Controlling the distribution and the structural properties of positioned quantum dots

Indium arsenide quantum dots were site-selectively grown on patterned gallium arsenide substrates. The mechanisms which influence the distribution and the structural properties of positioned quantum dots were investigated. Geometrical parameters of the pits and growth parameters were studied in order to reveal possible ways to control these parameters. In situ annealing experiments were performed, offering additional possibilities to adjust the size and the density of positioned quantum dots

Influence of hole shape/size on the growth of site-selective quantum dots

The number of quantum dots which nucleate at a certain place has to be controllable for device integration. It was shown that the number of quantum dots per nucleation site depends on the size of the hole in the substrate, but other dimensions of the nucleation site are vague. We report on the influence of hole shape on site-selectively grown InAs quantum dots (QDs) by molecular beam epitaxy. Dry etching of the GaAs wafers was used because of its high anisotropic etching characteristic. Therefore, it was possible to verify the influence of several hole shape parameters on the subsequent QD growth independently. We show that the nucleation of these QDs depends on several properties of the hole, namely its surface area, aspect ratio of the surface area, and depth. Especially, the aspect ratio shows a big influence on the number of nucleating QDs per site. With knowledge of these dependencies, it is possible to influence the number of QDs per site and also its distribution

Investigation of pre-structured GaAs surfaces for subsequent site-selective InAs quantum dot growth

In this study, we investigated pre-structured (100) GaAs sample surfaces with respect to subsequent site-selective quantum dot growth. Defects occurring in the GaAs buffer layer grown after pre-structuring are attributed to insufficient cleaning of the samples prior to regrowth. Successive cleaning steps were analyzed and optimized. A UV-ozone cleaning is performed at the end of sample preparation in order to get rid of remaining organic contamination

Investigation of pre-structured GaAs surfaces for subsequent site-selective InAs quantum dot growth

<p>Abstract</p> <p>In this study, we investigated pre-structured (100) GaAs sample surfaces with respect to subsequent site-selective quantum dot growth. Defects occurring in the GaAs buffer layer grown after pre-structuring are attributed to insufficient cleaning of the samples prior to regrowth. Successive cleaning steps were analyzed and optimized. A UV-ozone cleaning is performed at the end of sample preparation in order to get rid of remaining organic contamination.</p