550 research outputs found
Extending systems-on-chip to the third dimension : performance, cost and technological tradeoffs.
Because of the today's market demand for high-performance, high-density portable hand-held applications, electronic system design technology has shifted the focus from 2-D planar SoC single-chip solutions to different alternative options as tiled silicon and single-level embedded modules as well as 3-D integration. Among the various choices, finding an optimal solution for system implementation dealt usually with cost, performance and other technological trade-off analysis at the system conceptual level. It has been identified that the decisions made within the first 20% of the total design cycle time will ultimately result up to 80% of the final product cost. In this paper, we discuss appropriate and realistic metric for performance and cost trade-off analysis both at system conceptual level (up-front in the design phase) and at implementation phase for verification in the three-dimensional integration. In order to validate the methodology, two ubiquitous electronic systems are analyzed under various implementation schemes and discuss the pros and cons of each of them
Cost-Effective TSV Grouping for Yield Improvement of 3D-ICs
Three-dimensional Integrated Circuits (3D-ICs) vertically stack multiple silicon dies to reduce overall wire length, power consumption, and allow integration of heterogeneous technologies. Through-silicon-vias (TSVs) which act as vertical links between layers pose challenges for 3D integration design. TSV defects can happen in fabrication process and bonding stage, which can reduce the yield and increase the cost. Recent work proposed the employment of redundant TSVs to improve the yield of 3D-ICs. This paper presents a redundant TSVs grouping technique, which partition regular and redundant TSVs into groups. For each group, a set of multiplexers are used to select good signal paths away from defective TSVs. We investigate the impact of grouping ratio (regular-to-redundant TSVs in one group) on trade-off between yield and hardware overhead. We also show probabilistic models for yield analysis under the influence of independent and clustering defect distributions. Simulation results show that for a given number of TSVs and TSV failure rate, careful selection of grouping ratios lead to achieving 100% yield at minimal hardware cost (number of multiplexers and redundant TSVs) in comparison to a design that does not exploit TSV grouping ratios
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Characterization Of Thermal Stresses And Plasticity In Through-Silicon Via Structures For Three-Dimensional Integration
Through-silicon via (TSV) is a critical element connecting stacked dies in three-dimensional (3D) integration. The mismatch of thermal expansion coefficients between the Cu via and Si can generate significant stresses in the TSV structure to cause reliability problems. In this study, the thermal stress in the TSV structure was measured by the wafer curvature method and its unique stress characteristics were compared to that of a Cu thin film structure. The thermo-mechanical characteristics of the Cu TSV structure were correlated to microstructure evolution during thermal cycling and the local plasticity in Cu in a triaxial stress state. These findings were confirmed by microstructure analysis of the Cu vias and finite element analysis (FEA) of the stress characteristics. In addition, the local plasticity and deformation in and around individual TSVs were measured by synchrotron x-ray microdiffraction to supplement the wafer curvature measurements. The importance and implication of the local plasticity and residual stress on TSV reliabilities are discussed for TSV extrusion and device keep-out zone (KOZ).Microelectronics Research Cente
Thermo-Mechanical Effects Of Thermal Cycled Copper Through Silicon Vias
The semiconductor industry is currently facing transistor scaling issues due to fabrication thresholds and quantum effects. In this \u27More-Than-Moore\u27 era, the industry is developing new ways to increase device performance, such as stacking chips for three-dimensional integrated circuits (3D-IC). The 3D-IC\u27s superior performance over their 2D counterparts can be attributed to the use of vertical interconnects, or through silicon vias (TSV). These interconnects are much shorter, reducing signal delay. However TSVs are susceptible to various thermo-mechanical reliability concerns. Heating during fabrication and use, in conjunction with coefficient of thermal expansion mismatch between the copper TSVs and silicon substrate, create harmful stresses in the system. The purpose of this work is to evaluate the signal integrity of Cu-TSVs and determine the major contributing factors of the signal degradation upon in-use conditions. Two series of samples containing blind Cu-TSVs embedded in a Si substrate were studied, each having different types and amounts of voids from manufacturing. The samples were thermally cycled up to 2000 times using three maximum temperatures to simulate three unique in-use conditions. S11 parameter measurements were then conducted to determine the signal integrity of the TSVs. To investigate the internal response from cycling, a protocol was developed for cross-sectioning the copper TSVs. Voids were measured using scanning electron microscope and focused ion beam imaging of the cross-sections, while the microstructural evolution of the copper was monitored with electron backscattering diffraction. An increase in void area was found to occur after cycling. This is thought to be the major contributing factor in the signal degradation of the TSVs, since no microstructural changes were observed in the copper
Investigation into yield and reliability enhancement of TSV-based three-dimensional integration circuits
Three dimensional integrated circuits (3D ICs) have been acknowledged as a promising technology to overcome the interconnect delay bottleneck brought by continuous CMOS scaling. Recent research shows that through-silicon-vias (TSVs), which act as vertical links between layers, pose yield and reliability challenges for 3D design. This thesis presents three original contributions.The first contribution presents a grouping-based technique to improve the yield of 3D ICs under manufacturing TSV defects, where regular and redundant TSVs are partitioned into groups. In each group, signals can select good TSVs using rerouting multiplexers avoiding defective TSVs. Grouping ratio (regular to redundant TSVs in one group) has an impact on yield and hardware overhead. Mathematical probabilistic models are presented for yield analysis under the influence of independent and clustering defect distributions. Simulation results using MATLAB show that for a given number of TSVs and TSV failure rate, careful selection of grouping ratio results in achieving 100% yield at minimal hardware cost (number of multiplexers and redundant TSVs) in comparison to a design that does not exploit TSV grouping ratios. The second contribution presents an efficient online fault tolerance technique based on redundant TSVs, to detect TSV manufacturing defects and address thermal-induced reliability issue. The proposed technique accounts for both fault detection and recovery in the presence of three TSV defects: voids, delamination between TSV and landing pad, and TSV short-to-substrate. Simulations using HSPICE and ModelSim are carried out to validate fault detection and recovery. Results show that regular and redundant TSVs can be divided into groups to minimise area overhead without affecting the fault tolerance capability of the technique. Synthesis results using 130-nm design library show that 100% repair capability can be achieved with low area overhead (4% for the best case). The last contribution proposes a technique with joint consideration of temperature mitigation and fault tolerance without introducing additional redundant TSVs. This is achieved by reusing spare TSVs that are frequently deployed for improving yield and reliability in 3D ICs. The proposed technique consists of two steps: TSV determination step, which is for achieving optimal partition between regular and spare TSVs into groups; The second step is TSV placement, where temperature mitigation is targeted while optimizing total wirelength and routing difference. Simulation results show that using the proposed technique, 100% repair capability is achieved across all (five) benchmarks with an average temperature reduction of 75.2? (34.1%) (best case is 99.8? (58.5%)), while increasing wirelength by a small amount
Design for pre-bond testability in 3D integrated circuits
In this dissertation we propose several DFT techniques specific to 3D
stacked IC systems. The goal has explicitly been to create techniques that
integrate easily with existing IC test systems. Specifically, this means
utilizing scan- and wrapper-based techniques, two foundations
of the digital IC test industry.
First, we describe a general test architecture for 3D ICs. In this
architecture, each tier of a 3D design is wrapped in test control logic that
both manages tier test
pre-bond and integrates the tier into the large test architecture post-bond.
We describe a new kind of boundary scan to provide the necessary test control
and observation of the partial circuits, and we propose
a new design methodology for test hardcore that ensures both pre-bond functionality
and post-bond optimality. We present the application of these techniques to
the 3D-MAPS test vehicle, which has proven their effectiveness.
Second, we extend these DFT techniques to circuit-partitioned designs. We find
that boundary scan design is generally sufficient, but that some 3D designs require
special DFT treatment. Most importantly, we demonstrate that the functional
partitioning inherent in 3D design can potentially decrease the total test cost
of verifying a circuit.
Third, we present a new CAD algorithm for designing 3D test wrappers. This algorithm
co-designs the pre-bond and post-bond wrappers to simultaneously minimize test
time and routing cost. On average, our algorithm utilizes over 90% of the wires
in both the pre-bond and post-bond wrappers.
Finally, we look at the 3D vias themselves to develop a low-cost, high-volume
pre-bond test methodology appropriate for production-level test. We describe
the shorting probes methodology, wherein large test probes are used to contact
multiple small 3D vias. This technique is an all-digital test method that
integrates seamlessly into existing test flows. Our
experimental results demonstrate two key facts: neither the large capacitance
of the probe tips nor the process variation in the 3D vias and the probe tips
significantly hinders the testability of the circuits.
Taken together, this body of work defines a complete test methodology for
testing 3D ICs pre-bond, eliminating one of the key hurdles to the
commercialization of 3D technology.PhDCommittee Chair: Lee, Hsien-Hsin; Committee Member: Bakir, Muhannad; Committee Member: Lim, Sung Kyu; Committee Member: Vuduc, Richard; Committee Member: Yalamanchili, Sudhaka
High Speed Test Interface Module Using MEMS Technology
With the transient frequency of available CMOS technologies exceeding hundreds of gigahertz and the increasing complexity of Integrated Circuit (IC) designs, it is now apparent that the architecture of current testers needs to be greatly improved to keep up with the formidable challenges ahead. Test requirements for modern integrated circuits are becoming more stringent, complex and costly. These requirements include an increasing number of test channels, higher test-speeds and enhanced measurement accuracy and resolution. In a conventional test configuration, the signal path from Automatic Test Equipment (ATE) to the Device-Under-Test (DUT) includes long traces of wires. At frequencies above a few gigahertz, testing integrated circuits becomes a challenging task. The effects on transmission lines become critical requiring impedance matching to minimize signal reflection. AC resistance due to the skin effect and electromagnetic coupling caused by radiation can also become important factors affecting the test results. In the design of a Device Interface Board (DIB), the greater the physical separation of the DUT and the ATE pin electronics, the greater the distortion and signal degradation. In this work, a new Test Interface Module (TIM) based on MEMS technology is proposed to reduce the distance between the tester and device-under-test by orders of magnitude. The proposed solution increases the bandwidth of test channels and reduces the undesired effects of transmission lines on the test results. The MEMS test interface includes a fixed socket and a removable socket. The removable socket incorporates MEMS contact springs to provide temporary with the DUT pads and the fixed socket contains a bed of micro-pins to establish electrical connections with the ATE pin electronics. The MEMS based contact springs have been modified to implement a high-density wafer level test probes for Through Silicon Vias (TSVs) in three dimensional integrated circuits (3D-IC). Prototypes have been fabricated using Silicon On Insulator SOI wafer. Experimental results indicate that the proposed architectures can operate up to 50 GHz without much loss or distortion. The MEMS probes can also maintain a good elastic performance without any damage or deformation in the test phase
Thermo-Mechanical Characterization of Copper Through-Wafer Interconnects
Copper through wafer interconnects (TWIs) have become a viable solution to providing interconnectivity between stacked die. In a world where minimizing chip real estate while increasing functionality is the goal for further miniaturization of electronics, TWIs hold a key role as new packaging schemes become critical for overall higher density. Little is known, however, about the impacts of mismatched coefficients of thermal expansion (CTEs) inherent to the materials used in their construction. CTE differences, if left unresolved, can pose reliability issues during TWI operation. This research focuses on providing insight into the stress levels experienced by TWI materials through finite element analysis to gain a better understanding of the possible failure mechanisms associated with the CTE differences
Heterogeneous 2.5D integration on through silicon interposer
© 2015 AIP Publishing LLC. Driven by the need to reduce the power consumption of mobile devices, and servers/data centers, and yet continue to deliver improved performance and experience by the end consumer of digital data, the semiconductor industry is looking for new technologies for manufacturing integrated circuits (ICs). In this quest, power consumed in transferring data over copper interconnects is a sizeable portion that needs to be addressed now and continuing over the next few decades. 2.5D Through-Si-Interposer (TSI) is a strong candidate to deliver improved performance while consuming lower power than in previous generations of servers/data centers and mobile devices. These low-power/high-performance advantages are realized through achievement of high interconnect densities on the TSI (higher than ever seen on Printed Circuit Boards (PCBs) or organic substrates), and enabling heterogeneous integration on the TSI platform where individual ICs are assembled at close proximity
3D Integration: Another Dimension Toward Hardware Security
We review threats and selected schemes concerning hardware security at design
and manufacturing time as well as at runtime. We find that 3D integration can
serve well to enhance the resilience of different hardware security schemes,
but it also requires thoughtful use of the options provided by the umbrella
term of 3D integration. Toward enforcing security at runtime, we envision
secure 2.5D system-level integration of untrusted chips and "all around"
shielding for 3D ICs.Comment: IEEE IOLTS 201
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