17 research outputs found
Charge Transfer Inefficiency in Pinned Photodiode CMOS image sensors: Simple Montecarlo modeling and experimental measurement based on a pulsed storage-gate method
The charge transfer time represents the bottleneck in terms of temporal resolution in Pinned Photodiode (PPD) CMOS image sensors. This work focuses on the modeling and estimation of this key parameter. A simple numerical model of charge transfer in PPDs is presented. The model is based on a Montecarlo simulation and takes into account both charge diffusion in the PPD and the effect of potential obstacles along the charge transfer path. This work also presents a new experimental approach for the estimation of the charge transfer time, called pulsed Storage Gate (SG) method. This method, which allows reproduction of a “worst-case” transfer condition, is based on dedicated SG pixel structures and is particularly suitable to compare transfer efficiency performances for different pixel geometries
Vulnerability of CMOS image sensors in megajoule class laser harsh environment
CMOS image sensors (CIS) are promising candidates as part of optical imagers for the plasma diagnostics devoted to the study of fusion by inertial confinement. However, the harsh radiative environment of Megajoule Class Lasers threatens the performances of these optical sensors. In this paper, the vulnerability of CIS to the transient and mixed pulsed radiation environment associated with such facilities is investigated during an experiment at the OMEGA facility at the Laboratory for Laser Energetics (LLE), Rochester, NY, USA. The transient and permanent effects of the 14 MeV neutron pulse on CIS are presented. The behavior of the tested CIS shows that active pixel sensors (APS) exhibit a better hardness to this harsh environment than a CCD. A first order extrapolation of the reported results to the higher level of radiation expected for Megajoule Class Laser facilities (Laser Megajoule in France or National Ignition Facility in the USA) shows that temporarily saturated pixels due to transient neutron-induced single event effects will be the major issue for the development of radiation-tolerant plasma diagnostic instruments whereas the permanent degradation of the CIS related to displacement damage or total ionizing dose effects could be reduced by applying well known mitigation techniques
Speed Analysis in Pinned Photodiode CMOS Image Sensors based on a Pulsed Storage-Gate Method
The charge transfer time represents the bottleneck in terms of temporal resolution in Pinned Photodiode (PPD) CMOS image sensors. This work focuses on the modeling and estimation of this key parameter. A simple numerical model of charge transfer in PPDs is presented. The model is based on a Montecarlo simulation and takes into account both charge diffusion in the PPD and the effect of potential obstacles along the charge transfer path. This work also presents a new experimental approach for the estimation of the charge transfer time, called pulsed Storage Gate (SG) method. This method, which allows reproduction of a “worst-case” transfer condition, is based on dedicated SG pixe
Hardening approach to use CMOS image sensors for fusion by inertial confinement diagnostics
A hardening method is proposed to enable the use of CMOS image sensors for Fusion by Inertial Confinement Diagnostics. The mitigation technique improves their radiation tolerance using a reset mode implemented in the device. The results obtained evidence a reduction of more than 70% in the number of transient white pixels induced in the pixel array by the mixed neutron and γ-ray pulsed radiation environment
Radiation Hardening of Digital Color CMOS Camera-on-a-Chip Building Blocks for Multi-MGy Total Ionizing Dose Environments
The Total Ionizing Dose (TID) hardness of digital color Camera-on-a-Chip (CoC) building blocks is explored in the Multi-MGy range using 60Co gamma-ray irradiations. The performances of the following CoC subcomponents are studied: radiation hardened (RH) pixel and photodiode designs, RH readout chain, Color Filter Arrays (CFA) and column RH Analog-to-Digital Converters (ADC). Several radiation hardness improvements are reported (on the readout chain and on dark current). CFAs and ADCs degradations appear to be very weak at the maximum TID of 6 MGy(SiO2), 600 Mrad. In the end, this study demonstrates the feasibility of a MGy rad-hard CMOS color digital camera-on-a-chip, illustrated by a color image captured after 6 MGy(SiO2) with no obvious degradation. An original dark current reduction mechanism in irradiated CMOS Image Sensors is also reported and discussed
Analysis of X-Ray Photo-Charge Induced Speckles in a Radiation Hardened CMOS Image Sensor
Analysis of X-Ray Photo-Charge Induced Speckles in a Radiation Hardened CMOS Image Sensor
Multi-MGy total ionizing dose induced MOSFET variability effects on radiation hardened CMOS image sensor performances
MOSFETs variability in irradiated CIS up to 10 MGy (SiO2) is statistically investigated on about 65000 devices. Different variability sources are identified and the role played by the transistors composing the readout chain is clarified
Radiation Hardening of Digital Color CMOS Camera-on-a-Chip Building Blocks for Grad Total Ionizing Dose Environments
Radiation Hardening of Digital Color CMOS Camera-on-a-Chip Building Blocks for Grad Total Ionizing Dose Environments
Toward Multi-MGy / Grad Radiation Hardened CMOS Image Sensors for Nuclear Applications
International audienc
Radiation Hardening of Digital Color CMOS Camera-on-a-Chip Building Blocks for Multi-MGy Total Ionizing Dose Environments
International audienceThe TID hardness of digital color CMOS camera-on-a-chip building blocks (radiation hardened pixel array, color filter arrays and radiation hardened column ADCs) is demonstrated in the multi-MGy range using Co-60 irradiation