259 research outputs found

    Multistability at arbitrary low optical intensities in a metallo-dielectric layered structure

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    We show that a nonlinear metallo-dielectric layered slab of subwavelength thickness and very small average dielectric permittivity displays optical multistable behavior at arbitrary low optical intensities. This is due to the fact that, in the presence of the small linear permittivity, one of the multiple electromagnetic slab states exists no matter how small is the transmitted optical intensity. We prove that multiple states at ultra-low optical intensities can be reached only by simultaneously operating on the incident optical intensity and incidence angle. By performing full wave simulations, we prove that the predicted phenomenology is feasible and very robust.Comment: 4 pages, 4 figure

    Layer-Resolved Ultrafast XUV Measurement of Hole Transport in a Ni-TiO2-Si Photoanode

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    Metal-oxide-semiconductor junctions are central to most electronic and optoelectronic devices. Here, the element-specificity of broadband extreme ultraviolet (XUV) ultrafast pulses is used to measure the charge transport and recombination kinetics in each layer of a Ni-TiO2-Si junction. After photoexcitation of silicon, holes are inferred to transport from Si to Ni ballistically in ~100 fs, resulting in spectral shifts in the Ni M2,3 XUV edge that are characteristic of holes and the absence of holes initially in TiO2. Meanwhile, the electrons are observed to remain on Si. After picoseconds, the transient hole population on Ni is observed to back-diffuse through the TiO2, shifting the Ti spectrum to higher oxidation state, followed by electron-hole recombination at the Si-TiO2 interface and in the Si bulk. Electrical properties, such as the hole diffusion constant in TiO2 and the initial hole mobility in Si, are fit from these transient spectra and match well with values reported previously

    A Variational Method for Interpolation Between Zone Centers in 2-D Geometry

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    Design and Analysis of Turbulence Grids for Aeroacoustic Measurements

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    Layer-resolved ultrafast extreme ultraviolet measurement of hole transport in a Ni-TiOâ‚‚-Si photoanode

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    Metal oxide semiconductor junctions are central to most electronic and optoelectronic devices, but ultrafast measurements of carrier transport have been limited to device-average measurements. Here, charge transport and recombination kinetics in each layer of a Ni-TiOâ‚‚-Si junction is measured using the element specificity of broadband extreme ultraviolet (XUV) ultrafast pulses. After silicon photoexcitation, holes are inferred to transport from Si to Ni ballistically in ~100 fs, resulting in characteristic spectral shifts in the XUV edges. Meanwhile, the electrons remain on Si. After picoseconds, the transient hole population on Ni is observed to back-diffuse through the TiOâ‚‚, shifting the Ti spectrum to a higher oxidation state, followed by electron-hole recombination at the Si-TiOâ‚‚ interface and in the Si bulk. Electrical properties, such as the hole diffusion constant in TiOâ‚‚ and the initial hole mobility in Si, are fit from these transient spectra and match well with values reported previously

    Narrowing of EIT resonance in a Doppler Broadened Medium

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    We derive an analytic expression for the linewidth of EIT resonance in a Doppler broadened system. It is shown here that for relatively low intensity of the driving field the EIT linewidth is proportional to the square root of intensity and is independent of the Doppler width, similar to the laser induced line narrowing effect by Feld and Javan. In the limit of high intensity we recover the usual power broadening case where EIT linewidth is proportional to the intensity and inversely proportional to the Doppler width.Comment: 4 pages, 2 figure
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