γ-rays irradiation effects on dielectric properties of Ti/Au/GaAsN Schottky diodes with 1.2%N

Dielectric properties of As grown and irradiated Ti /Au/GaAsN Schottky diodes with 1.2%N are investigated using capacitance/conductance-voltage measurements in 90–290 K temperature range and 50–2000 kHz frequency range. Extracted parameters are interface state density, series resistance, dielectric constant, dielectric loss, tangent loss and ac conductivity. It is shown that exposure to γ-rays irradiation leads to reduction in effective trap density believed to result from radiation-induced traps annulations. An increase in series resistance is attributed to a net doping reduction. Dielectric constant (ε’) shows usual step-like transitions with corresponding relaxation peaks in dielectric loss. These peaks shift towards lower temperature as frequency decrease. Temperature dependant ac conductivity followed an Arrhenius relation with activation energy of 153 meV in the 200–290 K temperature range witch correspond to As vacancy. The results indicate that γ-rays irradiation improves the dielectric and electrical properties of the diode due to the defect annealing effect

Effect of Co-60 gamma-ray irradiation on electrical properties of Ti/Au/GaAs1-xNx Schottky diodes

Current-voltage (I-V), capacitance-voltage-frequency (C-V-f) and conductance-voltage-frequency (G/ω-V-f) measurements at room temperature are used to study 50 kGy 60Co γ-ray electrical properties irradiation dependence of Ti/Au/GaAs1−xNx Schottky diodes with 0.2%; 0.4%; 0.8% and 1.2% nitrogen dilution. This γ-ray irradiation induces a permanent damage that has increased ideality factor and series resistance for all samples. It was accompanied by a decrease in Schottky barrier height with nitrogen content up to 0.4%N and remained constant thereafter. Radiation was also found to degrade the reverse leakage current. At high frequency (1 MHz), capacitance and conductance decreased after radiation due to a decrease in net doping concentration. Interface state density and series resistance were determined from C-V-f and G/ω-V-f characteristics using Hill-Coleman methods. Interface states density exponentially decreased with increasing frequency confirming the behavior of interface traps response to ac signal. Series resistance increases after irradiation is attributed to carrier's removal effect and mobility degradation. It has two peaks in the accumulation and inversion region for some diodes (0.4%N, 0.8%N). γ-ray irradiation produced traps levels and recombination centers that reduce relaxation time. An increase in %N content can impede irradiation damage with even some compensation when the percent of diluted nitrogen is high (1.2%N)

Electrical performance of conducting polymer (SPAN) grown on GaAs with different substrate orientations

This article reports the effect of n-type GaAs substrate orientation, namely (100), (311)A and (311)B, on the electrical properties of sulfonated polyaniline (SPAN)/GaAs heterojunction devices. In addition, the inhomogeneity of the interface between various GaAs substrates and SPAN is investigated in terms of barrier height and ideality factor by performing I–V measurements at different temperatures (20–420K). The I–V results indicate that the value of the rectification ratio (IF/IR) at 0.5V is higher for SPAN/(311)B GaAs samples than for SPAN/(100) GaAs and SPAN/(311)A GaAs samples. Moreover, the barrier height decreases and the ideality factor increases with decreasing temperature for all three heterostructure devices. The high value of mean barrier ˚¯ b of SPAN/(311)B (calculated from the plots of ˚b0 as a function of 1/2kT) confirms that the GaAs substrate orientation results in an increase of barrier homogeneities. Furthermore,the C-V characteristics were obtained at room temperature. The C-V measurements showed that the carrier distributions at the interface and away from the interface in high index (311) GaAs orientations are more uniform and have better barrier homogeneity than those grown on the conventional (100) GaAs substrates

Investigation of the Effect of Substrate Orientation on the Structural, Electrical and Optical Properties of n-type GaAs1-xBix Layers Grown by Molecular Beam Epitaxy

Current-Voltage (I-V), Capacitance-Voltage (C-V), Deep Level Transient Spectroscopy (DLTS), Laplace DLTS, Photoluminescence (PL) and Micro-Raman techniques have been employed to investigate the effect of the orientation of the substrates on the structural, electrically and optically active defects in dilute GaAs1−xBix epilayers structures having a Bi composition x = ~5.4%, grown by Molecular Beam Epitaxy (MBE) on (100) and (311)B GaAs planes. X-ray diffraction results revealed that the in-plane strain in the Ga(As,Bi) layer of the samples grown on (100)-oriented substrate (−0.0484) is significantly larger than that of the samples grown on (311)B-oriented substrate. The substrate orientation is found to have a noticeable impact on the Bi incorporation and the electrical properties of dilute GaAsBi Schottky diodes. The I-V characteristics showed that (100) Schottky diodes exhibited a larger ideality factor and higher barrier height compared with (311)B samples. The DLTS measurements showed that the number of electrically active traps were different for the two GaAs substrate orientations. In particular, three and two electron traps are detected in samples grown on (100) and (311)B GaAs substrates, respectively, with activation energies ranging from 0.12 to 0.41 eV. Additionally, one hole trap was observed only in sample grown on (100) substrates with activation energy 0.24 eV. The observed traps with small activation energies are attributed to Bi pair defects. The photoluminescence (PL) and Raman spectra have evidenced different compressive strain which affects considerably the optical properties. Furthermore, the PL spectra were also affected by different contributions of Bi- related traps which are different for different substrate orientation in agreement with DLTS results

Acceptance of Moodle as a Teaching/Learning Tool by the Faculty of the Department of Information Studies at Sultan Qaboos University, Oman based on UTAUT

This research aims to explore the acceptance of Moodle as a teaching and learning tool by the faculty of the Department of Information Studies (IS) at Sultan Qaboos University (SQU) in the Sultanate of Oman. The researchers employed the Unified Theory of Acceptance and Use of Technology (UTAUT) to examine the effects of performance expectancy, effort expectancy, social influence and facilitating conditions on the behav-ioural intention of SQU faculty members to employ Moodle in their instruction. Data were collected by the interview method. Results showed the emergence of two faculty groups: one uses Moodle and one does not use Moodle. In group that uses Moodle, performance expectancy, effort expectancy, social influence, facilitating conditions and behavioural intention are positively related, thereby influencing the faculty members’use behavior. In addition to the aforementioned UTAUT constructs, four additional factors affect Moodle’s adoption. These moderators are gender, age, experience and the voluntariness of use, amongst which gender exhibits the least influence on Moodle adoption. That is, male and female faculty generally both use the learning platform. Although some members of the group that does not use Moodle exhibit optimistic performance expectancy for technology, the overall perception in this regard for Moodle is negative. The other UTAUT constructs exert no influence on this group’s adoption of the learning platform

Effect of post-growth annealing treatment on interfacial misfit GaSb/GaAs heterostructures

Post-growth annealing treatments in the range 400–600 °C are performed on GaSb/GaAs Interfacial Misfit grown samples. Current density–voltage (J–V), Capacitance–voltage (C–V), capacitance–frequency (C–F) and Deep Level Transient Spectroscopy (DLTS) measurements are performed on as-grown and annealed samples. Our studies show that possible defect compensation is observed with the annealing treatments, resulting in a significant improvement in the performances of the devices

Effects of substrate material on the electrical properties of self-assembled InAs quantum dots-based laser structures

In this work, the effects of the substrate material on the electrical properties of self-assembled InAs quantum dots (QDs)-based laser structures have been reported. Two InAs QD laser structures with the same active regions deposited on GaAs and Si substrates utilizing strain reducing layer (SRL) containing GaAs/InGaAs have been investigated using current–voltage (I–V), capacitance–voltage, and Deep-Level Transient Spectroscopy (DLTS) techniques. The I–V measurements illustrated that the rectification ratio (IF/IR) and built-in potential (ϕB) for the sample deposited on Si substrate are higher than that of sample deposited on GaAs substrate. However, the series resistance (Rs) of the InAs QDs deposited on Si substrate is lower than that of the InAs QDs deposited on GaAs substrate. The DLTS and Laplace-DLTS measurements showed that the number of traps in InAs QDs/GaAs devices is lower than that in InAs QDs/Si devices, corroborating with I–V results

High-performance organic/inorganic hybrid heterojunction based on Gallium Arsenide (GaAs) substrates and a conjugated polymer

In this paper, we present an extensive study of the electrical properties of organic-inorganic hybrid heterojunctions. Polyaniline (PANI) thin films were deposited by a very simple technique on (1 0 0) and (3 1 1)B n-type Gallium Arsenide (GaAs) substrates to fabricate hybrid devices with excellent electrical properties. The hybrid devices were electrically characterized using current–voltage (I–V), capacitance–voltage (C–V) and deep level transient spectroscopy (DLTS) measurements in the temperature range 20–440 K. The analysis of I–V characteristics based on the thermionic emission mechanism has shown a decrease of the barrier height and an increase of the ideality factor at lower temperatures for both hybrid devices. The interface states were analyzed by series resistance obtained using the C–G–V methods. The interface state density (Dit) of PANI/(1 0 0) GaAs devices is approximately one order of magnitude higher than that of PANI/(3 1 1)B GaAs devices. This behaviour is attributed to the effect of crystallographic orientation of the substrates, and was confirmed by DLTS results as well. Additionally, the devices show excellent air stability, with rectification ratio values almost unaltered after two years of storage under ambient conditions, making the polyaniline an interesting conductor polymer for future devices applications