Limits on Fundamental Limits to Computation

An indispensable part of our lives, computing has also become essential to industries and governments. Steady improvements in computer hardware have been supported by periodic doubling of transistor densities in integrated circuits over the last fifty years. Such Moore scaling now requires increasingly heroic efforts, stimulating research in alternative hardware and stirring controversy. To help evaluate emerging technologies and enrich our understanding of integrated-circuit scaling, we review fundamental limits to computation: in manufacturing, energy, physical space, design and verification effort, and algorithms. To outline what is achievable in principle and in practice, we recall how some limits were circumvented, compare loose and tight limits. We also point out that engineering difficulties encountered by emerging technologies may indicate yet-unknown limits.Comment: 15 pages, 4 figures, 1 tabl

Nano-Scaled Fet Device For Cmos Technology

In this work the 3-D structure of the Accumulation mode (ACM) and Enhance mode (ECM) FinFET was developed by the Taurus-Device Editor. The design of both ACM and ECM FinFET was optimized for high-performance IC applications to meet ITRS specification for Ioff current, for 9nm gate length. The design of ACM and ECM FinFET is optimized, analyzed and compared against each other with respect to Darin Induced Barrier Lower (DIBL), Sub-threshold Swing(SS), operation and performance characteristics with varying electrical and physical parameters Silicon thickness (Tsi), Source/Drain doping gradient (σsd), electrical channel length (Leff ), lacer spacer width (Lsp) and Source/Drain Contact Resistance (rsd). Finally, both designs were optimized for 9nm gate length for on current (Ion) to meet ITRS specifications for Ioff. The simulation solves and includes Poisson, drift-diffusion transport equation and 3D-Schrodinger equation self-consistently

Design, Modeling and Analysis of Non-classical Field Effect Transistors

Transistor scaling following per Moore\u27s Law slows down its pace when entering into nanometer regime where short channel effects (SCEs), including threshold voltage fluctuation, increased leakage current and mobility degradation, become pronounced in the traditional planar silicon MOSFET. In addition, as the demand of diversified functionalities rises, conventional silicon technologies cannot satisfy all non-digital applications requirements because of restrictions that stem from the fundamental material properties. Therefore, novel device materials and structures are desirable to fuel further evolution of semiconductor technologies. In this dissertation, I have proposed innovative device structures and addressed design considerations of those non-classical field effect transistors for digital, analog/RF and power applications with projected benefits. Considering device process difficulties and the dramatic fabrication cost, application-oriented device design and optimization are performed through device physics analysis and TCAD modeling methodology to develop design guidelines utilizing transistor\u27s improved characteristics toward application-specific circuit performance enhancement. Results support proposed device design methodologies that will allow development of novel transistors capable of overcoming limitation of planar nanoscale MOSFETs. In this work, both silicon and III-V compound devices are designed, optimized and characterized for digital and non-digital applications through calibrated 2-D and 3-D TCAD simulation. For digital functionalities, silicon and InGaAs MOSFETs have been investigated. Optimized 3-D silicon-on-insulator (SOI) and body-on-insulator (BOI) FinFETs are simulated to demonstrate their impact on the performance of volatile memory SRAM module with consideration of self-heating effects. Comprehensive simulation results suggest that the current drivability degradation due to increased device temperature is modest for both devices and corresponding digital circuits. However, SOI FinFET is recommended for the design of low voltage operation digital modules because of its faster AC response and better SCEs management than the BOI structure. The FinFET concept is also applied to the non-volatile memory cell at 22 nm technology node for low voltage operation with suppressed SCEs. In addition to the silicon technology, our TCAD estimation based on upper projections show that the InGaAs FinFET, with superior mobility and improved interface conditions, achieve tremendous drive current boost and aggressively suppressed SCEs and thereby a strong contender for low-power high-performance applications over the silicon counterpart. For non-digital functionalities, multi-fin FETs and GaN HEMT have been studied. Mixed-mode simulations along with developed optimization guidelines establish the realistic application potential of underlap design of silicon multi-Fin FETs for analog/RF operation. The device with underlap design shows compromised current drivability but improve analog intrinsic gain and high frequency performance. To investigate the potential of the novel N-polar GaN material, for the first time, I have provided calibrated TCAD modeling of E-mode N-polar GaN single-channel HEMT. In this work, I have also proposed a novel E-mode dual-channel hybrid MIS-HEMT showing greatly enhanced current carrying capability. The impact of GaN layer scaling has been investigated through extensive TCAD simulations and demonstrated techniques for device optimization

A novel control mechanism for hybrid 5-level DC-DC converter for higher switching frequency and lower voltage ripple

The introduction and development of hybrid DC-DC converters present a valuable opportunity in on-chip power management, as they combine the advantages of buck and switched-capacitor converters while alleviating shortcomings such as conversion efficiency and sizing requirements. In this paper, a new control methodology is presented for the recently developed 5-level hybrid DC-DC converter, which utilizes the Virtex 5 LX50T FPGA to drive the converter. This control method allows for a higher switching frequency of 1MHz and an improved conversion efficiency while also allowing for dynamic voltage control based on the desired output voltage. Simulations as well as a test circuit are used to illustrate the proper control functionality, with tabulated results that showcase the efficiency advantage over prior control methods as well as the buck and 3-level hybrid converters

Intrinsic variability of nanoscale CMOS technology for logic and memory.

The continuous downscaling of CMOS technology, the main engine of development of the semiconductor Industry, is limited by factors that become important for nanoscale device size, which undermine proper device operation completely offset gains from scaling. One of the main problems is device variability: nominally identical devices are different at the microscopic level due to fabrication tolerance and the intrinsic granularity of matter. For this reason, structures, devices and materials for the next technology nodes will be chosen for their robustness to process variability, in agreement with the ITRS (International Technology Roadmap for Semiconductors). Examining the dispersion of various physical and geometrical parameters and the effect these have on device performance becomes necessary. In this thesis, I focus on the study of the dispersion of the threshold voltage due to intrinsic variability in nanoscale CMOS technology for logic and for memory. In order to describe this, it is convenient to have an analytical model that allows, with the assistance of a small number of simulations, to calculate the standard deviation of the threshold voltage due to the various contributions

Six decades of research on 2D materials: progress, dead ends, and new horizons

The present paper guides the reader through six decades of research on 2D materials, thereby putting special focus on the use of these materials for electronic devices. It is shown that after a slow start and only little activity over many years, since 2004 the exploration of 2D materials advanced at an enormous pace. While some of the high expectations raised in the so-called golden era of graphene did not fulfil, other electronic applications for 2D materials that originally were not on the agenda gain increasing attention now. One of the main research topics in the field of 2D materials during the early 2000s was high-performance graphene transistors. This effort, however, led to a dead end due the consequences of the missing bandgap in graphene. On the other hand, the semiconducting 2D materials show potential for different device concepts including stacked-channel 2D nanosheet MOSFETs and 2D memristors. The former may become the transistor architecture of choice at the end of the CMOS roadmap and 2D memristors represent a promising device concept for future neuromorphic computing, a type of information processing that shows great potential for artificial intelligence applications where energy efficiency is a key requirement

Energy challenges for ICT

The energy consumption from the expanding use of information and communications technology (ICT) is unsustainable with present drivers, and it will impact heavily on the future climate change. However, ICT devices have the potential to contribute signi - cantly to the reduction of CO2 emission and enhance resource e ciency in other sectors, e.g., transportation (through intelligent transportation and advanced driver assistance systems and self-driving vehicles), heating (through smart building control), and manu- facturing (through digital automation based on smart autonomous sensors). To address the energy sustainability of ICT and capture the full potential of ICT in resource e - ciency, a multidisciplinary ICT-energy community needs to be brought together cover- ing devices, microarchitectures, ultra large-scale integration (ULSI), high-performance computing (HPC), energy harvesting, energy storage, system design, embedded sys- tems, e cient electronics, static analysis, and computation. In this chapter, we introduce challenges and opportunities in this emerging eld and a common framework to strive towards energy-sustainable ICT

A comprehensive review of a data centre for a cooling system

Cyber-Physical-Social Systems, commercial enterprises, and social networking use data centers to store, process, and distribute massive amounts of data. A data center serves as the foundation for all of these endeavors. The data center's workload and power consumption are increasing rapidly due to the demand for remote data services. Mechanical refrigeration and terminal cooling are the most critical components for most cooling systems. There is a way to transfer heat from the data center to the outside environment, but it's a complicated process. Air cooling systems and technology are most useful for room cooling and rack-level cooling. Because of their superior cooling performance and higher energy efficiency, air cooling has attracted more attention than water cooling in most existing data centers. The chillers and fans consume the most power of all the cooling equipment in the system. These methods can be divided into mechanism-based methods and data-driven methods for energy management of the cooling system. Operation management of cooling equipment is proposed to reduce power consumption, mainly using predictive model control and reinforcement learning-based methods. An overview of the data center's cooling system is presented in this paper, which focuses on the most common cooling solutions, power consumption modeling methods, and optimization control strategies, among others. In addition, the data center's cooling system is described as a current and future issue

Concept, design, simulation, and fabrication of an ultra-scalable vertical MOSFET

A new orientation to the conventional MOSFET is proposed. Processing issues, as well as short channel effects have been making planar MOSFET scaling increasingly difficult. It is predicted by the 2001 International Technology Roadmap for Semiconductors (ITRS) that non-planar devices will be needed for production as early as 2007. The device proposed in this thesis is similar in operation to the planar MOSFET, however the current transport from source to drain, normally in the same plane as the wafer surface, is oriented perpendicular to the die surface. The proposed device has successfully been simulated, showing a proof of concept. Fabrication of the proposed devices led to the creation of vertical MOS Gated Tunnel Diodes. This work, in fact, represents possibly the first demonstration of this type of technology. Suggestions are made to improve upon the proposed vertical MOSFET as well as the vertical MOS Gated Tunnel Diode

A Process Variation Tolerant Self-Compensation Sense Amplifier Design

As we move under the aegis of the Moore\u27s law, we have to deal with its darker side with problems like leakage and short channel effects. Once we go beyond 45nm regime process variations also have emerged as a significant design concern.Embedded memories uses sense amplifier for fast sensing and typically, sense amplifiers uses pair of matched transistors in a positive feedback environment. A small difference in voltage level of applied input signals to these matched transistors is amplified and the resulting logic signals are latched. Intra die variation causes mismatch between the sense transistors that should ideally be identical structures. Yield loss due to device and process variations has never been so critical to cause failure in circuits. Due to growth in size of embedded SRAMs as well as usage of sense amplifier based signaling techniques, process variations in sense amplifiers leads to significant loss of yield for that we need to come up with process variation tolerant circuit styles and new devices. In this work impact of transistor mismatch due to process variations on sense amplifier is evaluated and this problem is stated. For the solution of the problem a novel self compensation scheme on sense amplifiers is presented on different technology nodes up to 32nm on conventional bulk MOSFET technology. Our results show that the self compensation technique in the conventional bulk MOSFET latch type sense amplifier not just gives improvement in the yield but also leads to improvement in performance for latch type sense amplifiers. Lithography related CD variations, fluctuations in dopant density, oxide thickness and parametric variations of devices are identified as a major challenge to the classical bulk type MOSFET. With the emerging nanoscale devices, SIA roadmap identifies FinFETs as a candidate for post-planar end-of-roadmap CMOS device. With current technology scaling issues and with conventional bulk type MOSFET on 32nm node our technique can easily be applied to Double Gate devices. In this work, we also develop the model of Double Gate MOSFET through 3D Device Simulator Damocles and TCAD simulator. We propose a FinFET based process variation tolerant sense amplifier design that exploits the back gate of FinFET devices for dynamic compensation against process variations. Results from statistical simulation show that the proposed dynamic compensation is highly effective in restoring yield at a level comparable to that of sense amplifiers without process variations. We created the 32nm double gate models generated from Damocles 3-D device simulations [25] and Taurus Device Simulator available commercially from Synopsys [47] and use them in the nominal latch type sense amplifier design and on the Independent Gate Self Compensation Sense Amplifier Design (IGSSA) to compare the yield and performance benefits of sense amplifier design on FinFET technology over the conventional bulk type CMOS based sense amplifier on 32nm technology node effective in restoring yield at a level comparable to that of sense amplifiers without process variations. We created the 32nm double gate models generated from Damocles 3-D device simulations [25] and Taurus Device Simulator available commercially from Synopsys [47] and use them in the nominal latch type sense amplifier design and on the Independent Gate Self Compensation Sense Amplifier Design (IGSSA) to compare the yield and performance benefits of sense amplifier design on FinFET technology over the conventional bulk type CMOS based sense amplifier on 32nm technology node