Design for Manufacturability in Advanced Lithography Technologies

As the technology nodes keep shrinking following Moore\u27s law, lithography becomes increasingly critical to the fabrication of integrated circuits. The 193nm ArF immersion lithography (193i) has been a common technique for manufacturing integrated circuits. However, the 193i with single exposure has finally reached its printability limit at the 28nm technology node. To keep the pace of Moore\u27s law, design for manufacturability (DFM) is demonstrated to be effective and cost-efficient. The concept of DFM is to modify the design of integrated circuits in order to make them more manufacturable. Tremendous efforts have been made for DFM in advanced lithography technologies. In general, the progress can be summarized in four directions. (1) Advanced lithography process by novel patterning techniques and next-generation lithography; (2) High performance lithography simulation approach in mask synthesis; (3) Physical design (PD) methodology with lithography manufacturability awareness; (4) Robust design flow integrating emerging PD challenges. Accordingly, we propose our research topics in those directions. (1) Throughput optimization for self-aligned double patterning (SADP) and e-beam lithography based manufacturing of 1D layout; (2) Design of efficient rasterization algorithm for mask patterns in inverse lithography technology (ILT); (3) SADP-aware detailed routing; (4) SADP-aware detailed routing with consideration of double via insertion and via manufacturability; (5) Pin accessibility driven detailed placement refinement. In our first research work, we investigate throughput optimization of 1D layout manufacturing. SADP is a mature lithography technique to print 1D gridded layout for advanced technologies. However, in 16nm technology node, trim mask pattern in SADP lithography process may not be printable using 193i along within a single exposure. A viable solution is to complement SADP with e-beam lithography. To order to increase the throughput of 1D layout manufacturing, we consider the problem of e-beam shot minimization subject to bounded line-end extension constraints. Two different approaches of utilizing the trim mask and e-beam to print a 1D layout are considered. The first approach is trimming by end cutting, in which trim mask and e-beam are used to chop up parallel lines at required locations by small fixed rectangles. The second approach is trimming by gap removal, in which trim mask and e-beam are used to rid of all unnecessary portions. We propose elegant integer linear program formulations for both approaches. Experimental results show that both integer linear program formulations can be solved efficiently and have a major speedup compared with previous related work. Furthermore, the pros and cons of the two approaches for manufacturing 1D layout are discussed. In our second research work, we focus on a critical problem of lithography simulation in the design of ILT mask. To reduce the complexity of modern lithography simulation, a widely used approach is to first rasterize the ILT mask before it is inputted to the simulation tool. Accordingly, we propose a high performance rasterization algorithm. The algorithm is based on a pre-computed look-up table. Every pixel in the rasterized image is firstly identified its category: exception or non-exception. Then convolution for every pixel can be performed by a single or multiple look-up table queries depending on its category. In addition, the proposed algorithm has shift invariant property and can be applied for all-angle mask patterns in ILT. Experimental results demonstrate that our approach can speedup conventional rasterization process by almost 500x while maintaining small variations in critical dimension. In our third research work, we concentrate on SADP-aware detailed routing. SADP is a promising manufacturing option for sub-22nm technology nodes due to its good overlay control. To ensure layout is manufacturable by SADP, it is necessary to consider it during layout configuration, e.g., detailed routing stage. However, SADP process is not intuitive in terms of mask design, and considering it during detailed routing stage is even more challenging. We investigate both of two popular types of SADP: spacer-is-dielectric and spacer-is-metal. Different from previous works, we apply the color pre-assignment idea and propose an elegant graph model which captures both routing and SADP manufacturing cost. They greatly simplify the problem to maintain SADP design rules during detailed routing. A negotiated congestion based rip-up and reroute scheme is applied to achieve good routability while maintaining SADP design rules. Our approach can be extended to consider other multiple patterning lithography during detailed routing, e.g., self-aligned quadruple patterning targeted at sub-10nm technology nodes. Compared with state-of-the-art academic SADP-aware detailed routers, we offer routing solution with better quality of result. In our fourth research work, we extend our SADP-aware detailed routing to consider other manufacturing issues. Both SADP and triple patterning lithography (TPL) are potential layout manufacturing techniques in 10nm technology node. While metal layers can be printed by SADP, via layer manufacturing requires TPL. Previous works on SADP-aware detailed routing do not automatically guarantee via layer are manufacturable by TPL. We extend our SADP-aware detailed routing to consider TPL manufacturability of via layer. Double via insertion is an effective method to improve yield and reliability in integrated circuits manufacturing. We also consider it in our SADP-aware detailed routing to further improve insertion rate. A problem of TPL-aware double via insertion in the post routing stage is proposed. It is solved by both integer linear programming and high-performance heuristic. Experimental results demonstrate that our SADP-aware detailed routing can ensure via layer are TPL manufacturable and improve double via insertion rate. In our last research work, we target at the enhancement of pin access. The significant increased number of routing design rules in advanced technologies has made pin access an emerging difficultly in detailed routing. Resolving pin access in detailed routing may be too late due to the fix pin locations. Thus, we consider pin access in earlier design stage, i.e., detailed placement stage, when perturbation of cell placement is allowed. A cost function is proposed to model pin access for each pin-to-pin connection in detailed routing. A two-phase detailed placement refinement is performed to improve pin access, and refinement techniques are limited to cell flipping, same-row adjacent cell swap and cell shifting. The problem is solved by dynamic programming and linear programming. Experimental results demonstrate that the proposed detailed placement refinement improve pin access and reduce the number of unroutable nets in detailed routing significantly

Initial detailed routing algorithms

In this work, we present a study of the problem of routing in the context of the VLSI physical synthesis flow. We study the fundamental routing algorithms such as maze routing, A*, and Steiner tree-based algorithms, as well as some global routing algorithms, namely FastRoute 4.0 and BoxRouter 2.0. We dissect some of the major state of the art initial detailed routing tools, such as RegularRoute, TritonRoute, SmartDR and Dr.CU 2.0. We also propose an initial detailed routing flow, and present an implementation of the proposed routing flow, with a track assignment technique that models the problem as an instance of the maximum independent weighted set (MWIS) and utilizes integer linear programming (ILP) as a solver. The implementation of the proposed initial detailed routing flow also includes an implementation of multiple-source and multiple-target A* for terminal andnet connection with adjustable rules and weights. Finally, we also present a study of the results obtained by the implementation of the proposed initial detailed routing flow and a comparison with the ISPD 2019 contest winners, considering the ISPD 2019 and benchmark suite and evaluation tools.Neste trabalho, apresentamos um estudo do problema de roteamento no contexto do fluxo de síntese física de circuitos integrados VLSI. Nós estudamos algoritmos de roteamento fundamentais como roteamento de labirinto, A* e baseados em árvores de Steiner, além de alguns algoritmos de roteamento global como FastRoute 4.0 e BoxRouter 2.0. Nós dissecamos alguns dos principais trabalhos de roteamento detalhado inicial do estado da arte, como RegularRoute, TritonRoute, SmartDR e Dr.CU 2.0. Também propomos um fluxo de roteamento detalhado inicial, e apresentamos uma implementação do fluxo de roteametno proposto, com uma técnica de assinalamento de trilhas que modela o problema como uma instância do problema do conjunto independente de peso máximo e usa programação linear inteira como um resolvedor. A implementação do fluxo de rotemaento detalhado inicial proposto também inclui uma implementação de um A* com múltiplas fontes e múltiplos destinos para conexão de terminais e redes, com regras e pesos ajustáveis. Por fim, nós apresentamos um estudo dos resultados obtidos pela implementação do fluxo de roteamento detalhado inicial proposto e comparamos com os vencedores do ISPD 2019 contest considerando a suíte de teste e ferramentas de avaliação do ISPD 2019

The impact of design techniques in the reduction of power consumption of SoCs Multimedia

Orientador: Guido Costa Souza de AraújoDissertação (mestrado) - Universidade Estadual de Campinas, Instituto de ComputaçãoResumo: A indústria de semicondutores sempre enfrentou fortes demandas em resolver problema de dissipação de calor e reduzir o consumo de energia em dispositivos. Esta tendência tem sido intensificada nos últimos anos com o movimento de sustentabilidade ambiental. A concepção correta de um sistema eletrônico de baixo consumo de energia é um problema de vários níveis de complexidade e exige estratégias sistemáticas na sua construção. Fora disso, a adoção de qualquer técnica de redução de energia sempre está vinculada com objetivos especiais e provoca alguns impactos no projeto. Apesar dos projetistas conheçam bem os impactos de forma qualitativa, as detalhes quantitativas ainda são incógnitas ou apenas mantidas dentro do 'know-how' das empresas. Neste trabalho, de acordo com resultados experimentais baseado num plataforma de SoC1 industrial, tentamos quantificar os impactos derivados do uso de técnicas de redução de consumo de energia. Nos concentramos em relacionar o fator de redução de energia de cada técnica aos impactos em termo de área, desempenho, esforço de implementação e verificação. Na ausência desse tipo de dados, que relacionam o esforço de engenharia com as metas de consumo de energia, incertezas e atrasos serão frequentes no cronograma de projeto. Esperamos que este tipo de orientações possam ajudar/guiar os arquitetos de projeto em selecionar as técnicas adequadas para reduzir o consumo de energia dentro do alcance de orçamento e cronograma de projetoAbstract: The semiconductor industry has always faced strong demands to solve the problem of heat dissipation and reduce the power consumption in electronic devices. This trend has been increased in recent years with the action of environmental sustainability. The correct conception of an electronic system for low power consumption is an issue with multiple levels of complexities and requires systematic approaches in its construction. However, the adoption of any technique for reducing the power consumption is always linked with some specific goals and causes some impacts on the project. Although the designers know well that these impacts can affect the design in a quality aspect, the quantitative details are still unkown or just be kept inside the company's know-how. In this work, according to the experimental results based on an industrial SoC2 platform, we try to quantify the impacts of the use of low power techniques. We will relate the power reduction factor of each technique to the impact in terms of area, performance, implementation and verification effort. In the absence of such data, which relates the engineering effort to the goals of power consumption, uncertainties and delays are frequent. We hope that such guidelines can help/guide the project architects in selecting the appropriate techniques to reduce the power consumption within the limit of budget and project scheduleMestradoCiência da ComputaçãoMestre em Ciência da Computaçã

Practical Techniques for Improving Performance and Evaluating Security on Circuit Designs

As the modern semiconductor technology approaches to nanometer era, integrated circuits (ICs) are facing more and more challenges in meeting performance demand and security. With the expansion of markets in mobile and consumer electronics, the increasing demands require much faster delivery of reliable and secure IC products. In order to improve the performance and evaluate the security of emerging circuits, we present three practical techniques on approximate computing, split manufacturing and analog layout automation. Approximate computing is a promising approach for low-power IC design. Although a few accuracy-configurable adder (ACA) designs have been developed in the past, these designs tend to incur large area overheads as they rely on either redundant computing or complicated carry prediction. We investigate a simple ACA design that contains no redundancy or error detection/correction circuitry and uses very simple carry prediction. The simulation results show that our design dominates the latest previous work on accuracy-delay-power tradeoff while using 39% less area. One variant of this design provides finer-grained and larger tunability than that of the previous works. Moreover, we propose a delay-adaptive self-configuration technique to further improve the accuracy-delay-power tradeoff. Split manufacturing prevents attacks from an untrusted foundry. The untrusted foundry has front-end-of-line (FEOL) layout and the original circuit netlist and attempts to identify critical components on the layout for Trojan insertion. Although defense methods for this scenario have been developed, the corresponding attack technique is not well explored. Hence, the defense methods are mostly evaluated with the k-security metric without actual attacks. We develop a new attack technique based on structural pattern matching. Experimental comparison with existing attack shows that the new attack technique achieves about the same success rate with much faster speed for cases without the k-security defense, and has a much better success rate at the same runtime for cases with the k-security defense. The results offer an alternative and practical interpretation for k-security in split manufacturing. Analog layout automation is still far behind its digital counterpart. We develop the layout automation framework for analog/mixed-signal ICs. A hierarchical layout synthesis flow which works in bottom-up manner is presented. To ensure the qualified layouts for better circuit performance, we use the constraint-driven placement and routing methodology which employs the expert knowledge via design constraints. The constraint-driven placement uses simulated annealing process to find the optimal solution. The packing represented by sequence pairs and constraint graphs can simultaneously handle different kinds of placement constraints. The constraint-driven routing consists of two stages, integer linear programming (ILP) based global routing and sequential detailed routing. The experiment results demonstrate that our flow can handle complicated hierarchical designs with multiple design constraints. Furthermore, the placement performance can be further improved by using mixed-size block placement which works on large blocks in priority

Investigation into yield and reliability enhancement of TSV-based three-dimensional integration circuits

Three dimensional integrated circuits (3D ICs) have been acknowledged as a promising technology to overcome the interconnect delay bottleneck brought by continuous CMOS scaling. Recent research shows that through-silicon-vias (TSVs), which act as vertical links between layers, pose yield and reliability challenges for 3D design. This thesis presents three original contributions.The first contribution presents a grouping-based technique to improve the yield of 3D ICs under manufacturing TSV defects, where regular and redundant TSVs are partitioned into groups. In each group, signals can select good TSVs using rerouting multiplexers avoiding defective TSVs. Grouping ratio (regular to redundant TSVs in one group) has an impact on yield and hardware overhead. Mathematical probabilistic models are presented for yield analysis under the influence of independent and clustering defect distributions. Simulation results using MATLAB show that for a given number of TSVs and TSV failure rate, careful selection of grouping ratio results in achieving 100% yield at minimal hardware cost (number of multiplexers and redundant TSVs) in comparison to a design that does not exploit TSV grouping ratios. The second contribution presents an efficient online fault tolerance technique based on redundant TSVs, to detect TSV manufacturing defects and address thermal-induced reliability issue. The proposed technique accounts for both fault detection and recovery in the presence of three TSV defects: voids, delamination between TSV and landing pad, and TSV short-to-substrate. Simulations using HSPICE and ModelSim are carried out to validate fault detection and recovery. Results show that regular and redundant TSVs can be divided into groups to minimise area overhead without affecting the fault tolerance capability of the technique. Synthesis results using 130-nm design library show that 100% repair capability can be achieved with low area overhead (4% for the best case). The last contribution proposes a technique with joint consideration of temperature mitigation and fault tolerance without introducing additional redundant TSVs. This is achieved by reusing spare TSVs that are frequently deployed for improving yield and reliability in 3D ICs. The proposed technique consists of two steps: TSV determination step, which is for achieving optimal partition between regular and spare TSVs into groups; The second step is TSV placement, where temperature mitigation is targeted while optimizing total wirelength and routing difference. Simulation results show that using the proposed technique, 100% repair capability is achieved across all (five) benchmarks with an average temperature reduction of 75.2? (34.1%) (best case is 99.8? (58.5%)), while increasing wirelength by a small amount

Standard cell optimization and physical design in advanced technology nodes

Integrated circuits (ICs) are at the heart of modern electronics, which rely heavily on the state-of-the-art semiconductor manufacturing technology. The key to pushing forward semiconductor technology is IC feature-size miniaturization. However, this brings ever-increasing design complexities and manufacturing challenges to the $340 billion semiconductor industry. The manufacturing of two-dimensional layout on high-density metal layers depends on complex design-for-manufacturing techniques and sophisticated empirical optimizations, which introduces huge amounts of turnaround time and yield loss in advanced technology nodes. Our study reveals that unidirectional layout design can significantly reduce the manufacturing complexities and improve the yield, which is becoming increasingly adopted in semiconductor industry [61, 89]. The lithography printing of unidirectional layout can be tightly controlled using advanced patterning techniques, such as self-aligned double and quadruple patterning. Despite the manufacturing benefits, unidirectional layout leads to more restrictive solution space and brings significant impacts on the IC design automation ow for routing closure. Notably, unidirectional routing limits the standard cell pin accessibility, which further exacerbates the resource competitions during routing. Moreover, for post-routing optimization, traditional redundant-via insertion has become obsolete under unidirectional routing style, which makes the yield enhancement task extremely challenging. Regardless of complex multiple patterning and design-for-manufacturing approaches, mask optimization through resolution enhancement techniques remains as the key strategy to improve the yield of the semiconductor manufacturing processes. Among them, Sub-Resolution Assist Feature (SRAF) generation is a very important method to improve lithographic process windows. Model-based SRAF generation has been widely used to achieve high accuracy but it is time-consuming and hard to obtain consistent SRAFs. This dissertation proposes novel CAD algorithms and methodologies for standard cell optimization and physical design in advanced technology nodes, which ultimately reduces the design cycle and manufacturing cost of IC design. First, a standard cell pin access optimization engine is proposed to evaluate the pin accessibility of a given standard cell library. We further propose novel pin access planning techniques and concurrent pin access optimizations to efficiently resolve the routing resource competitions, which generates much better routing solutions than state-of-the-art, manufacturing-friendly routers. To systematically improve the manufacturing yield in the post-routing stage, a global optimization engine has been introduced for redundant local-loop insertion considering advanced manufacturing constraints. Finally, we propose the first machine learning-based framework for fast yet consistent SRAF generation with the high quality of results.Electrical and Computer Engineerin