Network-on-Chip Synchronization

Technology scaling has enabled the number of cores within a System on Chip (SoC) to increase significantly. Globally Asynchronous Locally Synchronous (GALS) systems using Dynamic Voltage and Frequency Scaling (DVFS) operate each of these cores on distinct and dynamic clock domains. The main communication method between these cores is increasingly more likely to be a Network-on-Chip (NoC). Typically, the interfaces between these clock domains experience multi-cycle synchronization latencies due to their use of “brute-force” synchronizers. This dissertation aims to improve the performance of NoCs and thereby SoCs as a whole by reducing this synchronization latency. First, a survey of NoC improvement techniques is presented. One such improvement technique: a multi-layer NoC, has been successfully simulated. Given how one of the most commonly used techniques is DVFS, a thorough analysis and simulation of brute-force synchronizer circuits in both current and future process technologies is presented. Unfortunately, a multi-cycle latency is unavoidable when using brute-force synchronizers, so predictive synchronizers which require only a single cycle of latency have been proposed. To demonstrate the impact of these predictive synchronizer circuits at a high level, multi-core system simulations incorporating these circuits have been completed. Multiple forms of GALS NoC configurations have been simulated, including multi-synchronous, NoC-synchronous, and single-synchronizer. Speedup on the SPLASH benchmark suite was measured to directly quantify the performance benefit of predictive synchronizers in a full system. Additionally, Mean Time Between Failures (MTBF) has been calculated for each NoC synchronizer configuration to determine the reliability benefit possible when using predictive synchronizers

Nano-scale TG-FinFET: Simulation and Analysis

Transistor has been designed and fabricated in the same way since its invention more than four decades ago enabling exponential shrinking in the channel length. However, hitting fundamental limits imposed the need for introducing disruptive technology to take over. FinFET - 3-D transistor - has been emerged as the first successor to MOSFET to continue the technology scaling roadmap. In this thesis, scaling of nano-meter FinFET has been investigated on both the device and circuit levels. The studies, primarily, consider FinFET in its tri-gate (TG) structure. On the device level, first, the main TCAD models used in simulating electron transport are benchmarked against the most accurate results on the semi-classical level using Monte Carlo techniques. Different models and modifications are investigated in a trial to extend one of the conventional models to the nano-scale simulations. Second, a numerical study for scaling TG-FinFET according to the most recent International Technology Roadmap of Semiconductors is carried out by means of quantum corrected 3-D Monte Carlo simulations in the ballistic and quasi-ballistic regimes, to assess its ultimate performance and scaling behavior for the next generations. Ballisticity ratio (BR) is extracted and discussed over different channel lengths. The electron velocity along the channel is analyzed showing the physical significance of the off-equilibrium transport with scaling the channel length. On the circuit level, first, the impact of FinFET scaling on basic circuit blocks is investigated based on the PTM models. 256-bit (6T) SRAM is evaluated for channel lengths of 20nm down to 7nm showing the scaling trends of basic performance metrics. In addition, the impact of VT variations on the delay, power, and stability is reported considering die-to-die variations. Second, we move to another peer-technology which is 28nm FD-SOI as a comparative study, keeping the SRAM cell as the test block, more advanced study is carried out considering the cell‘s stability and the evolution from dynamic to static metrics

Insights into tunnel FET-based charge pumps and rectifiers for energy harvesting applications

In this paper, the electrical characteristics of tunnel field-effect transistor (TFET) devices are explored for energy harvesting front-end circuits with ultralow power consumption. Compared with conventional thermionic technologies, the improved electrical characteristics of TFET devices are expected to increase the power conversion efficiency of front-end charge pumps and rectifiers powered at sub-µW power levels. However, under reverse bias conditions the TFET device presents particular electrical characteristics due to its different carrier injection mechanism. In this paper, it is shown that reverse losses in TFET-based circuits can be attenuated by changing the gate-to-source voltage of reverse-biased TFETs. Therefore, in order to take full advantage of the TFETs in front-end energy harvesting circuits, different circuit approaches are required. In this paper, we propose and discuss different topologies for TFET-based charge pumps and rectifiers for energy harvesting applications.Peer ReviewedPostprint (author's final draft

Review on suitable eDRAM configurations for next nano-metric electronics era

We summarize most of our studies focused on the main reliability issues that can threat the gain-cells eDRAM behavior when it is simulated at the nano-metric device range has been collected in this review. So, to outperform their memory cell counterparts, we explored different technological proposals and operational regimes where it can be located. The best memory cell performance is observed for the 3T1D-eDRAM cell when it is based on FinFET devices. Both device variability and SEU appear as key reliability issues for memory cells at sub-22nm technology node.Peer ReviewedPostprint (author's final draft

Understanding the Potential and Limitations of Tunnel FETs for Low-Voltage Analog/Mixed-Signal Circuits

In this paper, the analog/mixed-signal performance is evaluated at device and circuit levels for a III-V nanowire tunnel field effect transistor (TFET) technology platform and compared against the predictive model for FinFETs at the 10-nm technology node. The advantages and limits of TFETs over their FinFET counterparts are discussed in detail, considering the main analog figures of merits, as well as the implementation of low-voltage track and-hold (T/H) and comparator circuits. It is found that the higher output resistance offered by TFET-based designs allows achieving significantly higher intrinsic voltage gain and higher maximum-oscillation frequency at low current levels. TFET-based T/H circuits have better accuracy and better hold performance by using the dummy switch solution for the mitigation of the charge injection. Among the comparator circuits, the TFET-based conventional dynamic architecture exhibits the best performance while keeping lower area occupation with respect to the more complex double-tail circuits. Moreover, it outperforms all the FinFET counterparts over a wide range of supply voltage when considering low values of the common-mode voltage

Near-Threshold Computing: Past, Present, and Future.

Transistor threshold voltages have stagnated in recent years, deviating from constant-voltage scaling theory and directly limiting supply voltage scaling. To overcome the resulting energy and power dissipation barriers, energy efficiency can be improved through aggressive voltage scaling, and there has been increased interest in operating at near-threshold computing (NTC) supply voltages. In this region sizable energy gains are achieved with moderate performance loss, some of which can be regained through parallelism. This thesis first provides a methodical definition of how near to threshold is "near threshold" and continues with an in-depth examination of NTC across past, present, and future CMOS technologies. By systematically defining near-threshold, the trends and tradeoffs are analyzed, lending insight in how best to design and optimize near-threshold systems. NTC works best for technologies that feature good circuit delay scalability, therefore technologies without strong short-channel effects. Early planar technologies (prior to 90nm or so) featured good circuit scalability (8x energy gains), but lacked area in which to add cores for parallelization. Recent planar nodes (32nm – 20nm) feature more area for cores but suffer from poor delay scalability, and so are not well-suited for NTC (4x energy gains). The switch to FinFET CMOS technology allows for a return to strong voltage scalability (8x gain), reversing trends seen in planar technologies, while dark silicon has created an opportunity to add cores for parallelization. Improved FinFET voltage scalability even allows for latency reduction of a single task, as long as the task is sufficiently parallelizable (< 10% serial code). Finally, we will look at a technique for fast voltage boosting, called Shortstop, in which a core's operating voltage is raised in 10s of cycles. Shortstop can be used to quickly respond to single-threaded performance demands of a near-threshold system by leveraging the innate parasitic inductance of a dedicated dirty supply rail, further improving energy efficiency. The technique is demonstrated in a wirebond implementation and is able to boost a core up to 1.8x faster than a header-based approach, while reducing supply droop by 2-7x. An improved flip-chip architecture is also proposed.PhDElectrical EngineeringUniversity of Michigan, Horace H. Rackham School of Graduate Studieshttp://deepblue.lib.umich.edu/bitstream/2027.42/113600/1/npfet_1.pd

PERFORMANCE ANALYSIS OF FINFET BASED INVERTER, NAND AND NOR CIRCUITS AT 10 NM ,7 NM AND 5 NM NODE TECHNOLOGIES

Advancement in the semiconductor industry has transformed modern society. A miniaturization of a silicon transistor is continuing following Moore’s empirical law. The planar metal-oxide semiconductor field effect transistor (MOSFET) structure has reached its limit in terms of technological node reduction. To ensure the continuation of CMOS scaling and to overcome the Short Channel Effect (SCE) issues, a new MOS structure known as Fin field-effect transistor (FinFET) has been introduced and has led to significant performance enhancements.This paper presents a comparative study of CMOS gates designed with FinFET 10 nm, 7 nm and 5 nm technology nodes. Electrical parameters like the maximum switching current ION, the leakage current IOFF, and the performance ratio ION/IOFF for N and P FinFET with different nodes are presented in this simulation.The aim and the novelty  of this paper is to extract the operating frequency for CMOS circuits using Quantum and Stress effects implemented in the Spice parameters on the latest Microwind software. The simulation results show a fitting with experimental data  for FinFET N and P 10 nm strctures using quantum correction. Finally, we have demonstrate that FinFET 5 nm can reach a minimum time delay of  td=1.4 ps for CMOS NOT gate and td=1 ps  for CMOS NOR gate to improve Integrated Circuits IC

Steep-slope Devices for Power Efficient Adiabatic Logic Circuits

Reducing supply voltage is an effective way to reduce power consumption, however, it greatly reduces CMOS circuits speed. This translates in limitations on how low the supply voltage can be reduced in many applications due to frequency constraints. In particular, in the context of low voltage adiabatic circuits, another well-known technique to save power, it is not possible to obtain satisfactory power-speed trade-offs. Tunnel field-effect transistors (TFETs) have been shown to outperforms CMOS at low supply voltage in static logic implementations, operation due to their steep subthreshold slope (SS), and have potential for combining low voltage and adiabatic. To the best of our knowledge, the adiabatic circuit topologies reported with TFETs do not take into account the problems associated with their inverse current due to their intrinsic p-i-n diode. In this paper, we propose a solution to this problem, demonstrating that the proposed modification allows to significantly improving the performance in terms of power/energy savings compared to the original ones, especially at medium and low frequencies. In addition, we have evaluated the relative advantages of the proposed TFET adiabatic circuits, both at gate and architecture levels, with respect to their static implementations, demonstrating that these are greater than for FinFET transistor designs. Index Terms—Adiabatic logic, TunnelPeer reviewe

Analysis of SoftError Rates for future technologies

La fiabilitat s'ha convertit en un aspecte important del disseny de sistemes informàtics a causa de la miniaturització de la tecnologia. En aquest projecte s'analitza la fiabilitat de les tecnologies actuals i futures simulant els components bàsics d'un processador

NOVEL RESOURCE EFFICIENT CIRCUIT DESIGNS FOR REBOOTING COMPUTING

CMOS based computing is reaching its limits. To take computation beyond Moores law (the number of transistors and hence processing power on a chip doubles every 18 months to 3 years) requires research explorations in (i) new materials, devices, and processes, (ii) new architectures and algorithms, (iii) new paradigm of logic bit representation. The focus is on fundamental new ways to compute under the umbrella of rebooting computing such as spintronics, quantum computing, adiabatic and reversible computing. Therefore, this thesis highlights explicitly Quantum computing and Adiabatic logic, two new computing paradigms that come under the umbrella of rebooting computing. Quantum computing is investigated for its promising application in high-performance computing. The first contribution of this thesis is the design of two resource-efficient designs for quantum integer division. The first design is based on non-restoring division algorithm and the second one is based on restoring division algorithm. Both the designs are compared and shown to be superior to the existing work in terms of T-count and T-depth. The proliferation of IoT devices which work on low-power also has drawn interests to the rebooting computing. Hence, the second contribution of this thesis is proving that Adiabatic Logic is a promising candidate for implementation in IoT devices. The adiabatic logic family called Symmetric Pass Gate Adiabatic Logic (SPGAL) is implemented in PRESENT-80 lightweight algorithm. Adiabatic Logic is extended to emerging transistor devices