Electrostatic Discharge

As we enter the nanoelectronics era, electrostatic discharge (ESD) phenomena is an important issue for everything from micro-electronics to nanostructures. This book provides insight into the operation and design of micro-gaps and nanogenerators with chapters on low capacitance ESD design in advanced technologies, electrical breakdown in micro-gaps, nanogenerators from ESD, and theoretical prediction and optimization of triboelectric nanogenerators. The information contained herein will prove useful for for engineers and scientists that have an interest in ESD physics and design

Design, Characterization and Analysis of Component Level Electrostatic Discharge (ESD) Protection Solutions

Electrostatic Discharges (ESD) is a significant hazard to electronic components and systems. Based on a specific process technology, a given circuit application requires a customized ESD consideration that meets all the requirements such as the core circuit\u27s operating condition, maximum accepted leakage current, breakdown conditions for the process and overall device sizes. In every several years, there will be a new process technology becomes mature, and most of those new technology requires custom design of effective ESD protection solution. And usually the design window will shrinks due to the evolving of the technology becomes smaller and smaller. The ESD related failure is a major IC reliability concern and results in a loss of millions dollars each year in the semiconductor industry. To emulate the real word stress condition, several ESD stress models and test methods have been developed. The basic ESD models are Human Body model (HBM), Machine Mode (MM), and Charge Device Model (CDM). For the system-level ESD robustness, it is defined by different standards and specifications than component-level ESD requirements. International Electrotechnical Commission (IEC) 61000-4-2 has been used for the product and the Human Metal Model (HMM) has been used for the system at the wafer level. Increasingly stringent design specifications are forcing original equipment manufacturers (OEMs) to minimize the number of off-chip components. This is the case in emerging multifunction mobile, industrial, automotive and healthcare applications. It requires a high level of ESD robustness and the integrated circuit (IC) level, while finding ways to streamline the ESD characterization during early development cycle. To enable predicting the ESD performance of IC\u27s pins that are directly exposed to a system-level stress condition, a new the human metal model (HMM) test model has been introduced. In this work, a new testing methodology for product-level HMM characterization is introduced. This testing framework allows for consistently identifying ESD-induced failures in a product, substantially simplifying the testing process, and significantly reducing the product evaluation time during development cycle. It helps eliminates the potential inaccuracy provided by the conventional characterization methodology. For verification purposes, this method has been applied to detect the failures of two different products. Addition to the exploration of new characterization methodology that provides better accuracy, we also have looked into the protection devices itself. ICs for emerging high performance precision data acquisition and transceivers in industrial, automotive and wireless infrastructure applications require effective and ESD protection solutions. These circuits, with relatively high operating voltages at the Input/Output (I/O) pins, are increasingly being designed in low voltage Complementary Metal-Oxide-Semiconductor (CMOS) technologies to meet the requirements of low cost and large scale integration. A new dual-polarity SCR optimized for high bidirectional blocking voltages, high trigger current and low capacitance is realized in a sub 3-V, 180-nm CMOS process. This ESD device is designed for a specific application where the operating voltage at the I/O is larger than that of the core circuit. For instance, protecting high voltage swing I/Os in CMOS data acquisition system (DAS) applications. In this reference application, an array of thin film resistors voltage divider is directly connected to the interface pin, reducing the maximum voltage that is obtained at the core device input down to ± 1-5 V. Its ESD characteristics, including the trigger voltage and failure current, are compared against those of a typical CMOS-based SCR. Then, we have looked into the ESD protection designs into more advanced technology, the 28-nm CMOS. An ESD protection design builds on the multiple discharge-paths ESD cell concept and focuses the attention on the detailed design, optimization and realization of the in-situ ESD protection cell for IO pins with variable operation voltages. By introducing different device configurations fabricated in a 28-nm CMOS process, a greater flexibility in the design options and design trade-offs can be obtained in the proposed topology, thus achieving a higher integration and smaller cell size definition for multi-voltage compatibility interface ESD protection applications. This device is optimized for low capacitance and synthesized with the circuit IO components for in-situ ESD protection in communication interface applications developed in a 28-nm, high-k, and metal-gate CMOS technology. ESD devices have been used in different types of applications and also at different environment conditions, such as high temperature. At the last section of this research work, we have performed an investigation of several different ESD devices\u27 performance under various temperature conditions. And it has been shown that the variations of the device structure can results different ESD performance, and some devices can be used at the high temperature and some cannot. And this investigation also brings up a potential threat to the current ESD protection devices that they might be very vulnerable to the latch-up issue at the higher temperature range

Design of Novel Devices and Circuits for Electrostatic Discharge Protection Applications in Advanced Semiconductor Technologies

Electrostatic Discharge (ESD), as a subset of Electrical Overstress (EOS), was reported to be in charge of more than 35% of failure in integrated circuits (ICs). Especially in the manufacturing process, the silicon wafer turns out to be a functional ICs after numerous physical, chemical and mechanical processes, each of which expose the sensitive and fragile ICs to ESD environment. In normal end-user applications, ESD from human and machine handling, surge and spike signals in the power supply, and wrong supplying signals, will probably cause severe damage to the ICs and even the whole systems. Generally, ESD protections are evaluated after wafer and even system fabrication, increasing the development period and cost if the protections cannot meet customer\u27s requirements. Therefore, it is important to design and customize robust and area-efficient ESD protections for the ICs at the early development stage. As the technologies generally scaling down, however, ESD protection clamps remain comparable area consumption in the recent years because they provide the discharging path for the ESD energy which rarely scales down. Diode is the most simple and effective device for ESD protection in ICs, but the usage is significantly limited by its low turn-on voltage. MOS devices can be triggered by a dynamic-triggered RC circuit for IOs operating at low voltage, while the one triggered by a static-triggered network, e.g., zener-resistor circuit or grounded-gate configuration, provides a high trigger voltage for high-voltage applications. However, the relatively low current discharging capability makes MOS devices as the secondary choice. Silicon-controlled rectifier (SCR) has become famous due to its high robustness and area efficiency, compared to diode and MOS. In this dissertation, a comprehensive design methodology for SCR based on simulation and measurement are presented for different advanced commercial technologies. Furthermore, an ESD clamp is designed and verified for the first time for the emerging GaN technology. For the SCR, no matter what modification is going to be made, the first concern when drawing the layout is to determine the layout geometrical style, finger width and finger number. This problem for diode and MOS device were studied in detail, so the same method was usually used in SCR. The research in this dissertation provides a closer look into the metal layout effect to the SCR, finding out the optimized robustness and minimized side-effect can be obtained by using specific layout geometry. Another concern about SCR is the relatively low turn-on speed when the IOs under protection is stressed by ESD pulses having very fast rising time, e.g., CDM and IEC 61000-4-2 pulses. On this occasion a large overshoot voltage is generated and cause damage to internal circuit component like gate oxides of MOS devices. The key determination of turn-on speed of SCR is physically investigated, followed by a novel design on SCR by directly connecting the Anode Gate and Cathode Gate to form internal trigger (DCSCR), with improved performance verified experimentally in this dissertation. The overshoot voltage and trigger voltage of the DCSCR will be significantly reduced, in return a better protection for internal circuit component is offered without scarifying neither area or robustness. Even though two SCR\u27s with single direction of ESD current path can be constructed in reverse parallel to form bidirectional protection to pins, stand-alone bidirectional SCR (BSCR) is always desirable for sake of smaller area. The inherent high trigger voltage of BSCR that only fit in high-voltage technologies is overcome by embedding a PMOS transistor as trigger element, making it highly suitable for low-voltage ESD protection applications. More than that, this modification simultaneously introduces benefits including high robustness and low overshoot voltage. For high voltage pins, however, it presents another story for ESD designs. The high operation voltages require that a high trigger voltage and high holding voltage, so as to reduce the false trigger and latch-up risk. For several capacitive pins, the displacement current induced by a large snapback will cause severe damage to internal circuits. A novel design on SCR is proposed to minimize the snapback with adjustable trigger and holding voltage. Thanks to the additional a PIN diode, the similar high robustness and stable thermal leakage performance to SCR is maintained. For academic purpose of ESD design, it is always difficult to obtain the complete process deck in TCAD simulation because those information are highly confidential to the companies. Another challenge of using TCAD is the difficulty of maintaining the accuracy of physics models and predicting the performance of the other structures. In this dissertation a TCAD-aid ESD design methodology is used to evaluate ESD performance before the silicon shuttle. GaN is a promising material for high-voltage high-power RF application compared to the GaAs. However, distinct from GaAs, the leaky problem of the schottky junction and the lack of choice of passive/active components in GaN technology limit the ESD protection design, which will be discussed in this dissertation. However, a promising ESD protection clamp is finally developed based on depletion-mode pHEMT with adjustable trigger voltage, reasonable leakage current and high robustness

Modeling and simulation of full-component integrated circuits in transient ESD events

This thesis presents a methodology to model and simulate transient electrostatic discharge (ESD) responses of integrated circuits (IC). To obtain valid simulation results, the IC component must be represented by a circuit netlist composed of device models that are valid under the ESD conditions. Models of the nonlinear devices that make up the ESD protection network of the IC must have transient I-V responses calibrated against measurements that emulate ESD events. Interconnects, power distribution networks, and the silicon substrate on the chip die as well as on the IC package must be faithfully constructed to emulate the fact that ESD current flows in a distributed manner across the entire IC component. The resultant equivalent circuit model therefore contains a huge number of nodes and devices, and the simulation runtime may be prohibitively long. Techniques must be devised to make the numerical simulation process more efficient without sacrifice of accuracy. These techniques include reasonable abstraction of the distributed full-component circuit netlist, dynamic piecewise-linear device models, and customized efficient transient circuit simulator. With the simulation streamlining techniques set up properly, comprehensive and predictive transient ESD simulation can be carried out efficiently to investigate the weakest link in the target IC, and the design can be fine-tuned to achieve optimal performance in both functionality and ESD reliability

Novel techniques for the design and practical realization of switched-capacitor circuits in deep-submicron CMOS technologies

Dissertação apresentada para obtenção do Grau de Doutor em Engenharia Electrotécnica e de Computadores pela Universidade Nova de Lisboa, Faculdade de Ciências e TecnologiaSwitches presenting high linearity are more and more required in switched-capacitor circuits,namely in 12 to 16 bits resolution analog-to-digital converters. The CMOS technology evolves continuously towards lower supply voltages and, simultaneously, new design techniques are necessary to fulfill the realization of switches exhibiting a high dynamic range and a distortion compatible with referred resolutions. Moreover, with the continuously downing of the sizes, the physic constraints of the technology must be considered to avoid the excessive stress of the devices when relatively high voltages are applied to the gates. New switch-linearization techniques, with high reliability, must be necessarily developed and demonstrated in CMOS integrated circuits. Also, the research of new structures of circuits with switched-capacitor is permanent. Simplified and efficient structures are mandatory, adequate to the new demands emerging from the proliferation of portable equipments, necessarily with low energy consumption while assuring high performance and multiple functions. The work reported in this Thesis comprises these two areas. The behavior of the switches under these new constraints is analyzed, being a new and original solution proposed, in order to maintain the performance. Also, proposals for the application of simpler clock and control schemes are presented, and for the use of open-loop structures and amplifiers with localfeedback. The results, obtained in laboratory or by simulation, assess the feasibility of the presented proposals

Advances in Solid State Circuit Technologies

This book brings together contributions from experts in the fields to describe the current status of important topics in solid-state circuit technologies. It consists of 20 chapters which are grouped under the following categories: general information, circuits and devices, materials, and characterization techniques. These chapters have been written by renowned experts in the respective fields making this book valuable to the integrated circuits and materials science communities. It is intended for a diverse readership including electrical engineers and material scientists in the industry and academic institutions. Readers will be able to familiarize themselves with the latest technologies in the various fields

Low phase noise 2 GHz Fractional-N CMOS synthesizer IC

Low noise low division 2 GHz RF synthesizer integrated circuits (ICs) are conventionally implemented in some form of HBT process such as SiGe or GaAs. The research in this dissertation differs from convention, with the aim of implementing a synthesizer IC in a more convenient, low-cost Si-based CMOS process. A collection of techniques to push towards the noise and frequency limits of CMOS processes, and possibly other IC processes, is then one of the research outcomes. In a synthesizer low N-divider ratios are important, as high division ratios would amplify in-band phase noise. The design methods deployed as part of this research achieve low division ratios (4 ≤ N ≤ 33) and a high phase comparison frequency (>100 MHz). The synthesizer IC employs a first-order fractional-N topology to achieve increased frequency tuning resolution. The primary N-divider was implemented utilising current mode logic (CML) and the fractional accumulator utilising conventional CMOS. Both a conventional CMOS phase frequency detector (PFD) and a CML PFD were implemented for benchmarking purposes. A custom-built 4.4 GHz synthesizer circuit employing the IC was used to validate the research. In the 4.4 GHz synthesizer circuit, the prototype IC achieved a measured in-band phase noise plateau of L( f ) = -113 dBc/Hz at a 100 kHz frequency offset, which equates to a figure of merit (FOM) of -225 dBc/Hz. The FOM compares well with existing, but expensive, SiGe and GaAs HBT processes. Total IC power dissipation was 710 mW, which is considerably less than commercially available GaAs designs. The complete synthesizer IC was implemented in Austriamicrosystems‟ (AMS) 0.35 μm CMOS process and occupies an area of 3.15 x 2.18 mm2.Dissertation (MEng)--University of Pretoria, 2010.Electrical, Electronic and Computer Engineeringunrestricte

Ultra-low noise, high-frame rate readout design for a 3D-stacked CMOS image sensor

Due to the switch from CCD to CMOS technology, CMOS based image sensors have become smaller, cheaper, faster, and have recently outclassed CCDs in terms of image quality. Apart from the extensive set of applications requiring image sensors, the next technological breakthrough in imaging would be to consolidate and completely shift the conventional CMOS image sensor technology to the 3D-stacked technology. Stacking is recent and an innovative technology in the imaging field, allowing multiple silicon tiers with different functions to be stacked on top of each other. The technology allows for an extreme parallelism of the pixel readout circuitry. Furthermore, the readout is placed underneath the pixel array on a 3D-stacked image sensor, and the parallelism of the readout can remain constant at any spatial resolution of the sensors, allowing extreme low noise and a high-frame rate (design) at virtually any sensor array resolution. The objective of this work is the design of ultra-low noise readout circuits meant for 3D-stacked image sensors, structured with parallel readout circuitries. The readout circuit’s key requirements are low noise, speed, low-area (for higher parallelism), and low power. A CMOS imaging review is presented through a short historical background, followed by the description of the motivation, the research goals, and the work contributions. The fundamentals of CMOS image sensors are addressed, as a part of highlighting the typical image sensor features, the essential building blocks, types of operation, as well as their physical characteristics and their evaluation metrics. Following up on this, the document pays attention to the readout circuit’s noise theory and the column converters theory, to identify possible pitfalls to obtain sub-electron noise imagers. Lastly, the fabricated test CIS device performances are reported along with conjectures and conclusions, ending this thesis with the 3D-stacked subject issues and the future work. A part of the developed research work is located in the Appendices.Devido à mudança da tecnologia CCD para CMOS, os sensores de imagem em CMOS tornam se mais pequenos, mais baratos, mais rápidos, e mais recentemente, ultrapassaram os sensores CCD no que respeita à qualidade de imagem. Para além do vasto conjunto de aplicações que requerem sensores de imagem, o próximo salto tecnológico no ramo dos sensores de imagem é o de mudar completamente da tecnologia de sensores de imagem CMOS convencional para a tecnologia “3D-stacked”. O empilhamento de chips é relativamente recente e é uma tecnologia inovadora no campo dos sensores de imagem, permitindo vários planos de silício com diferentes funções poderem ser empilhados uns sobre os outros. Esta tecnologia permite portanto, um paralelismo extremo na leitura dos sinais vindos da matriz de píxeis. Além disso, num sensor de imagem de planos de silício empilhados, os circuitos de leitura estão posicionados debaixo da matriz de píxeis, sendo que dessa forma, o paralelismo pode manter-se constante para qualquer resolução espacial, permitindo assim atingir um extremo baixo ruído e um alto debito de imagens, virtualmente para qualquer resolução desejada. O objetivo deste trabalho é o de desenhar circuitos de leitura de coluna de muito baixo ruído, planeados para serem empregues em sensores de imagem “3D-stacked” com estruturas altamente paralelizadas. Os requisitos chave para os circuitos de leitura são de baixo ruído, rapidez e pouca área utilizada, de forma a obter-se o melhor rácio. Uma breve revisão histórica dos sensores de imagem CMOS é apresentada, seguida da motivação, dos objetivos e das contribuições feitas. Os fundamentos dos sensores de imagem CMOS são também abordados para expor as suas características, os blocos essenciais, os tipos de operação, assim como as suas características físicas e suas métricas de avaliação. No seguimento disto, especial atenção é dada à teoria subjacente ao ruído inerente dos circuitos de leitura e dos conversores de coluna, servindo para identificar os possíveis aspetos que dificultem atingir a tão desejada performance de muito baixo ruído. Por fim, os resultados experimentais do sensor desenvolvido são apresentados junto com possíveis conjeturas e respetivas conclusões, terminando o documento com o assunto de empilhamento vertical de camadas de silício, junto com o possível trabalho futuro