Chemical and physical properties in layers and interfaces of nanolayered Si(100)/Ni/BC x

Layered stacks of the structure Si(100)/Ni/BCxNy were produced by physical (Ni) and chemical (BCN) vapor deposition. The BCN layers were deposited at temperatures of 200, 300, 400, and 500 °C. The resulting samples were characterized by ellipsometry, X-ray photoelectron spectrometry, secondary ion mass spectrometry, atomic force microscopy, and X-ray reflectometry. The formed structures of the samples synthesized at 200 and 500 °C, respectively, were determined. For the synthesis temperature of 200 °C, compounds with Ni-C bonds were found at the interface Ni/BCxNy. For the sample produced at 500 °C, compounds with Ni-Si bonds were identified, dispersed as particles or droplets in the corresponding interface. Copyright © 2015 John Wiley & Sons, Ltd