X-ray Nanodiffraction on a Single SiGe Quantum Dot inside a Functioning Field-Effect Transistor

For advanced electronic, optoelectronic, or mechanical nanoscale devices a detailed understanding of their structural properties and in particular the strain state within their active region is of utmost importance. We demonstrate that X-ray nanodiffraction represents an excellent tool to investigate the internal structure of such devices in a nondestructive way by using a focused synchotron X-ray beam with a diameter of 400 nm. We show results on the strain fields in and around a single SiGe island, which serves as stressor for the Si-channel in a fully functioning Si-metal-oxide semiconductor field-effect transistor

Crystal Phase Selective Growth in GaAs/InAs Core–Shell Nanowires

We present a novel type of core–shell nanowires in which only certain parts of the core are covered by the shell. This is achieved by the crystal phase selective growth of the InAs shell on zinc blende GaAs nanowires with controlled wurtzite inclusions. The shell grows on the zinc blende phase, but its growth is hindered on the wurtzite crystal phase. Nucleation of InAs occurs exclusively on the zinc blende GaAs regions. The wurtzite segments are placed inside self-catalyzed GaAs nanowires by partially consuming and refilling the Ga droplet. The crystal phase selective growth of InAs on the side facets of the GaAs nanowires is explained by the local environment of each new In atom. Because of unbalanced neighbors on the wurtzite side facets, the growth of a highly lattice mismatched material is hindered. This happens not only on the wurtzite segments, but also on regions being characterized by a high density of twins

Mode of Growth of Ultrathin Topological Insulator Bi₂Te₃ Films on Si (111) Substrates

Layered materials such as graphene, bi-, and multilayer graphene as well as various compounds of topological insulators are currently in the focus of interest due to their extraordinary physical properties related to Dirac surface states. The ability to grow thin films of these complex layered materials is the key to explore their fundamental phenomena giving insights into modern solid-state physics. However, complex materials composed of layers only weakly bonded via van der Waals forces offer unmatched challenges for the deposition of thin epitaxial films. Here, we report on the growth of Bi₂Te₃ ultrathin films on Si (111) substrates using molecular beam epitaxy. Special emphasis is put on the nucleation phenomena and growth dynamics studied in detail by in situ scanning tunnelling microscopy and high-resolution scanning transmission electron microscopy. The morphology of the Bi₂Te₃ surface and the structure of the Si(111)/Bi₂Te₃ interface as well as the formation of threading dislocations and crystal domains are studied at the atomic level. Our data indicate that the film is formed via the nucleation of islands, which float on the substrate; thus, the islands are only weakly bonded to the substrate and rather mobile. Apparently, these floating islands are able to arrange themselves by moving in the <i>x</i>–<i>y</i> direction to perfectly coalesce and form a continuous film. The results present a crucial step toward understanding growth and defect formation in this class of materials and thus pave the avenue to a higher control over both their structural and electronic properties, in order to study the electronic properties of the Dirac surface states

Molecular Beam Epitaxy Growth of GaAs/InAs Core–Shell Nanowires and Fabrication of InAs Nanotubes

We present results about the growth of GaAs/InAs core–shell nanowires (NWs) using molecular beam epitaxy. The core is grown via the Ga droplet-assisted growth mechanism. For a homogeneous growth of the InAs shell, the As₄ flux and substrate temperature are critical. The shell growth starts with InAs islands along the NW core, which increase in time and merge giving finally a continuous and smooth layer. At the top of the NWs, a small part of the core is free of InAs indicating a crystal phase selective growth. This allows a precise measurement of the shell thickness and the fabrication of InAs nanotubes by selective etching. The strain relaxation in the shell occurs mainly via the formation of misfit dislocations and saturates at ∼80%. Additionally, other types of defects are observed, namely stacking faults transferred from the core or formed in the shell, and threading dislocations

Extreme ultraviolet interference lithography at the Paul Scherrer Institut

Auzelyte V, Dais C, Farquet P, et al. Extreme ultraviolet interference lithography at the Paul Scherrer Institut. JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS. 2009;8(2):021204.We review the performance and applications of an extreme ultraviolet interference lithography (EUV-IL) system built at the Swiss Light Source of the Paul Scherrer Institut (Villigen, Switzerland). The interferometer uses fully coherent radiation from an undulator source. 1-D (line/space) and 2-D (dot/hole arrays) patterns are obtained with a transmission-diffraction-grating type of interferometer. Features with sizes in the range from one micrometer down to the 10-nm scale can be printed in a variety of resists. The highest resolution of 11-nm half-pitch line/space patterns obtained with this method represents a current record for photon based lithography. Thanks to the excellent performance of the system in terms of pattern resolution, uniformity, size of the patterned area, and the throughput, the system has been used in numerous applications. Here we demonstrate the versatility and effectiveness of this emerging nanolithography method through a review of some of the applications, namely, fabrication of metallic and magnetic nanodevice components, self-assembly of Si/Ge quantum dots, chemical patterning of self-assembled monolayers (SAM), and radiation grafting of polymers. (c) 2009 Society of Photo-Optical Instrumentation Engineers. [DOI: 10.1117/1.3116559

Amphoteric Nature of Sn in CdS Nanowires

High-quality CdS nanowires with uniform Sn doping were synthesized using a Sn-catalyzed chemical vapor deposition method. X-ray diffraction and transmission electron microscopy demonstrate the single crystalline wurtzite structure of the CdS/Sn nanowires. Both donor and acceptor levels, which originate from the amphoteric nature of Sn in II–VI semiconductors, are identified using low-temperature microphotoluminescence. This self-compensation effect was cross examined by gate modulation and temperature-dependent electrical transport measurement. They show an overall n-type behavior with relatively low carrier concentration and low carrier mobilities. Moreover, two different donor levels due to intrinsic and extrinsic doping could be distinguished. They agree well with both the electrical and optical data

Ranko Marinković in Czech translations

This work deals with the literary production of Croatian author Ranko Marinković and surveys primarily his publications released in Czech language. The biggest part presents two most important translations - the collection of short stories Ruce (The Hands) and the novel Kyklop (The Cyclops)