Growth of high crystalline quality semi-insulating GaN layers for high electron mobility transistor applications

Cataloged from PDF version of article.Semi-insulating character ( sheet resistivity of 3.26 x 10(11) ohm/sq ) of thick GaN layers was developed for AlGaN/GaN high electron mobility transistor ( HEMT ) applications on an AlN buffer layer. Electrical and structural properties were characterized by a dark current-voltage transmission line model, x-ray diffraction, and atomic force microscope measurements. The experimental results showed that compared to semi-insulating GaN grown on low temperature GaN nucleation, the crystal quality as well as surface morphology were remarkably improved. It was ascribed to the utilization of a high quality insulating AlN buffer layer and the GaN initial coalescence growth mode. Moreover, the significant increase of electron mobility in a HEMT structure suggests that this is a very promising method to obtain high performance AlGaN/GaN HEMT structures on sapphire substrates. (c) 2006 American Institute of Physics

Metal–semiconductor–metal photodetector on as-deposited TiO2 thin films on sapphire substrate

Cataloged from PDF version of article.TiO2 thin films are prepared on c-plane sapphire substrates by the RF magnetron sputtering method. The performance of the Pt contact metal–semiconductor–metal (MSM) photodetector fabricated on as-deposited films is studied. The dark current density and the responsivity obtained were 1.57 × 10−9 A/cm2 at 5 V bias and 1.73 A/W at 50 V bias, respectively. Breakdown is not observed up to 50 V bias. Rise and fall times for the photocurrent were 7 and 3 s, respectively. Our results show that high quality MSM photodetectors can be fabricated without high temperature and complicated fabrication steps

Chemical Visualization of a GaN p-n junction by XPS

We report on an operando XPS investigation of a GaN diode, by recording the Ga2p 3/2 peak position under both forward and reverse bias. Areal maps of the peak positions under reverse bias are completely decoupled with respect to doped regions and allow a novel chemical visualization of the p-n junction in a 2-D fashion. Other electrical properties of the device, such as leakage current, resistivity of the domains are also tapped via recording line-scan spectra. Application of a triangular voltage excitation enables probing photoresponse of the device

Co doping induced structural and optical properties of sol-gel prepared ZnO thin films

Cataloged from PDF version of article.The preparation conditions for Co doping process into the ZnO structure were studied by the ultrasonic spray pyrolysis technique. Structural and optical properties of the Co:ZnO thin films as a function of Co concentrations were examined. It was observed that hexagonal wurtzite structure of ZnO is dominant up to the critical value, and after the value, the cubic structural phase of the cobalt oxide appears in the X-ray diffraction patterns. Every band-edge of Co:ZnO films shifts to the lower energies and all are confirmed with the PL measurements. Co substitution in ZnO lattice has been proved by the optical transmittance measurement which is observed as the loss of transmission appearing in specific region due to Co2+ characteristic transitions. © 2014 Elsevier B.V. All rights reserved

Low dark current and high speed ZnO metal–semiconductor–metal photodetector on SiO2/Si substrate

Cataloged from PDF version of article.ZnO thin films are deposited by radio-frequency magnetron sputtering on thermally grown SiO2 on Si substrates. Pt/Au contacts are fabricated by standard photolithography and lift-off in order to form a metal-semiconductor-metal (MSM) photodetector. The dark current of the photodetector is measured as 1 pA at 100V bias, corresponding to 100 pA/cm(2) current density. Spectral photoresponse measurement showed the usual spectral behavior and 0.35 A/W responsivity at a 100V bias. The rise and fall times for the photocurrent are measured as 22 ps and 8 ns, respectively, which are the lowest values to date. Scanning electron microscope image shows high aspect ratio and dense grains indicating high surface area. Low dark current density and high speed response are attributed to high number of recombination centers due to film morphology, deducing from photoluminescence measurements. These results show that as deposited ZnO thin film MSM photodetectors can be used for the applications needed for low light level detection and fast operation. (C) 2014 AIP Publishing LLC

On the difference between updating the mixing matrix and updating the separation matrix

Raw data for our paper: "Interrelated chemical-microstructural-nanomechanical variations in the structural units of the cuttlebone of Sepia officinalis" DOI: 10.1063/1.499320

The behavior of the I-V-T characteristics of inhomogeneous (Ni/Au)-Al0.3Ga0.7N/AlN/GaN heterostructures at high temperatures

Cataloged from PDF version of article.We investigated the behavior of the forward bias current-voltage-temperature (I-V-T) characteristics of inhomogeneous (Ni/Au)-Al0.3Ga0.7N/AlN/GaN heterostructures in the temperature range of 295-415 K. The experimental results show that all forward bias semilogarithmic I-V curves for the different temperatures have a nearly common cross point at a certain bias voltage, even with finite series resistance. At this cross point, the sample current is temperature independent. We also found that the values of series resistance (R-s) that were obtained from Cheung's method are strongly dependent on temperature and the values abnormally increased with increasing temperature. Moreover, the ideality factor (n), zero-bias barrier height (Phi(B0)) obtained from I-V curves, and R-s were found to be strongly temperature dependent and while Phi(B0) increases, n decreases with increasing temperature. Such behavior of Phi(B0) and n is attributed to Schottky barrier inhomogeneities by assuming a Gaussian distribution (GD) of the barrier heights (BHs) at the metal/semiconductor interface. We attempted to draw a Phi(B0) versus q/2kT plot in order to obtain evidence of the GD of BHs, and the values of (Phi) over bar (B0)=1.63 eV and sigma(0)=0.217 V for the mean barrier height and standard deviation at a zero bias, respectively, were obtained from this plot. Therefore, a modified ln(I-0/T-2)-q(2)sigma(2)(0)/2(kT)(2) versus q/kT plot gives Phi(B0) and Richardson constant A(*) as 1.64 eV and 34.25 A/cm(2) K-2, respectively, without using the temperature coefficient of the barrier height. The Richardson constant value of 34.25 A/cm(2) K-2 is very close to the theoretical value of 33.74 A/cm(2) K-2 for undoped Al0,3Ga0,7N. Therefore, it has been concluded that the temperature dependence of the forward I-V characteristics of the (Ni/Au)-Al0.3Ga0.7/AlN/GaN heterostructures can be successfully explained based on the thermionic emission mechanism with the GD of BHs. (c) 2007 American Institute of Physics

Metalorganic chemical vapor deposition growth and thermal stability of the AllNN/GaN high electron mobility transistor structure

Cataloged from PDF version of article.The AlxIn1-xN barrier high electron mobility transistor (HEMT) structure has been optimized with varied barrier composition and thickness grown by metalorganic chemical vapor deposition. After optimization, a transistor structure comprising a 7 nm thick nearly lattice-matched Al0.83In0.17 N barrier exhibits a sheet electron density of 2.0 x 10(13) cm(-2) with a high electron mobility of 1540 cm(2) V-1 s(-1). AnAl(0.83)In(0.17)N barrier HEMT device with 1 mu m gate length provides a current density of 1.0 A mm(-1) at V-GS = 0 V and an extrinsic transconductance of 242 mS mm(-1), which are remarkably improved compared to that of a conventional Al0.3Ga0.7N barrier HEMT. To investigate the thermal stability of the HEMT epi-structures, post-growth annealing experiments up to 800 degrees C have been applied to Al0.83In0.17N and Al0.3Ga0.7N barrier heterostructures. As expected, the electrical properties of an Al0.83In0.17N barrier HEMT structure showed less stability than that of an Al0.3Ga0.7N barrier HEMT to the thermal annealing. The structural properties of Al0.83In0.17N/GaN also showed more evidence for decomposition than that of the Al0.3Ga0.7N/GaN structure after 800 degrees C post-annealing

The Period Analysis of the Hierarchical System DI Peg

The existence of an additional body around a binary system can be detected by the help of the light-travel time effect. Due to the motions of the binary and the companion stars around the common mass center of the ternary system, the light-time effect produces an irregularity on the eclipse timings. Monitoring the variations in these timings, sub-stellar or planet companions orbiting around the binary system can be identified. In this paper, additional bodies orbiting the Algol-type binary DI Peg are examined by using the archival eclipse timings including our CCD data observed at the Ankara University Kreiken Observatory. More than five hundred minimum times equivalent to about nine decades are employed to identify the orbital behaviour of the binary system. The best fit to the timings shows that the orbital period of DI Peg has variations due to an integration of two sinusoids with the periods of yr and yr. The orbital change is thought to be most likely due to the existence of two M-type red dwarf companions with the masses of M and M, assuming that the orbits of additional bodies are co-planar with the orbit of the binary system. Also, the residuals of two sinusoidal fits still seem to show another modulation with the period of roughly yr. The origin of this modulation is not clear and more observational data are required to reveal if the periodicity is caused by another object gravitationally bounded to the system

Compact left-handed metamaterial based on double-layer planar metal strip arrays

The existence of a left-handed transmission peak of a metamaterial consisting of double-layer planar metal strip arrays at 15 GHz is demonstrated. This design is very suitable to submicron scales required at communication wavelengths. © 2006 Optical Society of America