A scalable model of the substrate network in deep N-Well RF MOSFETs with multiple fingers

A novel scalable model of substrate components for deep n-well (DNW) RF MOSFETs with different number of fingers is presented for the first time. The test structure developed in [1] is employed to directly access the characteristics of the substrate to extract the different substrate components. A methodology is developed to directly extract the parameters for the substrate network from the measured data. By using the measured two-port data of a set of nMOSFETs with different number of fingers, with the DNW in grounded and float configuration, respectively, the parameters of the scalable substrate model are obtained. The method and the substrate model are further verified and validated by matching the measured and simulated output admittances. Excellent agreement up to 40 GHz for configurations in common-source has been achieved

Compact modelling in RF CMOS technology

With the continuous downscaling of complementary metal-oxide-semiconductor (CMOS) technology, the RF performance of metal-oxide-semiconductor field transistors (MOSFETs) has considerably improved over the past years. Today, the standard CMOS technology has become a popular choice for realizing radio frequency (RF) applications. The focus of the thesis is on device compact modelling methodologies in RF CMOS. Compact models oriented to integrated circuit (ICs) computer automatic design (CAD) are the key component of a process design kit (PDK) and the bridge between design houses and foundries. In this work, a novel substrate model is proposed for accurately characterizing the behaviour of RF-MOSFETs with deep n-wells (DNW). A simple test structure is presented to directly access the substrate parasitics from two-port measurements in DNWs. The most important passive device in RFIC design in CMOS is the spiral inductor. A 1-pi model with a novel substrate network is proposed to characterize the broadband loss mechanisms of spiral inductors. Based on the proposed 1-pi model, a physics-originated fully-scalable 2-pi model and model parameter extraction methodology are also presented for spiral inductors in this work. To test and verify the developed active and passive device models and model parameter extraction methods, a series of RF-MOSFETs and planar on-chip spiral inductors with different geometries manufactured by employing standard RF CMOS processes were considered. Excellent agreement between the measured and the simulated results validate the compact models and modelling technologies developed in this work

Reliability Investigations of MOSFETs using RF Small Signal Characterization

Modern technology needs and advancements have introduced various new concepts such as Internet-of-Things, electric automotive, and Artificial intelligence. This implies an increased activity in the electronics domain of analog and high frequency. Silicon devices have emerged as a cost-effective solution for such diverse applications. As these silicon devices are pushed towards higher performance, there is a continuous need to improve fabrication, power efficiency, variability, and reliability. Often, a direct trade-off of higher performance is observed in the reliability of semiconductor devices. The acceleration-based methodologies used for reliability assessment are the adequate time-saving solution for the lifetime's extrapolation but come with uncertainty in accuracy. Thus, the efforts to improve the accuracy of reliability characterization methodologies run in parallel. This study highlights two goals that can be achieved by incorporating high-frequency characterization into the reliability characteristics. The first one is assessing high-frequency performance throughout the device's lifetime to facilitate an accurate description of device/circuit functionality for high-frequency applications. Secondly, to explore the potential of high-frequency characterization as the means of scanning reliability effects within devices. S-parameters served as the high-frequency device's response and mapped onto a small-signal model to analyze different components of a fully depleted silicon-on-insulator MOSFET. The studied devices are subjected to two important DC stress patterns, i.e., Bias temperature instability stress and hot carrier stress. The hot carrier stress, which inherently suffers from the self-heating effect, resulted in the transistor's geometry-dependent magnitudes of hot carrier degradation. It is shown that the incorporation of the thermal resistance model is mandatory for the investigation of hot carrier degradation. The property of direct translation of small-signal parameter degradation to DC parameter degradation is used to develop a new S-parameter based bias temperature instability characterization methodology. The changes in gate-related small-signal capacitances after hot carrier stress reveals a distinct signature due to local change of flat-band voltage. The measured effects of gate-related small-signal capacitances post-stress are validated through transient physics-based simulations in Sentaurus TCAD.:Abstract Symbols Acronyms 1 Introduction 2 Fundamentals 2.1 MOSFETs Scaling Trends and Challenges 2.1.1 Silicon on Insulator Technology 2.1.2 FDSOI Technology 2.2 Reliability of Semiconductor Devices 2.3 RF Reliability 2.4 MOSFET Degradation Mechanisms 2.4.1 Hot Carrier Degradation 2.4.2 Bias Temperature Instability 2.5 Self-heating 3 RF Characterization of fully-depleted Silicon on Insulator devices 3.1 Scattering Parameters 3.2 S-parameters Measurement Flow 3.2.1 Calibration 3.2.2 De-embedding 3.3 Small-Signal Model 3.3.1 Model Parameters Extraction 3.3.2 Transistor Figures of Merit 3.4 Characterization Results 4 Self-heating assessment in Multi-finger Devices 4.1 Self-heating Characterization Methodology 4.1.1 Output Conductance Frequency dependence 4.1.2 Temperature dependence of Drain Current 4.2 Thermal Resistance Behavior 4.2.1 Thermal Resistance Scaling with number of fingers 4.2.2 Thermal Resistance Scaling with finger spacing 4.2.3 Thermal Resistance Scaling with GateWidth 4.2.4 Thermal Resistance Scaling with Gate length 4.3 Thermal Resistance Model 4.4 Design for Thermal Resistance Optimization 5 Bias Temperature Instability Investigation 5.1 Impact of Bias Temperature Instability stress on Device Metrics 5.1.1 Experimental Details 5.1.2 DC Parameters Drift 5.1.3 RF Small-Signal Parameters Drift 5.2 S-parameter based on-the-fly Bias Temperature Instability Characterization Method 5.2.1 Measurement Methodology 5.2.2 Results and Discussion 6 Investigation of Hot-carrier Degradation 6.1 Impact of Hot-carrier stress on Device performance 6.1.1 DC Metrics Degradation 6.1.2 Impact on small-signal Parameters 6.2 Implications of Self-heating on Hot-carrier Degradation in n-MOSFETs 6.2.1 Inclusion of Thermal resistance in Hot-carrier Degradation modeling 6.2.2 Convolution of Bias Temperature Instability component in Hot-carrier Degradation 6.2.3 Effect of Source and Drain Placement in Multi-finger Layout 6.3 Vth turn-around effect in p-MOSFET 7 Deconvolution of Hot-carrier Degradation and Bias Temperature Instability using Scattering parameters 7.1 Small-Signal Parameter Signatures for Hot-carrier Degradation and Bias Temperature Instability 7.2 TCAD Dynamic Simulation of Defects 7.2.1 Fixed Charges 7.2.2 Interface Traps near Gate 7.2.3 Interface Traps near Spacer Region 7.2.4 Combination of Traps 7.2.5 Drain Series Resistance effect 7.2.6 DVth Correction 7.3 Empirical Modeling based deconvolution of Hot-carrier Degradation 8 Conclusion and Recommendations 8.1 General Conclusions 8.2 Recommendations for Future Work A Directly measured S-parameters and extracted Y-parameters B Device Dimensions for Thermal Resistance Modeling C Frequency response of hot-carrier degradation (HCD) D Localization Effect of Interface Traps Bibliograph

Study Of Nanoscale Cmos Device And Circuit Reliability

The development of semiconductor technology has led to the significant scaling of the transistor dimensions -The transistor gate length drops down to tens of nanometers and the gate oxide thickness to 1 nm. In the future several years, the deep submicron devices will dominate the semiconductor industry for the high transistor density and the corresponding performance enhancement. For these devices, the reliability issues are the first concern for the commercialization. The major reliability issues caused by voltage and/or temperature stress are gate oxide breakdown (BD), hot carrier effects (HCs), and negative bias temperature instability (NBTI). They become even more important for the nanoscale CMOS devices, because of the high electrical field due to the small device size and high temperature due to the high transistor densities and high-speed performances. This dissertation focuses on the study of voltage and temperature stress-induced reliability issues in nanoscale CMOS devices and circuits. The physical mechanisms for BD, HCs, and NBTI have been presented. A practical and accurate equivalent circuit model for nanoscale devices was employed to simulate the RF performance degradation in circuit level. The parameter measurement and model extraction have been addressed. Furthermore, a methodology was developed to predict the HC, TDDB, and NBTI effects on the RF circuits with the nanoscale CMOS. It provides guidance for the reliability considerations of the RF circuit design. The BD, HC, and NBTI effects on digital gates and RF building blocks with the nanoscale devices low noise amplifier, oscillator, mixer, and power amplifier, have been investigated systematically. The contributions of this dissertation include: It provides a thorough study of the reliability issues caused by voltage and/or temperature stresses on nanoscale devices from device level to circuit level; The more real voltage stress case high frequency (900 MHz) dynamic stress, has been first explored and compared with the traditional DC stress; A simple and practical analytical method to predict RF performance degradation due to voltage stress in the nanoscale devices and RF circuits was given based on the normalized parameter degradations in device models. It provides a quick way for the designers to evaluate the performance degradations; Measurement and model extraction technologies, special for the nanoscale MOSFETs with ultra-thin, ultra-leaky gate oxide, were addressed and employed for the model establishments; Using the present existing computer-aided design tools (Cadence, Agilent ADS) with the developed models for performance degradation evaluation due to voltage or/and temperature stress by simulations provides a potential way that industry could use to save tens of millions of dollars annually in testing costs. The world now stands at the threshold of the age of nanotechnology, and scientists and engineers have been exploring here for years. The reliability is the first challenge for the commercialization of the nanoscale CMOS devices, which will be further downscaling into several tens or ten nanometers. The reliability is no longer the post-design evaluation, but the pre-design consideration. The successful and fruitful results of this dissertation, from device level to circuit level, provide not only an insight on how the voltage and/or temperature stress effects on the performances, but also methods and guidance for the designers to achieve more reliable circuits with nanoscale MOSFETs in the future

Development of a Universal MOSFET Gate Impedance Model

Scaling of CMOS technology to 100 nm & below and the endless pursuit of higher operating frequencies drive the need to accurately model effects that dominate at those feature sizes and frequencies. Current modeling techniques are frequency limited and require different models for different frequency ranges in order to achieve accuracy goals. In the foundry world, high frequency models are typically empirical in nature and significantly lag their low frequency counterparts in terms of availability. This tends to slow the adoption of new foundry technologies for high performance applications such as extremely high data rate serializer/deserializer transceiver cores. However, design cycle time and time to market while transitioning between technology nodes can be reduced by incorporating a reusable, industry-standard model. This work proposes such a model for device gate impedance that is simulator-friendly, compact, frequencyindependent, and relatively portable across technology nodes. This semi-empirical gate impedance model is based on depletion in the poly-silicon gate electrode. The effect of device length and single-leg width on the input impedance is studied with the aid of extensive measured data obtained from devices built in 110 nm and 180 nm technologies in the 1-20GHz frequency range. The measured data illustrates that the device input impedance has a non-linear frequency dependency. This variation in input impedance is the result of gate poly-silicon depletion, which can be modeled by an external RC network connected at the gate of the device. Excellent agreement between the simulation results and the measured data validates the model in the device active region for 1-20GHz frequency range. The gate impedance model is further modified by incorporating parasitic effects, extending its range to 200MHz-20GHz. This model performs accurately for 180 run, 110 nm and 90 nm technologies at different bias conditions and dimensions. The model and model parameter behavior are consistent across technology nodes thereby enabling re-usability and portability. The accuracy of this new gate impedance model is demonstrated in various applications: to validate the model extraction techniques for different device configurations, to assess the input data run-length variations on CML buffer performance and to estimate the jitter in ring oscillators

A New Non-Quasi Static Mosfet Model

Recent progress in wireless communication is sustained through integrated circuit technologies that offer a low cost and low power devices that operate in the Radio Frequency (RF) range with relatively low noise figure. The submicrometer CMOS technology presents a serious alternative to the more expensive, high power GaAs and Si bipolar technologies that have been used for the design of high frequency ICs. Design testing and verification through circuit simulation is a critical step in the design cycle of RF integrated circuits (RFICs). Accurate device models are therefore required to reduce design cycles and to achieve success when the circuit is finally committed to silicon.This thesis addresses the Radio Frequency (RF) small-signal and large-signal models for the MOS transistor. The quasi-static (QS) and non-quasi-static (NQS) models are discussed and the assumptions used in their development are examined. The various charge components are briefly introduced and the source/drain charge partitioning is presented. The limitation of the QS approach at high frequency is investigated using the Bsim3v3.1 model. The development of a first order NQS small-signal model is briefly presented and its suitability for RF applications is indicated. The effect of the distributed gate, channel, and substrate resistances on the high frequency characteristics of the MOS transistor is examined. We propose a Radio Frequency small-signal equivalent circuit (EC) together with an efficient parameter extraction algorithm that is necessary for the device optimization and the development of accurate large-signal models. The validity of the proposed model and the accuracy of the extraction method are verified by comparing Pspice simulation results of the EC to experimental data and the Bsim3v3.1 model up to 10GHz

Extension of 0.18µm standard CMOS technology operating range to the microwave and millimetre-wave regime

There is an increasing interest in building millimetre-wave circuits on standard digital complementary metal oxide semiconductor (CMOS) technology for applications such as wireless local area networks (WLAN), automotive radar and remote sensing. This stems from the existing low cost, well-developed, high yield infrastructure for mass production. The overall aim of this thesis is to extend the operating range of 0.18um standard logic CMOS technology to millimetre-wave regime. To this end, microwave and millimetre-wave design, optimisation and modelling methodologies for active and passive devices and low noise circuit implementation are described. As part of the evaluation, new systematic and modular ways of making high performance passive and active devices such as spiral inductors, slow-wave coplanar waveguide (CPW) transmission lines, comb capacitors and NMOS transistors are proposed, designed, simulated, fabricated, modelled and analysed. Small-signal and noise de-embedding techniques are developed and verified up to 110 GHz, providing an increased accuracy in the device model, leading to a robust design at millimetre-wave frequencies. Reduced substrate losses resulting in increased quality factor are presented for optimised spiral inductor designs, featuring patterned floating shield (PFS), enabling improved matching network and a reduced chip area. Based on the proposed shielded slow-wave CPW, both the line attenuation and structure length are decreased, resulting in a more compact and simplified circuit design. An optimised transistor design, aimed at reducing the layout parasitic effects, was realised. The optimisation led to a significant improvement in the gain and noise performance of the transistor, extending its operation beyond the cut-off frequency (ft). By combining all the optimised components, low noise amplifiers (LNAs) operating at 25 GHz and 40 GHz were implemented and compared. These LNAs demonstrate state-of-the-art performance, with the 40 GHz LNA exhibiting the highest gain and lowest noise performance of any LNA reported using 0.18um CMOS technology. On the other hand, the 25 GHz LNA showed a comparable performance to other reported results in literature using several topologies implemented in CMOS technology. These findings will provide a framework for expansion to smaller CMOS technology nodes with the view of extending to sub millimetre-wave frequencies

Two-Dimensional Electronics - Prospects and Challenges

During the past 10 years, two-dimensional materials have found incredible attention in the scientific community. The first two-dimensional material studied in detail was graphene, and many groups explored its potential for electronic applications. Meanwhile, researchers have extended their work to two-dimensional materials beyond graphene. At present, several hundred of these materials are known and part of them is considered to be useful for electronic applications. Rapid progress has been made in research concerning two-dimensional electronics, and a variety of transistors of different two-dimensional materials, including graphene, transition metal dichalcogenides, e.g., MoS2 and WS2, and phosphorene, have been reported. Other areas where two-dimensional materials are considered promising are sensors, transparent electrodes, or displays, to name just a few. This Special Issue of Electronics is devoted to all aspects of two-dimensional materials for electronic applications, including material preparation and analysis, device fabrication and characterization, device physics, modeling and simulation, and circuits. The devices of interest include, but are not limited to transistors (both field-effect transistors and alternative transistor concepts), sensors, optoelectronics devices, MEMS and NEMS, and displays