Nouvelles Architectures Hybrides (Logique / Mémoires Non-Volatiles et technologies associées.)

Les nouvelles approches de technologies mémoires permettront une intégration dite back-end, où les cellules élémentaires de stockage seront fabriquées lors des dernières étapes de réalisation à grande échelle du circuit. Ces approches innovantes sont souvent basées sur l'utilisation de matériaux actifs présentant deux états de résistance distincts. Le passage d'un état à l'autre est contrôlé en courant ou en tension donnant lieu à une caractéristique I-V hystérétique. Nos mémoires résistives sont composées d'argent en métal électrochimiquement actif et de sulfure amorphe agissant comme électrolyte. Leur fonctionnement repose sur la formation réversible et la dissolution d'un filament conducteur. Le potentiel d'application de ces nouveaux dispositifs n'est pas limité aux mémoires ultra-haute densité mais aussi aux circuits embarqués. En empilant ces mémoires dans la troisième dimension au niveau des interconnections des circuits logiques CMOS, de nouvelles architectures hybrides et innovantes deviennent possibles. Il serait alors envisageable d'exploiter un fonctionnement à basse énergie, à haute vitesse d'écriture/lecture et de haute performance telles que l'endurance et la rétention. Dans cette thèse, en se concentrant sur les aspects de la technologie de mémoire en vue de développer de nouvelles architectures, l'introduction d'une fonctionnalité non-volatile au niveau logique est démontrée par trois circuits hybrides: commutateurs de routage non volatiles dans un Field Programmable Gate Arrays, un 6T-SRAM non volatile, et les neurones stochastiques pour un réseau neuronal. Pour améliorer les solutions existantes, les limitations de la performances des dispositifs mémoires sont identifiés et résolus avec des nouveaux empilements ou en fournissant des défauts de circuits tolérants.Novel approaches in the field of memory technology should enable backend integration, where individual storage nodes will be fabricated during the last fabrication steps of the VLSI circuit. In this case, memory operation is often based upon the use of active materials with resistive switching properties. A topology of resistive memory consists of silver as electrochemically active metal and amorphous sulfide acting as electrolyte and relies on the reversible formation and dissolution of a conductive filament. The application potential of these new memories is not limited to stand-alone (ultra-high density), but is also suitable for embedded applications. By stacking these memories in the third dimension at the interconnection level of CMOS logic, new ultra-scalable hybrid architectures becomes possible which exploit low energy operation, fast write/read access and high performance with respect to endurance and retention. In this thesis, focusing on memory technology aspects in view of developing new architectures, the introduction of non-volatile functionality at the logic level is demonstrated through three hybrid (CMOS logic ReRAM devices) circuits: nonvolatile routing switches in a Field Programmable Gate Array, nonvolatile 6T-SRAMs, and stochastic neurons of an hardware neural network. To be competitive or even improve existing solutions, limitations on the memory devices performances are identified and solved by stack engineering of CBRAM devices or providing faults tolerant circuits.SAVOIE-SCD - Bib.électronique (730659901) / SudocGRENOBLE1/INP-Bib.électronique (384210012) / SudocGRENOBLE2/3-Bib.électronique (384219901) / SudocSudocFranceF

Defect Induced Aging and Breakdown in High-k Dielectrics

abstract: High-k dielectrics have been employed in the metal-oxide semiconductor field effect transistors (MOSFETs) since 45 nm technology node. In this MOSFET industry, Moore’s law projects the feature size of MOSFET scales half within every 18 months. Such scaling down theory has not only led to the physical limit of manufacturing but also raised the reliability issues in MOSFETs. After the incorporation of HfO2 based high-k dielectrics, the stacked oxides based gate insulator is facing rather challenging reliability issues due to the vulnerable HfO2 layer, ultra-thin interfacial SiO2 layer, and even messy interface between SiO2 and HfO2. Bias temperature instabilities (BTI), hot channel electrons injections (HCI), stress-induced leakage current (SILC), and time dependent dielectric breakdown (TDDB) are the four most prominent reliability challenges impacting the lifetime of the chips under use. In order to fully understand the origins that could potentially challenge the reliability of the MOSFETs the defects induced aging and breakdown of the high-k dielectrics have been profoundly investigated here. BTI aging has been investigated to be related to charging effects from the bulk oxide traps and generations of Si-H bonds related interface traps. CVS and RVS induced dielectric breakdown studies have been performed and investigated. The breakdown process is regarded to be related to oxygen vacancies generations triggered by hot hole injections from anode. Post breakdown conduction study in the RRAM devices have shown irreversible characteristics of the dielectrics, although the resistance could be switched into high resistance state.Dissertation/ThesisDoctoral Dissertation Electrical Engineering 201

Fabrication and Pseudo-Analog Characteristics of Ta2O5 -Based ReRAM Cell

Memristori on yksi elektroniikan peruskomponenteista vastuksen, kondensaattorin ja kelan lisäksi. Se on passiivinen komponentti, jonka teorian kehitti Leon Chua vuonna 1971. Kesti kuitenkin yli kolmekymmentä vuotta ennen kuin teoria pystyttiin yhdistämään kokeellisiin tuloksiin. Vuonna 2008 Hewlett Packard julkaisi artikkelin, jossa he väittivät valmistaneensa ensimmäisen toimivan memristorin. Memristori eli muistivastus on resistiivinen komponentti, jonka vastusarvoa pystytään muuttamaan. Nimens mukaisesti memristori kykenee myös säilyttämään vastusarvonsa ilman jatkuvaa virtaa ja jännitettä. Tyypillisesti memristorilla on vähintään kaksi vastusarvoa, joista kumpikin pystytään valitsemaan syöttämällä komponentille jännitettä tai virtaa. Tämän vuoksi memristoreita kutsutaankin usein resistiivisiksi kytkimiksi. Resistiivisiä kytkimiä tutkitaan nykyään paljon erityisesti niiden mahdollistaman muistiteknologian takia. Resistiivisistä kytkimistä rakennettua muistia kutsutaan ReRAM-muistiksi (lyhenne sanoista resistive random access memory). ReRAM-muisti on Flash-muistin tapaan haihtumaton muisti, jota voidaan sähköisesti ohjelmoida tai tyhjentää. Flash-muistia käytetään tällä hetkellä esimerkiksi muistitikuissa. ReRAM-muisti mahdollistaa kuitenkin nopeamman ja vähävirtaiseman toiminnan Flashiin verrattuna, joten se on tulevaisuudessa varteenotettava kilpailija markkinoilla. ReRAM-muisti mahdollistaa myös useammin bitin tallentamisen yhteen muistisoluun binäärisen (”0” tai ”1”) toiminnan sijaan. Tyypillisesti ReRAM-muistisolulla on kaksi rajoittavaa vastusarvoa, mutta näiden kahden tilan välille pystytään mahdollisesti ohjelmoimaan useampia tiloja. Muistisoluja voidaan kutsua analogisiksi, jos tilojen määrää ei ole rajoitettu. Analogisilla muistisoluilla olisi mahdollista rakentaa tehokkaasti esimerkiksi neuroverkkoja. Neuroverkoilla pyritään mallintamaan aivojen toimintaa ja suorittamaan tehtäviä, jotka ovat tyypillisesti vaikeita perinteisille tietokoneohjelmille. Neuroverkkoja käytetään esimerkiksi puheentunnistuksessa tai tekoälytoteutuksissa. Tässä diplomityössä tarkastellaan Ta2O5 -perustuvan ReRAM-muistisolun analogista toimintaa pitäen mielessä soveltuvuus neuroverkkoihin. ReRAM-muistisolun valmistus ja mittaustulokset käydään läpi. Muistisolun toiminta on harvoin täysin analogista, koska kahden rajoittavan vastusarvon välillä on usein rajattu määrä tiloja. Tämän vuoksi toimintaa kutsutaan pseudoanalogiseksi. Mittaustulokset osoittavat, että yksittäinen ReRAM-muistisolu kykenee binääriseen toimintaan hyvin. Joiltain osin yksittäinen solu kykenee tallentamaan useampia tiloja, mutta vastusarvoissa on peräkkäisten ohjelmointisyklien välillä suurta vaihtelevuutta, joka hankaloittaa tulkintaa. Valmistettu ReRAM-muistisolu ei sellaisenaan kykene toimimaan pseudoanalogisena muistina, vaan se vaati rinnalleen virtaa rajoittavan komponentin. Myös valmistusprosessin kehittäminen vähentäisi yksittäisen solun toiminnassa esiintyvää varianssia, jolloin sen toiminta muistuttaisi enemmän pseudoanalogista muistia.The memristor is one of the fundamental circuit elements in addition to a resistor, capacitor and an inductor. It is a passive component whose theory was postulated by Leon Chua in 1971. It took over 30 years before any known physical examples were discovered. In 2008 Hewlett Packard published an article where they manufactured a device which they claimed to be the first memristor found. The memristor, which is a concatenation of memory resistor, is a resistive component that has an ability to change its resistance. It can also remember its resistance value without continuous current or voltage. Typically, a memristor has at least two resistance states that can be altered. This is the reason why memristors are also called resistive switches. Resistive switches can be used in memory technologies. A memory array that has been built using resistive switches is called ReRAM (resistive random access memory). ReRAM, like Flash memory, is a non-volatile memory that can be programmed or erased electrically. Flash memories are currently used e.g. in memory sticks. However, compared to Flash, ReRAM has faster operating speed and lower power consumption, for instance. It could potentially replace current memory standards in future. A ReRAM memory cell can also store multiple bits instead of binary operation (”0” or ”1”). Typically there exists multiple intermediate resistance states between ReRAM’s limiting resistances that could be utilized. Such memory could be called analog, if the amount of intermediate states is not limited to discrete levels. Analog memories make it possible to build artificial neural networks (ANN) efficiently, for instance. ANNs try to model the behaviour of brain and to perform tasks that are difficult for traditional computer programs such as speech recognition or artificial intelligence. This thesis studies the analog behaviour of Ta 2 O 5 -based ReRAM cell. Manufacturing process and measurement results are presented. The operation of ReRAM cell is rarely fully analog as there exists limited amount of intermediate resistance states. This is the reason why operation is called pseudo-analog. Measurement results show that a single ReRAM cell is suitable for binary operation. In some cases, a single cell can store multiple resistance values but there exists significant variance in resistance states between subsequent programming cycles. The proposed ReRAM cell cannot operate as pseudo-analog ReRAM cell in itself as it needs an external current limiting component. Improving the manufacturing process should reduce the variability such that the operation would be more like a pseudo-analog memory.Siirretty Doriast

Resistive switching devices with improved control of oxygen vacancies dynamics

L'abstract è presente nell'allegato / the abstract is in the attachmen

Adaptive Intelligent Systems for Extreme Environments

As embedded processors become powerful, a growing number of embedded systems equipped with artificial intelligence (AI) algorithms have been used in radiation environments to perform routine tasks to reduce radiation risk for human workers. On the one hand, because of the low price, commercial-off-the-shelf devices and components are becoming increasingly popular to make such tasks more affordable. Meanwhile, it also presents new challenges to improve radiation tolerance, the capability to conduct multiple AI tasks and deliver the power efficiency of the embedded systems in harsh environments. There are three aspects of research work that have been completed in this thesis: 1) a fast simulation method for analysis of single event effect (SEE) in integrated circuits, 2) a self-refresh scheme to detect and correct bit-flips in random access memory (RAM), and 3) a hardware AI system with dynamic hardware accelerators and AI models for increasing flexibility and efficiency. The variances of the physical parameters in practical implementation, such as the nature of the particle, linear energy transfer and circuit characteristics, may have a large impact on the final simulation accuracy, which will significantly increase the complexity and cost in the workflow of the transistor level simulation for large-scale circuits. It makes it difficult to conduct SEE simulations for large-scale circuits. Therefore, in the first research work, a new SEE simulation scheme is proposed, to offer a fast and cost-efficient method to evaluate and compare the performance of large-scale circuits which subject to the effects of radiation particles. The advantages of transistor and hardware description language (HDL) simulations are combined here to produce accurate SEE digital error models for rapid error analysis in large-scale circuits. Under the proposed scheme, time-consuming back-end steps are skipped. The SEE analysis for large-scale circuits can be completed in just few hours. In high-radiation environments, bit-flips in RAMs can not only occur but may also be accumulated. However, the typical error mitigation methods can not handle high error rates with low hardware costs. In the second work, an adaptive scheme combined with correcting codes and refreshing techniques is proposed, to correct errors and mitigate error accumulation in extreme radiation environments. This scheme is proposed to continuously refresh the data in RAMs so that errors can not be accumulated. Furthermore, because the proposed design can share the same ports with the user module without changing the timing sequence, it thus can be easily applied to the system where the hardware modules are designed with fixed reading and writing latency. It is a challenge to implement intelligent systems with constrained hardware resources. In the third work, an adaptive hardware resource management system for multiple AI tasks in harsh environments was designed. Inspired by the “refreshing” concept in the second work, we utilise a key feature of FPGAs, partial reconfiguration, to improve the reliability and efficiency of the AI system. More importantly, this feature provides the capability to manage the hardware resources for deep learning acceleration. In the proposed design, the on-chip hardware resources are dynamically managed to improve the flexibility, performance and power efficiency of deep learning inference systems. The deep learning units provided by Xilinx are used to perform multiple AI tasks simultaneously, and the experiments show significant improvements in power efficiency for a wide range of scenarios with different workloads. To further improve the performance of the system, the concept of reconfiguration was further extended. As a result, an adaptive DL software framework was designed. This framework can provide a significant level of adaptability support for various deep learning algorithms on an FPGA-based edge computing platform. To meet the specific accuracy and latency requirements derived from the running applications and operating environments, the platform may dynamically update hardware and software (e.g., processing pipelines) to achieve better cost, power, and processing efficiency compared to the static system

DESIGN AND TEST OF DIGITAL CIRCUITS AND SYSTEMS USING CMOS AND EMERGING RESISTIVE DEVICES

The memristor is an emerging nano-device. Low power operation, high density, scalability, non-volatility, and compatibility with CMOS Technology have made it a promising technology for memory, Boolean implementation, computing, and logic systems. This dissertation focuses on testing and design of such applications. In particular, we investigate on testing of memristor-based memories, design of memristive implementation of Boolean functions, and reliability and design of neuromorphic computing such as neural network. In addition, we show how to modify threshold logic gates to implement more functions. Although memristor is a promising emerging technology but is prone to defects due to uncertainties in nanoscale fabrication. Fast March tests are proposed in Chapter 2 that benefit from fast write operations. The test application time is reduced significantly while simultaneously reducing the average test energy per cell. Experimental evaluation in 45 nm technology show a speed-up of approximately 70% with a decrease in energy by approximately 40%. DfT schemes are proposed to implement the new test methods. In Chapter 3, an Integer Linear Programming based framework to identify current-mode threshold logic functions is presented. It is shown that threshold logic functions can be implemented in CMOS-based current mode logic with reduced transistor count when the input weights are not restricted to be integers. Experimental results show that many more functions can be implemented with predetermined hardware overhead, and the hardware requirement of a large percentage of existing threshold functions is reduced when comparing to the traditional CMOS-based threshold logic implementation. In Chapter 4, a new method to implement threshold logic functions using memristors is presented. This method benefits from the high range of memristor’s resistivity which is used to define different weight values, and reduces significantly the transistor count. The proposed approach implements many more functions as threshold logic gates when comparing to existing implementations. Experimental results in 45 nm technology show that the proposed memristive approach implements threshold logic gates with less area and power consumption. Finally, Chapter 5 focuses on current-based designs for neural networks. CMOS aging impacts the total synaptic current and this impacts the accuracy. Chapter 5 introduces an enhanced memristive crossbar array (MCA) based analog neural network architecture to improve reliability due to the aging effect. A built-in current-based calibration circuit is introduced to restore the total synaptic current. The calibration circuit is a current sensor that receives the ideal reference current for non-aged column and restores the reduced sensed current at each column to the ideal value. Experimental results show that the proposed approach restores the currents with less than 1% precision, and the area overhead is negligible

Characterisation of Novel Resistive Switching Memory Devices

Resistive random access memory (RRAM) is widely considered as a disruptive technology that will revolutionize not only non-volatile data storage, but also potentially digital logic and neuromorphic computing. The resistive switching mechanism is generally conceived as the rupture/restoration of defect-formed conductive filament (CF) or defect profile modulation, for filamentary and non-filamentary devices respectively. However, details of the underlying microscopic behaviour of the resistive switching in RRAM are still largely missing. In this thesis, a defect probing technique based on the random telegraph noise (RTN) is developed for both filamentary and non-filamentary devices, which can reveal the resistive switching mechanism at defect level and can also be used to analyse the device performance issues. HfO2 is one of the most matured metal-oxide materials in semiconductor industry and HfO2 RRAM shows promising potential in practical application. An RTN-based defect extraction technique is developed for the HfO2 devices to detect individual defect movement and provide statistical information of CF modification during normal operations. A critical filament region (CFR) is observed and further verified by defect movement tracking. Both defect movements and CFR modification are correlated with operation conditions, endurance failure and recovery. Non-filamentary devices have areal switching characteristics, and are promising in overcoming the drawbacks of filamentary devices that mainly come from the stochastic nature of the CF. a-VMCO is an outstanding non-filamentary device with a set of unique characteristics, but its resistive switching mechanism has not been clearly understood yet. By utilizing the RTN-based defect profiling technique, defect profile modulation in the switching layer is identified and correlated with digital and analogue switching behaviours, for the first time. State instability is analysed and a stable resistance window of 10 for >106 cycles is restored through combining optimizations of device structure and operation conditions, paving the way for its practical application. TaOx-based RRAM has shown fast switching in the sub-nanosecond regime, good CMOS compatibility and record endurance of more than 1012 cycles. Several inconsistent models have been proposed for the Ta2O5/TaOx bilayered structure, and it is difficult to quantify and optimize the performance, largely due to the lack of microscopic description of resistive switching based on experimental results. An indepth analysis of the TiN/Ta2O5/TaOx/TiN structured RRAM is carried out with the RTN-based defect probing technique, for both bipolar and unipolar switching modes. Significant differences in defect profile have been observed and explanations have been provided

Circuit Design, Architecture and CAD for RRAM-based FPGAs

Field Programmable Gate Arrays (FPGAs) have been indispensable components of embedded systems and datacenter infrastructures. However, energy efficiency of FPGAs has become a hard barrier preventing their expansion to more application contexts, due to two physical limitations: (1) The massive usage of routing multiplexers causes delay and power overheads as compared to ASICs. To reduce their power consumption, FPGAs have to operate at low supply voltage but sacrifice performance because the transistors drive degrade when working voltage decreases. (2) Using volatile memory technology forces FPGAs to lose configurations when powered off and to be reconfigured at each power on. Resistive Random Access Memories (RRAMs) have strong potentials in overcoming the physical limitations of conventional FPGAs. First of all, RRAMs grant FPGAs non-volatility, enabling FPGAs to be "Normally powered off, Instantly powered on". Second, by combining functionality of memory and pass-gate logic in one unique device, RRAMs can greatly reduce area and delay of routing elements. Third, when RRAMs are embedded into datpaths, the performance of circuits can be independent from their working voltage, beyond the limitations of CMOS circuits. However, researches and development of RRAM-based FPGAs are in their infancy. Most of area and performance predictions were achieved without solid circuit-level simulations and sophisticated Computer Aided Design (CAD) tools, causing the predicted improvements to be less convincing. In this thesis,we present high-performance and low-power RRAM-based FPGAs fromtransistorlevel circuit designs to architecture-level optimizations and CAD tools, using theoretical analysis, industrial electrical simulators and novel CAD tools. We believe that this is the first systematic study in the field, covering: From a circuit design perspective, we propose efficient RRAM-based programming circuits and routing multiplexers through both theoretical analysis and electrical simulations. The proposed 4T(ransitor)1R(RAM) programming structure demonstrates significant improvements in programming current, when compared to most popular 2T1R programming structure. 4T1R-based routingmultiplexer designs are proposed by considering various physical design parasitics, such as intrinsic capacitance of RRAMs and wells doping organization. The proposed 4T1R-based multiplexers outperformbest CMOS implementations significantly in area, delay and power at both nominal and near-Vt regime. From a CAD perspective, we develop a generic FPGA architecture exploration tool, FPGASPICE, modeling a full FPGA fabric with SPICE and Verilog netlists. FPGA-SPICE provides different levels of testbenches and techniques to split large SPICE netlists, in order to obtain better trade-off between simulation time and accuracy. FPGA-SPICE can capture area and power characteristics of SRAM-based and RRAM-based FPGAs more accurately than the currently best analyticalmodels. From an architecture perspective, we propose architecture-level optimizations for RRAMbased FPGAs and quantify their minimumrequirements for RRAM devices. Compared to the best SRAM-based FPGAs, an optimized RRAM-based FPGA architecture brings significant reduction in area, delay and power respectively. In particular, RRAM-based FPGAs operating in the near-Vt regime demonstrate a 5x power improvement without delay overhead as compared to optimized SRAM-based FPGA operating at nominal working voltage

Etude à l'échelle nanométrique par sonde locale de la fiabilité et de la dégradation de films minces d'oxyde pour applications MOS et MIM

Integration of High-k dielectrics in gate oxides of MOS raised new issues concerning the reliability of futur technology nodes. The constant miniaturisation of devices leads to thinner gate oxides, making their electrical caracterisation more complex at the device scale. To solve this problem, an atomic force microscope in conductive mode under ultra high vacuum can be used thanks to the readuce contact area between the tip and the sample which allow a drastic decrease of the tunneling current and thus the study of the degradation and the dielectric breakdown of ultra-thin oxides. The systematic comparaison of the TDDB distributions obtained on the High-k gate oxide of the 28nm technology node on one side and obtained on the Interfacial layer alone revealed that the failure probability of High-k oxides is governed by the failure probability of each layer present in the stack. This allow to give an extrapolation law of the High-k gate oxide lifetime as a function of the applied voltage and the electrode area and to predict the failure statistic of the 28nm tehcnology node. The impact of voltage pre-stress with a microseconde range of duration on the TDDB and VBD distributions of both single layer and High-k gate oxides is given is the manuscript. The results are then interpreted by an invasive degradation nucleating from an interface during a stress and leading to a local thinned oxide. Pre-breakdown negative differential resistance have been studied and modeled for several oxide thickness, using a growing mecanism of the elctrical degradation. An analytic expression linking the growth caracteristic time of the filament and the mean time to breakdown observed on the statistical distributions has then been given. Finally, C-AFM measurements developped in this work has been extended to MIM structures used for oxide resistive random access memories (OxRAM). A self healing has been observed at the nanometric scale for these samples.L'intégration de diélectriques High-k dans les empilements de grille des dispositifs MOS a fait naître de nouvelles interrogations concernant la fiabilité des futurs nœuds technologiques. La miniaturisation constante des dispositifs conduisant à l'amincissement des épaisseurs d'oxyde de grille, leur caractérisation électrique est rendue de plus en plus complexe à l'échelle du dispositif. Pour palier à ce problème, l'utilisation d'un microscope à force atomique en mode conducteur sous ultravide permet grâce à la faible surface de contact entre la pointe et l'échantillon de réduire suffisamment le courant tunnel pour pouvoir étudier la dégradation et le claquage diélectrique d'oxyde ultra fin. La comparaison systématique des résultats de fiabilité de l'empilement High-k du nœud 28nm et de la couche interfaciale seule ayant subi les mêmes étapes de développement que celles présentes dans l'empilement, obtenus par C-AFM sous ultra vide, ont permis de montrer expérimentalement que la probabilité de claquage des oxydes de grille High-k est gouvernée par la fiabilité propre des couches qui la composent, et de déduire une loi d'extrapolation de la durée de vie en tension et en surface ce qui permet de prédire la statistique de défaillance du dispositif. Les impacts d'un pré-stress en tension de l'ordre de la milliseconde sur les distributions de claquage des oxydes de grille simples et bicouches ont été rapportés. Ces résultats sont expliqués dans ce manuscrit par le déclenchement lors de l'application du stress, d'une dégradation au sein de l'oxyde, prenant naissance dans la couche interfaciale des oxydes High-k et conduisant à une réduction locale de l'épaisseur de diélectrique. Des phénomènes de résistance différentielle négative au moment de la rupture diélectrique ont été étudiés et modélisés pour différentes épaisseurs d'oxyde, par une croissance filamentaire de la dégradation. Il a été possible de donner une expression analytique reliant le temps caractéristique de croissance filamentaire et le temps moyen de claquage observé sur les distributions statistiques. Enfin, les mesures C-AFM de ce travail ont été étendues au cas des structures MIM utilisées pour le développement des futurs mémoires résistives OxRAM. Dans ce cas un effet d'auto-guérison à l'échelle nanométrique a été mis en évidence