Characterisation of thermal and coupling effects in advanced silicon MOSFETs

PhD ThesisNew approaches to metal-oxide-semiconductor field effect transistor (MOSFET) engineering emerge in order to keep up with the electronics market demands. Two main candidates for the next few generations of Moore’s law are planar ultra-thin body and buried oxide (UTBB) devices and three-dimensional FinFETs. Due to miniature dimensions and new materials with low thermal conductivity, performance of advanced MOSFETs is affected by self-heating and substrate effects. Self-heating results in an increase of the device temperature which causes mobility reduction, compromised reliability and signal delays. The substrate effect is a parasitic source and drain coupling which leads to frequency-dependent analogue behaviour. Both effects manifest themselves in the output conductance variation with frequency and impact analogue as well as digital performance. In this thesis self-heating and substrate effects in FinFETs and UTBB devices are characterised, discussed and compared. The results are used to identify trade-offs in device performance, geometry and thermal properties. Methods how to optimise the device geometry or biasing conditions in order to minimise the parasitic effects are suggested. To identify the most suitable technique for self-heating characterisation in advanced semiconductor devices, different methods of thermal characterisation (time and frequency domain) were experimentally compared and evaluated alongside an analytical model. RF and two different pulsed I-V techniques were initially applied to partially depleted silicon-on-insulator (PDSOI) devices. The pulsed I-V hot chuck method showed good agreement with the RF technique in the PDSOI devices. However, subsequent analysis demonstrated that for more advanced technologies the time domain methods can underestimate self-heating. This is due to the reduction of the thermal time constants into the nanosecond range and limitations of the pulsed I-V set-up. The reduction is related to the major increase of the surface to volume ratio in advanced MOSFETs. Consequently the work showed that the thermal properties of advanced semiconductor devices must be characterised within the frequency domain. For UTBB devices with 7-8 nm Si body and 10 nm ultra-thin buried oxide (BOX) the analogue performance degradation caused by the substrate effects can be stronger than the analogue performance degradation caused by self-heating. However, the substrate effects can be effectively reduced if the substrate doping beneath the buried ii oxide is adjusted using a ground plane. In the MHz – GHz frequency range the intrinsic voltage gain variation is reduced ~6 times when a device is biased in saturation if a ground plane is implemented compared with a device without a ground plane. UTBB devices with 25 nm BOX were compared with UTBB devices with 10 nm BOX. It was found that the buried oxide thinning from 25 nm to 10 nm is not critical from the thermal point of view as other heat evacuation paths (e.g. source and drain) start to play a role. Thermal and substrate effects in FinFETs were also analysed. It was experimentally shown that FinFET thermal properties depend on the device geometry. The thermal resistance of FinFETs strongly varies with the fin width and number of parallel fins, whereas the fin spacing is less critical. The results suggest that there are trade-offs between thermal properties and integration density, electrostatic control and design complexity, since these aspects depend on device geometry. The high frequency substrate effects were found to be effectively reduced in devices with sub-100 nm wide fins.Engineering and Physical Sciences Research Council (EPSRC) and EU fundin

Developing ultrasensitive and CMOS compatible ISFETs in the BEOL of industrial UTBB FDSOI transistors

Le marché des capteurs a récemment connu une croissance spectaculaire alimentée par l'application remarquable de capteurs dans l'électronique de consommation, l'industrie de l'automatisation, les appareils portables, le secteur automobile et l'internet des objets de plus en plus adopté. La technologie avancée des complementary metal oxide semiconductor (CMOS), les technologies de nano et de micro-fabrication et les plateformes de synthèse de matériaux innovantes sont également des moteurs du développement incroyable de l'industrie des capteurs. Ces progrès ont permis la réalisation de capteurs dotés de nombreuses caractéristiques telles que la précision accrue, les dimensions miniaturisées, l’intégrabilité, la production de masse, le coût très réduit et le temps de réponse rapide. Les ion-sensitive field-effect transistors (ISFETs) sont des capteurs à l'état solide (bio) chimiques, destinés à la détection des ions H+ (pH), Na+ et K+. Malgré cela, la commercialisation des ISFETs est encore à ses balbutiements, après près de cinq décennies de recherche et développement. Cela est dû principalement à la sensibilité limitée, à la controverse sur l'utilisation de l'électrode de référence pour le fonctionnement des ISFETs et à des problèmes de stabilité. Dans cette thèse, les ISFETs ultrasensibles et compatibles CMOS sont intégrés dans le BEOL des transistors UTBB FDSOI standard. Un circuit diviseur capacitif est utilisé pour polariser la grille d’avant afin d'assurer des performances stables du capteur. En exploitant la fonction d’amplification intrinsèque fournie par les transistors UTBB FDSOI, nous avons présenté des ISFET ultra sensibles. L'amplification découle du fort couplage électrostatique entre la grille avant et la grille arrière du FDSOI et des capacités asymétriques des deux grilles. Un changement de tension au niveau de la grille avant apparaît sur la grille arrière sous la forme d'un décalage amplifié de la tension. L'amplification, représentée par le facteur de couplage (γ), est égale au rapport de la capacité de l'oxyde de grille et de la capacité de le buried oxide (BOX). Par conséquent, en fonctionnalisant la détection du pH sur la grille avant pour les dispositifs FDSOI, la modification du potentiel de surface sur la grille avant est détectée par la grille arrière et amplifiée du facteur de couplage (γ), donnant lieu à un capteur chimique à l'état solide à sensibilité ultra-élevée. L'intégration de la fonctionnalité de détection a été réalisée en back end of line (BEOL), ce qui offre les avantages d'une fiabilité et d'une durée de vie accrues du capteur, d'une compatibilité avec le processus CMOS standard et d'une possibilité d'intégration d'un circuit diviseur capacitif. Le fonctionnement des MOSFETs, sans une polarisation appropriée de la grille avant, les rend vulnérables aux effets de grilles flottantes indésirables. Le circuit diviseur capacitif résout ce problème en polarisant la grille avant tout enmaintenant la fonctionnalité de détection sur la même grille par un couplage capacitif au métal commun du BEOL. Par conséquent, le potentiel au niveau du métal BEOL est une somme pondérée du potentiel de surface au niveau de la grille de détection et de la polarisation appliquée au niveau de la grille de contrôle. Le capteur proposé est modélisé et simulé à l'aide de TCAD-Sentaurus. Un modèle mathématique complet a été développé. Il fournit la réponse du capteur en fonction du pH de la solution (entrée du capteur) et des paramètres de conception du circuit diviseur capacitif et du transistor UTBB FDSOI. Dans ce cas, des résultats cohérents ont été obtenus des travaux de modélisation et de simulation, avec une sensibilité attendue de 780 mV / pH correspondant à un film de détection ayant une réponse de Nernst. La modélisation et la simulation du capteur proposé ont également été validées par une fabrication et une caractérisation du capteur de pH à grille étendue avec validation de son concept. Ces capteurs ont été développés par un traitement séparé du composant de détection de pH, qui est connecté électriquement au transistor uniquement lors de la caractérisation du capteur. Ceci permet une réalisation plus rapide et plus simple du capteur sans avoir besoin de masques et de motifs par lithographie. Les capteurs à grille étendue ont présenté une sensibilité de 475 mV/pH, ce qui est supérieur aux ISFET de faible puissance de l'état de l’art. Enfin, l’intégration de la fonctionnalité de détection directement dans le BEOL des dispositifs FDSOI UTBB a été poursuivie. Une sensibilité expérimentale de 730 mV/pH a été obtenue, ce qui confirme le modèle mathématique et la réponse simulée. Cette valeur est 12 fois supérieure à la limite de Nernst et supérieure aux capteurs de l'état de l’art. Les capteurs sont également évalués pour la stabilité, la résolution, l'hystérésis et la dérive dans lesquels d'excellentes performances sont démontrées. Une nouvelle architecture de détection du pH est également démontrée avec succès, dans laquelle la détection est fonctionnalisée au niveau de la diode de protection de la grille plutôt que de la grille avant des dispositifs UTBB FDSOI. La commutation de courant abrupte, aussi basse que 9 mV/decade, pourrait potentiellement augmenter la sensibilité de polarisation fixée à 6,6 decade/pH. Nous avons démontré expérimentalement une sensibilité de 1,25 decade/pH supérieure à la sensibilité reportée à l’état de l’art.Abstract: The sensor market has recently seen a dramatic growth fueled by the remarkable application of sensors in the consumer electronics, automation industry, wearable devices, the automotive sector, and in the increasingly adopted internet of things (IoT). The advanced complementary metal oxide semiconductor (CMOS) technology, the nano and micro fabrication technologies, and the innovative material synthesis platforms are also driving forces for the incredible development of the sensor industry. These technological advancements have enabled realization of sensors with characteristic features of increased accuracy, miniaturized dimension, integrability, volume production, highly reduced cost, and fast response time. Ion-sensitive field-effect transistors (ISFETs) are solid state (bio)chemical sensors, for pH (H+), Na+, K+ ion detection, that are equipped with the promise of the highly aspired features of CMOS devices. Despite this, the commercialization of ISFETs is still at the stage of infancy after nearly five decades of research and development. This is due mainly to the limited sensitivity, the controversy over the use of the reference electrode for ISFET operation, and because of stability issues. In this thesis, ultrasensitive and CMOS compatible ISFETs are integrated in the back end of line (BEOL) of standard UTBB FDSOI transistors. A capacitive divider circuit is employed for biasing the front gate for stable performance of the sensor. Exploiting the intrinsic amplification feature provided by UTBB FDSOI transistors, we demonstrated ultrahigh sensitive ISFETs. The amplification arises from the strong electrostatic coupling between the front gate and the back gate of the FDSOI, and the asymmetric capacitances of the two gates. A change in voltage at the front gate appears at the back gate as an amplified shift in voltage. The amplification, referred to as the coupling factor (γ), is equal to the ratio of the gate oxide capacitance and the buried oxide (BOX) capacitance. Therefore, functionalizing the pH sensing at the front gate of FDSOI devices, the change in surface potential at the front gate is detected at the back gate amplified by the coupling factor (γ), giving rise to an ultrahigh-sensitive solid state chemical sensor. Integration of the sensing functionality was made in the BEOL which gives the benefits of increased reliability and life time of the sensor, compatibility with the standard CMOS process, and possibility for embedding a capacitive divider circuit. Operation of the MOSFETs without a proper front gate bias makes them vulnerable for undesired floating body effects. The capacitive divider circuit addresses these issues by biasing the front gate simultaneously with the sensing functionality at the same gate through capacitive coupling to a common BEOL metal. Therefore, the potential at the BEOL metal would be a weighted sum of the surface potential at the sensing gate and the applied bias at the control gate. The proposed sensor is modeled and simulated using TCAD-Sentaurus. A complete mathematical model is developed which provides the output of the sensor as a function of the solution pH (input to the sensor), and the design parameters of the capacitive divider circuit and the UTBB FDSOI transistor. In that case, consistent results have been obtained from the modeling and simulation works, with an expected sensitivity of 780 mV/pH corresponding to a sensing film having Nernst response. The modeling and simulation of the proposed sensor was further validated by a proof of concept extended gate pH sensor fabrication and characterization. These sensors were developed by a separated processing of just the pH sensing component, which is electrically connected to the transistor only during characterization of the sensor. This provides faster and simpler realization of the sensor without the need for masks and patterning by lithography. The extended gate sensors showed 475 mV/pH sensitivity which is superior to state of the art low power ISFETs. Finally, integration of the sensing functionality directly in the BEOL of the UTBB FDSOI devices was pursued. An experimental sensitivity of 730 mV/pH is obtained which is consistent with the mathematical model and the simulated response. This is more than 12-times higher than the Nernst limit, and superior to state of the art sensors. Sensors are also evaluated for stability, resolution, hysteresis, and drift in which excellent performances are demonstrated. A novel pH sensing architecture is also successfully demonstrated in which the detection is functionalized at the gate protection diode rather than the front gate of UTBB FDSOI devices. The abrupt current switching, as low as 9 mV/decade, has the potential to increase the fixed bias sensitivity to 6.6 decade/pH. We experimentally demonstrated a sensitivity of 1.25 decade/pH which is superior to the state of the art sensitivity

Study of Radiation Effects on 28nm UTBB FDSOI Technology

With the evolution of modern Complementary Metal-Oxide-Semiconductor (CMOS) technology, transistor feature size has been scaled down to nanometers. The scaling has resulted in tremendous advantages to the integrated circuits (ICs), such as higher speed, smaller circuit size, and lower operating voltage. However, it also creates some reliability concerns. In particular, small device dimensions and low operating voltages have caused nanoscale ICs to become highly sensitive to operational disturbances, such as signal coupling, supply and substrate noise, and single event effects (SEEs) caused by ionizing particles, like cosmic neutrons and alpha particles. SEEs found in ICs can introduce transient pulses in circuit nodes or data upsets in storage cells. In well-designed ICs, SEEs appear to be the most troublesome in a space environment or at high altitudes in terrestrial environment. Techniques from the manufacturing process level up to the system design level have been developed to mitigate radiation effects. Among them, silicon-on-insulator (SOI) technologies have proven to be an effective approach to reduce single-event effects in ICs. So far, 28nm ultra-thin body and buried oxide (UTBB) Fully Depleted SOI (FDSOI) by STMicroelectronics is one of the most advanced SOI technologies in commercial applications. Its resilience to radiation effects has not been fully explored and it is of prevalent interest in the radiation effects community. Therefore, two test chips, namely ST1 and AR0, were designed and tested to study SEEs in logic circuits fabricated with this technology. The ST1 test chip was designed to evaluate SET pulse widths in logic gates. Three kinds of the on-chip pulse-width measurement detectors, namely the Vernier detector, the Pulse Capture detector and the Pulse Filter detector, were implemented in the ST1 chip. Moreover, a Circuit for Radiation Effects Self-Test (CREST) chain with combinational logic was designed to study both SET and SEU effects. The ST1 chip was tested using a heavy ion irradiation beam source in Radiation Effects Facility (RADEF), Finland. The experiment results showed that the cross-section of the 28nm UTBB-FDSOI technology is two orders lower than its bulk competitors. Laser tests were also applied to this chip to research the pulse distortion effects and the relationship between SET, SEU and the clock frequency. Total Ionizing Dose experiments were carried out at the University of Saskatchewan and European Space Agency with Co-60 gammacell radiation sources. The test results showed the devices implemented in the 28nm UTBB-FDSOI technology can maintain its functionality up to 1 Mrad(Si). In the AR0 chip, we designed five ARM Cortex-M0 cores with different logic protection levels to investigate the performance of approximate logic protecting methods. There are three custom-designed SRAM blocks in the test chip, which can also be used to measure the SEU rate. From the simulation result, we concluded that the approximate logic methodology can protect the digital logic efficiently. This research comprehensively evaluates the radiation effects in the 28nm UTBB-FDSOI technology, which provides the baseline for later radiation-hardened system designs in this technology

Etude de la variabilité en technologie FDSOI : du transistor aux cellules mémoires SRAM

The scaling of bulk MOSFETs transistors is facing various difficulties at the nanometer era. The variability of the electrical characteristics becomes a major challenge which increases as the device dimensions are scaled down. Fully-Depleted Silicon On Insulator (FDSOI) technology, developed as an alternative to bulk transistors, exhibits a better electrostatic immunity which enables higher performances. Moreover, the reduction of the Random Dopant Fluctuation allows excellent variability immunity for the FDSOI technology due to its undoped channel. It leads to a yield enhancement and a reduction of the minimum supply voltage of SRAM circuits. The variability has been analyzed deeply during this thesis in this technology, both on the threshold voltage (VT) and on the ON-state current (ISAT). The correlation between the electrical characteristics of MOSFETs devices (i.e., the threshold voltage and the standard deviation σVT) and SRAM cells (i.e., the SNM and σSNM) has been investigated thanks to an extensive experimental study and modeling. This purpose of this thesis is also to analyze the specific FDSOI variability source: silicon thickness fluctuations. An analytical model has been developed in order to quantify the impact of local TSi variations on the VT variability for 28 and 20nm technology nodes, as well as on a 200Mb SRAM array. This model also enables to evaluate the silicon thickness mean (µTsi) and standard deviation (σTsi) specifications for next technology nodes.La miniaturisation des transistors MOSFETs sur silicium massif présente de nombreux enjeux en raison de l'apparition de phénomènes parasites. Notamment, la réduction de la surface des dispositifs entraîne une dégradation de la variabilité de leurs caractéristiques électriques. La technologie planaire totalement désertée, appelée communément FDSOI (pour Fully Depleted Silicon on Insulator), permet d'améliorer le contrôle électrostatique de la grille sur le canal de conduction et par conséquent d'optimiser les performances. De plus, de par la présence d'un canal non dopé, il est possible de réduire efficacement la variabilité de la tension de seuil des transistors. Cela se traduit par un meilleur rendement et par une diminution de la tension minimale d'alimentation des circuits SRAM (pour Static Random Access Memory). Une étude détaillée de la variabilité intrinsèque à cette technologie a été réalisée durant ce travail de recherche, aussi bien sur la tension de seuil (VT) que sur le courant de drain à l'état passant (ISAT). De plus, le lien existant entre la fluctuation des caractéristiques électriques des transistors et des circuits SRAM a été expérimentalement analysé en détail. Une large partie de cette thèse est enfin dédiée à l'investigation de la source de variabilité spécifique à la technologie FDSOI : les fluctuations de l'épaisseur du film de silicium. Un modèle analytique a été développé durant cette thèse afin d'étudier l'influence des fluctuations locales de TSi sur la variabilité de la tension de seuil des transistors pour les nœuds technologiques 28 et 20nm, ainsi que sur un circuit SRAM de 200Mb. Ce modèle a également pour but de fournir des spécifications en termes d'uniformité σTsi et d'épaisseur moyenne µTsi du film de silicium pour les prochains nœuds technologiques

Reliability Investigations of MOSFETs using RF Small Signal Characterization

Modern technology needs and advancements have introduced various new concepts such as Internet-of-Things, electric automotive, and Artificial intelligence. This implies an increased activity in the electronics domain of analog and high frequency. Silicon devices have emerged as a cost-effective solution for such diverse applications. As these silicon devices are pushed towards higher performance, there is a continuous need to improve fabrication, power efficiency, variability, and reliability. Often, a direct trade-off of higher performance is observed in the reliability of semiconductor devices. The acceleration-based methodologies used for reliability assessment are the adequate time-saving solution for the lifetime's extrapolation but come with uncertainty in accuracy. Thus, the efforts to improve the accuracy of reliability characterization methodologies run in parallel. This study highlights two goals that can be achieved by incorporating high-frequency characterization into the reliability characteristics. The first one is assessing high-frequency performance throughout the device's lifetime to facilitate an accurate description of device/circuit functionality for high-frequency applications. Secondly, to explore the potential of high-frequency characterization as the means of scanning reliability effects within devices. S-parameters served as the high-frequency device's response and mapped onto a small-signal model to analyze different components of a fully depleted silicon-on-insulator MOSFET. The studied devices are subjected to two important DC stress patterns, i.e., Bias temperature instability stress and hot carrier stress. The hot carrier stress, which inherently suffers from the self-heating effect, resulted in the transistor's geometry-dependent magnitudes of hot carrier degradation. It is shown that the incorporation of the thermal resistance model is mandatory for the investigation of hot carrier degradation. The property of direct translation of small-signal parameter degradation to DC parameter degradation is used to develop a new S-parameter based bias temperature instability characterization methodology. The changes in gate-related small-signal capacitances after hot carrier stress reveals a distinct signature due to local change of flat-band voltage. The measured effects of gate-related small-signal capacitances post-stress are validated through transient physics-based simulations in Sentaurus TCAD.:Abstract Symbols Acronyms 1 Introduction 2 Fundamentals 2.1 MOSFETs Scaling Trends and Challenges 2.1.1 Silicon on Insulator Technology 2.1.2 FDSOI Technology 2.2 Reliability of Semiconductor Devices 2.3 RF Reliability 2.4 MOSFET Degradation Mechanisms 2.4.1 Hot Carrier Degradation 2.4.2 Bias Temperature Instability 2.5 Self-heating 3 RF Characterization of fully-depleted Silicon on Insulator devices 3.1 Scattering Parameters 3.2 S-parameters Measurement Flow 3.2.1 Calibration 3.2.2 De-embedding 3.3 Small-Signal Model 3.3.1 Model Parameters Extraction 3.3.2 Transistor Figures of Merit 3.4 Characterization Results 4 Self-heating assessment in Multi-finger Devices 4.1 Self-heating Characterization Methodology 4.1.1 Output Conductance Frequency dependence 4.1.2 Temperature dependence of Drain Current 4.2 Thermal Resistance Behavior 4.2.1 Thermal Resistance Scaling with number of fingers 4.2.2 Thermal Resistance Scaling with finger spacing 4.2.3 Thermal Resistance Scaling with GateWidth 4.2.4 Thermal Resistance Scaling with Gate length 4.3 Thermal Resistance Model 4.4 Design for Thermal Resistance Optimization 5 Bias Temperature Instability Investigation 5.1 Impact of Bias Temperature Instability stress on Device Metrics 5.1.1 Experimental Details 5.1.2 DC Parameters Drift 5.1.3 RF Small-Signal Parameters Drift 5.2 S-parameter based on-the-fly Bias Temperature Instability Characterization Method 5.2.1 Measurement Methodology 5.2.2 Results and Discussion 6 Investigation of Hot-carrier Degradation 6.1 Impact of Hot-carrier stress on Device performance 6.1.1 DC Metrics Degradation 6.1.2 Impact on small-signal Parameters 6.2 Implications of Self-heating on Hot-carrier Degradation in n-MOSFETs 6.2.1 Inclusion of Thermal resistance in Hot-carrier Degradation modeling 6.2.2 Convolution of Bias Temperature Instability component in Hot-carrier Degradation 6.2.3 Effect of Source and Drain Placement in Multi-finger Layout 6.3 Vth turn-around effect in p-MOSFET 7 Deconvolution of Hot-carrier Degradation and Bias Temperature Instability using Scattering parameters 7.1 Small-Signal Parameter Signatures for Hot-carrier Degradation and Bias Temperature Instability 7.2 TCAD Dynamic Simulation of Defects 7.2.1 Fixed Charges 7.2.2 Interface Traps near Gate 7.2.3 Interface Traps near Spacer Region 7.2.4 Combination of Traps 7.2.5 Drain Series Resistance effect 7.2.6 DVth Correction 7.3 Empirical Modeling based deconvolution of Hot-carrier Degradation 8 Conclusion and Recommendations 8.1 General Conclusions 8.2 Recommendations for Future Work A Directly measured S-parameters and extracted Y-parameters B Device Dimensions for Thermal Resistance Modeling C Frequency response of hot-carrier degradation (HCD) D Localization Effect of Interface Traps Bibliograph

Low energy digital circuits in advanced nanometer technologies

The demand for portable devices and the continuing trend towards the Internet ofThings (IoT) have made of energy consumption one of the main concerns in the industry and researchers. The most efficient way of reducing the energy consump-tion of digital circuits is decreasing the supply voltage (Vdd) since the dynamicenergy quadratically depends onVdd. Several works have shown that an optimumsupply voltage exists that minimizes the energy consumption of digital circuits. This optimum supply voltage is usually around 200 mV and 400 mV dependingon the circuit and technology used. To obtain these low supply voltages, on-chipdc-dc converters with high efficiency are needed.This thesis focuses on the study of subthreshold digital systems in advancednanometer technologies. These systems usually can be divided into a Power Man-agement Unit (PMU) and a digital circuit operating at the subthreshold regime.In particular, while considering the PMU, one of the key circuits is the dc-dcconverter. This block converts the voltage from the power source (battery, supercapacitor or wireless power transfer link) to a voltage between 200 mV and 400mV in order to power the digital circuit. In this thesis, we developed two chargerecycling techniques in order to improve the efficiency of switched capacitors dc-dcconverters. The first one is based on a technique used in adiabatic circuits calledstepwise charging. This technique was used in circuits and applications wherethe switching consumption of a big capacitance is very important. We analyzedthe possibility of using this technique in switched capacitor dc-dc converters withintegrated capacitors. We showed through measurements that a 29% reductionin the gate drive losses can be obtained with this technique. The second one isa simplification of stepwise charging which can be applied in some architecturesof switched capacitors dc-dc converters. We also fabricated and tested a dc-dcconverter with this technique and obtained a 25% energy reduction in the drivingof the switches that implement the converter.Furthermore, we studied the digital circuit working in the subthreshold regime,in particular, operating at the minimum energy point. We studied different modelsfor circuits working in these conditions and improved them by considering thedifferences between the NMOS and PMOS transistors. We obtained an optimumNMOS/PMOS leakage current imbalance that minimizes the total leakage energy per operation. This optimum depends on the architecture of the digital circuitand the input data. However, we also showed that important energy reductionscan be obtained by operating at a mean optimum imbalance. We proposed two techniques to achieve the optimum imbalance. We used aFully Depleted Silicon on Insulator (FD-SOI) 28 nm technology for most of the simulations, but we also show that these techniques can be applied in traditionalbulk CMOS technologies. The first one consists in using the back plane voltage of the transistors (or bulk voltage in traditional CMOS) to adjust independently theleakage current of the NMOS and PMOS transistor to work under the optimum NMOS/PMOS leakage current imbalance. We called this approach the OptimumBack Plane Biasing (OBB). A second technique consists of using the length of the transistors to adjust this leakage current imbalance. In the subthreshold regimeand in advanced nanometer technologies a moderate increase in the length has little impact in the output capacitance of the gates and thus in the dynamic energy.We called this approach an Asymmetric Length Biasing (ALB). Finally, we use these techniques in some basic circuits such as adders. We show that around 50% energy reduction can be obtained, in a wide range of frequency while working near the minimum energy point and using these techniques. The main contributions of this thesis are: • Analysis of the stepwise charging technique in small capacitances. •Implementation of stepwise charging technique as a charge recycling tech-nique for efficiency improvement in switched capacitor dc-dc converters. • Development of a charge sharing technique for efficiency improvement inswitched capacitor dc-dc converters. • Analysis of minimum operating voltage of digital circuits due to intrinsicnoise and the impact of technology scaling in this minimum. • Improvement in the modeling of the minimum energy point while considering NMOS and PMOS transistors difference. • Demonstration of the existence of an optimum leakage current imbalance be-tween the NMOS and PMOS transistors that minimizes energy consumptionin the subthreshold regiion. • Development of a back plane (bulk) voltage strategy for working in this optimum.• Development of a sizing strategy for working in the aforementioned optimum. • Analysis of the impact of architecture and input data on the optimum im-balance. The thesis is based on the publications [1–8]. During the Ph.D. program, other publications were generated [9–16] that are partially related with the thesis butwere not included in it.La constante demanda de dispositivos portables y los avances hacia la Internet de las Cosas han hecho del consumo de energía uno de los mayores desafíos y preocupación en la industria y la academia. La forma más eficiente de reducir el consumo de energía de los circuitos digitales es reduciendo su voltaje de alimentación ya que la energía dinámica depende de manera cuadrática con dicho voltaje. Varios trabajos demostraron que existe un voltaje de alimentación óptimo, que minimiza la energía consumida para realizar cierta operación en un circuito digital, llamado punto de mínima energía. Este óptimo voltaje se encuentra usualmente entre 200 mV y 400 mV dependiendo del circuito y de la tecnología utilizada. Para obtener estos voltajes de alimentación de la fuente de energía, se necesitan conversores dc-dc integrados con alta eficiencia. Esta tesis se concentra en el estudio de sistemas digitales trabajando en la región sub umbral diseñados en tecnologías nanométricas avanzadas (28 nm). Estos sistemas se pueden dividir usualmente en dos bloques, uno llamado bloque de manejo de potencia, y el segundo, el circuito digital operando en la region sub umbral. En particular, en lo que corresponde al bloque de manejo de potencia, el circuito más crítico es en general el conversor dc-dc. Este circuito convierte el voltaje de una batería (o super capacitor o enlace de transferencia inalámbrica de energía o unidad de cosechado de energía) en un voltaje entre 200 mV y 400 mV para alimentar el circuito digital en su voltaje óptimo. En esta tesis desarrollamos dos técnicas que, mediante el reciclado de carga, mejoran la eficiencia de los conversores dc-dc a capacitores conmutados. La primera es basada en una técnica utilizada en circuitos adiabáticos que se llama carga gradual o a pasos. Esta técnica se ha utilizado en circuitos y aplicaciones en donde el consumo por la carga y descarga de una capacidad grande es dominante. Nosotros analizamos la posibilidad de utilizar esta técnica en conversores dc-dc a capacitores conmutados con capacitores integrados. Se demostró a través de medidas que se puede reducir en un 29% el consumo debido al encendido y apagado de las llaves que implementan el conversor dc-dc. La segunda técnica, es una simplificación de la primera, la cual puede ser aplicada en ciertas arquitecturas de conversores dc-dc a capacitores conmutados. También se fabricó y midió un conversor con esta técnica y se obtuvo una reducción del 25% en la energía consumida por el manejo de las llaves del conversor. Por otro lado, estudiamos los circuitos digitales operando en la región sub umbral y en particular cerca del punto de mínima energía. Estudiamos diferentes modelos para circuitos operando en estas condiciones y los mejoramos considerando las diferencias entre los transistores NMOS y PMOS. Mediante este modelo demostramos que existe un óptimo en la relación entre las corrientes de fuga de ambos transistores que minimiza la energía de fuga consumida por operación. Este óptimo depende de la arquitectura del circuito digital y ademas de los datos de entrada del circuito. Sin embargo, demostramos que se puede reducir el consumo de manera considerable al operar en un óptimo promedio. Propusimos dos técnicas para alcanzar la relación óptima. Utilizamos una tecnología FD-SOI de 28nm para la mayoría de las simulaciones, pero también mostramos que estas técnicas pueden ser utilizadas en tecnologías bulk convencionales. La primer técnica, consiste en utilizar el voltaje de la puerta trasera (o sustrato en CMOS convencional) para ajustar de manera independiente las corrientes del NMOS y PMOS para que el circuito trabaje en el óptimo de la relación de corrientes. Esta técnica la llamamos polarización de voltaje de puerta trasera óptimo. La segunda técnica, consiste en utilizar los largos de los transistores para ajustar las corrientes de fugas de cada transistor y obtener la relación óptima. Trabajando en la región sub umbral y en tecnologías avanzadas, incrementar moderadamente el largo del transistor tiene poco impacto en la energía dinámica y es por eso que se puede utilizar. Finalmente, utilizamos estas técnicas en circuitos básicos como sumadores y mostramos que se puede obtener una reducción de la energía consumida de aproximadamente 50%, en un amplio rango de frecuencias, mientras estos circuitos trabajan cerca del punto de energía mínima. Las principales contribuciones de la tesis son: • Análisis de la técnica de carga gradual o a pasos en capacidades pequeñas. • Implementación de la técnica de carga gradual para la mejora de eficiencia de conversores dc-dc a capacitores conmutados. • Simplificación de la técnica de carga gradual para mejora de la eficiencia en algunas arquitecturas de conversores dc-dc de capacitores conmutados. • Análisis del mínimo voltaje de operación en circuitos digitales debido al ruido intrínseco del dispositivo y el impacto del escalado de las tecnologías en el mismo. • Mejoras en el modelado del punto de energía mínima de operación de un circuito digital en el cual se consideran las diferencias entre el transistor PMOS y NMOS. • Demostración de la existencia de un óptimo en la relación entre las corrientes de fuga entre el NMOS y PMOS que minimiza la energía de fugas consumida en la región sub umbral. • Desarrollo de una estrategia de polarización del voltaje de puerta trasera para que el circuito digital trabaje en el óptimo antes mencionado. • Desarrollo de una estrategia para el dimensionado de los transistores que componen las compuertas digitales que permite al circuito digital operar en el óptimo antes mencionado. • Análisis del impacto de la arquitectura del circuito y de los datos de entrada del mismo en el óptimo antes mencionado

Strain integration and performance optimization in sub-20nm FDSOI CMOS technology

La technologie CMOS à base de Silicium complètement déserté sur isolant (FDSOI) est considérée comme une option privilégiée pour les applications à faible consommation telles que les applications mobiles ou les objets connectés. Elle doit cela à son architecture garantissant un excellent comportement électrostatique des transistors ainsi qu'à l'intégration de canaux contraints améliorant la mobilité des porteurs. Ce travail de thèse explore des solutions innovantes en FDSOI pour nœuds 20nm et en deçà, comprenant l'ingénierie de la contrainte mécanique à travers des études sur les matériaux, les dispositifs, les procédés d'intégration et les dessins des circuits. Des simulations mécaniques, caractérisations physiques (µRaman), et intégrations expérimentales de canaux contraints (sSOI, SiGe) ou de procédés générant de la contrainte (nitrure, fluage de l'oxyde enterré) nous permettent d'apporter des recommandations pour la technologie et le dessin physique des transistors en FDSOI. Dans ce travail de thèse, nous avons étudié le transport dans les dispositifs à canal court, ce qui nous a amené à proposer une méthode originale pour extraire simultanément la mobilité des porteurs et la résistance d'accès. Nous mettons ainsi en évidence la sensibilité de la résistance d'accès à la contrainte que ce soit pour des transistors FDSOI ou nanofils. Nous mettons en évidence et modélisons la relaxation de la contrainte dans le SiGe apparaissant lors de la gravure des motifs et causant des effets géométriques (LLE) dans les technologies FDSOI avancées. Nous proposons des solutions de type dessin ainsi que des solutions technologiques afin d'améliorer la performance des cellules standard digitales et de mémoire vive statique (SRAM). En particulier, nous démontrons l'efficacité d'une isolation duale pour la gestion de la contrainte et l'extension de la capacité de polarisation arrière, qui un atout majeur de la technologie FDSOI. Enfin, la technologie 3D séquentielle rend possible la polarisation arrière en régime dynamique, à travers une co-optimisation dessin/technologie (DTCO).The Ultra-Thin Body and Buried oxide Fully Depleted Silicon On Insulator (UTBB FDSOI) CMOS technology has been demonstrated to be highly efficient for low power and low leakage applications such as mobile, internet of things or wearable. This is mainly due to the excellent electrostatics in the transistor and the successful integration of strained channel as a carrier mobility booster. This work explores scaling solutions of FDSOI for sub-20nm nodes, including innovative strain engineering, relying on material, device, process integration and circuit design layout studies. Thanks to mechanical simulations, physical characterizations and experimental integration of strained channels (sSOI, SiGe) and local stressors (nitride, oxide creeping, SiGe source/drain) into FDSOI CMOS transistors, we provide guidelines for technology and physical circuit design. In this PhD, we have in-depth studied the carrier transport in short devices, leading us to propose an original method to extract simultaneously the carrier mobility and the access resistance and to clearly evidence and extract the strain sensitivity of the access resistance, not only in FDSOI but also in strained nanowire transistors. Most of all, we evidence and model the patterning-induced SiGe strain relaxation, which is responsible for electrical Local Layout Effects (LLE) in advanced FDSOI transistors. Taking into account these geometrical effects observed at the nano-scale, we propose design and technology solutions to enhance Static Random Access Memory (SRAM) and digital standard cells performance and especially an original dual active isolation integration. Such a solution is not only stress-friendly but can also extend the powerful back-bias capability, which is a key differentiating feature of FDSOI. Eventually the 3D monolithic integration can also leverage planar Fully-Depleted devices by enabling dynamic back-bias owing to a Design/Technology Co-Optimization

FDSOI Design using Automated Standard-Cell-Grained Body Biasing

With the introduction of FDSOI processes at competitive technology nodes, body biasing on an unprecedented scale was made possible. Body biasing influences one of the central transistor characteristics, the threshold voltage. By being able to heighten or lower threshold voltage by more than 100mV, the very physics of transistor switching can be manipulated at run time. Furthermore, as body biasing does not lead to different signal levels, it can be applied much more fine-grained than, e.g., DVFS. With the state of the art mainly focused on combinations of body biasing with DVFS, it has thus ignored granularities unfeasible for DVFS. This thesis fills this gap by proposing body bias domain partitioning techniques and for body bias domain partitionings thereby generated, algorithms that search for body bias assignments. Several different granularities ranging from entire cores to small groups of standard cells were examined using two principal approaches: Designer aided pre-partitioning based determination of body bias domains and a first-time, fully automatized, netlist based approach called domain candidate exploration. Both approaches operate along the lines of activation and timing of standard cell groups. These approaches were evaluated using the example of a Dynamically Reconfigurable Processor (DRP), a highly efficient category of reconfigurable architectures which consists of an array of processing elements and thus offers many opportunities for generalization towards many-core architectures. Finally, the proposed methods were validated by manufacturing a test-chip. Extensive simulation runs as well as the test-chip evaluation showed the validity of the proposed methods and indicated substantial improvements in energy efficiency compared to the state of the art. These improvements were accomplished by the fine-grained partitioning of the DRP design. This method allowed reducing dynamic power through supply voltage levels yielding higher clock frequencies using forward body biasing, while simultaneously reducing static power consumption in unused parts.Die Einführung von FDSOI Prozessen in gegenwärtigen Prozessgrößen ermöglichte die Nutzung von Substratvorspannung in nie zuvor dagewesenem Umfang. Substratvorspannung beeinflusst unter anderem eine zentrale Eigenschaft von Transistoren, die Schwellspannung. Mittels Substratvorspannung kann diese um mehr als 100mV erhöht oder gesenkt werden, was es ermöglicht, die schiere Physik des Schaltvorgangs zu manipulieren. Da weiterhin hiervon der Signalpegel der digitalen Signale unberührt bleibt, kann diese Technik auch in feineren Granularitäten angewendet werden, als z.B. Dynamische Spannungs- und Frequenz Anpassung (Engl. Dynamic Voltage and Frequency Scaling, Abk. DVFS). Da jedoch der Stand der Technik Substratvorspannung hauptsächlich in Kombinationen mit DVFS anwendet, werden feinere Granularitäten, welche für DVFS nicht mehr wirtschaftlich realisierbar sind, nicht berücksichtigt. Die vorliegende Arbeit schließt diese Lücke, indem sie Partitionierungsalgorithmen zur Unterteilung eines Entwurfs in Substratvorspannungsdomänen vorschlägt und für diese hierdurch unterteilten Domänen entsprechende Substratvorspannungen berechnet. Hierzu wurden verschiedene Granularitäten berücksichtigt, von ganzen Prozessorkernen bis hin zu kleinen Gruppen von Standardzellen. Diese Entwürfe wurden dann mit zwei verschiedenen Herangehensweisen unterteilt: Chipdesigner unterstützte, vorpartitionierungsbasierte Bestimmung von Substratvorspannungsdomänen, sowie ein erstmals vollautomatisierter, Netzlisten basierter Ansatz, in dieser Arbeit Domänen Kandidaten Exploration genannt. Beide Ansätze funktionieren nach dem Prinzip der Aktivierung, d.h. zu welchem Zeitpunkt welcher Teil des Entwurfs aktiv ist, sowie der Signallaufzeit durch die entsprechenden Entwurfsteile. Diese Ansätze wurden anhand des Beispiels Dynamisch Rekonfigurierbarer Prozessoren (DRP) evaluiert. DRPs stellen eine Klasse hocheffizienter rekonfigurierbarer Architekturen dar, welche hauptsächlich aus einem Feld von Rechenelementen besteht und dadurch auch zahlreiche Möglichkeiten zur Verallgemeinerung hinsichtlich Many-Core Architekturen zulässt. Schließlich wurden die vorgeschlagenen Methoden in einem Testchip validiert. Alle ermittelten Ergebnisse zeigen im Vergleich zum Stand der Technik drastische Verbesserungen der Energieeffizienz, welche durch die feingranulare Unterteilung in Substratvorspannungsdomänen erzielt wurde. Hierdurch konnten durch die Anwendung von Substratvorspannung höhere Taktfrequenzen bei gleicher Versorgungsspannung erzielt werden, während zeitgleich in zeitlich unkritischen oder ungenutzten Entwurfsteilen die statische Leistungsaufnahme minimiert wurde

Low Temperature Characterization and Modeling of FDSOI Transistors for Cryo CMOS Applications

The wide range of cryogenic applications, such as spatial, high performance computing or high-energy physics, has boosted the investigation of CMOS technology performance down to cryogenic temperatures. In particular, the readout electronics of quantum computers operating at low temperature requires larger bandwidth than spatial applications, so that advanced CMOS node has to be considered. FDSOI technology appears as a valuable solution for co-integration between qubits and consistent engineering of control and read-out. However, there is still lack of reports on literature concerning advanced CMOS nodes behavior at deep cryogenic operation, from devices electrostatics to mismatch and self-heating, all requested for the development of robust design tools. For these reasons, this chapter presents a review of electrical characterization and modeling results recently obtained on ultra-thin film FDSOI MOSFETs down to 4.2 K