Super Dielectric Materials

Evidence is provided that a class of materials with dielectric constants greater than 100,000, herein called super dielectric materials (SDM), can be generated readily from common, inexpensive materials.Comment: The first material ever with an intrinsic dielectric constant greater than 100,000. Postulated to be a class of materials with super dielectric propertie

High-K dielectric sulfur-selenium alloys.

Upcoming advancements in flexible technology require mechanically compliant dielectric materials. Current dielectrics have either high dielectric constant, K (e.g., metal oxides) or good flexibility (e.g., polymers). Here, we achieve a golden mean of these properties and obtain a lightweight, viscoelastic, high-K dielectric material by combining two nonpolar, brittle constituents, namely, sulfur (S) and selenium (Se). This S-Se alloy retains polymer-like mechanical flexibility along with a dielectric strength (40 kV/mm) and a high dielectric constant (K = 74 at 1 MHz) similar to those of established metal oxides. Our theoretical model suggests that the principal reason is the strong dipole moment generated due to the unique structural orientation between S and Se atoms. The S-Se alloys can bridge the chasm between mechanically soft and high-K dielectric materials toward several flexible device applications

Plasma Damage on Low-k Dielectric Materials

Low dielectric constant (low-k) materials as an interconnecting insulator in integrated circuits are essential for resistance-capacitance (RC) time delay reduction. Plasma technology is widely used for the fabrication of the interconnects, such as dielectric etching, resisting ashing or stripping, barrier metal deposition, and surface treatment. During these processes, low-k dielectric materials may be exposed to the plasma environments. The generated reactive species from the plasma react with the low-k dielectric materials. The reaction involves physical and chemical effects, causing degradations for low-k dielectric materials. This is called “plasma damage” on low-k dielectric materials. Therefore, this chapter is an attempt to provide an overview of plasma damage on the low-k dielectric materials

Towards a Theory of Molecular Forces between Deformed Media

A macroscopic theory for the molecular or Casimir interaction of dielectric materials with arbitrarily shaped surfaces is developed. The interaction is generated by the quantum and thermal fluctuations of the electromagnetic field which depend on the dielectric function of the materials. Using a path integral approach for the electromagnetic gauge field, we derive an effective Gaussian action which can be used to compute the force between the objects. No assumptions about the independence of the shape and material dependent contributions to the interaction are made. In the limiting case of flat surfaces our approach yields a simple and compact derivation of the Lifshitz theory for molecular forces. For ideal metals with arbitrarily deformed surfaces the effective action can be calculated explicitly. For the general case of deformed dielectric materials the applicability of perturbation theory and numerical techniques to the evaluation of the force from the effective action is discussed.Comment: 15 pages, 1 figur