7 research outputs found

    Recommended reading list of early publications on atomic layer deposition-Outcome of the "Virtual Project on the History of ALD"

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    Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency. (C) 2016 Author(s).Peer reviewe

    Adaptive Detection of Range-Spread Target in Compound-Gaussian Clutter Without Secondary Data

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    In this paper, we address the problem of detecting a range-spread target embedded in a non-Gaussian clutter with unknown covariance matrix and without using secondary data. We propose a new autoregressive method based on the generalized likelihood ratio test (GLRT) that requires only the cells under test. This method is used to derive two new detectors, corresponding to two different scenarios: a) when all range cells contain the target and share the same covariance matrix (homogeneous clutter), b) when different covariance matrices for different range cells are assumed (heterogeneous clutter). The proposed method is shown to outperform the state of the art on various scenarios in terms of false alarm probability and detection probability, especially in critical scenario as small data records or low number of secondary data. Finally, it exhibits the desired constant false alarm rate (CFAR) property

    Adaptive Detection of Range Spread Target in Compound-Gaussian Clutter Without Secondary Data

    No full text
    In this paper, we address the problem of detecting a range-spread target embedded in a non-Gaussian clutter with unknown covariance matrix and without using secondary data. We propose a new autoregressive method based on the generalized likelihood ratio test (GLRT) that requires only the cells under test. This method is used to derive two new detectors, corresponding to two different scenarios: a) when all range cells contain the target and share the same covariance matrix (homogeneous clutter), b) when different covariance matrices for different range cells are assumed (heterogeneous clutter). The proposed method is shown to outperform the state of the art on various scenarios in terms of false alarm probability and detection probability, especially in critical scenario as small data records or low number of secondary data. Finally, it exhibits the desired constant false alarm rate (CFAR) property

    Review article: recommended reading list of early publications on atomic layer deposition - outcome of the "virtual Project on the History of ALD"

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    Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas-solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name "molecular layering" (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency

    Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD”

    No full text
    Atomic layer deposition (ALD), a gas-phase thin film deposition technique based on repeated, self-terminating gas–solid reactions, has become the method of choice in semiconductor manufacturing and many other technological areas for depositing thin conformal inorganic material layers for various applications. ALD has been discovered and developed independently, at least twice, under different names: atomic layer epitaxy (ALE) and molecular layering. ALE, dating back to 1974 in Finland, has been commonly known as the origin of ALD, while work done since the 1960s in the Soviet Union under the name “molecular layering” (and sometimes other names) has remained much less known. The virtual project on the history of ALD (VPHA) is a volunteer-based effort with open participation, set up to make the early days of ALD more transparent. In VPHA, started in July 2013, the target is to list, read and comment on all early ALD academic and patent literature up to 1986. VPHA has resulted in two essays and several presentations at international conferences. This paper, based on a poster presentation at the 16th International Conference on Atomic Layer Deposition in Dublin, Ireland, 2016, presents a recommended reading list of early ALD publications, created collectively by the VPHA participants through voting. The list contains 22 publications from Finland, Japan, Soviet Union, United Kingdom, and United States. Up to now, a balanced overview regarding the early history of ALD has been missing; the current list is an attempt to remedy this deficiency
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