143 research outputs found

    Roadmapping the Next Generation of Silicon Photonics

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    Silicon photonics has developed into a mainstream technology driven by advances in optical communications. The current generation has led to a proliferation of integrated photonic devices from thousands to millions - mainly in the form of communication transceivers for data centers. Products in many exciting applications, such as sensing and computing, are around the corner. What will it take to increase the proliferation of silicon photonics from millions to billions of units shipped? What will the next generation of silicon photonics look like? What are the common threads in the integration and fabrication bottlenecks that silicon photonic applications face, and which emerging technologies can solve them? This perspective article is an attempt to answer such questions. We chart the generational trends in silicon photonics technology, drawing parallels from the generational definitions of CMOS technology. We identify the crucial challenges that must be solved to make giant strides in CMOS-foundry-compatible devices, circuits, integration, and packaging. We identify challenges critical to the next generation of systems and applications - in communication, signal processing, and sensing. By identifying and summarizing such challenges and opportunities, we aim to stimulate further research on devices, circuits, and systems for the silicon photonics ecosystem

    Heterogeneous integration of InP etched facet lasers to silicon photonics by micro transfer printing

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    Photonics Integrated Circuits allow optical functionalities and interconnects with small footprint, large band -width and -density, low heat generation. The silicon photonics platform (SOI) offers excellent waveguiding properties, large-area wafers and a highly developed CMOS infrastructure matured with electronics. Nevertheless, the key function of light amplification is missing due to the indirect band-gap of silicon. The light has to be provided to the SOI from a separate direct band-gap III-V material. InP based devices work in the infrared optical window of the electromagnetic spectrum and can be heterogeneously integrated to the SOI. This research deals with the development of the first stand-alone InP Fabry-Perot lasers heterogeneously integrated to SOI by Micro Transfer Printing (ĀµTP). The lasers are pre-fabricated and tested before transfer and are optimized to reach excellent optical, electrical and thermal performance. Lasers printed on Si substrates emit over 20 mW optical power, have threshold current of 16 mA and series resistance of 6 ā„¦; the thermal impedance of 38 K/W is half of that for the same laser printed directly on the SOI. The transfer printable InP ridge lasers have been designed as rectangular coupons with both contacts at the top and etched facets at the sidewalls. Two main release technologies based on the FeCl3:H2O (1:2) solution and a InGaAs or a InAlAs sacrificial layer were developed for releasing the devices from the original InP substrate with selectivity to InP greater than 4000 at 1 ā—¦C. The working principle of a polymer anchor system which restrains the devices to the substrate during the undercut were determined. The devices were printed on different silicon photonic substrates with excellent adhesion, with and without adhesive layers. A process for creating recesses into the SOI was developed to allow edge coupling the laser waveguide to the SOI or a polymer waveguide. High alignment accuracy along the three spatial directions can be achieved with alignment markers, reference walls and the interposition of a metal layer beneath the devices. This work shows a possible path for the achievement of a laser source for silicon photonics and it has been the basis for the integration of others InP devices to PICs by micro transfer printing

    III-V Microdisk lasers on silicon-on-insulator : fabrication optimizations and novel applications

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    Photonic platform and the impact of optical nonlinearity on communication devices

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    It is important to understand properties of different materials and the impact they have on devices used in communication networks. This paper is an overview of optical nonlinearities in Silicon and Gallium Nitride and how these nonlinearities can be used in the realization of optical ultra-fast devices targeting the next generation integrated optics. Research results related to optical lasing, optical switching, data modulation, optical signal amplification and photo-detection using Gallium Nitride devices based on waveguides are examined. Attention is also paid to hybrid and monolithic integration approaches towards the development of advanced photonic chips

    Thin-film Lithium Niobate Photonics for Electro-optics, Nonlinear Optics, and Quantum Optics on Silicon

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    Ion-sliced thin-film lithium niobate (LN) compact waveguide technology has facilitated the resurgence of integrated photonics based on lithium niobate. These thin-film LN waveguides offer over an order of magnitude improvement in optical confinement, and about two orders of magnitude reduction in waveguide bending radius, compared to conventional LN waveguides. Harnessing the improved confinement, a variety of miniaturized and efficient photonic devices are demonstrated in this work. First, two types of compact electrooptic modulators are presented ā€“ microring modulators, and Mach-Zehnder modulators. Next, two distinct approaches to nonlinear optical frequency converters are implemented ā€“ periodically poled lithium niobate, and mode shape modulation (grating assisted quasi-phase matching). Following this, stochastic variations are added to the mode shape modulation approach to demonstrate random quasi-phase matching. Afterward, broadband photon-pair generation is demonstrated in the miniaturized periodically poled lithium niobate, and spectral correlations of the biphoton spectrum are reported. Finally, extensions of the aforementioned results suitable for future work are discussed

    Infrared Photodetectors based on InSb and InAs Nanostructures via Heterogeneous Integration-Rapid Melt Growth and Template Assisted Selective Epitaxy

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    Monolithic heterogeneous integration of III-V semiconductors with the contemporary Si Complementary Metal Oxide Semiconductor (CMOS) technology has instigated a wide range of possibilities and functionalities in the semiconductor industry, in the field of digitalcircuits, optical sensors, light emitters, and high-frequency communication devices. However, the integration of III-V semiconductorsis not trivial due to the differences in lattice parameters, polarity, and thermal expansion coefficient. This thesis explores two integrationtechniques to form III-V nanostructures with potential applications in the infrared detection field.The first technique implemented in this thesis work is the Rapid Melt Growth technique. InSb, which has a large lattice mismatch(19%) to Si, is used to demonstrate the RMG integration technique. A flash lamp with a millisecond annealing technique is utilized tomelt and recrystallize amorphous InSb material to form a single crystalline material. The development of the fabrication process andthe experimental results for obtaining a single crystalline InSb-on-insulator from a Si seed area through the RMG process are presented.Electron Back Scatter Diffraction (EBSD) technique was employed to understand the crystal quality, orientation, and defects in theRMG InSb nanostructures. The InSb nanostructures have a resistivity of 10 mĪ© cm, similar to the VLS-grown InSb nanowires.Mobility ranging from 3490 - 877 cm2/ V sec was extracted through Hall and Van der Pauw measurements. Finally, we report the firstmonolithic integrated InSb nanostructure photodetector on Si through the RMG process. Detailed optical and electrical characterizationof the device, including the spectrally resolved photocurrent and the temperature-dependent dark current, is studied. The thesis presentsan InSb photodetector with a stable photodetector with a responsivity of 0.5 A/W at 16 nW illumination and millisecond time response.The second integration technique implemented in this thesis work is Template Assisted Selective Epitaxy. Here, the versatility ofTASE technique to integrate InAs nanowires on W metal seed is demonstrated. This technique enables the feasibility of integratingIII-V semiconductors to back -end of the line integration with Si CMOS technology. EBSD technique was utilized to study andobtain the statistics on the single crystalline InAs nanowires grown from different diameter templates. We also demonstrate thepossibility of achieving an nBn InAs detector using TASE on W approach. This technique is a promising step towards developinghigh operating temperature (HOT) monolithic integrated mid-infrared detectors. Thus, the results of this thesis provide theperspective into two viable CMOS-compatible III-V integration techniques that could be utilized for photodetector applications at areduced cost

    2022 Roadmap on integrated quantum photonics

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    AbstractIntegrated photonics will play a key role in quantum systems as they grow from few-qubit prototypes to tens of thousands of qubits. The underlying optical quantum technologies can only be realized through the integration of these components onto quantum photonic integrated circuits (QPICs) with accompanying electronics. In the last decade, remarkable advances in quantum photonic integration have enabled table-top experiments to be scaled down to prototype chips with improvements in efficiency, robustness, and key performance metrics. These advances have enabled integrated quantum photonic technologies combining up to 650 optical and electrical components onto a single chip that are capable of programmable quantum information processing, chip-to-chip networking, hybrid quantum system integration, and high-speed communications. In this roadmap article, we highlight the status, current and future challenges, and emerging technologies in several key research areas in integrated quantum photonics, including photonic platforms, quantum and classical light sources, quantum frequency conversion, integrated detectors, and applications in computing, communications, and sensing. With advances in materials, photonic design architectures, fabrication and integration processes, packaging, and testing and benchmarking, in the next decade we can expect a transition from single- and few-function prototypes to large-scale integration of multi-functional and reconfigurable devices that will have a transformative impact on quantum information science and engineering

    Scalable designs and methods for heterogeneous electronic-photonic integrated circuitry

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    A set of semiconductor designs shown to be capable of facilitating scalable and reconfigurable layouts for electronic-photonic integrated circuitry is presented. Three emphases are established to outline and discuss the methods and advantages of merging stand-alone optical components into integrated heterogeneous systems, specifically for implementing optical sensing, efficient laser wavelength tuning, and III-V-on-Si semiconductor fabrication techniques together on a single platform. Considerations regarding the optical geometries and power efficiency of each design are reiterated to assure that each design is compatible with the goals of system-level integration in either biochemical point-of-use or telecommunications applications. These three approaches to scalable photonic designs are then investigated in their ability to offer dynamic controls of optical signals and their novel usage of heterogeneous material patterning. The optical sensing platform directly integrates multiple linear variable filters (LVFs) atop a CMOS image sensor for electronic controls of detecting a biochemical fluorescent or absorptive optical signal signature, enabling good wavelength resolution (3.77āˆ’6.08 nm) over a wide-band detection spectrum. Detection limits of 0.28 nM for Quantum Dot emitters and 32 ng/mL for near-infrared fluorescent dyes are found in this integrated design, providing comparable results in the compact optical platform to conventional laboratory spectrometers. The instrument is then extended in its usage by testing on point-of-use detection tests via discerning the concentration of free-chlorine in water colorimetrically. The tunable laser cavity design integrates together a GaN waveguide into a standard InGaAsP telecom (1550 nm) edge-emitting laser atop silicon, allowing for wide-band tuning via the strong anisotropic effects solved for in wurtzite GaN. A tuning parameter based off a refractive index variation, Ī”, is found to be at |1.75āˆ™10Eāˆ’4|, based off the electro-optic effects in conjunction with an etched grating geometry designed directly into the coupled GaN waveguide, with the structure further extended into a Y-branch laser cavity to enable the Vernier effect for wideband tuning via mode-hopping. A separate GaN-based design, consisting of an RF signal modulator that launches a surface acoustic wave (SAW) into a cavity to produce a highly controllable refractive index variation, Ī”, via the photo-elastic and photo-elastic effects, is found to produce a large tuning parameter of |1.84āˆ™10Eāˆ’3|. These effects are then described in their application to dynamically controllable effects for dense wavelength division multiplexing (DWDM) and how the underlying electronic platform enables this, providing advantages over larger footprint or less efficient designs. The fabrication techniques designed provide a method to enable bonding of III-V epitaxial wafers onto a silicon carrier wafer for large-scale processing before final bonding onto CMOS. A processing recipe takes bulk GaAs epitaxial structures and constructs a method for reversibly bonding and processing them on a silicon carrier wafer as III-V islands, ready for final large scale flip-chip bonding onto aligning CMOS features. Additional findings discuss the merits of various etch processes and techniques such that they are compatible to the heterogeneous III-V-on-Si patterning as laid out. The methods optimized allow for simultaneous, heterogeneous development of system-level device integration such that further processing can place various III-V devices side-by-side and process geometries in unison. Processing steps and their results are presented. The extension of this method to different III-V alloys beyond GaAs entirely is therefore considered for even larger-scale system design across photonic elements. Each set of findings presents both the relevant photonic device characteristics and also a method on how to intersect these devices with a paired CMOS electronic system on silicon, so that a single unified electronic-photonic schematic can be made. Accompanying these conclusions is a range of experimental work ranging from simulation studies, to full-scale integrable sensing designs and their testing, to detailed cleanroom-based fabrication processes for designing the system of III-V-on-Si patterns. A final set of conclusions relates the three tracks of research as being part of a common path forward in scalable photonics designs. Forecasts are then made on how the field of electronic-photonic integration and its applications utilized herein may yet evolve and potentially encompass findings or methodologies from this work
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