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research
A versatile CMOS transistor array IC for the statistical characterization of time-zero variability, RTN, BTI, and HCI
Authors
Xavier Aragonès Cervera
Enrique Barajas Ojeda
+8 more
Rafael Castro López
Javier Diaz Fortuny
Francisco V. Fernández Fernández
Javier Martin Martínez
Diego Mateo Peña
Montserrat Nafría Maqueda
Elisenda Roca Moreno
Rosana Rodríguez Martínez
Publication date
1 January 2018
Publisher
'Institute of Electrical and Electronics Engineers (IEEE)'
Doi
Cite
Abstract
© 2018 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes,creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.Statistical characterization of CMOS transistor variability phenomena in modern nanometer technologies is key for accurate end-of-life prediction. This paper presents a novel CMOS transistor array chip to statistically characterize the effects of several critical variability sources, such as time-zero variability (TZV), random telegraph noise (RTN), bias temperature instability (BTI), and hot-carrier injection (HCI). The chip integrates 3136 MOS transistors of both pMOS and nMOS types, with eight different sizes. The implemented architecture provides the chip with a high level of versatility, allowing all required tests and attaining the level of accuracy that the characterization of the above-mentioned variability effects requires. Another very important feature of the array is the capability of performing massively parallel aging testing, thus significantly cutting down the time for statistical characterization. The chip has been fabricated in a 1.2-V, 65-nm CMOS technology with a total chip area of 1800 x 1800 µm².Peer ReviewedPostprint (author's final draft
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