Defect cluster recognition system for fabricated semiconductor wafers

The International Technology Roadmap for Semiconductors (ITRS) identifies production test data as an essential element in improving design and technology in the manufacturing process feedback loop. One of the observations made from the high-volume production test data is that dies that fail due to a systematic failure have a tendency to form certain unique patterns that manifest as defect clusters at the wafer level. Identifying and categorising such clusters is a crucial step towards manufacturing yield improvement and implementation of real-time statistical process control. Addressing the semiconductor industry's needs, this research proposes an automatic defect cluster recognition system for semiconductor wafers that achieves up to 95% accuracy (depending on the product type)

제조 시스템에서의 예측 모델링을 위한 지능적 데이터 획득

학위논문 (박사) -- 서울대학교 대학원 : 공과대학 산업공학과, 2021. 2. 조성준.Predictive modeling is a type of supervised learning to find the functional relationship between the input variables and the output variable. Predictive modeling is used in various aspects in manufacturing systems, such as automation of visual inspection, prediction of faulty products, and result estimation of expensive inspection. To build a high-performance predictive model, it is essential to secure high quality data. However, in manufacturing systems, it is practically impossible to acquire enough data of all kinds that are needed for the predictive modeling. There are three main difficulties in the data acquisition in manufacturing systems. First, labeled data always comes with a cost. In many problems, labeling must be done by experienced engineers, which is costly. Second, due to the inspection cost, not all inspections can be performed on all products. Because of time and monetary constraints in the manufacturing system, it is impossible to obtain all the desired inspection results. Third, changes in the manufacturing environment make data acquisition difficult. A change in the manufacturing environment causes a change in the distribution of generated data, making it impossible to obtain enough consistent data. Then, the model have to be trained with a small amount of data. In this dissertation, we overcome this difficulties in data acquisition through active learning, active feature-value acquisition, and domain adaptation. First, we propose an active learning framework to solve the high labeling cost of the wafer map pattern classification. This makes it possible to achieve higher performance with a lower labeling cost. Moreover, the cost efficiency is further improved by incorporating the cluster-level annotation into active learning. For the inspection cost for fault prediction problem, we propose a active inspection framework. By selecting products to undergo high-cost inspection with the novel uncertainty estimation method, high performance can be obtained with low inspection cost. To solve the recipe transition problem that frequently occurs in faulty wafer prediction in semiconductor manufacturing, a domain adaptation methods are used. Through sequential application of unsupervised domain adaptation and semi-supervised domain adaptation, performance degradation due to recipe transition is minimized. Through experiments on real-world data, it was demonstrated that the proposed methodologies can overcome the data acquisition problems in the manufacturing systems and improve the performance of the predictive models.예측 모델링은 지도 학습의 일종으로, 학습 데이터를 통해 입력 변수와 출력 변수 간의 함수적 관계를 찾는 과정이다. 이런 예측 모델링은 육안 검사 자동화, 불량 제품 사전 탐지, 고비용 검사 결과 추정 등 제조 시스템 전반에 걸쳐 활용된다. 높은 성능의 예측 모델을 달성하기 위해서는 양질의 데이터가 필수적이다. 하지만 제조 시스템에서 원하는 종류의 데이터를 원하는 만큼 획득하는 것은 현실적으로 거의 불가능하다. 데이터 획득의 어려움은 크게 세가지 원인에 의해 발생한다. 첫번째로, 라벨링이 된 데이터는 항상 비용을 수반한다는 점이다. 많은 문제에서, 라벨링은 숙련된 엔지니어에 의해 수행되어야 하고, 이는 큰 비용을 발생시킨다. 두번째로, 검사 비용 때문에 모든 검사가 모든 제품에 대해 수행될 수 없다. 제조 시스템에는 시간적, 금전적 제약이 존재하기 때문에, 원하는 모든 검사 결과값을 획득하는 것이 어렵다. 세번째로, 제조 환경의 변화가 데이터 획득을 어렵게 만든다. 제조 환경의 변화는 생성되는 데이터의 분포를 변형시켜, 일관성 있는 데이터를 충분히 획득하지 못하게 한다. 이로 인해 적은 양의 데이터만으로 모델을 재학습시켜야 하는 상황이 빈번하게 발생한다. 본 논문에서는 이런 데이터 획득의 어려움을 극복하기 위해 능동 학습, 능동 피쳐값 획득, 도메인 적응 방법을 활용한다. 먼저, 웨이퍼 맵 패턴 분류 문제의 높은 라벨링 비용을 해결하기 위해 능동학습 프레임워크를 제안한다. 이를 통해 적은 라벨링 비용으로 높은 성능의 분류 모델을 구축할 수 있다. 나아가, 군집 단위의 라벨링 방법을 능동학습에 접목하여 비용 효율성을 한차례 더 개선한다. 제품 불량 예측에 활용되는 검사 비용 문제를 해결하기 위해서는 능동 검사 방법을 제안한다. 제안하는 새로운 불확실성 추정 방법을 통해 고비용 검사 대상 제품을 선택함으로써 적은 검사 비용으로 높은 성능을 얻을 수 있다. 반도체 제조의 웨이퍼 불량 예측에서 빈번하게 발생하는 레시피 변경 문제를 해결하기 위해서는 도메인 적응 방법을 활용한다. 비교사 도메인 적응과 반교사 도메인 적응의 순차적인 적용을 통해 레시피 변경에 의한 성능 저하를 최소화한다. 본 논문에서는 실제 데이터에 대한 실험을 통해 제안된 방법론들이 제조시스템의 데이터 획득 문제를 극복하고 예측 모델의 성능을 높일 수 있음을 확인하였다.1. Introduction 1 2. Literature Review 9 2.1 Review of Related Methodologies 9 2.1.1 Active Learning 9 2.1.2 Active Feature-value Acquisition 11 2.1.3 Domain Adaptation 14 2.2 Review of Predictive Modelings in Manufacturing 15 2.2.1 Wafer Map Pattern Classification 15 2.2.2 Fault Detection and Classification 16 3. Active Learning for Wafer Map Pattern Classification 19 3.1 Problem Description 19 3.2 Proposed Method 21 3.2.1 System overview 21 3.2.2 Prediction model 25 3.2.3 Uncertainty estimation 25 3.2.4 Query wafer selection 29 3.2.5 Query wafer labeling 30 3.2.6 Model update 30 3.3 Experiments 31 3.3.1 Data description 31 3.3.2 Experimental design 31 3.3.3 Results and discussion 34 4. Active Cluster Annotation for Wafer Map Pattern Classification 42 4.1 Problem Description 42 4.2 Proposed Method 44 4.2.1 Clustering of unlabeled data 46 4.2.2 CNN training with labeled data 48 4.2.3 Cluster-level uncertainty estimation 49 4.2.4 Query cluster selection 50 4.2.5 Cluster-level annotation 50 4.3 Experiments 51 4.3.1 Data description 51 4.3.2 Experimental setting 51 4.3.3 Clustering results 53 4.3.4 Classification performance 54 4.3.5 Analysis for label noise 57 5. Active Inspection for Fault Prediction 60 5.1 Problem Description 60 5.2 Proposed Method 65 5.2.1 Active inspection framework 65 5.2.2 Acquisition based on Expected Prediction Change 68 5.3 Experiments 71 5.3.1 Data description 71 5.3.2 Fault prediction models 72 5.3.3 Experimental design 73 5.3.4 Results and discussion 74 6. Adaptive Fault Detection for Recipe Transition 76 6.1 Problem Description 76 6.2 Proposed Method 78 6.2.1 Overview 78 6.2.2 Unsupervised adaptation phase 81 6.2.3 Semi-supervised adaptation phase 83 6.3 Experiments 85 6.3.1 Data description 85 6.3.2 Experimental setting 85 6.3.3 Performance degradation caused by recipe transition 86 6.3.4 Effect of unsupervised adaptation 87 6.3.5 Effect of semi-supervised adaptation 88 7. Conclusion 91 7.1 Contributions 91 7.2 Future work 94Docto

A deep learning-based approach for defect classification with context information in semiconductor manufacturing

This thesis presents some methodological and experimental contributions to a deep learning-based approach for the automatic classifi cation of microscopic defects in silicon wafers with context information. Canonical image classifi cation approaches have the limitation of utilizing only the information contained in the images. This work overcomes this limitation by using some context information about the defects to improve the current automatic classifi cation system

A review of data mining applications in semiconductor manufacturing

The authors acknowledge Fundacao para a Ciencia e a Tecnologia (FCT-MCTES) for its financial support via the project UIDB/00667/2020 (UNIDEMI).For decades, industrial companies have been collecting and storing high amounts of data with the aim of better controlling and managing their processes. However, this vast amount of information and hidden knowledge implicit in all of this data could be utilized more efficiently. With the help of data mining techniques unknown relationships can be systematically discovered. The production of semiconductors is a highly complex process, which entails several subprocesses that employ a diverse array of equipment. The size of the semiconductors signifies a high number of units can be produced, which require huge amounts of data in order to be able to control and improve the semiconductor manufacturing process. Therefore, in this paper a structured review is made through a sample of 137 papers of the published articles in the scientific community regarding data mining applications in semiconductor manufacturing. A detailed bibliometric analysis is also made. All data mining applications are classified in function of the application area. The results are then analyzed and conclusions are drawn.publishersversionpublishe

A Review and Analysis of Automatic Optical Inspection and Quality Monitoring Methods in Electronics Industry

Electronics industry is one of the fastest evolving, innovative, and most competitive industries. In order to meet the high consumption demands on electronics components, quality standards of the products must be well-maintained. Automatic optical inspection (AOI) is one of the non-destructive techniques used in quality inspection of various products. This technique is considered robust and can replace human inspectors who are subjected to dull and fatigue in performing inspection tasks. A fully automated optical inspection system consists of hardware and software setups. Hardware setup include image sensor and illumination settings and is responsible to acquire the digital image, while the software part implements an inspection algorithm to extract the features of the acquired images and classify them into defected and non-defected based on the user requirements. A sorting mechanism can be used to separate the defective products from the good ones. This article provides a comprehensive review of the various AOI systems used in electronics, micro-electronics, and opto-electronics industries. In this review the defects of the commonly inspected electronic components, such as semiconductor wafers, flat panel displays, printed circuit boards and light emitting diodes, are first explained. Hardware setups used in acquiring images are then discussed in terms of the camera and lighting source selection and configuration. The inspection algorithms used for detecting the defects in the electronic components are discussed in terms of the preprocessing, feature extraction and classification tools used for this purpose. Recent articles that used deep learning algorithms are also reviewed. The article concludes by highlighting the current trends and possible future research directions.Framework of the IQONIC Project; European Union’s Horizon 2020 Research and Innovation Program

BagStack Classification for Data Imbalance Problems with Application to Defect Detection and Labeling in Semiconductor Units

abstract: Despite the fact that machine learning supports the development of computer vision applications by shortening the development cycle, finding a general learning algorithm that solves a wide range of applications is still bounded by the ”no free lunch theorem”. The search for the right algorithm to solve a specific problem is driven by the problem itself, the data availability and many other requirements. Automated visual inspection (AVI) systems represent a major part of these challenging computer vision applications. They are gaining growing interest in the manufacturing industry to detect defective products and keep these from reaching customers. The process of defect detection and classification in semiconductor units is challenging due to different acceptable variations that the manufacturing process introduces. Other variations are also typically introduced when using optical inspection systems due to changes in lighting conditions and misalignment of the imaged units, which makes the defect detection process more challenging. In this thesis, a BagStack classification framework is proposed, which makes use of stacking and bagging concepts to handle both variance and bias errors. The classifier is designed to handle the data imbalance and overfitting problems by adaptively transforming the multi-class classification problem into multiple binary classification problems, applying a bagging approach to train a set of base learners for each specific problem, adaptively specifying the number of base learners assigned to each problem, adaptively specifying the number of samples to use from each class, applying a novel data-imbalance aware cross-validation technique to generate the meta-data while taking into account the data imbalance problem at the meta-data level and, finally, using a multi-response random forest regression classifier as a meta-classifier. The BagStack classifier makes use of multiple features to solve the defect classification problem. In order to detect defects, a locally adaptive statistical background modeling is proposed. The proposed BagStack classifier outperforms state-of-the-art image classification techniques on our dataset in terms of overall classification accuracy and average per-class classification accuracy. The proposed detection method achieves high performance on the considered dataset in terms of recall and precision.Dissertation/ThesisDoctoral Dissertation Computer Engineering 201

Advanced Process Monitoring for Industry 4.0

This book reports recent advances on Process Monitoring (PM) to cope with the many challenges raised by the new production systems, sensors and “extreme data” conditions that emerged with Industry 4.0. Concepts such as digital-twins and deep learning are brought to the PM arena, pushing forward the capabilities of existing methodologies to handle more complex scenarios. The evolution of classical paradigms such as Latent Variable modeling, Six Sigma and FMEA are also covered. Applications span a wide range of domains such as microelectronics, semiconductors, chemicals, materials, agriculture, as well as the monitoring of rotating equipment, combustion systems and membrane separation processes

Review of data mining applications for quality assessment in manufacturing industry: Support Vector Machines

In many modern manufacturing industries, data that characterize the manufacturing process are electronically collected and stored in the databases. Due to advances in data collection systems and analysis tools, data mining (DM) has widely been applied for quality assessment (QA) in manufacturing industries. In DM, the choice of technique to use in analyzing a dataset and assessing the quality depend on the understanding of the analyst. On the other hand, with the advent of improved and efficient prediction techniques, there is a need for an analyst to know which tool performs best for a particular type of data set. Although a few review papers have recently been published to discuss DM applications in manufacturing for QA, this paper provides an extensive review to investigate the application of a special DM technique, namely support vector machine (SVM) to solve QA problems. The review provides a comprehensive analysis of the literature from various points of view as DM preliminaries, data preprocessing, DM applications for each quality task, SVM preliminaries, and application results. Summary tables and figures are also provided besides to the analyses. Finally, conclusions and future research directions are provided

Entwicklung einer Fully-Convolutional-Netzwerkarchitektur für die Detektion von defekten LED-Chips in Photolumineszenzbildern

Nowadays, light-emitting diodes (LEDs) can be found in a large variety of applications, from standard LEDs in domestic lighting solutions to advanced chip designs in automobiles, smart watches and video walls. The advances in chip design also affect the test processes, where the execution of certain contact measurements is exacerbated by ever decreasing chip dimensions or even rendered impossible due to the chip design. As an instance, wafer probing determines the electrical and optical properties of all LED chips on a wafer by contacting each and every chip with a prober needle. Chip designs without a contact pad on the surface, however, elude wafer probing and while electrical and optical properties can be determined by sample measurements, defective LED chips are distributed randomly over the wafer. Here, advanced data analysis methods provide a new approach to gather defect information from already available non-contact measurements. Photoluminescence measurements, for example, record a brightness image of an LED wafer, where conspicuous brightness values indicate defective chips. To extract these defect information from photoluminescence images, a computer-vision algorithm is required that transforms photoluminescence images into defect maps. In other words, each and every pixel of a photoluminescence image must be classifed into a class category via semantic segmentation, where so-called fully-convolutional-network algorithms represent the state-of-the-art method. However, the aforementioned task poses several challenges: on the one hand, each pixel in a photoluminescence image represents an LED chip and thus, pixel-fine output resolution is required. On the other hand, photoluminescence images show a variety of brightness values from wafer to wafer in addition to local areas of differing brightness. Additionally, clusters of defective chips assume various shapes, sizes and brightness gradients and thus, the algorithm must reliably recognise objects at multiple scales. Finally, not all salient brightness values correspond to defective LED chips, requiring the algorithm to distinguish salient brightness values corresponding to measurement artefacts, non-defect structures and defects, respectively. In this dissertation, a novel fully-convolutional-network architecture was developed that allows the accurate segmentation of defective LED chips in highly variable photoluminescence wafer images. For this purpose, the basic fully-convolutional-network architecture was modifed with regard to the given application and advanced architectural concepts were incorporated so as to enable a pixel-fine output resolution and a reliable segmentation of multiple scaled defect structures. Altogether, the developed dense ASPP Vaughan architecture achieved a pixel accuracy of 97.5 %, mean pixel accuracy of 96.2% and defect-class accuracy of 92.0 %, trained on a dataset of 136 input-label pairs and hereby showed that fully-convolutional-network algorithms can be a valuable contribution to data analysis in industrial manufacturing.Leuchtdioden (LEDs) werden heutzutage in einer Vielzahl von Anwendungen verbaut, angefangen bei Standard-LEDs in der Hausbeleuchtung bis hin zu technisch fortgeschrittenen Chip-Designs in Automobilen, Smartwatches und Videowänden. Die Weiterentwicklungen im Chip-Design beeinflussen auch die Testprozesse: Hierbei wird die Durchführung bestimmter Kontaktmessungen durch zunehmend verringerte Chip-Dimensionen entweder erschwert oder ist aufgrund des Chip-Designs unmöglich. Die sogenannteWafer-Prober-Messung beispielsweise ermittelt die elektrischen und optischen Eigenschaften aller LED-Chips auf einem Wafer, indem jeder einzelne Chip mit einer Messnadel kontaktiert und vermessen wird; Chip-Designs ohne Kontaktpad auf der Oberfläche können daher nicht durch die Wafer-Prober-Messung charakterisiert werden. Während die elektrischen und optischen Chip-Eigenschaften auch mittels Stichprobenmessungen bestimmt werden können, verteilen sich defekte LED-Chips zufällig über die Waferfläche. Fortgeschrittene Datenanalysemethoden ermöglichen hierbei einen neuen Ansatz, Defektinformationen aus bereits vorhandenen, berührungslosen Messungen zu gewinnen. Photolumineszenzmessungen, beispielsweise, erfassen ein Helligkeitsbild des LEDWafers, in dem auffällige Helligkeitswerte auf defekte LED-Chips hinweisen. Ein Bildverarbeitungsalgorithmus, der diese Defektinformationen aus Photolumineszenzbildern extrahiert und ein Defektabbild erstellt, muss hierzu jeden einzelnen Bildpunkt mittels semantischer Segmentation klassifizieren, eine Technik bei der sogenannte Fully-Convolutional-Netzwerke den Stand der Technik darstellen. Die beschriebene Aufgabe wird jedoch durch mehrere Faktoren erschwert: Einerseits entspricht jeder Bildpunkt eines Photolumineszenzbildes einem LED-Chip, so dass eine bildpunktfeine Auflösung der Netzwerkausgabe notwendig ist. Andererseits weisen Photolumineszenzbilder sowohl stark variierende Helligkeitswerte von Wafer zu Wafer als auch lokal begrenzte Helligkeitsabweichungen auf. Zusätzlich nehmen Defektanhäufungen unterschiedliche Formen, Größen und Helligkeitsgradienten an, weswegen der Algorithmus Objekte verschiedener Abmessungen zuverlässig erkennen können muss. Schlussendlich weisen nicht alle auffälligen Helligkeitswerte auf defekte LED-Chips hin, so dass der Algorithmus in der Lage sein muss zu unterscheiden, ob auffällige Helligkeitswerte mit Messartefakten, defekten LED-Chips oder defektfreien Strukturen korrelieren. In dieser Dissertation wurde eine neuartige Fully-Convolutional-Netzwerkarchitektur entwickelt, die die akkurate Segmentierung defekter LED-Chips in stark variierenden Photolumineszenzbildern von LED-Wafern ermöglicht. Zu diesem Zweck wurde die klassische Fully-Convolutional-Netzwerkarchitektur hinsichtlich der beschriebenen Anwendung angepasst und fortgeschrittene architektonische Konzepte eingearbeitet, um eine bildpunktfeine Ausgabeauflösung und eine zuverlässige Sementierung verschieden großer Defektstrukturen umzusetzen. Insgesamt erzielt die entwickelte dense-ASPP-Vaughan-Architektur eine Pixelgenauigkeit von 97,5 %, durchschnittliche Pixelgenauigkeit von 96,2% und eine Defektklassengenauigkeit von 92,0 %, trainiert mit einem Datensatz von 136 Bildern. Hiermit konnte gezeigt werden, dass Fully-Convolutional-Netzwerke eine wertvolle Erweiterung der Datenanalysemethoden sein können, die in der industriellen Fertigung eingesetzt werden