Modeling of optical amplifier waveguide based on silicon nanostructures and rare earth ions doped silica matrix gain media by a finite-difference time-domain method: comparison of achievable gain with Er3+ or Nd3+ ions dopants

A comparative study of the gain achievement is performed in a waveguide optical amplifier whose active layer is constituted by a silica matrix containing silicon nanograins acting as sensitizer of either neodymium ions (Nd 3+) or erbium ions (Er 3+). Due to the large difference between population levels characteristic times (ms) and finite-difference time step (10 --17 s), the conventional auxiliary differential equation and finite-difference time-domain (ADE-FDTD) method is not appropriate to treat such systems. Consequently, a new two loops algorithm based on ADE-FDTD method is presented in order to model this waveguide optical amplifier. We investigate the steady states regime of both rare earth ions and silicon nanograins levels populations as well as the electromagnetic field for different pumping powers ranging from 1 to 10 4 mW.mm-2. Furthermore, the three dimensional distribution of achievable gain per unit length has been estimated in this pumping range. The Nd 3+ doped waveguide shows a higher gross gain per unit length at 1064 nm (up to 30 dB.cm-1) than the one with Er 3+ doped active layer at 1532 nm (up to 2 dB.cm-1). Considering the experimental background losses found on those waveguides we demonstrate that a significant positive net gain can only be achieved with the Nd 3+ doped waveguide. The developed algorithm is stable and applicable to optical gain materials with emitters having a wide range of characteristic lifetimes.Comment: Photonics West , Feb 2015, San Francisco, United States. S, SPIE Proceedings, 9357 (935709), 2015, Physics and Simulation of Optoelectronic Devices XXIII. arXiv admin note: text overlap with arXiv:1405.533

Theoretical investigation of the more suitable rare earth to achieve high gain in waveguide based on silica containing silicon nanograins doped with either Nd3+ or Er3+ ions

We present a comparative study of the gain achievement in a waveguide whose active layer is constituted by a silica matrix containing silicon nanograins acting as sensitizer of either neodymium ions (Nd3+) or erbium ions (Er3+). By means of an auxiliary differential equation and finite difference time domain (ADE-FDTD) approach that we developed, we investigate the steady states regime of both rare earths ions and silicon nanograins levels populations as well as the electromagnetic field for different pumping powers ranging from 1 to 104 mW/mm2. Moreover, the achievable gain has been estimated in this pumping range. The Nd3+ doped waveguide shows a higher gross gain per unit length at 1064 nm (up to 30 dB/cm) than the one with Er3+ doped active layer at 1532 nm (up to 2 dB/cm). Taking into account the experimental background losses we demonstrate that a significant positive net gain can only be achieved with the Nd3+ doped waveguide

Photonic Properties of Silicon-Based Materials

Non peer reviewe

Hafnium Silicate dielectrics fabricated by RF magnetron sputtering.

International audienceStructural and composition properties of hafnium silicate layers fabricated by RF magnetron sputtering were studied by means of spectroscopic ellipsometry, X-ray diffraction, transmission electron microscopy and attenuated total reflection infrared spectroscopy with respect to the deposition parameters and postdeposition annealing treatment. The variation of the deposition conditions allows the temperature of amorphous-crystalline phase transformation of pure hafnium oxide layers to be controlled. It is shown that the silicon incorporation in oxide matrix prevents the formation of interfacial silicon oxide layer and plays a major role in the stability of the structure of hafnium based layers remaining an amorphous state upon annealing at 900-950 °C

Effect of the Nd content on the structural and photoluminescence properties of silicon-rich silicon dioxide thin films

In this article, the microstructure and photoluminescence (PL) properties of Nd-doped silicon-rich silicon oxide (SRSO) are reported as a function of the annealing temperature and the Nd concentration. The thin films, which were grown on Si substrates by reactive magnetron co-sputtering, contain the same Si excess as determined by Rutherford backscattering spectrometry. Fourier transform infrared (FTIR) spectra show that a phase separation occurs during the annealing because of the condensation of the Si excess resulting in the formation of silicon nanoparticles (Si-np) as detected by high-resolution transmission electron microscopy and X-ray diffraction (XRD) measurements. Under non-resonant excitation at 488 nm, our Nd-doped SRSO films simultaneously exhibited PL from Si-np and Nd3+ demonstrating the efficient energy transfer between Si-np and Nd3+ and the sensitizing effect of Si-np. Upon increasing the Nd concentration from 0.08 to 4.9 at.%, our samples revealed a progressive quenching of the Nd3+ PL which can be correlated with the concomitant increase of disorder within the host matrix as shown by FTIR experiments. Moreover, the presence of Nd-oxide nanocrystals in the highest Nd-doped sample was established by XRD. It is, therefore, suggested that the Nd clustering, as well as disorder, are responsible for the concentration quenching of the PL of Nd3+

Influence of the supersaturation on Si diffusion and growth of Si nanoparticles in silcion-rich silica

International audienceComb-drive micro-electro-mechanical systems oscillators for low temperature experiments Rev. Sci. Instrum. 84, 025003 (2013) Influence of the embedding matrix on optical properties of Ge nanocrystals-based nanocomposite J. Appl. Phys. 113, 053512 (2013) Fabrication of Bi2Te3 nanowire arrays and thermal conductivity measurement by 3ω-scanning thermal microscopy J. Appl. Phys. 113, 054308 (2013) Controlled route to the fabrication of carbon and boron nitride nanoscrolls: A molecular dynamics investigation J. Appl. Phys. 113, 054306 (2013) Electrodynamic control of the nanofiber alignment during electrospinning Appl. Phys. Lett. 102, 053111 (2013) Additional information on J. Appl. Phys. SiO X /SiO 2 multilayers have been prepared using magnetron sputtering and annealed in order to induce the growth of Si nanoparticles in Si-rich sublayers. This sample has undergone several successive annealing treatments and has been analyzed using a laser-assisted tomographic atom probe. This allows the phase separation between Si and SiO 2 and the growth process to be studied at the atomic scale as a function of annealing temperature. Si diffusion coefficient is estimated from the accurate measurement of matrix composition and Si particle size. We demonstrate that the diffusion coefficient in SiO X is supersaturation dependent, leading to a decrease in silicon particle growth kinetics during annealing. In addition, we use our measurements to predict the critical thickness for efficient SiO 2 diffusion barriers

Silicon Nanoscale Materials : From Theoretical Simulations to Photonic Applications

Peer reviewe

SiNx:Tb3+--Yb3+, an efficient down-conversion layer compatible with a silicon solar cell process

SiN x : Tb 3+-Yb 3+, an efficient down-conversion layer compatible with silicon solar cell process Abstract Tb 3+-Yb 3+ co-doped SiN x down-conversion layers compatible with silicon Photovoltaic Technology were prepared by reactive magnetron co-sputtering. Efficient sensitization of Tb 3+ ions through a SiN x host matrix and cooperative energy transfer between Tb 3+ and Yb 3+ ions were evidenced as driving mechanisms of the down-conversion process. In this paper, the film composition and microstructure are investigated alongside their optical properties, with the aim of maximizing the rare earth ions incorporation and emission efficiency. An optimized layer achieving the highest Yb 3+ emission intensity was obtained by reactive magnetron co-sputtering in a nitride rich atmosphere for 1.2 W/cm${}^2$ and 0.15 W/cm${}^2$ power density applied on the Tb and Yb targets, respectively. It was determined that depositing at 200 {\textdegree}C and annealing at 850 {\textdegree}C leads to comparable Yb 3+ emission intensity than depositing at 500 {\textdegree}C and annealing at 600 {\textdegree}C, which is promising for applications toward silicon solar cells.Comment: Solar Energy Materials and Solar Cells, Elsevier, 201

High rectifying behavior in Al/Sinanocrystal-embedded SiOxNy/p-Si heterojunctions

5International audienceWe examine the electrical properties of MIS devices made of Al/Si nanocrystal-SiOxNy/p Si. The J V characteristics of the devices present a high rectifying behavior. Temperature measurements show that the forward current is thermally activated following the thermal diffusion model of carriers. At low reverse bias, the current is governed by thermal emission amplified by Poole-Frenkel effect of carriers from defects located in the silicon nanocrystals/SiOxNy interfaces, whereas tunnel conduction in silicon oxynitride matrix dominates at high reverse bias. Devices exhibit a rectification ratio >104 for the current measured at V= 1V. Study reveals that thermal annealing in forming gas (H2/N2) improves electrical properties of the devices due to the passivation of defects