5,661 research outputs found
3D modeling and integration of current and future interconnect technologies
Title from PDF of title page viewed June 21, 2021Dissertation advisor: Masud H. ChowdhuryVitaIncludes bibliographical references (pages 133-138)Thesis (Ph.D.)--School of Computing and Engineering and Department of Physics and Astronomy. University of Missouri--Kansas City, 2021To ensure maximum circuit reliability it is very important to estimate the circuit
performance and signal integrity in the circuit design phase. A full phase simulation for
performance estimation of a large-scale circuit not only require a massive computational
resource but also need a lot of time to produce acceptable results. The estimation of
performance/signal integrity of sub-nanometer circuits mostly depends on the interconnect
capacitance. So, an accurate model for interconnect capacitance can be used in the circuit
CAD (computer-aided design) tools for circuit performance estimation before circuit
fabrication which reduces the computational resource requirement as well as the time
constraints. We propose a new capacitance models for interconnect lines in multilevel
interconnect structures by geometrically modeling the electrical flux lines of the interconnect
lines. Closed-form equations have been derived analytically for ground and coupling
capacitance. First, the capacitance model for a single line is developed, and then the new
model is used to derive expressions for the capacitance of a line surrounded by neighboring
lines in the same and the adjacent layers above and below. These expressions are simple, and
the calculated results are within 10% of Ansys Q3D extracted values.
Through silicon via (TSV) is one of the key components of the emerging 3D ICs.
However, increasing number of TSVs in smaller silicon area leads to some severe negative
impacts on the performance of the 3D IC. Growing signal integrity issues in TSVs is one of
the major challenges of 3D integration. In this paper, different materials for the cores of the
vias and the interposers are investigated to find the best possible combination that can reduce
crosstalk and other losses like return loss and insertion loss in the TSVs. We have explored
glass and silicon as interposer materials. The simulation results indicate that glass is the best
option as interposer material although silicon interposer has some distinct advantages. For
via cores three materials - copper (Cu), tungsten (W) and Cu-W bimetal are considered. From
the analysis it can concluded that W would be better for high frequency applications due to
lower transmission coefficient. Cu offers higher conductivity, but it has larger thermal
expansion coefficient mismatch with silicon. The performance of Cu-W bimetal via would be
in between Cu and W. However, W has a thermal expansion coefficient close to silicon.
Therefore, bimetal Cu-W based TSV with W as the outer layer would be a suitable option for
high frequency 3D IC. Here, we performed the analysis in terms of return loss, transmission
coefficient and crosstalk in the vias.
Signal speed in current digital systems depends mainly on the delay of interconnects.
To overcome this delay problem and keep up with Moore’s law, 3D integrated circuit
(vertical integration of multiple dies) with through-silicon via (TSV) has been introduced to
ensure much smaller interconnect lengths, and lower delay and power consumption
compared to conventional 2D IC technology. Like 2D circuit, the estimation of 3D circuit
performance depends on different electrical parameters (capacitance, resistance, inductance)
of the TSV. So, accurate modeling of the electrical parameters of the TSV is essential for the
design and analysis of 3D ICs. We propose a set of new models to estimate the capacitance,
resistance, and inductance of a Cu-filled TSV. The proposed analytical models are derived
from the physical shape and the size of the TSV. The modeling approach is comprehensive
and includes both the cylindrical and tapered TSVs as well as the bumps.
On-chip integration of inductors has always been very challenging. However, for sub-
14nm on-chip applications, large area overhead imposed by the on-chip capacitors and
inductors has become a more severe concern. To overcome this issue and ensure power
integrity, a novel 3D Through-Silicon-Via (TSV) based inductor design is presented. The
proposed TSV based inductor has the potential to achieve both high density and high
performance. A new design of a Voltage Controlled Oscillator (VCO) utilizing the TSV
based inductor is also presented. The implementation of the VCO is intended to study the
feasibility, performance, and real-world application of the proposed TSV based inductor.Introduction -- Background of capacitance modeling of on-chip interconnect -- Accurate modeling of interconnect capacitance in multilevel interconnect structures for sub 22nm technology -- Analysis of different materials and structures for through silicon via and through glass via in 3D integrated circuits -- Impacts of different shapes of through-silicon-via core on 3D IC performance -- Accurate electrical modeling of cu-filled through-silicon-via (TSV) -- Design and characterize TSV based inductor for high frequency voltage-controlled oscillator design -- Conclusion and future wor
A review of advances in pixel detectors for experiments with high rate and radiation
The Large Hadron Collider (LHC) experiments ATLAS and CMS have established
hybrid pixel detectors as the instrument of choice for particle tracking and
vertexing in high rate and radiation environments, as they operate close to the
LHC interaction points. With the High Luminosity-LHC upgrade now in sight, for
which the tracking detectors will be completely replaced, new generations of
pixel detectors are being devised. They have to address enormous challenges in
terms of data throughput and radiation levels, ionizing and non-ionizing, that
harm the sensing and readout parts of pixel detectors alike. Advances in
microelectronics and microprocessing technologies now enable large scale
detector designs with unprecedented performance in measurement precision (space
and time), radiation hard sensors and readout chips, hybridization techniques,
lightweight supports, and fully monolithic approaches to meet these challenges.
This paper reviews the world-wide effort on these developments.Comment: 84 pages with 46 figures. Review article.For submission to Rep. Prog.
Phy
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Skybridge-3D-CMOS: A Fine-Grained Vertical 3D-CMOS Technology Paving New Direction for 3D IC
2D CMOS integrated circuit (IC) technology scaling faces severe challenges that result from device scaling limitations, interconnect bottleneck that dominates power and performance, etc. 3D ICs with die-die and layer-layer stacking using Through Silicon Vias (TSVs) and Monolithic Inter-layer Vias (MIVs) have been explored in recent years to generate circuits with considerable interconnect saving for continuing technology scaling. However, these 3D IC technologies still rely on conventional 2D CMOS’s device, circuit and interconnect mindset showing only incremental benefits while adding new challenges reliability issues, robustness of power delivery network design and short-channel effects as technology node scaling.
Skybridge-3D-CMOS (S3DC) is a fine-grained 3D IC fabric that uses vertically-stacked gates and 3D interconnections composed on vertical nanowires to yield orders of magnitude benefits over 2D ICs. This 3D fabric fully uses the vertical dimension instead of relying on a multi-layered 2D mindset. Its core fabric aspects including device, circuit-style, interconnect and heat-extraction components are co-architected considering the major challenges in 3D IC technology. In S3DC, the 3D interconnections provide greater routing capacity in both vertical and horizontal directions compared to conventional 3D ICs, which eliminates the routability issue in conventional 3D IC technology while enabling ultra-high density design and significant benefits over 2D. Also, the improved vertical routing capacity in S3DC is beneficial for achieving robust and high-density power delivery network (PDN) design while conventional 3D IC has design issues in PDN design due to limited routing resource in vertical direction. Additionally, the 3D gate-all-around transistor incorporating with 3D interconnect in S3DC enables significant SRAM design benefits and good tolerance of process variation compared to conventional 3D IC technology as well as 2D CMOS.
The transistor-level (TR-L) monolithic 3D IC (M3D) is the state-of-the-art monolithic 3D technology which shows better benefits than other M3D approaches as well as the TSV-based 3D IC approach. The S3DC is evaluated in large-scale benchmark circuits with comparison to TR-L M3D as well as 2D CMOS. Skybridge yields up to 3x lower power against 2D with no routing congestion in benchmark circuits while TR-L M3D only has up-to 22% power saving with severe routing congestions in the design. The PDN design in S3DC show
Analysis and design of power delivery networks exploiting simulation tools and numerical optimization techniques
A higher performance of computing systems is being demanded year after year, driving the digital industry to fiercely compete for offering the fastest computer system at the lowest cost. In addition, as computing system performance is growing, power delivery networks (PDN) and power integrity (PI) designs are getting increasingly more relevance due to the faster speeds and more parallelism required to obtain the required performance growth. The largest data throughput at the lowest power consumption is a common goal for most of the commercial computing systems. As a consequence of this performance growth and power delivery tradeoffs, the complexity involved in analyzing and designing PDN in digital systems is being increased. This complexity drives longer design cycle times when using traditional design tools. For this reason, the need of using more efficient design methods is getting more relevance in order to keep designing and launching products in a faster manner to the market. This trend pushes PDN designers to look for methodologies to simplify analysis and reduce design cycle times. The main objective for this Master’s thesis is to propose alternative methods by exploiting reliable simulation approaches and efficient numerical optimization techniques to analyze and design PDN to ensure power integrity. This thesis explores the use of circuital models and electromagnetic (EM) field solvers in combination with numerical optimization methods, including parameter extraction (PE) formulations. It also establishes a sound basis for using space mapping (SM) methodologies in future developments, in a way that we exploit the advantages of the most accurate and powerful models, such as 3D full-wave EM simulators, but conserving the simplicity and low computational resourcing of the analytical, circuital, and empirical models
CAD methodologies for low power and reliable 3D ICs
The main objective of this dissertation is to explore and develop computer-aided-design (CAD) methodologies and optimization techniques for reliability, timing performance, and power consumption of through-silicon-via(TSV)-based and monolithic 3D IC designs. The 3D IC technology is a promising answer to the device scaling and interconnect problems that industry faces today. Yet, since multiple dies are stacked vertically in 3D ICs, new problems arise such as thermal, power delivery, and so on. New physical design methodologies and optimization techniques should be developed to address the problems and exploit the design freedom in 3D ICs. Towards the objective, this dissertation includes four research projects.
The first project is on the co-optimization of traditional design metrics and reliability metrics for 3D ICs. It is well known that heat removal and power delivery are two major reliability concerns in 3D ICs. To alleviate thermal problem, two possible solutions have been proposed: thermal-through-silicon-vias (T-TSVs) and micro-fluidic-channel (MFC) based cooling. For power delivery, a complex power distribution network is required to deliver currents reliably to all parts of the 3D IC while suppressing the power supply noise to an acceptable level. However, these thermal and power networks pose major challenges in signal routability and congestion. In this project, a co-optimization methodology for signal, power, and thermal interconnects in 3D ICs is presented. The goal of the proposed approach is to improve signal, thermal, and power noise metrics and to provide fast and accurate design space explorations for early design stages.
The second project is a study on 3D IC partition. For a 3D IC, the target circuit needs to be partitioned into multiple parts then mapped onto the dies. The partition style impacts design quality such as footprint, wirelength, timing, and so on. In this project, the design methodologies of 3D ICs with different partition styles are demonstrated. For the LEON3 multi-core microprocessor, three partitioning styles are compared: core-level, block-level, and gate-level. The design methodologies for such partitioning styles and their implications on the physical layout are discussed. Then, to perform timing optimizations for 3D ICs, two timing constraint generation methods are demonstrated that lead to different design quality.
The third project is on the buffer insertion for timing optimization of 3D ICs. For high performance 3D ICs, it is crucial to perform thorough timing optimizations. Among timing optimization techniques, buffer insertion is known to be the most effective way. The TSVs have a large parasitic capacitance that increases the signal slew and the delay on the downstream. In this project, a slew-aware buffer insertion algorithm is developed that handles full 3D nets and considers TSV parasitics and slew effects on delay. Compared with the well-known van Ginneken algorithm and a commercial tool, the proposed algorithm finds buffering solutions with lower delay values and acceptable runtime overhead.
The last project is on the ultra-high-density logic designs for monolithic 3D ICs. The nano-scale 3D interconnects available in monolithic 3D IC technology enable ultra-high-density device integration at the individual transistor-level. The benefits and challenges of monolithic 3D integration technology for logic designs are investigated. First, a 3D standard cell library for transistor-level monolithic 3D ICs is built and their timing and power behavior are characterized. Then, various interconnect options for monolithic 3D ICs that improve design quality are explored. Next, timing-closed, full-chip GDSII layouts are built and iso-performance power comparisons with 2D IC designs are performed. Important design metrics such as area, wirelength, timing, and power consumption are compared among transistor-level monolithic 3D, gate-level monolithic 3D, TSV-based 3D, and traditional 2D designs.PhDCommittee Chair: Lim, Sung Kyu; Committee Member: Bakir, Muhannad; Committee Member: Kim, Hyesoon; Committee Member: Lee, Hsien-Hsin; Committee Member: Mukhopadhyay, Saiba
On Energy Efficient Computing Platforms
In accordance with the Moore's law, the increasing number of on-chip integrated transistors has enabled modern computing platforms with not only higher processing power but also more affordable prices. As a result, these platforms, including portable devices, work stations and data centres, are becoming an inevitable part of the human society. However, with the demand for portability and raising cost of power, energy efficiency has emerged to be a major concern for modern computing platforms.
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Modeling, design, and characterization of through vias in silicon and glass interposers
Advancements in very large scale integration (VLSI) technology have led to unprecedented transistor and interconnect scaling. Further miniaturization by traditional IC scaling in future planar CMOS technology faces significant challenges. Stacking of ICs (3D IC) using three dimensional (3D) integration technology helps in significantly reducing wiring lengths, interconnect latency and power dissipation while reducing the size of the chip and enhancing performance. Interposer technology with ultra-fine pitch interconnections needs to be developed to support the huge I/O connection requirement for packaging 3D ICs. Through vias in stacked silicon ICs and interposers are the key components of a 3D system.
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