Design of broadband CNFET LNA based on extracted I-V closed-form equation

© 2018 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes,creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.A procedure of extracting a closed-form user-friendly I-V equation for short channel carbon nanotube field-effect transistors (CNFET) in the saturation region is presented by employing a relation between CNFET parameters meeting the experimental results. The methodology is based on the Stanford model and ballistic relation of one channel CNFET. In this regard, the ballistic relation is simplified to a closed-form I-V equation, and then, the parameters are estimated through the fitting algorithm by means of ICCAP and least square (LS) method, respectively, and the obtained equation is verified by the experimental results given in the literature. Additionally, an extended quantitative noise analysis is performed at the circuit level and the noise sources implemented in Verilog-A are added to the Stanford CNFET HSPICE model. Subsequently, with the accordance to the extracted I-V equation, a CNFET-based inductor-less broadband common-gate low noise amplifier (LNA) is designed theoretically and its results are confirmed in HSPICE based on the Stanford CNFET model, indicating a proper matching between analysis and simulation. The proposed CNFET-based LNA provides very high frequency bandwidth and also lower noise figure in comparison with its contemporary CMOS-based LNA, without any passive spiral inductor.Peer ReviewedPostprint (author's final draft

HSPICE implementation of a numerically efficient model of CNT transistor

This paper presents the algorithms of an implementation of a numerically efficient carbon nanotube transistor (CNT) model in HSPICE. The model is derived from cubic spline non-linear approximation of the non-equilibrium mobile charge density. The spline algorithm exploits a rapid and accurate solution of the numerical relationship between the charge density and the self-consistent voltage, which results in the acceleration of deriving the current through the channel without losing much accuracy. The output I-V characteristics of the proposed model have been compared with those of a recent HSPICE implementation of the Stanford CNT model and published experimental I-V curves. The results show superior accuracy of the proposed model while maintaining similar CPU time performance. Two versions of the HSPICE macromodel implementation have been developed and validated, one to reflect ballistic transport only and another with non-ballistic effects. To further validate the model a complementary logic inverter has also been implemented using the proposed technique and simulated in HSPICE

Imperfection-Aware Design of CNFET Digital VLSI Circuits

Carbon nanotube field-effect transistor (CNFET) is one of the promising candidates as extensions to silicon CMOS devices. The CNFET, which is a 1-D structure with a near-ballistic transport capability, can potentially offer excellent device characteristics and order-of-magnitude better energy-delay product over standard CMOS devices. Significant challenges in CNT synthesis prevent CNFETs today from achieving such ideal benefits. CNT density variation and metallic CNTs are the dominant type of CNT variations/imperfections that cause performance variation, large static power consumption, and yield degradation. We present an imperfection-aware design technique for CNFET digital VLSI circuits by: 1) Analytical models that are developed to analyze and quantify the effects of CNT density variation on device characteristics, gate and system levels delays. The analytical models, which were validated by comparison to real experimental/simulation data, enables us to examine the space of CNFET combinational, sequential and memory cells circuits to minimize delay variations. Using these model, we drive CNFET processing and circuit design guidelines to manage/overcome CNT density variation. 2) Analytical models that are developed to analyze the effects of metallic CNTs on device characteristics, gate and system levels delay and power consumption. Using our presented analytical models, which are again validated by comparison with simulation data, it is shown that the static power dissipation is a more critical issue than the delay and the dynamic power of CNFET circuits in the presence of m-CNTs. 3) CNT density variation and metallic CNTs can result in functional failure of CNFET circuits. The complete and compact model for CNFET probability of failure that consider CNT density variation and m-CNTs is presented. This analytical model is applied to analyze the logical functional failures. The presented model is extended to predict opportunities and limitations of CNFET technology at todays Gigascale integration and beyond.\u2

Variability and reliability analysis of carbon nanotube technology in the presence of manufacturing imperfections

In 1925, Lilienfeld patented the basic principle of field effect transistor (FET). Thirty-four years later, Kahng and Atalla invented the MOSFET. Since that time, it has become the most widely used type of transistor in Integrated Circuits (ICs) and then the most important device in the electronics industry. Progress in the field for at least the last 40 years has followed an exponential behavior in accordance with Moore¿s Law. That is, in order to achieve higher densities and performance at lower power consumption, MOS devices have been scaled down. But this aggressive scaling down of the physical dimensions of MOSFETs has required the introduction of a wide variety of innovative factors to ensure that they could still be properly manufactured. Transistors have expe- rienced an amazing journey in the last 10 years starting with strained channel CMOS transistors at 90nm, carrying on the introduction of the high-k/metal-gate silicon CMOS transistors at 45nm until the use of the multiple-gate transistor architectures at 22nm and at recently achieved 14nm technology node. But, what technology will be able to produce sub-10nm transistors? Different novel materials and devices are being investigated. As an extension and enhancement to current MOSFETs some promising devices are n-type III-V and p-type Germanium FETs, Nanowire and Tunnel FETs, Graphene FETs and Carbon Nanotube FETs. Also, non-conventional FETs and other charge-based information carrier devices and alternative information processing devices are being studied. This thesis is focused on carbon nanotube technology as a possible option for sub-10nm transistors. In recent years, carbon nanotubes (CNTs) have been attracting considerable attention in the field of nanotechnology. They are considered to be a promising substitute for silicon channel because of their small size, unusual geometry (1D structure), and extraordinary electronic properties, including excellent carrier mobility and quasi-ballistic transport. In the same way, carbon nanotube field-effect transistors (CNFETs) could be potential substitutes for MOSFETs. Ideal CNFETs (meaning all CNTs in the transistor behave as semiconductors, have the same diameter and doping level, and are aligned and well-positioned) are predicted to be 5x faster than silicon CMOS, while consuming the same power. However, nowadays CNFETs are also affected by manufacturing variability, and several significant challenges must be overcome before these benefits can be achieved. Certain CNFET manufacturing imperfections, such as CNT diameter and doping variations, mispositioned and misaligned CNTs, high metal-CNT contact resistance, the presence of metallic CNTs (m-CNTs), and CNT density variations, can affect CNFET performance and reliability and must be addressed. The main objective of this thesis is to analyze the impact of the current CNFET manufacturing challenges on multi-channel CNFET performance from the point of view of variability and reliability and at different levels, device and circuit level. Assuming that CNFETs are not ideal or non-homogeneous because of today CNFET manufacturing imperfections, we propose a methodology of analysis that based on a CNFET ideal compact model is able to simulate heterogeneous or non-ideal CNFETs; that is, transistors with different number of tubes that have different diameters, are not uniformly spaced, have different source/drain doping levels, and, most importantly, are made up not only of semiconducting CNTs but also metallic ones. This method will allow us to analyze how CNT-specific variations affect CNFET device characteristics and parameters and CNFET digital circuit performance. Furthermore, we also derive a CNFET failure model and propose an alternative technique based on fault-tolerant architectures to deal with the presence of m-CNTs, one of the main causes of failure in CNFET circuits

Analysis of CNT Bundle and Its Comparison with Copper Interconnect for CMOS and CNFET Drivers

In nanoscale regime as the CMOS process technology continues to scale, the standard copper (Cu) interconnect will become a major hurdle for onchip communication due to high resistivity and electromigration. This paper presents the comprehensive evaluation of mixed CNT bundle interconnects and investigates their prospects as a low power high-speed interconnect for future nanoscale-integrated circuits. The performance of mixed CNT bundle interconnect is examined with carbon nanotube field effect transistor (CNFET) as a driver and compared with the traditional interconnect, that is, CMOS driver on Cu interconnect. All HSPICE simulations are carried out at operating frequency of 1 GHz and it is found that mixed CNT bundle interconnects with CNFET as the driver can potentially provide a substantial delay reduction over traditional interconnects implemented at 32 nm process technology. Similarly, the CNFET driver with mixed CNT bundle as interconnect is more energy efficient than the traditional interconnect at all supply voltages (VDD) from 0.9 V to 0.3 V

A Novel Ultra Low-Power 10T CNFET-Based Full Adder Cell Design in 32nm Technology

Nowadays, energy consumption is the main concern in portable electronic systems such as laptops, smart mobile phones, personal digital assistances (PDAs) and so forth. Considering that the 1-bit Full adder cell has been the determinant circuit due to its wide usage in these systems, it affects the entire performance of the electronic system. In this paper, a novel low-power and low-energy 10 transistor (10T) Full Adder cell using NAND/NOR functions based on carbon nanotube field effect transistors (CNFETs) is presented. The proposed cell showed superiority in terms of power-delay product (PDP) compared to the other cells under different simulation condition, such as power supply, temperature, load and operating frequency variations. Moreover, a Monte Carlo (MC) simulation was conducted to study the reliability of the proposed cell against manufacturing process variations (i.e. the variations of diameters of carbon nanotubes). Simulations confirmed the robustness of the proposed cell