrotérmicos en dispositivos de subterahercios para comunicaciones de alta velocidad (SA254P18). Consejería de Educación de la Junta de Castilla y León

High-frequency response and thermal effects in GaN diodes and transistors: modeling and experimental characterization

[ES] Se han analizado diodos autoconmutantes (SSDs) y transitores de alta movilidad de electrones (HEMTs) de GaN, tanto en el régimen DC como en AC, tanto desde el punto de vista experimental como de simulaciones. Las no linealidades presentes en las curvas corriente-voltaje permiten su operación como detectores de microondas a polarización nula. A pesar de las buenas propiedades del GaN, existen problemas tecnológicos relacionados con defectos, trampas y calentamiento que deben ser investigados para perfeccionar la electrónica de potencia en el futuro. Medidas pulsadas y de transitorios de corriente realizadas sobre el SSD han revelado la influencia de trampas volúmicas y superficiales, observándose anomalías en las características DC e impedancia AC. Los efectos superficiales son relevantes en canales estrechos puesto que la relación superficie-volumen del dispositivo aumenta, mientras que en los dispositivos más anchos prevalece la influencia de las trampas de tipo volúmico. Las medidas muestran un incremento anómalo de la detección a bajas temperaturas, mientras que a altas frecuencias el voltaje detectado muestra una caída que atribuimos a la presencia de trampas de tipo superficial y volúmico. Se ha observado una fuerte dispersión a baja frecuencia tanto de la transconductanciacomo de la conductancia de salida en HEMTs de AlGaN/AlN/GaN en el rango de microondas, que atribuimos a la presencia de trampas y defectos tanto en el volumen de canal de GaN como en los contactos de fuente y drenador. Estos efectos han sido modelados mediante un circuito equivalente (SSEC) modificado, obteniéndose un acuerdo excelente con los parámetros S medidos. La geometría del dispositivo afecta a los valores de los elementos del circuito equivalente y con ello a las frecuencias de corte, siendo la longitud de puerta el parámetro más influyente. Para LG = 75 nm, ft y fmax son 72 y 89 GHz, respectivamente, en los HEMTs estudiados. En los SSDs caracterizados, se ha observado una potencia equivalente del ruido (NEP) de 100 - 500 pW/Hz1=2 y una responsividad de decenas de V/W con una fuente de 50 ohmios. Se ha demostrado una frecuencia de corte de unos 200 GHz junto a una respuesta cuadrática hasta 20 dBm de potencia de entrada. A bajas frecuencias, las medidas RF muestran una responsividad que reproduce bien los cálculos realizados mediante un modelo cuasiestático (QS) basado en la pendiente y la curvatura de las curvas corriente-voltaje. Polarizar los dispositivos aumenta el voltaje detectado a costa del consumo de potencia y la aparición de ruido 1/f. El modelo QS predice que la reducción de la anchura del canal mejora la responsividad, hecho que ha sido confirmado experimentalmente. El aumento del número de diodos en paralelo reduce la impedancia; cuando coincide con el triple de la impedancia de la linea de transmisión o la antena, la NEP alcanza su valor mínimo. Los diodos con puerta (G-SSDs) muestran, en espacio libre a 300 GHz, una responsividad en torno a 600 V/W y una NEP en torno a 50 pW/Hz1=2 cerca del voltaje umbral. De nuevo, se obtiene un buen acuerdo entre los resultados del modelo QS, las medidas a 900 MHz y las medidas en espacio libre a 300 GHz, todo ello por encima de la zona subumbral. La NEP mejora al aumentar el número de canales en paralelo. Se han comparado los resultados de la detección inyectando la señal por el drenador (DCS) y la puerta (GCS) de los HEMTs hasta 40 GHz. Para DCS, se han obtenido una responsividad en torno a 400 V/W y una NEP de 30 pW/Hz1/2, en un HEMT con LG = 150 nm a temperatura ambiente bajo condiciones de polarización nula y puerta polarizada cerca del umbral. Por otro lado, la responsividad se incrementa en GCS hasta 1.4 kV/W, con la desventaja de polarizar con una corriente de drenador de ID = 1.2 mA. Ambas configuraciones muestran una frecuencia de corte, con -3 dB de caída, en torno a 40 GHz. Resulta interesante que en GCS y a unafrecuencia suficientemente alta para cortocircuitar la rama puerta-drenador con la de la no linealidad, se consigue detectar una responsividad no nula. El estudio del autocalentamiento se vuelve relevante cuando los dispositivos trabajan en condiciones de alta potencia. Las simulaciones se han realizado con una herramienta Monte Carlo (MC) desarrollada por el grupo y acoplada con dos modelos térmicos: (i) modelo de resistencia térmica (TRM) y (ii) un modelo electrotérmico avanzado y que se basa en la resolución autoconsistente de la ecuación del calor independiente del tiempo. A temperatura ambiente la herramienta MC se calibró comparando con resultados experimentales de TLMs (transfer length measurement ), lográndose reproducir la densidad super cial de portadores y la movilidad. Incluyendo la resistencia de contactos, la barrera Schottky y la barrera térmica, nuestros resultados se han validado con medidas experimentales de un HEMT de dimensiones LDS = 1.5 micras y LG = 150 nm, encontrándose un acuerdo razonable. El TRM da unos resultados similares al ETM con valores de la resistencia térmica (RTH) bien calibradas. La principal ventaja del ETM es la posibilidad de obtener mapas de temperatura dentro del canal e identificar la localización de los puntos calientes. También se discute el impacto de la polarización en el SSEC y las discrepancias entre los modelos ETM y TRM. Se utilizan medidas pulsadas hasta 500 K para estimar la temperatura del canal y el valor de la RTH. Para T 250 K

Micro- and Nanotechnology of Wide Bandgap Semiconductors

Owing to their unique characteristics, direct wide bandgap energy, large breakdown field, and excellent electron transport properties, including operation at high temperature environments and low sensitivity to ionizing radiation, gallium nitride (GaN) and related group III-nitride heterostructures proved to be enabling materials for advanced optoelectronic and electronic devices and systems. Today, they are widely used in high performing short wavelength light emitting diodes (LEDs) and laser diodes (LDs), high performing radar, wireless telecommunications, as well ‘green’ power electronics. Impressive progress in GaN technology over the last 25 years has been driven by a continuously growing need for more advanced systems, and still new challenges arise and need to be solved. Actually, lighting industry, RF defene industry, and 5G mmWave telecommunication systems are driving forces for further intense research in order to reach full potential of GaN-based semiconductors. In the literature, there is a number of review papers and publications reporting technology progress and indicating future trends. In this Special Issue of Electronics, eight papers are published, the majority of them focusing materials and process technology of GaN-based devices fabricated on native GaN substrates. The specific topics include: GaN single crystalline substrates for electronic devices by ammonothermal and HVPE methods, Selective – Area Metalorganic Vapour – Phase Epitaxy of GaN and AlGaN/GaN hetereostructures for HEMTs, Advances in Ion Implantation of GaN and Related Materials including high pressure processing (lattice reconstruction) of ion implanted GaN (Mg and Be) and III-Nitride Nanowires for electronic and optoelectronic devices

Development of InAlN HEMTs for space application

This thesis investigates the emerging InAlN high electron mobility transistor (HEMT) technology with respect to its application in the space industry. The manufacturing processes and device performance of InAlN HEMTs were compared to AlGaN HEMTs, also produced as part of this work. RF gain up to 4 GHz was demonstrated in both InAlN and AlGaN HEMTs with gate lengths of 1 μm, with InAlN HEMTs generally showing higher channel currents (~150 c.f. 60 mA/mm) but also degraded leakage properties (~ 1 x 10-4 c.f. < 1 x 10-8 A/mm) with respect to AlGaN. An analysis of device reliability was undertaken using thermal stability, radiation hardness and off-state breakdown measurements. Both InAlN and AlGaN HEMTs showed excellent stability under space-like conditions, with electrical operation maintained after exposure to 9.2 Mrad of gamma radiation at a dose rate of 6.6 krad/hour over two months and after storage at 250°C for four weeks. Furthermore a link was established between the optimisation of device performance (RF gain, power handling capabilities and leakage properties) and reliability (radiation hardness, thermal stability and breakdown properties), particularly with respect to surface passivation. Following analysis of performance and reliability data, the InAlN HEMT device fabrication process was optimised by adjusting the metal Ohmic contact formation process (specifically metal stack thicknesses and anneal conditions) and surface passivation techniques (plasma power during dielectric layer deposition), based on an existing AlGaN HEMT process. This resulted in both a reduction of the contact resistivity to around 1 x 10-4 Ω.cm2 and the suppression of degrading trap-related effects, bringing the measured gate-lag close to zero. These discoveries fostered a greater understanding of the physical mechanisms involved in device operation and manufacture, which is elaborated upon in the final chapter

Piezotransistive III-V Nitride Microcantilever Based Mems/Nems Sensor for Photoacoustic Spectroscopy of Chemicals

Microcantilevers are highly attractive as transducers for detecting chemicals, explosives, and biological molecules due to their high sensitivity, micro-scale dimensions, and low power consumption. Though optical transduction of the mechanical movement of the microcantilevers into an electrical signal is widely practiced, there is a continuous thrust to develop alternative transduction methods that are more conducive to the development of compact miniaturized sensors. Piezoelectric and piezoresistive transduction methods are two of the most popular ones that have been utilized to develop miniaturized sensor systems. Piezoelectric cantilevers, which are commonly made of PZT film, have demonstrated very high sensitivity; however, they suffer from incompatibility with Si based circuitry and challenges with dc and low frequency measurements due to the problem of charge leakage. On the other hand, piezoresistive microcantilever, which are mostly made of Si, can be easily integrated with existing Si based process technologies, but suffer from low sensitivity. In addition, none of the above material systems are suitable for high temperature (\u3e300 °C) and harsh environment operation. III-V Nitride semiconductors are being extensively studied almost two decades for electronic and optoelectronic applications due to their exceptional physical and chemical properties, which include a wide bandgap, strong piezoelectric properties, high electron mobility, and chemical inertness. AlGaN/GaN heterostructures offer unique advantage over existing piezoresistive or piezoelectric materials, as it actually converts the piezoelectric response of these materials to piezoresistive response, since the two dimensional electron gas (2DEG) formed at the AlGaN/GaN interface gets modulated by the stress induced change in piezoelectric polarization. The epitaxial growth of III-V Nitride layers on a Si substrate enables direct integration of nitride microelectromechanical systems (MEMS) with mature Si based integrated circuits to develop miniaturized sensor systems. In spite of several technological advantages of III-V Nitride MEMS, of which a microcantilever is a simple example, only a handful of studies have been reported on their deflection characterization in static mode and none on dynamic bending mode. The effect of mechanical strain, on 2DEG density and output characteristics of AlGaN/GaN heterostructure field effect transistors (HFETs), have been reported earlier. High gauge factors (\u3e100) have been reported for quasi-static and step bending response, however, the factors contributing to such high values, especially their deviation from much lower theoretical estimates, are poorly understood. Recently, very high gauge factor of -850 was reported for microcantilevers in transient condition, however, the corresponding dynamic response was not studied. Acoustic detection using microcantilevers have attracted interest in recent years, especially in photoacoustic spectroscopy, as they can offer up to two orders of higher sensitivity compared to existing acoustic sensors. III-V Nitride based ultrasonic microcantilevers sensors, offering high sensitivity, low noise, and harsh environment operation, are ideally suited for many demanding sensing applications that are not possible at present. This dissertation aims the theory and application of III-V Nitride microcantilevers and a novel electronic transduction scheme named as ‘Piezotransistive Microcantilever’ to transduce femtoscale excitation. A complete fabrication process, measurement techniques and several application aspects of this sensing technology specially acoustic wave detection generated in solid and air media with high sensitivity, have been demonstrated. This thesis reports on displacement measurement at the femtoscale level using a GaN microcantilever with an AlGaN/GaN Heterojuction Field Effect Transistor (HFET) integrated at the base that utilizes piezoelectric polarization induced changes in two dimensional electron gas (2DEG) to transduce displacement with very high sensitivity. With appropriate biasing of the HFET, an ultra-high Gauge Factor (GF) of 8700, the highest ever reported, was obtained, with an extremely low power consumption of \u3c1 \u3enW, which enabled direct electrical readout of the thermal noise spectra of the cantilever. The self-sensing piezotransistor was able to transduce external excitation with a superior noise limited resolution of 12.43 fm/Hz and an outstanding responsivity of 170 nV/fm, which is three orders higher that state-of-the-art technology, supported by both analytical calculations and laser vibrometry measurements. This extraordinary deflection sensitivity enabled unique detection of nanogram quantity of analytes using photoacoustic spectroscopy

Feature Papers in Electronic Materials Section

This book entitled "Feature Papers in Electronic Materials Section" is a collection of selected papers recently published on the journal Materials, focusing on the latest advances in electronic materials and devices in different fields (e.g., power- and high-frequency electronics, optoelectronic devices, detectors, etc.). In the first part of the book, many articles are dedicated to wide band gap semiconductors (e.g., SiC, GaN, Ga2O3, diamond), focusing on the current relevant materials and devices technology issues. The second part of the book is a miscellaneous of other electronics materials for various applications, including two-dimensional materials for optoelectronic and high-frequency devices. Finally, some recent advances in materials and flexible sensors for bioelectronics and medical applications are presented at the end of the book

Advanced characterisation of novel III-nitride semiconductor based photonics and electronics on polar and non-polar substrates

Advanced characterisation has been carried out on a number of novel III-nitride based photonics and electronics, including micro-LED arrays achieved by a direct epitaxy approach, high performance c-plane HEMTs structure achieved by a novel growth method and non-polar GaN/AlGaN HEMTs. In this work, a systematic study has been conducted to understand the electrical properties of these novel devices, demonstrating their excellent properties. Furthermore, the electrical properties are directly related to epitaxial growth, which provides useful information for further improving device performance, such as 2D growth mode for GaN on a large lattice-mismatched substrate which plays an important in obtaining high breakdown and minimised leakage current for HEMTs. Micro-LEDs are the key elements for a microdisplay system, where electrical properties are extremely important. Potentially, any leakage current can trigger to turn on any neighbouring microLEDs which are supposed to be off. Instead of using conventional fabrication methods which normally enhances leakage current, our team developed a direct epitaxy approach to achieving microLED arrays. In this work, detailed I-V characteristic and capacitance measurements have been conducted on these novel microLED devices, demonstrating leakage currents as low as 14.1 nA per LED and a smooth negative capacitance curve instead of odd positive capacitance performances. Furthermore, a comparison study between our microLEDs and the microLEDs prepared using the conventional method indicates our device shows a large reduction of size-dependent inefficiency while such a behaviour is never observed on the microLEDs fabricated by the conventional methods. Unlike the classic two-step method for GaN growth on large lattice-matched sapphire, our team developed a high-temperature AlN buffer technology, where a 2D growth mode, instead of an initial 2D and then 3D growth mode that typically happens for the growth of conventional GaN growth, takes place through the whole growth process. This method allows us to achieve a breakdown electric field strength of 2.5 MV/cm, a leakage current of as low as 41.7 pA at 20 V and saturation current densities as high as 1.1 A/mm. In this work a systematic study has conducted in order to establish a relationship between the excellent device performance and material properties, where a very low screw dislocation density plays a critical role, while our 2D growth method can provide an excellent opportunity for achieving such a low screw dislocation density. This demonstrates the major advantage over the classic two-step method in the growth of power and RF devices. In our case, we have obtained an unintentional doping as low as 2×10^14 cm-3 and screw dislocation densities of 2.3×10^7 cm-2. Compared with c-plane GaN based HEMTs due to its intrinsic polarisation, non-polar GaN/AlGaN HEMTs on r-plane sapphire yields potential advantages in terms of the fabrication of normal-off devices which are particularly important for practical applications. However, it is a great challenge to achieve high quality non-polar GaN on sapphire. Some initial work has been conducted, where the detailed characterisation indicates an electron mobility of 43 cm2 V-1 s-1 has been initially obtained. Furthermore, instead of using an AlGaN/GaN heterostructure with a modulation doping, we deliberately use a quantum well structure as an electron channel, leading to a mobility of 76 cm2 V-1 s-1. Our simulations as well as measurements also provide a guideline for optimising the general epitaxial structure