Total Dose Simulation for High Reliability Electronics

abstract: New technologies enable the exploration of space, high-fidelity defense systems, lighting fast intercontinental communication systems as well as medical technologies that extend and improve patient lives. The basis for these technologies is high reliability electronics devised to meet stringent design goals and to operate consistently for many years deployed in the field. An on-going concern for engineers is the consequences of ionizing radiation exposure, specifically total dose effects. For many of the different applications, there is a likelihood of exposure to radiation, which can result in device degradation and potentially failure. While the total dose effects and the resulting degradation are a well-studied field and methodologies to help mitigate degradation have been developed, there is still a need for simulation techniques to help designers understand total dose effects within their design. To that end, the work presented here details simulation techniques to analyze as well as predict the total dose response of a circuit. In this dissertation the total dose effects are broken into two sub-categories, intra-device and inter-device effects in CMOS technology. Intra-device effects degrade the performance of both n-channel and p-channel transistors, while inter-device effects result in loss of device isolation. In this work, multiple case studies are presented for which total dose degradation is of concern. Through the simulation techniques, the individual device and circuit responses are modeled post-irradiation. The use of these simulation techniques by circuit designers allow predictive simulation of total dose effects, allowing focused design changes to be implemented to increase radiation tolerance of high reliability electronics.Dissertation/ThesisPh.D. Electrical Engineering 201

Analog layout design automation: ILP-based analog routers

The shrinking design window and high parasitic sensitivity in the advanced technology have imposed special challenges on the analog and radio frequency (RF) integrated circuit design. In this thesis, we propose a new methodology to address such a deficiency based on integer linear programming (ILP) but without compromising the capability of handling any special constraints for the analog routing problems. Distinct from the conventional methods, our algorithm utilizes adaptive resolutions for various routing regions. For a more congested region, a routing grid with higher resolution is employed, whereas a lower-resolution grid is adopted to a less crowded routing region. Moreover, we strengthen its speciality in handling interconnect width control so as to route the electrical nets based on analog constraints while considering proper interconnect width to address the acute interconnect parasitics, mismatch minimization, and electromigration effects simultaneously. In addition, to tackle the performance degradation due to layout dependent effects (LDEs) and take advantage of optical proximity correction (OPC) for resolution enhancement of subwavelength lithography, in this thesis we have also proposed an innovative LDE-aware analog layout migration scheme, which is equipped with our special routing methodology. The LDE constraints are first identified with aid of a special sensitivity analysis and then satisfied during the layout migration process. Afterwards the electrical nets are routed by an extended OPC-inclusive ILP-based analog router to improve the final layout image fidelity while the routability and analog constraints are respected in the meantime. The experimental results demonstrate the effectiveness and efficiency of our proposed methods in terms of both circuit performance and image quality compared to the previous works

Analysis and Design of Electrostatic Discharge Protection Devices and Circuits

An electrostatic discharge (ESD) is a spontaneous electrical current that flows between two objects at different electrical potentials. ESD currents can reach several amps and are typically in the order of tens of nanoseconds. Concerning microelectronics, on-chip protection against ESD events has become a main concern on the reliability of IC as dimensions continue to shrink. ESD currents could lead to on-chip voltages that are high enough to cause MOS gate oxide breakdown. ICs can thus be damaged by human handling, contact with machinery, packaging, board assembling, etc. The main goal of this study was to analyze the effectiveness of two-stage ESD protection circuits by means of mixed mode TCAD simulations. Two-dimensional device simulations were carried out using T-Suprem4 and Taurus-Medici software from Synopsis. Also, a TCAD input deck calibration for an NXP Semiconductors¿ proprietary 0.14m¿ CMOS technology was realized. In addition, two aspects on the transparency of ESD protections were studied. An excessive leakage problem found in a real product was analyzed in TCAD. Furthermore, a new approach for distributed ESD protection design for broadband applications is also discussed, resulting in improved RF performance.Pérez Monteagudo, JM. (2010). Analysis and Design of Electrostatic Discharge Protection Devices and Circuits. http://hdl.handle.net/10251/21061.Archivo delegad

Lateral Power Mosfets Hardened Against Single Event Radiation Effects

The underlying physical mechanisms of destructive single event effects (SEE) from heavy ion radiation have been widely studied in traditional vertical double-diffused power MOSFETs (VDMOS). Recently lateral double-diffused power MOSFETs (LDMOS), which inherently provide lower gate charge than VDMOS, have become an attractive option for MHz-frequency DC-DC converters in terrestrial power electronics applications [1]. There are growing interests in extending the LDMOS concept into radiation-hard space applications. Since the LDMOS has a device structure considerably different from VDMOS, the well studied single event burn-out (SEB) or single event gate rapture (SEGR) response of VDMOS cannot be simply assumed for LDMOS devices without further investigation. A few recent studies have begun to investigate ionizing radiation effects in LDMOS devices, however, these studies were mainly focused on displacement damage and total ionizing dose (TID) effects, with very limited data reported on the heavy ion SEE response of these devices [2]-[5]. Furthermore, the breakdown voltage of the LDMOS devices in these studies was limited to less than 80 volts (mostly in the range of 20-30 volts), considerably below the voltage requirement for some space power applications. In this work, we numerically and experimentally investigate the physical insights of SEE in two different fabricated LDMOS devices designed by the author and intended for use in radiation hard applications. The first device is a 24 V Resurf LDMOS fabricated on P-type epitaxial silicon on a P+ silicon substrate. The second device is a iv much different 150 V SOI Resurf LDMOS fabricated on a 1.0 micron thick N-type silicon-on-insulator substrate with a 1.0 micron thick buried silicon dioxide layer on an N-type silicon handle wafer. Each device contains internal features, layout techniques, and process methods designed to improve single event and total ionizing dose radiation hardness. Technology computer aided design (TCAD) software was used to develop the transistor design and fabrication process of each device and also to simulate the device response to heavy ion radiation. Using these simulations in conjunction with experimentally gathered heavy ion radiation test data, we explain and illustrate the fundamental physical mechanisms by which destructive single event effects occur in these LDMOS devices. We also explore the design tradeoffs for making an LDMOS device resistant to destructive single event effects, both in terms of electrical performance and impact on other radiation hardness metric

Compact CMOS active quenching/recharge circuit for SPAD arrays

Avalanche diodes operating in Geiger mode are able to detect single photon events. They can be employed to photon counting and time-of-flight estimation. In order to ensure proper operation of these devices, the avalanche current must be rapidly quenched, and, later on, the initial equilibrium must be restored. In this paper, we present an active quenching/recharge circuit specially designed to be integrated in the form of an array of single-photon avalanche diode (SPAD) detectors. Active quenching and recharge provide benefits like an accurately controllable pulse width and afterpulsing reduction. In addition, this circuit yields one of the lowest reported area occupations and power consumptions. The quenching mechanism employed is based on a positive feedback loop that accelerates quenching right after sensing the avalanche current. We have employed a current starved inverter for the regulation of the hold-off time, which is more compact than other reported controllable delay implementations. This circuit has been fabricated in a standard 0.18 μm complementary metal-oxide-semiconductor (CMOS) technology. The SPAD has a quasi-circular shape of 12 μm diameter active area. The fill factor is about 11%. The measured time resolution of the detector is 187 ps. The photon-detection efficiency (PDE) at 540 nm wavelength is about 5% at an excess voltage of 900 mV. The break-down voltage is 10.3 V. A dark count rate of 19 kHz is measured at room temperature. Worst case post-layout simulations show a 117 ps quenching and 280 ps restoring times. The dead time can be accurately tuned from 5 to 500 ns. The pulse-width jitter is below 1.8 ns when dead time is set to 40 ns.Ministerio de Economía y Competitividad TEC2012-38921-C02, IPT-2011-1625-430000, IPC-20111009 CDTIJunta de Andalucía TIC 2338-2013Office of Naval Research (USA) N00014141035

Simulation study of scaling design, performance characterization, statistical variability and reliability of decananometer MOSFETs

This thesis describes a comprehensive, simulation based scaling study – including device design, performance characterization, and the impact of statistical variability – on deca-nanometer bulk MOSFETs. After careful calibration of fabrication processes and electrical characteristics for n- and p-MOSFETs with 35 nm physical gate length, 1 nm EOT and stress engineering, the simulated devices closely match the performance of contemporary 45 nm CMOS technologies. Scaling to 25 nm, 18 nm and 13 nm gate length n and p devices follows generalized scaling rules, augmented by physically realistic constraints and the introduction of high-k/metal-gate stacks. The scaled devices attain the performance stipulated by the ITRS. Device a.c. performance is analyzed, at device and circuit level. Extrinsic parasitics become critical to nano-CMOS device performance. The thesis describes device capacitance components, analyzes the CMOS inverter, and obtains new insights into the inverter propagation delay in nano-CMOS. The projection of a.c. performance of scaled devices is obtained. The statistical variability of electrical characteristics, due to intrinsic parameter fluctuation sources, in contemporary and scaled decananometer MOSFETs is systematically investigated for the first time. The statistical variability sources: random discrete dopants, gate line edge roughness and poly-silicon granularity are simulated, in combination, in an ensemble of microscopically different devices. An increasing trend in the standard deviation of the threshold voltage as a function of scaling is observed. The introduction of high-k/metal gates improves electrostatic integrity and slows this trend. Statistical evaluations of variability in Ion and Ioff as a function of scaling are also performed. For the first time, the impact of strain on statistical variability is studied. Gate line edge roughness results in areas of local channel shortening, accompanied by locally increased strain, both effects increasing the local current. Variations are observed in both the drive current, and in the drive current enhancement normally expected from the application of strain. In addition, the effects of shallow trench isolation (STI) on MOSFET performance and on its statistical variability are investigated for the first time. The inverse-narrow-width effect of STI enhances the current density adjacent to it. This leads to a local enhancement of the influence of junction shapes adjacent to the STI. There is also a statistical impact on the threshold voltage due to random STI induced traps at the silicon/oxide interface

Testing of leakage current failure in ASIC devices exposed to total ionizing dose environment using design for testability techniques

Due to the advancements in technology, electronic devices have been relied upon to operate under harsh conditions. Radiation is one of the main causes of different failures of the electronics devices. According to the operation environment, the sources of the radiation can be terrestrial or extra-terrestrial. For terrestrial the devices can be used in nuclear reactors or biomedical devices where the radiation is man-made. While for the extra- terrestrial, the devices can be used in satellites, the international space station or spaceships, where the radiation comes from various sources like the Sun. According to the operation environment the effects of radiation differ. These effects falls under two categories, total ionizing dose effect (TID) and single event effects (SEEs). TID effects can be affect the delay and leakage current of CMOS circuits negatively. The affects can therefore hinder the integrated circuits\u27 operation. Before the circuits are used, particularly in critical radiation heavy applications like military and space, testing under radiation must be done to avoid any failures during operation. The standard in testing electronic devices is generating worst case test vectors (WCTVs) and under radiation using these vectors the circuits are tested. However, the generation of these WCTVs have been very challenging so this approach is rarely used for TIDs effects. Design for testability (DFT) have been widely used in the industry for digital circuits testing applications. DFT is usually used with automatic test patterns generation software to generate test vectors against fault models of manufacturer defects for application specific integrated circuit (ASIC.) However, it was never used to generate test vectors for leakage current testing induced in ASICs exposed to TID radiation environment. The purpose of the thesis is to use DFT to identify WCTVs for leakage current failures in sequential circuits for ASIC devices exposed to TID. A novel methodology was devised to identify these test vectors. The methodology is validated and compared to previous non DFT methods. The methodology is proven to overcome the limitation of previous methodologies