Probabilistic computing with future deep sub-micrometer devices: a modelling approach

An approach is described that investigates the potential of probabilistic "neural" architectures for computation with deep sub-micrometer (DSM) MOSFETs. Initially, noisy MOSFET models are based upon those for a 0.35 /spl mu/m MOS technology with an exaggerated 1/f characteristic. We explore the manifestation of the 1/f characteristic at the output of a 2-quadrant multiplier when the key n-channel MOSFETs are replaced by "noisy" MOSFETs. The stochastic behavior of this noisy multiplier has been mapped on to a software (Matlab) model of a continuous restricted Boltzmann machine (CRBM) - an analogue-input stochastic computing structure. Simulation of this DSM CRBM implementation shows little degradation from that of a "perfect" CRBM. This paper thus introduces a methodology for a form of "technology-downstreaming" and highlights the potential of probabilistic architectures for DSM computation

Aging-Aware Design Methods for Reliable Analog Integrated Circuits using Operating Point-Dependent Degradation

The focus of this thesis is on the development and implementation of aging-aware design methods, which are suitable to satisfy current needs of analog circuit design. Based on the well known \gm/\ID sizing methodology, an innovative tool-assisted aging-aware design approach is proposed, which is able to estimate shifts in circuit characteristics using mostly hand calculation schemes. The developed concept of an operating point-dependent degradation leads to the definition of an aging-aware sensitivity, which is compared to currently available degradation simulation flows and proves to be efficient in the estimation of circuit degradation. Using the aging-aware sensitivity, several analog circuits are investigated and optimized towards higher reliability. Finally, results are presented for numerous target specifications

Monitor-Based In-Field Wearout Mitigation for CMOS RF Integrated Circuits

abstract: Performance failure due to aging is an increasing concern for RF circuits. While most aging studies are focused on the concept of mean-time-to-failure, for analog circuits, aging results in continuous degradation in performance before it causes catastrophic failures. In this regard, the lifetime of RF/analog circuits, which is defined as the point where at least one specification fails, is not just determined by aging at the device level, but also by the slack in the specifications, process variations, and the stress conditions on the devices. In this dissertation, firstly, a methodology for analyzing the performance degradation of RF circuits caused by aging mechanisms in MOSFET devices at design-time (pre-silicon) is presented. An algorithm to determine reliability hotspots in the circuit is proposed and design-time optimization methods to enhance the lifetime by making the most likely to fail circuit components more reliable is performed. RF circuits are used as test cases to demonstrate that the lifetime can be enhanced using the proposed design-time technique with low area and no performance impact. Secondly, in-field monitoring and recovering technique for the performance of aged RF circuits is discussed. The proposed in-field technique is based on two phases: During the design time, degradation profiles of the aged circuit are obtained through simulations. From these profiles, hotspot identification of aged RF circuits are conducted and the circuit variable that is easy to measure but highly correlated to the performance of the primary circuit is determined for a monitoring purpose. After deployment, an on-chip DC monitor is periodically activated and its results are used to monitor, and if necessary, recover the circuit performances degraded by aging mechanisms. It is also necessary to co-design the monitoring and recovery mechanism along with the primary circuit for minimal performance impact. A low noise amplifier (LNA) and LC-tank oscillators are fabricated for case studies to demonstrate that the lifetime can be enhanced using the proposed monitoring and recovery techniques in the field. Experimental results with fabricated LNA/oscillator chips show the performance degradation from the accelerated stress conditions and this loss can be recovered by the proposed mitigation scheme.Dissertation/ThesisDoctoral Dissertation Electrical Engineering 201

AI/ML Algorithms and Applications in VLSI Design and Technology

An evident challenge ahead for the integrated circuit (IC) industry in the nanometer regime is the investigation and development of methods that can reduce the design complexity ensuing from growing process variations and curtail the turnaround time of chip manufacturing. Conventional methodologies employed for such tasks are largely manual; thus, time-consuming and resource-intensive. In contrast, the unique learning strategies of artificial intelligence (AI) provide numerous exciting automated approaches for handling complex and data-intensive tasks in very-large-scale integration (VLSI) design and testing. Employing AI and machine learning (ML) algorithms in VLSI design and manufacturing reduces the time and effort for understanding and processing the data within and across different abstraction levels via automated learning algorithms. It, in turn, improves the IC yield and reduces the manufacturing turnaround time. This paper thoroughly reviews the AI/ML automated approaches introduced in the past towards VLSI design and manufacturing. Moreover, we discuss the scope of AI/ML applications in the future at various abstraction levels to revolutionize the field of VLSI design, aiming for high-speed, highly intelligent, and efficient implementations

A versatile CMOS transistor array IC for the statistical characterization of time-zero variability, RTN, BTI, and HCI

Statistical characterization of CMOS transistor variability phenomena in modern nanometer technologies is key for accurate end-of-life prediction. This paper presents a novel CMOS transistor array chip to statistically characterize the effects of several critical variability sources, such as time-zero variability (TZV), random telegraph noise (RTN), bias temperature instability (BTI), and hot-carrier injection (HCI). The chip integrates 3136 MOS transistors of both pMOS and nMOS types, with eight different sizes. The implemented architecture provides the chip with a high level of versatility, allowing all required tests and attaining the level of accuracy that the characterization of the above-mentioned variability effects requires. Another very important feature of the array is the capability of performing massively parallel aging testing, thus significantly cutting down the time for statistical characterization. The chip has been fabricated in a 1.2-V, 65-nm CMOS technology with a total chip area of 1800 x 1800 µm²

A versatile CMOS transistor array IC for the statistical characterization of time-zero variability, RTN, BTI, and HCI

© 2018 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes,creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.Statistical characterization of CMOS transistor variability phenomena in modern nanometer technologies is key for accurate end-of-life prediction. This paper presents a novel CMOS transistor array chip to statistically characterize the effects of several critical variability sources, such as time-zero variability (TZV), random telegraph noise (RTN), bias temperature instability (BTI), and hot-carrier injection (HCI). The chip integrates 3136 MOS transistors of both pMOS and nMOS types, with eight different sizes. The implemented architecture provides the chip with a high level of versatility, allowing all required tests and attaining the level of accuracy that the characterization of the above-mentioned variability effects requires. Another very important feature of the array is the capability of performing massively parallel aging testing, thus significantly cutting down the time for statistical characterization. The chip has been fabricated in a 1.2-V, 65-nm CMOS technology with a total chip area of 1800 x 1800 µm².Peer ReviewedPostprint (author's final draft

MANAGING AND LEVERAGING VARIATIONS AND NOISE IN NANOMETER CMOS

Advanced CMOS technologies have enabled high density designs at the cost of complex fabrication process. Variation in oxide thickness and Random Dopant Fluctuation (RDF) lead to variation in transistor threshold voltage Vth. Current photo-lithography process used for printing decreasing critical dimensions result in variation in transistor channel length and width. A related challenge in nanometer CMOS is that of on-chip random noise. With decreasing threshold voltage and operating voltage; and increasing operating temperature, CMOS devices are more sensitive to random on-chip noise in advanced technologies. In this thesis, we explore novel circuit techniques to manage the impact of process variation in nanometer CMOS technologies. We also analyze the impact of on-chip noise on CMOS circuits and propose techniques to leverage or manage impact of noise based on the application. True Random Number Generator (TRNG) is an interesting cryptographic primitive that leverages on-chip noise to generate random bits; however, it is highly sensitive to process variation. We explore novel metastability circuits to alleviate the impact of variations and at the same time leverage on-chip noise sources like Random Thermal Noise and Random Telegraph Noise (RTN) to generate high quality random bits. We develop stochastic models for metastability based TRNG circuits to analyze the impact of variation and noise. The stochastic models are used to analyze and compare low power, energy efficient and lightweight post-processing techniques targeted to low power applications like System on Chip (SoC) and RFID. We also propose variation aware circuit calibration techniques to increase reliability. We extended this technique to a more generic application of designing Post-Si Tunable (PST) clock buffers to increase parametric yield in the presence of process variation. Apart from one time variation due to fabrication process, transistors undergo constant change in threshold voltage due to aging/wear-out effects and RTN. Process variation affects conventional sensors and introduces inaccuracies during measurement. We present a lightweight wear-out sensor that is tolerant to process variation and provides a fine grained wear-out sensing. A similar circuit is designed to sense fluctuation in transistor threshold voltage due to RTN. Although thermal noise and RTN are leveraged in applications like TRNG, they affect the stability of sensitive circuits like Static Random Access Memory (SRAM). We analyze the impact of on-chip noise on Bit Error Rate (BER) and post-Si test coverage of SRAM cells