Õpiobjekt õpetajale vasakukäelise väikelapse maalima õpetamiseks

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Iluuisutajate kehalised võimed = Figure skaters physical ability

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4MOST: the 4-metre multi-object spectroscopic telescope project in the assembly, integration and test phase

4MOST is a new high-multiplex, wide-field spectroscopic survey facility under construction for ESO's 4m-VISTA telescope at Paranal, Chile. Its key specifications are: a large field of view of 4.4 square degrees, a high multiplex fibre positioner based on the tilting spine principle that positions 2436 science fibres in the focal surface of which 1624 fibres go to two low-resolution optical spectrographs (R = λ/Δλ ~ 6500) and 812 fibres transfer light to the high-resolution optical spectrograph (R ~ 20,000). Currently, almost all subsystems are completed and full testing in Europe will be finished in spring 2023, after which 4MOST will be shipped to Chile. An overview is given of instrument construction and capabilities, the planned science of the consortium and the recently selected community programmes, and the unique operational scheme of 4MOST

Report drawn up on behalf of the Committee on Economic and Monetary Affairs on the proposal from the Commission of the European Communities to the Council (Doc. 1-99/83-COM(83) 85 final) for a Council Decision implementing the decision empowering the Commission to borrow under the New Community Instrument for the purpose of promoting investment within the Community, Working Documents 1983-1984, Document 1-236/83, 3 May 1983

The 4MOST([1]) instrument is a concept for a wide-field, fibre-fed high multiplex spectroscopic instrument facility on the ESO VISTA telescope designed to perform a massive (initially >25x10(6) spectra in 5 years) combined all-sky public survey. The main science drivers are: Gaia follow up of chemo-dynamical structure of the Milky Way, stellar radial velocities, parameters and abundances, chemical tagging; eROSITA follow up of cosmology with x-ray clusters of galaxies, X-ray AGN/galaxy evolution to z similar to 5, Galactic X-ray sources and resolving the Galactic edge; Euclid/LSST/SKA and other survey follow up of Dark Energy, Galaxy evolution and transients. The surveys will be undertaken simultaneously requiring: highly advanced targeting and scheduling software, also comprehensive data reduction and analysis tools to produce high-level data products. The instrument will allow simultaneous observations of similar to 1600 targets at R similar to 5,000 from 390-900nm and similar to 800 targets at R>18,000 in three channels between similar to 395-675nm (channel bandwidth: 45nm blue, 57nm green and 69nm red) over a hexagonal field of view of similar to 4.1 degrees2. The initial 5-year 4MOST survey is currently expect to start in 2020. We provide and overview of the 4MOST systems: opto-mechanical, control, data management and operations concepts; and initial performance estimates

4MOST : the 4-metre multi-object spectroscopic telescope project in the assembly, integration, and test phase

4MOST is a new high-multiplex, wide-field spectroscopic survey facility under construction for ESO's 4m-VISTA telescope at Paranal, Chile. Its key specifications are: a large field of view of 4.4 square degrees, a high multiplex fibre positioner based on the tilting spine principle that positions 2436 science fibres in the focal surface of which 1624 fibres go to two low-resolution optical spectrographs (R = λ/Δλ ~ 6500) and 812 fibres transfer light to the high-resolution optical spectrograph (R ~ 20,000). Currently, almost all subsystems are completed and full testing in Europe will be finished in spring 2023, after which 4MOST will be shipped to Chile. An overview is given of instrument construction and capabilities, the planned science of the consortium and the recently selected community programmes, and the unique operational scheme of 4MOST

4MOST: Project overview and information for the First Call for Proposals

We introduce the 4-metre Multi-Object Spectroscopic Telescope (4MOST), a new high-multiplex, wide-field spectroscopic survey facility under development for the four-metre-class Visible and Infrared Survey Telescope for Astronomy (VISTA) at Paranal. Its key specifications are: a large field of view (FoV) of 4.2 square degrees and a high multiplex capability, with 1624 fibres feeding two low-resolution spectrographs ($R = \lambda/\Delta\lambda \sim 6500$), and 812 fibres transferring light to the high-resolution spectrograph ($R \sim 20\,000$). After a description of the instrument and its expected performance, a short overview is given of its operational scheme and planned 4MOST Consortium science; these aspects are covered in more detail in other articles in this edition of The Messenger. Finally, the processes, schedules, and policies concerning the selection of ESO Community Surveys are presented, commencing with a singular opportunity to submit Letters of Intent for Public Surveys during the first five years of 4MOST operations

Vahakiinnityksen vaikutus piikiekon muotoon kiillotusprosessissa

Tässä insinöörityössä on tutkittu, kuinka vahakiinnitys vaikuttaa piikiekkojen muotoon kiillotusprosessissa. Aluksi on tutustuttu piikiekon mekaanisiin ominaisuuksiin, jonka jälkeen on kuvailtu yksipuolisesti kiillotetun piikiekon valmistusprosessi. Vahan levityksen vaiheet on käsitelty yksityiskohtaisesti spinnauksen teoriaan osittain nojautuen. Piikiekkojen tasomaisuuden mittaamista varten on suunniteltu ja rakennettu Newton-interferometri. Optisella mittalaitteella voidaan piikiekon tasomaisuus mitata tarkasti käyttäen hyväksi valon interferenssiä. Newton-interferometrin toiminta- ja mittausperiaate on esitelty yksityiskohtaisesti. Tasomaisuuteen vaikuttavat mahdolliset parametrit on kartoitettu. Piikiekkojen tasomai-suuden kannalta tärkeiksi nähtyjä parametreja on tutkittu viiden eri kokeen avulla. Kokeista on tehty tarkat koesuunnitelmat käyttäen hyväksi MODDE-ohjelmistoa. Viidessä kokeessa on tutkittu usean eri vahakiinnitysparametrin vaikutusta piikiekon muotoon. Tutkittavina muuttujina on käytetty spinnerin pyörimisnopeutta, vahan määrää, piikiekon painamista voimalla kiillotusalustaa vasten, vakuumiprässiä, sekä lämpötiloja vahakiinnityksessä. Lisäksi on kokeiltu kahta eri vahaa, joilla on eri viskositeetit. On havaittu, että suurin vaikutus piikiekon tasomaisuuteen on spinnauksen pyöritysnopeudella. Tasomaisuuden on havaittu paranevan spinnauksen pyöritysnopeuden ollessa korkea. Myös tasomaisuuden keskihajonnan on todettu pienenevän huomattavasti korkeilla pyöritysnopeuksilla. Lämpötilagradienttien on havaittu heikentävän piikiekon tasomaisuutta vahakiinnityksessä.The effect of wax mounting on the flatness of the silicon wafer in a polishing process is studied in the experimental part of this thesis. In the theoretical part of the thesis the mechanical properties of silicon wafers are summarized and the manufacturing process of silicon wafers is presented. In addition, the theory of wax spin coating is described in detail. In order to measure the flatness of a silicon wafer, mounted on a polishing carrier, a Newton Interferometer was designed and built. Using this optical measuring device, the flatness of the silicon wafer could be measured based on the interference of light. The theory behind the interferometer is described in detail. It is also described how a flat surface can actually be measured from an interferogram. A number of parameters that could potentially have an effect on the silicon wafer flatness in the wax mounting are determined. Parameters that are thought to be critical, in terms of the wafer flatness, are tested in five separate experiments. Each experiment is designed and carried out based on DOE principles. The MODDE software is used to design the experiments. In these five experiments variables such as the spinner rotation speed, wax amount, bonding arm pressure, vacuum press, and the temperatures on the silicon wafer flatness are studied after mounting the wafers on a carrier. Also two mounting waxes with different viscosities are tested. The spinner rotation speed is found to be the most important parameter on the silicon wafer flatness. With a high rotation speed the flatness of the silicon wafer is found to be the most substantial. The standard deviation of the wafer flatness is also significantly smaller with high rotation rates. It is also found that the temperature gradients in the wax mounting have a negative effect on the flatness