Heat production and energy balance in nanoengines driven by time-dependent fields

We present a formalism to study the heat transport and the power developed by the local driving fields on a quantum system coupled to macroscopic reservoirs. We show that, quite generally, two important mechanisms can take place: (i) directed heat transport between reservoirs induced by the ac potentials and (ii) at slow driving, two oscillating out of phase forces perform work against each other, while the energy dissipated into the reservoirs is negligibleComment: 5 pages, 4 figure

Orientation uncertainty reduces perceived obliquity

The influence of prejudice on perception should be greatest when certainty about stimulus identity is least. We exploited this relationship to reveal visual biases for the cardinal orientations: vertical and horizontal. Specifically, when we increased the variance of orientations in an array of grating patches, estimates of the mean became less oblique. This result is consistent with a stable prior, or prejudice, for those orientations most prevalent in natural scenes

Exploring 4D Quantum Hall Physics with a 2D Topological Charge Pump

The discovery of topological states of matter has profoundly augmented our understanding of phase transitions in physical systems. Instead of local order parameters, topological phases are described by global topological invariants and are therefore robust against perturbations. A prominent example thereof is the two-dimensional integer quantum Hall effect. It is characterized by the first Chern number which manifests in the quantized Hall response induced by an external electric field. Generalizing the quantum Hall effect to four-dimensional systems leads to the appearance of a novel non-linear Hall response that is quantized as well, but described by a 4D topological invariant - the second Chern number. Here, we report on the first observation of a bulk response with intrinsic 4D topology and the measurement of the associated second Chern number. By implementing a 2D topological charge pump with ultracold bosonic atoms in an angled optical superlattice, we realize a dynamical version of the 4D integer quantum Hall effect. Using a small atom cloud as a local probe, we fully characterize the non-linear response of the system by in-situ imaging and site-resolved band mapping. Our findings pave the way to experimentally probe higher-dimensional quantum Hall systems, where new topological phases with exotic excitations are predicted

Ensemble coding of color and luminance contrast

Ensemble coding has been demonstrated for many attributes including color, but the metrics on which this coding is based remain uncertain. We examined ensemble percepts for stimulus sets that varied in chromatic contrast between complementary hues, or that varied in luminance contrast between increments and decrements, in both cases focusing on the ensemble percepts for the neutral gray stimulus defining the category boundary. Each ensemble was composed of 16 circles with four contrast levels. Observers saw the display for 0.5 s and then judged whether a target contrast was a member of the set. False alarms were high for intermediate contrasts (within the range of the ensemble) and fell for higher or lower values. However, for ensembles with complementary hues, gray was less likely to be reported as a member, even when it represented the mean chromaticity of the set. When the settings were repeated for luminance contrast, false alarms for gray were higher and fell off more gradually for out-of-range contrasts. This difference implies that opposite luminance polarities represent a more continuous perceptual dimension than opponent-color variations, and that “gray” is a stronger category boundary for chromatic than luminance contrasts. For color, our results suggest that ensemble percepts reflect pooling within rather than between large hue differences, perhaps because the visual system represents hue differences more like qualitatively different categories than like quantitative differences within an underlying color “space.” The differences for luminance and color suggest more generally that ensemble coding for different visual attributes might depend on different processes that in turn depend on the format of the visual representation

• ROTHSCHILD ET AL. Recent Trends in Optical Lithography Recent Trends in Optical Lithography

■ The fast-paced evolution of optical lithography has been a key enabler in the dramatic size reduction of semiconductor devices and circuits over the last three decades. Various methods have been devised to pattern at dimensions smaller than the wavelength used in the process. In addition, the patterning wavelength itself has been reduced and will continue to decrease in the future. As a result, it is expected that optical lithography will remain the technology of choice in lithography for at least another decade. Lincoln Laboratory has played a seminal role in the progress of optical lithography; it pioneered 193-nm lithography, which is used in advanced production, and 157-nm lithography, which is under active development. Lincoln Laboratory also initiated exploration of liquidimmersion lithography and studied the feasibility of 121-nm lithography. Many of the challenges related to practical implementation of short-wavelength optical lithography are materials-related, including engineering of new materials, improving on existing materials, and optimizing their photochemistry. This article examines the technical issues facing optical lithography and Lincoln Laboratory’s contributions toward their resolution. Optical lithography, the technology of patterning, has enabled semiconductor devices to progressively shrink since the inception of integrated circuits more than three decades ago. Throughout the 1980s and 1990s, the trend of miniaturization continued unabated and even accelerated. Current semiconductor devices are being mass produced with 130-nm dense features; by 2007 these devices will have 65-nm dense features. Optical lithography has been, and will remain for the foreseeable future, the critical technology that makes this trend possible. (To learn the fundamentals of optical lithography, see the sidebar entitled “Optical Lithograph