Development of high mobility channel layer formation technology for high speed CMOS Devices

Ph.DDOCTOR OF PHILOSOPH

Strain-Engineered MOSFETs

This book brings together new developments in the area of strain-engineered MOSFETs using high-mibility substrates such as SIGe, strained-Si, germanium-on-insulator and III-V semiconductors into a single text which will cover the materials aspects, principles, and design of advanced devices, their fabrication and applications. The book presents a full TCAD methodology for strain-engineering in Si CMOS technology involving data flow from process simulation to systematic process variability simulation and generation of SPICE process compact models for manufacturing for yield optimization

Schottky Barrier Engineering for Contacts in Advanced CMOS Technology

Ph.DDOCTOR OF PHILOSOPH

Semiconductor Memory Devices for Hardware-Driven Neuromorphic Systems

This book aims to convey the most recent progress in hardware-driven neuromorphic systems based on semiconductor memory technologies. Machine learning systems and various types of artificial neural networks to realize the learning process have mainly focused on software technologies. Tremendous advances have been made, particularly in the area of data inference and recognition, in which humans have great superiority compared to conventional computers. In order to more effectively mimic our way of thinking in a further hardware sense, more synapse-like components in terms of integration density, completeness in realizing biological synaptic behaviors, and most importantly, energy-efficient operation capability, should be prepared. For higher resemblance with the biological nervous system, future developments ought to take power consumption into account and foster revolutions at the device level, which can be realized by memory technologies. This book consists of seven articles in which most recent research findings on neuromorphic systems are reported in the highlights of various memory devices and architectures. Synaptic devices and their behaviors, many-core neuromorphic platforms in close relation with memory, novel materials enabling the low-power synaptic operations based on memory devices are studied, along with evaluations and applications. Some of them can be practically realized due to high Si processing and structure compatibility with contemporary semiconductor memory technologies in production, which provides perspectives of neuromorphic chips for mass production

Strain integration and performance optimization in sub-20nm FDSOI CMOS technology

La technologie CMOS à base de Silicium complètement déserté sur isolant (FDSOI) est considérée comme une option privilégiée pour les applications à faible consommation telles que les applications mobiles ou les objets connectés. Elle doit cela à son architecture garantissant un excellent comportement électrostatique des transistors ainsi qu'à l'intégration de canaux contraints améliorant la mobilité des porteurs. Ce travail de thèse explore des solutions innovantes en FDSOI pour nœuds 20nm et en deçà, comprenant l'ingénierie de la contrainte mécanique à travers des études sur les matériaux, les dispositifs, les procédés d'intégration et les dessins des circuits. Des simulations mécaniques, caractérisations physiques (µRaman), et intégrations expérimentales de canaux contraints (sSOI, SiGe) ou de procédés générant de la contrainte (nitrure, fluage de l'oxyde enterré) nous permettent d'apporter des recommandations pour la technologie et le dessin physique des transistors en FDSOI. Dans ce travail de thèse, nous avons étudié le transport dans les dispositifs à canal court, ce qui nous a amené à proposer une méthode originale pour extraire simultanément la mobilité des porteurs et la résistance d'accès. Nous mettons ainsi en évidence la sensibilité de la résistance d'accès à la contrainte que ce soit pour des transistors FDSOI ou nanofils. Nous mettons en évidence et modélisons la relaxation de la contrainte dans le SiGe apparaissant lors de la gravure des motifs et causant des effets géométriques (LLE) dans les technologies FDSOI avancées. Nous proposons des solutions de type dessin ainsi que des solutions technologiques afin d'améliorer la performance des cellules standard digitales et de mémoire vive statique (SRAM). En particulier, nous démontrons l'efficacité d'une isolation duale pour la gestion de la contrainte et l'extension de la capacité de polarisation arrière, qui un atout majeur de la technologie FDSOI. Enfin, la technologie 3D séquentielle rend possible la polarisation arrière en régime dynamique, à travers une co-optimisation dessin/technologie (DTCO).The Ultra-Thin Body and Buried oxide Fully Depleted Silicon On Insulator (UTBB FDSOI) CMOS technology has been demonstrated to be highly efficient for low power and low leakage applications such as mobile, internet of things or wearable. This is mainly due to the excellent electrostatics in the transistor and the successful integration of strained channel as a carrier mobility booster. This work explores scaling solutions of FDSOI for sub-20nm nodes, including innovative strain engineering, relying on material, device, process integration and circuit design layout studies. Thanks to mechanical simulations, physical characterizations and experimental integration of strained channels (sSOI, SiGe) and local stressors (nitride, oxide creeping, SiGe source/drain) into FDSOI CMOS transistors, we provide guidelines for technology and physical circuit design. In this PhD, we have in-depth studied the carrier transport in short devices, leading us to propose an original method to extract simultaneously the carrier mobility and the access resistance and to clearly evidence and extract the strain sensitivity of the access resistance, not only in FDSOI but also in strained nanowire transistors. Most of all, we evidence and model the patterning-induced SiGe strain relaxation, which is responsible for electrical Local Layout Effects (LLE) in advanced FDSOI transistors. Taking into account these geometrical effects observed at the nano-scale, we propose design and technology solutions to enhance Static Random Access Memory (SRAM) and digital standard cells performance and especially an original dual active isolation integration. Such a solution is not only stress-friendly but can also extend the powerful back-bias capability, which is a key differentiating feature of FDSOI. Eventually the 3D monolithic integration can also leverage planar Fully-Depleted devices by enabling dynamic back-bias owing to a Design/Technology Co-Optimization

Miniaturized Transistors, Volume II

In this book, we aim to address the ever-advancing progress in microelectronic device scaling. Complementary Metal-Oxide-Semiconductor (CMOS) devices continue to endure miniaturization, irrespective of the seeming physical limitations, helped by advancing fabrication techniques. We observe that miniaturization does not always refer to the latest technology node for digital transistors. Rather, by applying novel materials and device geometries, a significant reduction in the size of microelectronic devices for a broad set of applications can be achieved. The achievements made in the scaling of devices for applications beyond digital logic (e.g., high power, optoelectronics, and sensors) are taking the forefront in microelectronic miniaturization. Furthermore, all these achievements are assisted by improvements in the simulation and modeling of the involved materials and device structures. In particular, process and device technology computer-aided design (TCAD) has become indispensable in the design cycle of novel devices and technologies. It is our sincere hope that the results provided in this Special Issue prove useful to scientists and engineers who find themselves at the forefront of this rapidly evolving and broadening field. Now, more than ever, it is essential to look for solutions to find the next disrupting technologies which will allow for transistor miniaturization well beyond silicon’s physical limits and the current state-of-the-art. This requires a broad attack, including studies of novel and innovative designs as well as emerging materials which are becoming more application-specific than ever before

Transient carrier and lattice dynamics in photo-excited semiconductors studied by femtosecond spectroscopic ellipsometry

This work investigates transient optical properties of semiconductors and the underlying carrier and lattice dynamics after intense pulsed optical excitation. To this aim, the ex- perimental technique of pump-probe spectroscopic ellipsometry and the corresponding experimental setup is introduced first. The pump-probe scheme yields sub-picosecond temporal resolution while the spectroscopic ellipsometry measurement allows direct ex- cess to the complex-valued optical response, that means real and imaginary part of the dielectric function. The functionality of the experimental setup as well as technical de- tails, capabilities and limitations are discussed. First measurements are demonstrated on the prototypical wide-bandgap semiconductor ZnO and the classical semiconductors Ge, Si and InP. Furthermore, the full dielectric function tensor of optically anisotropic materials can be obtained from ellipsometry measurements, if suitable orientations of the material are measured and collectively analyzed. This capability will be demonstrated for the uniaxial material ZnO. Upon optical excitation, the transient occupation of electronic states is varied which leads to a redistribution of the spectral weight of absorption. This embodies the com- bined intricate effects of inter- and intra-band transitions, carrier scattering with the heated lattice as well as many-body effects such as band-gap renormalization, carrier screening and Pauli blocking. The contributions of these effects are disentangled by means of line-shape analysis of the dielectric function. For ZnO, we additionally find a strong influence of the polar electron-phonon interaction on the dielectric function that are framed as hot-phonon effects in the literature. They exemplify the importance of the lattice in the relaxation process of photo-excited semiconductors. The experimental dielectric functions will be compared to theoretical results from first-principles calcu- lation taking excitonic effects and the photo-excited carriers at elevated temperatures into account. The transient carrier dynamics are additionally supported by simula- tions of the transient carrier and lattice temperature. Moreover, spatial information on the transient carrier dynamics was obtained from pump-probe imaging ellipsometry on ZnO under similar excitation conditions. Here, the photo-excitation enables a delicate interplay between diffusion and ballistic propagation of the carriers, that leads to a non- homogeneous lateral carrier profile. This spatial modulation of the carrier density and subsequently the optical properties challenges the standard assumption of homogeneous lateral excitation in the analysis of pump-probe experiments.:Introduction 1 1 Measurement of transient optical properties 5 1.1 Light polarization . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 5 1.2 Optical properties and ellipsometry . . . . . . . . . . . . . . . . . . . . . 6 1.3 Transient optical properties and time-resolved ellipsometry . . . . . . . . 7 1.4 Broadband femtosecond spectroscopic ellipsometry . . . . . . . . . . . . 10 2 Transient charge-carrier and lattice dynamics in photo-excited semicon- ductors 12 2.1 Four regimes of carrier relaxation . . . . . . . . . . . . . . . . . . . . . . 12 2.1.1 Hot-phonon effects in photo-excited wide-bandgap semiconductors 16 2.2 Effects of high carrier density on optical properties . . . . . . . . . . . . 17 2.3 Transient dielectric functions of ZnO . . . . . . . . . . . . . . . . . . . . 21 2.3.1 Ultrafast dynamics of hot charge carriers in an oxide semiconduc- tor probed by femtosecond spectroscopic ellipsometry . . . . . . . 21 2.3.2 Transient birefringence and dichroism in ZnO studied with fs-time- resolved spectroscopic ellipsometry . . . . . . . . . . . . . . . . . 22 2.3.3 Femtosecond-time-resolved imaging of the dielectric function of ZnO in the visible to near-IR spectral range . . . . . . . . . . . . 23 2.4 Transient dielectric functions of Ge, Si and InP . . . . . . . . . . . . . . 24 2.5 Conclusions . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 25 3 Summary and outlook 29 Bibliography 32 Cumulated Publications 52 Symbols and abbreviations 54 Danksagung 56 Zusammenfassung nach §11 (4) der Promotionsordnung 58In dieser Arbeit werden die transienten optischen Eigenschaften von Halbleitern nach gepulster optischer Anregung und die zugrundeliegende Prozesse der Ladungsträgerund Kristallgitterdynamik untersucht. Zu diesem Zwecke wird die experimentelle Methode der femtosekunden-zeitaufgelösten spektroskopische Ellipsometrie eingeführt. Das Pump-Probe-Messschema gewährt eine zeitliche Aufösung von weniger als einer Pikosekunde während es die spektroskopischen Ellipsometrie ermöglicht, direkten Zugang zur komplex-wertigen optischen Antwortfunktion auf eine eintreffende elektromagnetische Welle das heißt Real- und Imaginärteil der dielektrischen Funktion (DF) in einem breiten Spektralbereich zu erhalten. Zu Beginn wird der Messaufbau der zeitaufgelösten spektroskopischen Ellipsometrie vorgestellt. Seine Funktionalität wird durch Untersuchungen am prototypischen weitbandlückigen Halbleiter ZnO und den klassischen Halbleitern Ge, Si und InP demonstriert. Weiterhin können richtungsund polarisationsabhängige optischen Eigenschaften bestimmt werden, wenn entsprechende Orientierungen der Probe gemessen und simultan modelliert werden. Diese Fähigkeit wird ebenfalls an ZnO demonstriert, da es aufgrund seiner hexagonalen Kristallstruktur anisotrope optische Eigenschaften aufweist. Die intensive optische Anregung der Halbleiter bewirkt eine zeitweilige Umverteilung der Besetzung der elektronischen Zustände, welche sich in einer deutlich veränderten Linienform der DF widerspiegelt. Verantwortlich dafür sind unter anderem elektronische Interund Intra-Band-Übergänge und Streuprozesse mit dem aufgeheizten Gitter sowie verschiedene Vielteilcheneffekte wie Bandlückrenormierung, Abschirmung der Ladungsträger und das Pauli-Prinzip. Die Beiträge dieser Effekte können mittels geeigneter Linienformanalyse der DF näher untersucht werden. Am Beispiel von ZnO wird auch die starke Wechselwirkung der Elektronen mit dem aufgeheizten Gitter und deren Auswirkungen auf die DF gezeigt. Die experimentelle DF wird mit theoretischen Berechnungen verglichen, wobei bei exzitonische Effekte und die hohe Überschussenergie der Ladungsträger berücksichtigt werden. Zusätzlich erklären Simulationen der transienten Ladungsträgerund Gittertemperatur den Verlauf der Relaxation der Ladungsträger. Weiterhin werden Information über die räumliche Ausbreitung der Ladungsträger nach optischer Anregung mittels abbildender zeitaufgelöster Ellipsometrie an ZnO gewonnen. Hierbei wird ein komplexes Zwischenspiel zwischen Diffusion und ballistischer Propagation der Ladungsträger beobachtet, welches zu einer ringförmigen Verteilung der Ladungsträger führt.:Introduction 1 1 Measurement of transient optical properties 5 1.1 Light polarization . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 5 1.2 Optical properties and ellipsometry . . . . . . . . . . . . . . . . . . . . . 6 1.3 Transient optical properties and time-resolved ellipsometry . . . . . . . . 7 1.4 Broadband femtosecond spectroscopic ellipsometry . . . . . . . . . . . . 10 2 Transient charge-carrier and lattice dynamics in photo-excited semicon- ductors 12 2.1 Four regimes of carrier relaxation . . . . . . . . . . . . . . . . . . . . . . 12 2.1.1 Hot-phonon effects in photo-excited wide-bandgap semiconductors 16 2.2 Effects of high carrier density on optical properties . . . . . . . . . . . . 17 2.3 Transient dielectric functions of ZnO . . . . . . . . . . . . . . . . . . . . 21 2.3.1 Ultrafast dynamics of hot charge carriers in an oxide semiconduc- tor probed by femtosecond spectroscopic ellipsometry . . . . . . . 21 2.3.2 Transient birefringence and dichroism in ZnO studied with fs-time- resolved spectroscopic ellipsometry . . . . . . . . . . . . . . . . . 22 2.3.3 Femtosecond-time-resolved imaging of the dielectric function of ZnO in the visible to near-IR spectral range . . . . . . . . . . . . 23 2.4 Transient dielectric functions of Ge, Si and InP . . . . . . . . . . . . . . 24 2.5 Conclusions . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 25 3 Summary and outlook 29 Bibliography 32 Cumulated Publications 52 Symbols and abbreviations 54 Danksagung 56 Zusammenfassung nach §11 (4) der Promotionsordnung 5