Characterization of 28 nm FDSOI MOS and application to the design of a low-power 2.4 GHz LNA

IoT is expected to connect billions of devices all over world in the next years, and in a near future, it is expected to use LR-WPAN in a wide variety of applications. Not all the devices will require of high performance but will require of low power hungry systems since most of them will be powered with a battery. Conventional CMOS technologies cannot cover these needs even scaling it to very small regimes, which appear other problems. Hence, new technologies are emerging to cover the needs of this devices. One promising technology is the UTBB FDSOI, which achieves good performance with very good energy efficiency. This project characterizes this technology to obtain a set of parameters of interest for analog/RF design. Finally, with the help of a low-power design methodology (gm/Id approach), a design of an ULP ULV LNA is performed to check the suitability of this technology for IoT

Compensation of Threshold Voltage for Process and Temperature Variations in 28nm UTBB FDSOI

As technology scales down in order to meet demands of more computing power per area, a variety of challenges emerge. Devices with channel lengths of a few nano meters require atomic precision when they are manufactured. Small irregularities in the equipment and manufacturing environment can cause large process variations from die--to--die, but also within--die variations. Along with the increasing density of transistors per die which has led to severe performance issues due to temperature variations, these effects may seriously impact operation and cause large deviations in frequency and power across a the chip. This thesis will present the analysis and design of a circuit with the goal of compensating the threshold voltage, by means of body biasing, in order to mitigate process and temperature variations. The compensation circuit is designed to provide adaptive body biasing for a large number of equally matched devices within the chip, which may be useful in digital systems with many repetitive instances. Its functionality and effect will be tested by designing it to be used with a 13--stage inverter based ring oscillator operating at 65.5MHz, and observing the improvement in frequency variation across processing corners and a temperature range from -40 degrees Celsius to 80 degrees Celsius. All circuits were designed using a commercially available 28nm fdsoi transistor technology because of its excellent susceptibility to body biasing, and its promise as a competitive technology to continue Moore`s law. Results obtained by post--layout simulations on the ring oscillator show that frequency variations across processing corners and temperature has been reduced from 18.69% down to 0.632% by utilising adaptive body biasing provided by the compensation circuit. Ring oscillator frequency temperature sensitivity in a range from -40 degrees Celsius to 80 degrees Celsius for the typical corner is shown to be as little as 29.4ppm per degree Celsiu

Design of a RF communication receiver front-end for ultra-low power and voltage applications in a FDSOI 28nm technology

The advances in the semiconductor and wireless industry have enabled the expansion of new paradigms, which have given rise to concepts like Internet of Things (IoT). Apart from qualities like size, speed or cost, the ever-increasing demand for autonomy focuses all design efforts in the minimization of power consumption. Scaling technologies and the request to reduce power consumption have pushed designers towards lower supply voltages. Despite the fact that technology scalability allows for faster transistors, radio-frequency (RF) integrated circuit (IC) design accuses the reduction of the voltage supply through frequency response degradation, which significantly deteriorates the overall performance. Analog and RF circuits in highend applications require substantial gate voltage overdrive to maintain device speed, which further complicates the design due to the reduction of voltage headroom. As a consequence, the necessity to develop circuit topologies capable to deal with low-power and low-voltage stringent constraints well suited to applications requiring long battery life and low cost emerges. This work aims to implement a low-noise amplifier and mixer stages of a radio-frequency receiver front-end working under an ultra-low power (< 100 ?W) and ultra-low voltage (< 0.8V) scenario while targeting decent overall performance. To cope with the stringent power requirements, 28nm FD-SOI technology will be used to take maximum profit of aggressive forward body bias and enhance transistor performance

Conception, fabrication, caractérisation et modélisation de transistors MOSFET haute tension en technologie avancée SOI (Silicon-On-Insulator)

Nowadays the scaling of bulk silicon CMOS technologies is reaching physical limits. In this context, the FDSOI technology (fully depleted silicon-on-insulator) becomes an alternative for the industry because of its superior performances. The use of an ultra-thin SOI substrate provides an improvement of the MOSFETs behaviour and guarantees their electrostatic integrity for devices of 28nm and below. The development of high-voltage applications such DC/DC converters, voltage regulators and power amplifiers become necessary to integrate new functionalities in the technology. However, the standard devices are not designed to handle such high voltages. To overcome this limitation, this work is focused on the design of a high voltage MOSFET in FDSOI. Through simulations and electrical characterizations, we are exploring several solutions such as the hybridization of the SOI substrate (local opening of the buried oxide) or the implementation in the silicon film. An innovative architecture on SOI, the Dual Ground Plane EDMOS, is proposed, characterized and modelled. It relies on the biasing of a dedicated ground plane introduced below the device to offer promising RON.S/BV trade-off for the targeted applications.A l’heure où la miniaturisation des technologies CMOS sur substrat massif atteint des limites, la technologie FDSOI (silicium sur isolant totalement déserté) s’impose comme une alternative pour l’industrie en raison de ses meilleures performances. Dans cette technologie, l’utilisation d’un substrat SOI ultramince améliore le comportement des transistors MOSFETs et garantit leur intégrité électrostatique pour des dimensions en deçà de 28nm. Afin de lui intégrer de nouvelles fonctionnalités, il devient nécessaire de développer des applications dites « haute tension » comme les convertisseurs DC/DC, les régulateurs de tension ou encore les amplificateurs de puissance. Cependant les composants standards de la technologie CMOS ne sont pas capables de fonctionner sous les hautes tensions requises. Pour répondre à cette limitation, ces travaux portent sur le développement et l’étude de transistors MOS haute tension en technologie FDSOI. Plusieurs solutions sont étudiées à l’aide de simulations numériques et de caractérisations électriques : l’hybridation du substrat (gravure localisée de l’oxyde enterré) et la transposition sur le film mince. Une architecture innovante sur SOI, le Dual Gound Plane EDMOS, est alors proposée, caractérisée et modélisée. Cette architecture repose sur la polarisation d’une seconde grille arrière pour offrir un compromis RON.S/BV prometteur pour les applications visées

Study and development of low power consumption SRAMs on 28 nm FD-SOI CMOS process

Since analog circuit designs in CMOS nanometer (< 90 nm) nodes can be substantially affected by manufacturing process variations, circuit performance becomes more challenging to achieve efficient solutions by using analytical models. Extensive simulations are thus commonly required to provide a high yield. On the other hand, due to the fact that the classical bulk MOS structure is reaching scaling limits (< 32 nm), alternative approaches are being developed as successors, such as fully depleted silicon-oninsulator (FD-SOI), Multigate MOSFET, FinFETs, among others, and new design techniques emerge by taking advantage of the improved features of these devices. This thesis focused on the development of analytical expressions for the major performance parameters of the SRAM cache implemented in 28 nm FD-SOI CMOS, mainly to explore the transistor dimensions at low computational cost, thereby producing efficient designs in terms of energy consumption, speed and yield. By taking advantage of both low computational cost and close agreement results of the developed models, in this thesis we were able to propose a non-traditional sizing procedure for the simple 6T-SRAM cell, that unlike the traditional thin-cell design, transistor lengths are used as a design variable in order to reduce the static leakage. The single-P-well (SPW) structure in combination with reverse-body-biasing (RBB) technique were used to achieve a better balance between P-type and N-type transistors. As a result, we developed a 128 kB SRAM cache, whose post-layout simulations show that the circuit consumes an average energy per operation of 0.604 pJ/word-access (64 I/O bits) at supply voltage of 0.45 V and operation frequency of 40 MHz. The total chip area of the 128 kB SRAM cache is 0.060 mm2 .O projeto de circuitos analogicos em processos nanométricos CMOS ( < 90 nm) per substancialmente afetado pelas variacões do processo de fabricacão, sendo cada vez mais desafiador para os projetistas alcançar soluções eficientes no desempenho dos circuitos mediante o uso de modelos analíticos. Simulacões extensas com alto custo com- putacional sao normalmente requeridas para providenciar um correto funcionamento do circuito. Por outro lado, devido ao fato que a estrutura bulk-CMOS esta alcançando seus limites de escala (< 32 nm), outros transistores foram desenvolvidos como sucessores, tais como o fully depleted silicon-on-insulator (FD-SOI), Multigate MOSFET, entre outros, surgindo novas tecnicas de projeto que utilizam as características aprimoradas destes dispositivos. Dessa forma, esta tese de doutorado se foca no desenvolvimento de modelos analíticos dos parametros mais importantes do cache SRAM implementado em processo CMOS FD-SOI de 28 nm, principalmente para explorar as dimensõoes dos transistores com baixo custo computacional, e assim produzir solucões eficientes em termos de consumo de energia, velocidade e rendimento. Aproveitando o baixo custo computacional e a alta concordância dos modelos analíticos, nesta tese fomos capazes de propor um dimensionamento nao tradicional para a célula de memória 6T-SRAM, em que diferentemente é do classico dimensionamento "thin-cell”, os comprimentos dos transistores são utilizados como variável de projeto com o fim de reduzir o consumo estático de corrente. A estrutura single-P-well (SPW), combinada com a técnica reverse-body-biasing (RBB) foram utilizadas para alcançar um melhor balanço entre as correntes específicas dos transistores do tipo P e N

Reliability Investigations of MOSFETs using RF Small Signal Characterization

Modern technology needs and advancements have introduced various new concepts such as Internet-of-Things, electric automotive, and Artificial intelligence. This implies an increased activity in the electronics domain of analog and high frequency. Silicon devices have emerged as a cost-effective solution for such diverse applications. As these silicon devices are pushed towards higher performance, there is a continuous need to improve fabrication, power efficiency, variability, and reliability. Often, a direct trade-off of higher performance is observed in the reliability of semiconductor devices. The acceleration-based methodologies used for reliability assessment are the adequate time-saving solution for the lifetime's extrapolation but come with uncertainty in accuracy. Thus, the efforts to improve the accuracy of reliability characterization methodologies run in parallel. This study highlights two goals that can be achieved by incorporating high-frequency characterization into the reliability characteristics. The first one is assessing high-frequency performance throughout the device's lifetime to facilitate an accurate description of device/circuit functionality for high-frequency applications. Secondly, to explore the potential of high-frequency characterization as the means of scanning reliability effects within devices. S-parameters served as the high-frequency device's response and mapped onto a small-signal model to analyze different components of a fully depleted silicon-on-insulator MOSFET. The studied devices are subjected to two important DC stress patterns, i.e., Bias temperature instability stress and hot carrier stress. The hot carrier stress, which inherently suffers from the self-heating effect, resulted in the transistor's geometry-dependent magnitudes of hot carrier degradation. It is shown that the incorporation of the thermal resistance model is mandatory for the investigation of hot carrier degradation. The property of direct translation of small-signal parameter degradation to DC parameter degradation is used to develop a new S-parameter based bias temperature instability characterization methodology. The changes in gate-related small-signal capacitances after hot carrier stress reveals a distinct signature due to local change of flat-band voltage. The measured effects of gate-related small-signal capacitances post-stress are validated through transient physics-based simulations in Sentaurus TCAD.:Abstract Symbols Acronyms 1 Introduction 2 Fundamentals 2.1 MOSFETs Scaling Trends and Challenges 2.1.1 Silicon on Insulator Technology 2.1.2 FDSOI Technology 2.2 Reliability of Semiconductor Devices 2.3 RF Reliability 2.4 MOSFET Degradation Mechanisms 2.4.1 Hot Carrier Degradation 2.4.2 Bias Temperature Instability 2.5 Self-heating 3 RF Characterization of fully-depleted Silicon on Insulator devices 3.1 Scattering Parameters 3.2 S-parameters Measurement Flow 3.2.1 Calibration 3.2.2 De-embedding 3.3 Small-Signal Model 3.3.1 Model Parameters Extraction 3.3.2 Transistor Figures of Merit 3.4 Characterization Results 4 Self-heating assessment in Multi-finger Devices 4.1 Self-heating Characterization Methodology 4.1.1 Output Conductance Frequency dependence 4.1.2 Temperature dependence of Drain Current 4.2 Thermal Resistance Behavior 4.2.1 Thermal Resistance Scaling with number of fingers 4.2.2 Thermal Resistance Scaling with finger spacing 4.2.3 Thermal Resistance Scaling with GateWidth 4.2.4 Thermal Resistance Scaling with Gate length 4.3 Thermal Resistance Model 4.4 Design for Thermal Resistance Optimization 5 Bias Temperature Instability Investigation 5.1 Impact of Bias Temperature Instability stress on Device Metrics 5.1.1 Experimental Details 5.1.2 DC Parameters Drift 5.1.3 RF Small-Signal Parameters Drift 5.2 S-parameter based on-the-fly Bias Temperature Instability Characterization Method 5.2.1 Measurement Methodology 5.2.2 Results and Discussion 6 Investigation of Hot-carrier Degradation 6.1 Impact of Hot-carrier stress on Device performance 6.1.1 DC Metrics Degradation 6.1.2 Impact on small-signal Parameters 6.2 Implications of Self-heating on Hot-carrier Degradation in n-MOSFETs 6.2.1 Inclusion of Thermal resistance in Hot-carrier Degradation modeling 6.2.2 Convolution of Bias Temperature Instability component in Hot-carrier Degradation 6.2.3 Effect of Source and Drain Placement in Multi-finger Layout 6.3 Vth turn-around effect in p-MOSFET 7 Deconvolution of Hot-carrier Degradation and Bias Temperature Instability using Scattering parameters 7.1 Small-Signal Parameter Signatures for Hot-carrier Degradation and Bias Temperature Instability 7.2 TCAD Dynamic Simulation of Defects 7.2.1 Fixed Charges 7.2.2 Interface Traps near Gate 7.2.3 Interface Traps near Spacer Region 7.2.4 Combination of Traps 7.2.5 Drain Series Resistance effect 7.2.6 DVth Correction 7.3 Empirical Modeling based deconvolution of Hot-carrier Degradation 8 Conclusion and Recommendations 8.1 General Conclusions 8.2 Recommendations for Future Work A Directly measured S-parameters and extracted Y-parameters B Device Dimensions for Thermal Resistance Modeling C Frequency response of hot-carrier degradation (HCD) D Localization Effect of Interface Traps Bibliograph

Wideband CMOS Data Converters for Linear and Efficient mmWave Transmitters

With continuously increasing demands for wireless connectivity, higher\ua0carrier frequencies and wider bandwidths are explored. To overcome a limited transmit power at these higher carrier frequencies, multiple\ua0input multiple output (MIMO) systems, with a large number of transmitters\ua0and antennas, are used to direct the transmitted power towards\ua0the user. With a large transmitter count, each individual transmitter\ua0needs to be small and allow for tight integration with digital circuits. In\ua0addition, modern communication standards require linear transmitters,\ua0making linearity an important factor in the transmitter design.In this thesis, radio frequency digital-to-analog converter (RF-DAC)-based transmitters are explored. They shift the transition from digital\ua0to analog closer to the antennas, performing both digital-to-analog\ua0conversion and up-conversion in a single block. To reduce the need for\ua0computationally costly digital predistortion (DPD), a linear and wellbehaved\ua0RF-DAC transfer characteristic is desirable. The combination\ua0of non-overlapping local oscillator (LO) signals and an expanding segmented\ua0non-linear RF-DAC scaling is evaluated as a way to linearize\ua0the transmitter. This linearization concept has been studied both for\ua0the linearization of the RF-DAC itself and for the joint linearization of\ua0the cascaded RF-DAC-based modulator and power amplifier (PA) combination.\ua0To adapt the linearization, observation receivers are needed.\ua0In these, high-speed analog-to-digital converters (ADCs) have a central\ua0role. A high-speed ADC has been designed and evaluated to understand\ua0how concepts used to increase the sample rate affect the dynamic performance

Energy-Efficient Time-Based Encoders and Digital Signal Processors in Continuous Time

Continuous-time (CT) data conversion and continuous-time digital signal processing (DSP) are an interesting alternative to conventional methods of signal conversion and processing. This alternative proposes time-based encoding that may not suffer from aliasing; shows superior spectral properties (e.g. no quantization noise floor); and enables time-based, event-driven, flexible signal processing using digital circuits, thus scaling well with technology. Despite these interesting features, this approach has so far been limited by the CT encoder, due to both its relatively poor energy efficiency and the constraints it imposes on the subsequent CT DSP. In this thesis, we present three principles that address these limitations and help improve the CT ADC/DSP system. First, an adaptive-resolution encoding scheme that achieves first-order reconstruction with simple circuitry is proposed. It is shown that for certain signals, the scheme can significantly reduce the number of samples generated per unit of time for a given accuracy compared to schemes based on zero-order-hold reconstruction, thus promising to lead to low dynamic power dissipation at the system level. Presented next is a novel time-based CT ADC architecture, and associated encoding scheme, that allows a compact, energy-efficient circuit implementation, and achieves first-order quantization error spectral shaping. The design of a test chip, implemented in a 0.65-V 28-nm FDSOI process, that includes this CT ADC and a 10-tap programmable FIR CT DSP to process its output is described. The system achieves 32 dB – 42 dB SNDR over a 10 MHz – 50 MHz bandwidth, occupies 0.093 mm2, and dissipates 15 µW–163 µW as the input amplitude goes from zero to full scale. Finally, an investigation into the possibility of CT encoding using voltage-controlled oscillators is undertaken, and it leads to a CT ADC/DSP system architecture composed primarily of asynchronous digital delays. The latter makes the system highly digital and technology-scaling-friendly and, hence, is particularly attractive from the point of view of technology migration. The design of a test chip, where this delay-based CT ADC/DSP system architecture is used to implement a 16-tap programmable FIR filter, in a 1.2-V 28-nm FDSOI process, is described. Simulations show that the system will achieve a 33 dB – 40 dB SNDR over a 600 MHz bandwidth, while dissipating 4 mW

Electrical Characterisation of III-V Nanowire MOSFETs

The ever increasing demand for faster and more energy-efficient electricalcomputation and communication presents severe challenges for the semiconductor industry and particularly for the metal-oxidesemiconductorfield-effect transistor (MOSFET), which is the workhorse of modern electronics. III-V materials exhibit higher carrier mobilities than the most commonly used MOSFET material Si so that the realisation of III-V MOSFETs can enable higher operation speeds and lower drive voltages than that which is possible in Si electronics. A lowering of the transistor drive voltage can be further facilitated by employing gate-all-around nanowire geometries or novel operation principles. However, III-V materials bring about their own challenges related to material quality and to the quality of the gate oxide on top of a III-V MOSFET channel.This thesis presents detailed electrical characterisations of two types of (vertical) III-V nanowire transistors: MOSFETs based on conventional thermionic emission; and Tunnel FETs, which utilise quantum-mechanical tunnelling instead to control the device current and reach inverse subthreshold slopes below the thermal limit of 60 mV/decade. Transistor characterisations span over fourteen orders of magnitude in frequency/time constants and temperatures from 11 K to 370 K.The first part of the thesis focusses on the characterisation of electrically active material defects (‘traps’) related to the gate stack. Low-frequency noise measurements yielded border trap densities of 10^18 to 10^20 cm^-3 eV^-1 and hysteresis measurements yielded effective trap densities – projected to theoxide/semiconductor interface – of 2x10^12 to 3x10^13 cm^-2 eV^-1. Random telegraph noise measurements revealed that individual oxide traps can locally shift the channel energy bands by a few millielectronvolts and that such defects can be located at energies from inside the semiconductor band gap all the way into the conduction band.Small-signal radio frequency (RF) measurements revealed that parts of the wide oxide trap distribution can still interact with carriers in the MOSFET channel at gigahertz frequencies. This causes frequency hystereses in the small-signal transconductance and capacitances and can decrease the RF gains by a few decibels. A comprehensive small-signal model was developed, which takes into account these dispersions, and the model was applied to guide improvements of the physical structure of vertical RF MOSFETs. This resulted in values for the cutoff frequency fT and the maximum oscillation frequency fmax of about 150 GHz in vertical III-V nanowire MOSFETs.Bias temperature instability measurements and the integration of (lateral) III-V nanowire MOSFETs in a back end of line process were carried out as complements to the main focus of this thesis. The results of this thesis provide a broad perspective of the properties of gate oxide traps and of the RF performance of III-V nanowire transistors and can act as guidelines for further improvement and finally the integration of III-V nanowire MOSFETs in circuits

CMOS MESFET Cascode Amplifiers for RFIC Applications

abstract: There is an ever-increasing demand for higher bandwidth and data rate ensuing from exploding number of radio frequency integrated systems and devices. As stated in the Shannon-Hartley theorem, the maximum achievable data rate of a communication channel is linearly proportional to the system bandwidth. This is the main driving force behind pushing wireless systems towards millimeter-wave frequency range, where larger bandwidth is available at a higher carrier frequency. Observing the Moor’s law, highly scaled complementary metal–oxide–semiconductor (CMOS) technologies provide fast transistors with a high unity power gain frequency which enables operating at millimeter-wave frequency range. CMOS is the compelling choice for digital and signal processing modules which concurrently offers high computation speed, low power consumption, and mass integration at a high manufacturing yield. One of the main shortcomings of the sub-micron CMOS technologies is the low breakdown voltage of the transistors that limits the dynamic range of the radio frequency (RF) power blocks, especially with the power amplifiers. Low voltage swing restricts the achievable output power which translates into low signal to noise ratio and degraded linearity. Extensive research has been done on proposing new design and IC fabrication techniques with the goal of generating higher output power in CMOS technology. The prominent drawbacks of these solutions are an increased die area, higher cost per design, and lower overall efficiency due to lossy passive components. In this dissertation, CMOS compatible metal–semiconductor field-effect transistor (MESFETs) are utilized to put forward a new solution to enhance the power amplifier’s breakdown voltage, gain and maximum output power. Requiring no change to the conventional CMOS process flow, this low cost approach allows direct incorporation of high voltage power MESFETs into silicon. High voltage MESFETs were employed in a cascode structure to push the amplifier’s cutoff frequency and unity power gain frequency to the 5G and K-band frequency range. This dissertation begins with CMOS compatible MESFET modeling and fabrication steps, and culminates in the discussion of amplifier design and optimization methodology, parasitic de-embedding steps, simulation and measurement results, and high resistivity RF substrate characterization.Dissertation/ThesisDoctoral Dissertation Electrical Engineering 201