59 research outputs found
Ebf3⁺ niche-derived CXCL12 is required for the localization and maintenance of hematopoietic stem cells
Lympho-hematopoiesis is regulated by cytokines; however, it remains unclear how cytokines regulate hematopoietic stem cells (HSCs) to induce production of lymphoid progenitors. Here, we show that in mice whose CXC chemokine ligand 12 (CXCL12) is deleted from half HSC niche cells, termed CXC chemokine ligand 12 (CXCL12)-abundant reticular (CAR) cells, HSCs migrate from CXCL12-deficient niches to CXCL12-intact niches. In mice whose CXCL12 is deleted from all Ebf3+/leptin receptor (LepR)+ CAR cells, HSCs are markedly reduced and their ability to generate B cell progenitors is reduced compared with that to generate myeloid progenitors even when transplanted into wild-type mice. Additionally, CXCL12 enables the maintenance of B lineage repopulating ability of HSCs in vitro. These results demonstrate that CAR cell-derived CXCL12 attracts HSCs to CAR cells within bone marrow and plays a critical role in the maintenance of HSCs, especially lymphoid-biased or balanced HSCs. This study suggests an additional mechanism by which cytokines act on HSCs to produce B cells.Nakatani T., Sugiyama T., Omatsu Y., et al. Ebf3+ niche-derived CXCL12 is required for the localization and maintenance of hematopoietic stem cells. Nature Communications 14, 6402 (2023); https://doi.org/10.1038/s41467-023-42047-2
A New Experimental Approach to Evaluate Plasma-induced Damage in Microcantilever
Plasma etching, during micro-fabrication processing is indispensable for fabricating MEMS structures. During the plasma processes, two major matters, charged ions and vacuum–ultraviolet (VUV) irradiation damage, take charge of reliability degradation. The charged ions induce unwanted sidewall etching, generally called as “notching”, which causes degradation in brittle strength. Furthermore, the VUV irradiation gives rise to crystal defects on the etching surface. To overcome the problem, neutral beam etching (NBE), which use neutral particles without the VUV irradiation, has been developed. In order to evaluate the effect of the NBE quantitatively, we measured the resonance property of a micro-cantilever before and after NBE treatment. The thickness of damage layer (δ) times the imaginary part of the complex Young's modulus (Eds) were then compared, which is a parameter of surface damage. Although plasma processes make the initial surface of cantilevers damaged during their fabrication, the removal of that damage by NBE was confirmed as the reduction in δEds. NBE will realize a damage-free surface for microstructures
A New Experimental Approach to Evaluate Plasma-induced Damage in Microcantilever
Plasma etching, during micro-fabrication processing is indispensable for fabricating MEMS structures. During the plasma processes, two major matters, charged ions and vacuum–ultraviolet (VUV) irradiation damage, take charge of reliability degradation. The charged ions induce unwanted sidewall etching, generally called as “notching”, which causes degradation in brittle strength. Furthermore, the VUV irradiation gives rise to crystal defects on the etching surface. To overcome the problem, neutral beam etching (NBE), which use neutral particles without the VUV irradiation, has been developed. In order to evaluate the effect of the NBE quantitatively, we measured the resonance property of a micro-cantilever before and after NBE treatment. The thickness of damage layer (δ) times the imaginary part of the complex Young's modulus (Eds) were then compared, which is a parameter of surface damage. Although plasma processes make the initial surface of cantilevers damaged during their fabrication, the removal of that damage by NBE was confirmed as the reduction in δEds. NBE will realize a damage-free surface for microstructures.Keywords: cantilever, neutral beam etching, surface los
Imaging findings in 75 pediatric patients with pancreaticobiliary maljunction: a retrospective case study
Exome-wide association study to identify rare variants influencing COVID-19 outcomes : Results from the Host Genetics Initiative
Publisher Copyright: Copyright: © 2022 Butler-Laporte et al. This is an open access article distributed under the terms of the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original author and source are credited.Host genetics is a key determinant of COVID-19 outcomes. Previously, the COVID-19 Host Genetics Initiative genome-wide association study used common variants to identify multiple loci associated with COVID-19 outcomes. However, variants with the largest impact on COVID-19 outcomes are expected to be rare in the population. Hence, studying rare variants may provide additional insights into disease susceptibility and pathogenesis, thereby informing therapeutics development. Here, we combined whole-exome and whole-genome sequencing from 21 cohorts across 12 countries and performed rare variant exome-wide burden analyses for COVID-19 outcomes. In an analysis of 5,085 severe disease cases and 571,737 controls, we observed that carrying a rare deleterious variant in the SARS-CoV-2 sensor toll-like receptor TLR7 (on chromosome X) was associated with a 5.3-fold increase in severe disease (95% CI: 2.75–10.05, p = 5.41x10-7). This association was consistent across sexes. These results further support TLR7 as a genetic determinant of severe disease and suggest that larger studies on rare variants influencing COVID-19 outcomes could provide additional insights.Peer reviewe
Exome-wide association study to identify rare variants influencing COVID-19 outcomes: Results from the Host Genetics Initiative
Xenopericardial roll graft replacement for infectious pseudoaneurysms and graft infections of the aorta
Evaluation of endoscopic biliary stenting for obstructive jaundice caused by hepatocellular carcinoma
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