Extraordinary tunability of high-frequency devices using Hf0.3Zr0.7O2 ferroelectric at very low applied voltages

This paper presents the applications of the Hf0.3Zr0.7O2 ferroelectric with a thickness of 10 nm for tuning high-frequency devices such as filters, phase shifters, and phased antenna arrays in the X band when the low bias voltages in the range −3 V–+3 V are applied. In this respect, we show that a bandpass filter shifts its central frequency located at 10 GHz with 3 GHz, a phase shifter produces a phase difference of about 60 degrees in the X band, while the antenna array formed by two patched antennas is steering its lobe with ±32° at 10 GHz. These results open the way for the tunability of high frequency devices for very low power applications, which represent one of the most challenging issues in applied physics

Very large phase shift of microwave signals in a 6 nm Hf x Zr 1− x O 2 ferroelectric at ±3 V

In this letter, we report for the first time very large phase shifts of microwaves in the 1–10 GHz range, in a 1 mm long gold coplanar interdigitated structure deposited over a 6 nm Hf x Zr1−x O2 ferroelectric grown directly on a high resistivity silicon substrate. The phase shift is larger than 60° at 1 GHz and 13° at 10 GHz at maximum applied DC voltages of ±3 V, which can be supplied by a simple commercial battery. In this way, we demonstrate experimentally that the new ferroelectrics based on HfO2 could play an important role in the future development of wireless communication systems for very low power applications

Plasmonics: Enabling functionalities with novel materials

The Guest Editors sincerely thank all of the authors for their contributing articles. We are grateful to the Journal of Applied Physics Driving Editors, Professor Rachel Goldman and Professor David Aspnes, for their support as well as the American Institute of Physics publishing staff for helping and promoting the Special Topic issue “Plasmonics: Enabling functionalities with novel materials.” The Guest Editors also acknowledge the European Union’s Horizon 2020 Research and Innovation Program under Grant Agreement No. 899598 FET OPEN—PHEMTRONICS

Reconfigurable horizontal-vertical carrier transport in graphene/HfZrO field-effect transistors

We have fabricated at wafer level field-effect-transistors (FETs) having as channel graphene monolayers transferred on a HfZrO ferroelectric, grown by atomic layer deposition on a doped Si (100) substrate. These FETs display either horizontal or vertical carrier transport behavior, depending on the applied gate polarity. In one polarity, the FETs behave as a graphene FET where the transport is horizontal between two contacts (drain and grounded source) and is modulated by a back-gate. Changing the polarity, the transport is vertical between the drain and the back-gate and, irrespective of the metallic contact type, Ti/Au or Cr/Au, the source-drain bias modulates the height of the potential barrier between HfZrO and the doped Si substrate, the carrier transport being described by a Schottky mechanism at high gate voltages and by a space-charge limited mechanism low gate voltages. Vertical transport is required by three-dimensional integration technologies for increasing the density of transistors on chip

Electromagnetic energy harvesting based on HfZrO tunneling junctions

HfZrO ferroelectrics with a thickness of 6 nm were grown directly on Si using atomic layer deposition, top and bottom metallic electrodes being subsequently deposited by electron-beam metallization techniques. Depending on the polarity of the ±10 V poling voltages, the current–voltage dependence of these tunneling diodes shows a rectifying behavior for different polarizations, the ON–OFF ratio being about 104. Because the currents are at mA level, the HfZrO tunneling diodes coupled to an antenna array can harvest electromagnetic energy at 26 GHz (a bandwidth designated for internet of things), with a responsivity of 63 V W−1 and a NEP of 4 nW/Hz0.5

Reversible and non-volatile metal-to-insulator chemical transition in molybdenum oxide films

Significant effort is being dedicated to developing alternative materials whose optical properties can be controllably and reversibly modified. Here, we experimentally demonstrate the reversible non-volatile molybdenum oxides MoO3-to-MoO2 transition associated to a change from a metallic to a dielectric behavior through cycles of thermal annealing in air and hydrogen (H2). A full cycle is demonstrated by characterizing structurally and optically the transition using Raman spectroscopy and spectroscopic ellipsometry. The potential applicability of the metal-to-insulator transition in MoOx is benchmarked through comparison with a canonical Mott insulator VO2 in a reconfigurable reflective configuration as well as in cladded waveguide schemes.European Union’s Horizon 2020 research and innovation program (No 899598 – PHEMTRONICS

Al4SiC4 w\"urtzite crystal: structural, optoelectronic, elastic and piezoelectric properties

New experimental results supported by theoretical analyses are proposed for aluminum silicon carbide (Al4SiC4). A state of the art implementation of the Density Functional Theory is used to analyze the experimental crystal structure, the Born charges, the elastic and piezoelectric properties. The Born charge tensor is correlated to the local bonding environment for each atom. The electronic band structure is computed including self-consistent many-body corrections. Al4SiC4 material properties are compared to other wide band gap W\"urtzite materials. From a comparison between an ellipsometry study of the optical properties and theoretical results, we conclude that the Al4SiC4 material has indirect and direct band gap energies of about 2.5eV and 3.2 eV respectively.Comment: 10 pages, 4 figure

Properties of rf-sputtered indium-tin-oxynitride thin films

Indium-tin-oxide (ITO) and indium-tin-oxynitride (ITON) thin films have been fabricated by rf-sputtering in plasma containing Ar or a mixture of Ar and N-2, respectively. The structural, electrical and optical properties of ITON films were examined and compared with those of ITO films. The microstructure of ITON films was found to be dependent on the nitrogen concentration in the plasma. Increasing the amount of nitrogen in the plasma increased the resistivity and reduced the carrier concentration and mobility of the films. The electrical properties of the ITON films improved after annealing. The absorption edge of the ITON films deposited in pure N-2 plasma was shifted towards higher energies and showed reduced infrared reflectance compared to the respective properties of ITO films. The potential of indium-tin-oxynitride films for use as a transparent conductive material for optoelectronic devices is addressed

Plasmonic hot-electron reconfigurable photodetector based on phase-change material Sb2S3

Hot-carrier based photodetectors and enhanced by surface plasmons (SPs) hot-electron injection into semiconductors, are drawing significant attention. This photodetecting strategy yields to narrowband photoresponse while enabling photodetection at sub-bandgap energies of the semiconductor materials. In this work, we analyze the design of a reconfigurable photodetector based on a metal-semiconductor (MS) configuration with interdigitated dual-comb Au electrodes deposited on the semiconducting Sb2S3 phase-change material. The reconfigurability of the device relies on the changes of refractive index between the amorphous and crystalline phases of Sb2S3 that entail a modulation of the properties of the SPs generated at the dual-comb Au electrodes. An exhaustive numerical study has been realized on the Au grating parameters formed by the dual-comb electrodes, and on the SP order with the purpose of optimizing the absorption of the device, and thus, the responsivity of the photodetector. The optimized photodetector layout proposed here enables tunable narrowband photodetection from the O telecom band (λ = 1310 nm) to the C telecom band (λ = 1550 nm).Horizon 2020 Framework Programme (No 899598 – PHEMTRONICS

MoS2 radio: detecting radio waves with a two-dimensional transition metal dichalcogenide semiconductor

In this paper, we designed, fabricated and tested a microwave circuit based on a MoS2 self-switching diode. The MoS2 thin film (10-monolayers nominal thickness) was grown on a 4 inch Al2O3/high-resistivity silicon wafer by chemical vapor deposition process. The Raman measurements confirm the high quality of the MoS2 over the whole area of the 4 inch wafer. We show experimentally that a microwave circuit based on a few-layers MoS2 self-switching diode fabricated at the wafer level is able to detect the audio spectrum from amplitude-modulated microwave signals in the band 0.9–10 GHz, i.e. in the frequency range mostly used by current wireless communications. In particular, the 900 MHz band is widely exploited for GSM applications, whereas the 3.6 GHz band has been identified as the primary pioneer band for 5G in the European Union