Socio-Emotional Competencies and School Performance in Adolescence: What Role for School Adjustment?

There is growing evidence in the literature of positive relationships between socio-emotional competencies and school performance. Several hypotheses have been used to explain how these variables may be related to school performance. In this paper, we explored the role of various school adjustment variables in the relationship between interpersonal socio-emotional competencies and school grades, using a weighted network approach. This network approach allowed us to analyze the structure of interrelations between each variable, pointing to both central and mediatory school and socio-emotional variables within the network. Self-reported data from around 3,400 French vocational high school students were examined. This data included a set of interpersonal socio-emotional competencies (cognitive and affective empathy, socio-emotional behaviors and collective orientation), school adjustment measures (adaptation to the institution, school anxiety, self-regulation at school, and self-perceived competence at school) as well as grades in mathematics and French language. The results showed that self-regulation at school weighted the most strongly on the whole network, and was the most important mediatory pathway. More specifically, self-regulation mediated the relationships between interpersonal socio-emotional competencies and school grades

The paradoxical role of meritocratic selection in the perpetuation of social inequalities at school

The school system is intended to offer all students the same opportunities, but most international surveys reveal an overall lower achievement for students from disadvantaged groups compared with more advantaged students. Recent experimental research in social psychology has demonstrated that schools as institutions contribute with their implicit cultural norms and structure to the production of inequalities. This chapter examines the role that a structural feature of school, namely meritocratic selection, plays in this reproduction of inequalities at school. First, we describe how meritocracy in the educational system can hold paradoxical effects by masking the virtuous/vicious cycles of opportunities created by educational institutions. Second, we present recent research suggesting that selection practices relying on a meritocratic principle—more than other practices—can lead to biased academic decisions hindering disadvantaged students. We propose that inequalities in school might not just result from isolated failures in an otherwise functional meritocratic system, but rather that merit-based selection itself contributes to the perpetuation of inequalities at school

Sidewall passivation layer thickness and composition profiles of etched silicon patterns from angle resolved x-ray photoelectron spectroscopy analysis

International audienc

Achievement goals in educational contexts: A social psychology perspective

Research on achievement goals usually defines mastery goals as the desire to acquire knowledge, and performance goals as the desire to outperform (or not to underperform) others. Educational contexts are most of the time social contexts, involving various persons and groups, of various hierarchical positions, and various cultural and ideological contexts. Surprisingly, most research in the achievement goal field has been conducted at an individual level of analysis. In the present paper, we will review the social consequences and antecedents of goal endorsement. This research indicates that goals strongly affect the way one behaves with co-learners. Moreover, it suggests that more than merely individual dispositions, goals reflect the social relation students have with other persons, institutions, and with the society to which they belong. We conclude this paper by setting an agenda for future achievement goal research

Sidewall passivation layer thickness and composition profiles of etched silicon patterns from angle resolved x-ray photoelectron spectroscopy analysis

International audienc

Putting socio-cognitive conflict in context: Disagreements are more threatening in competition

Poste

Ultrafiltration within downstream processing: some process design considerations

International audienceThe use of ultrafiltration (UF) in downstream processing becomes increasingly important. Downstream processing involves complex biological mixture which can not be well-known with simple analytical techniques. That leads to very poor theoretical data on the UF of such solutions. As a consequence, the integration of this operation in downstream processing is somewhere limited and empirical, requiring a lot of experiments. This paper proposes a new method to overcome this difficulty and to transpose data obtained in a laboratory setup to a larger pilot unit. The approach is based on non steady state mass balance equations. On the assumption of constant transmission rates, these equations can be analytically solved. When these assumptions are not accurate, a numerical resolution is proposed. In this study, the simulated results are faced with experimental data obtained with a synthetic bio-solution constituted from a protein hydrolysate (yeast extract) and b-lactoglobulin, filtered on an inorganic Carbosep membrane (cutoff 15 kDa). The contribution of this method to simulate and scale-up UF units is discussed.

Silicon etching in a pulsed HBr/O−2 plasma. II. Pattern transfer

International audienceThe strong impact of synchronized plasma pulsing on an HBr/O 2 silicon pattern etch process is studied with respect to the continuous process. This article focuses on blanket etch rates and a detailed analysis of the etched profiles, where several significant features of plasma pulsing are identified. First, the time compensated (TC) silicon etch rate is increased while the SiO 2 TC etch rate is decreased at a low duty cycle, whereby the selectivity between silicon and SiO 2 etching is strongly increased. Furthermore, the thickness of the sidewall passivation layer is reduced, thereby guiding the etched profile. Finally, the overall homogeneity is increased compared to the continuous wave etching process