Advances in Solid State Circuit Technologies

This book brings together contributions from experts in the fields to describe the current status of important topics in solid-state circuit technologies. It consists of 20 chapters which are grouped under the following categories: general information, circuits and devices, materials, and characterization techniques. These chapters have been written by renowned experts in the respective fields making this book valuable to the integrated circuits and materials science communities. It is intended for a diverse readership including electrical engineers and material scientists in the industry and academic institutions. Readers will be able to familiarize themselves with the latest technologies in the various fields

Supply Voltage Dependence of Heavy Ion Induced SEEs on 65nm CMOS Bulk SRAMs

The power consumption of Static Random Access Memory (SRAM) has become an important issue for modern integrated circuit design, considering the fact that they occupy large area and consume significant portion of power consumption in modern nanometer chips. SRAM operating in low power supply voltages has become an effective approach in reducing power consumption. Therefore, it is essential to experimentally characterize the single event effects (SEE) of hardened and unhardened SRAM cells to determine their appropriate applications, especially when a low supply voltage is preferred. In this thesis, a SRAM test chip was designed and fabricated with four cell arrays sharing the same peripheral circuits, including two types of unhardened cells (standard 6T and sub-threshold 10T) and two types of hardened cells (Quatro and DICE). The systems for functional and radiation tests were built up with power supply voltages that ranged from near threshold 0.4 V to normal supply 1 V. The test chip was irradiated with alpha particles and heavy ions with various linear energy transfers (LETs) at different core supply voltages, ranging from 1 V to 0.4 V. Experimental results of the alpha test and heavy ion test were consistent with the results of the simulation. The cross sections of 6T and 10T cells present much more significant sensitivities than Quatro and DICE cells for all tested supply voltages and LET. The 10T cell demonstrates a more optimal radiation performance than the 6T cell when LET is small (0.44 MeV·cm2/mg), yet no significant advantage is evident when LET is larger than this. In regards to the Quatro and DICE cells, one does not consistently show superior performance over the other in terms of soft error rates (SERs). Multi-bit upsets (MBUs) occupy a larger portion of total SEUs in DICE cell when relatively larger LET and smaller supply voltage are applied. It explains the loss in radiation tolerance competition with Quatro cell when LET is bigger than 9.1 MeV·cm2/mg and supply voltage is smaller than 0.6 V. In addition, the analysis of test results also demonstrated that the error amount distributions follow a Poisson distribution very well for each type of cell array

Analysis of design strategies for RF ESD problems in CMOS circuits

This thesis analyses the design strategies used to protect RF circuits that are implemented in CMOS technologies. It investigates, in detail, the physical mechanisms involved when a ggNMOS structure is exposed to an ESD event and undergoes snapback. The understanding gained is used to understand why the performance of the current RF ESD clamp is poor and suggestions are made as to how the performance of ggNMOS clamps can be improved beyond the current body of knowledge. The ultimate aim is to be able to design effective ESD protection clamps whilst minimising the effect the circuit has on RF I/O signals. A current ggNMOS based RF ESD I/O protection circuit is analysed in detail using a Transmission Line Pulse (TLP) tester. This is shown to be a very effective diagnostic tool by showing many characteristics of the ggNMOS during the triggering and conducting phase of the ESD event and demonstrate deficiencies in the clamp design. The use of a FIB enhances the analysis by allowing the isolation of individual components in the circuit and therefore their analysis using the TLP tester. SPICE simulations are used to provide further commentary on the debate surrounding the specification required of a TLP tester for there to be a good correlation between a TLP test and the industry standard Human Body Model (HBM) ESD test. Finite element simulations are used to probe deeper in to the mechanisms involved when a ggNMOS undergoes snapback especially with regard to the contribution parasitic components within the ggNMOS make to the snapback process. New ggNMOS clamps are proposed which after some modification are shown to work. Some of the finite element experiments are repeated in a 0.18μπ7. process CMOS test chip and a comparison is made between the two sets of results. In the concluding chapter understanding that has been gained from previous chapters is combined with the published body of knowledge to suggest and explain improvements in the design of a ggNMOS for RF and standard applications. These improvements will improve homogeneity of ggNMOS operation thus allowing the device size to be reduced and parasitic loading for a given ESD performance. These techniques can also be used to ensure that the ESD current does not take an unintended path through the chip

Transient Safe Operating Area (tsoa) For Esd Applications

A methodology to obtain design guidelines for gate oxide input pin protection and high voltage output pin protection in Electrostatic Discharge (ESD) time frame is developed through measurements and Technology Computer Aided Design (TCAD). A set of parameters based on transient measurements are used to define Transient Safe Operating Area (TSOA). The parameters are then used to assess effectiveness of protection devices for output and input pins. The methodology for input pins includes establishing ESD design targets under Charged Device Model (CDM) type stress in low voltage MOS inputs. The methodology for output pins includes defining ESD design targets under Human Metal Model (HMM) type stress in high voltage Laterally Diffused MOS (LDMOS) outputs. First, the assessment of standalone LDMOS robustness is performed, followed by establishment of protection design guidelines. Secondly, standalone clamp HMM robustness is evaluated and a prediction methodology for HMM type stress is developed based on standardized testing. Finally, LDMOS and protection clamp parallel protection conditions are identifie

High Performance RF and Basdband Analog-to-Digital Interface for Multi-standard/Wideband Applications

The prevalence of wireless standards and the introduction of dynamic standards/applications, such as software-defined radio, necessitate the next generation wireless devices that integrate multiple standards in a single chip-set to support a variety of services. To reduce the cost and area of such multi-standard handheld devices, reconfigurability is desirable, and the hardware should be shared/reused as much as possible. This research proposes several novel circuit topologies that can meet various specifications with minimum cost, which are suited for multi-standard applications. This doctoral study has two separate contributions: 1. The low noise amplifier (LNA) for the RF front-end; and 2. The analog-to-digital converter (ADC). The first part of this dissertation focuses on LNA noise reduction and linearization techniques where two novel LNAs are designed, taped out, and measured. The first LNA, implemented in TSMC (Taiwan Semiconductor Manufacturing Company) 0.35Cm CMOS (Complementary metal-oxide-semiconductor) process, strategically combined an inductor connected at the gate of the cascode transistor and the capacitive cross-coupling to reduce the noise and nonlinearity contributions of the cascode transistors. The proposed technique reduces LNA NF by 0.35 dB at 2.2 GHz and increases its IIP3 and voltage gain by 2.35 dBm and 2dB respectively, without a compromise on power consumption. The second LNA, implemented in UMC (United Microelectronics Corporation) 0.13Cm CMOS process, features a practical linearization technique for high-frequency wideband applications using an active nonlinear resistor, which obtains a robust linearity improvement over process and temperature variations. The proposed linearization method is experimentally demonstrated to improve the IIP3 by 3.5 to 9 dB over a 2.5–10 GHz frequency range. A comparison of measurement results with the prior published state-of-art Ultra-Wideband (UWB) LNAs shows that the proposed linearized UWB LNA achieves excellent linearity with much less power than previously published works. The second part of this dissertation developed a reconfigurable ADC for multistandard receiver and video processors. Typical ADCs are power optimized for only one operating speed, while a reconfigurable ADC can scale its power at different speeds, enabling minimal power consumption over a broad range of sampling rates. A novel ADC architecture is proposed for programming the sampling rate with constant biasing current and single clock. The ADC was designed and fabricated using UMC 90nm CMOS process and featured good power scalability and simplified system design. The programmable speed range covers all the video formats and most of the wireless communication standards, while achieving comparable Figure-of-Merit with customized ADCs at each performance node. Since bias current is kept constant, the reconfigurable ADC is more robust and reliable than the previous published works

Design And Characterization Of Noveldevices For New Generation Of Electrostaticdischarge (esd) Protection Structures

The technology evolution and complexity of new circuit applications involve emerging reliability problems and even more sensitivity of integrated circuits (ICs) to electrostatic discharge (ESD)-induced damage. Regardless of the aggressive evolution in downscaling and subsequent improvement in applications\u27 performance, ICs still should comply with minimum standards of ESD robustness in order to be commercially viable. Although the topic of ESD has received attention industry-wide, the design of robust protection structures and circuits remains challenging because ESD failure mechanisms continue to become more acute and design windows less flexible. The sensitivity of smaller devices, along with a limited understanding of the ESD phenomena and the resulting empirical approach to solving the problem have yielded time consuming, costly and unpredictable design procedures. As turnaround design cycles in new technologies continue to decrease, the traditional trial-and-error design strategy is no longer acceptable, and better analysis capabilities and a systematic design approach are essential to accomplish the increasingly difficult task of adequate ESD protection-circuit design. This dissertation presents a comprehensive design methodology for implementing custom on-chip ESD protection structures in different commercial technologies. First, the ESD topic in the semiconductor industry is revised, as well as ESD standards and commonly used schemes to provide ESD protection in ICs. The general ESD protection approaches are illustrated and discussed using different types of protection components and the concept of the ESD design window. The problem of implementing and assessing ESD protection structures is addressed next, starting from the general discussion of two design methods. The first ESD design method follows an experimental approach, in which design requirements are obtained via fabrication, testing and failure analysis. The second method consists of the technology computer aided design (TCAD)-assisted ESD protection design. This method incorporates numerical simulations in different stages of the ESD design process, and thus results in a more predictable and systematic ESD development strategy. Physical models considered in the device simulation are discussed and subsequently utilized in different ESD designs along this study. The implementation of new custom ESD protection devices and a further integration strategy based on the concept of the high-holding, low-voltage-trigger, silicon controlled rectifier (SCR) (HH-LVTSCR) is demonstrated for implementing ESD solutions in commercial low-voltage digital and mixed-signal applications developed using complementary metal oxide semiconductor (CMOS) and bipolar CMOS (BiCMOS) technologies. This ESD protection concept proposed in this study is also successfully incorporated for implementing a tailored ESD protection solution for an emerging CMOS-based embedded MicroElectroMechanical (MEMS) sensor system-on-a-chip (SoC) technology. Circuit applications that are required to operate at relatively large input/output (I/O) voltage, above/below the VDD/VSS core circuit power supply, introduce further complications in the development and integration of ESD protection solutions. In these applications, the I/O operating voltage can extend over one order of magnitude larger than the safe operating voltage established in advanced technologies, while the IC is also required to comply with stringent ESD robustness requirements. A practical TCAD methodology based on a process- and device- simulation is demonstrated for assessment of the device physics, and subsequent design and implementation of custom P1N1-P2N2 and coupled P1N1-P2N2//N2P3-N3P1 silicon controlled rectifier (SCR)-type devices for ESD protection in different circuit applications, including those applications operating at I/O voltage considerably above/below the VDD/VSS. Results from the TCAD simulations are compared with measurements and used for developing technology- and circuit-adapted protection structures, capable of blocking large voltages and providing versatile dual-polarity symmetric/asymmetric S-type current-voltage characteristics for high ESD protection. The design guidelines introduced in this dissertation are used to optimize and extend the ESD protection capability in existing CMOS/BiCMOS technologies, by implementing smaller and more robust single- or dual-polarity ESD protection structures within the flexibility provided in the specific fabrication process. The ESD design methodologies and characteristics of the developed protection devices are demonstrated via ESD measurements obtained from fabricated stand-alone devices and on-chip ESD protections. The superior ESD protection performance of the devices developed in this study is also successfully verified in IC applications where the standard ESD protection approaches are not suitable to meet the stringent area constraint and performance requirement

Broadband Receiver Electronic Circuits for Fiber-Optical Communication Systems

The exponential growth of internet traffic drives datacenters to constantly improve their capacity. As the copper based network infrastructure is being replaced by fiber-optical interconnects, new industrial standards for higher datarates are required. Several research and industrial organizations are aiming towards 400 Gb Ethernet and beyond, which brings new challenges to the field of high-speed broadband electronic circuit design. Replacing OOK with higher M-ary modulation formats and using higher datarates increases network capacity but at the cost of power. With datacenters rapidly becoming significant energy consumers on the global scale, the energy efficiency of the optical interconnect transceivers takes a primary role in the development of novel systems. There are several additional challenges unique in the design of a broadband shortreach fiber-optical receiver system. The sensitivity of the receiver depends on the noise performance of the PD and the electronics. The overall system noise must be optimized for the specific application, modulation scheme, PD and VCSEL characteristics. The topology of the transimpedance amplifier affects the noise and frequency response of the PD, so the system must be optimized as a whole. Most state-of-the-art receivers are built on high-end semiconductor SiGe and InP technologies. However, there are still several design decisions to be made in order to get low noise, high energy efficiency and adequate bandwidth. In order to overcome the frequency limitations of the optoelectronic components, bandwidth enhancement and channel equalization techniques are used. In this work several different blocks of a receiver system are designed and characterized. A broadband, 50 GHz bandwidth CB-based TIA and a tunable gain equalizer are designed in a 130 nm SiGe BiCMOS process. An ultra-broadband traveling wave amplifier is presented, based on a 250 nm InP DHBT technology demonstrating a 207 GHz bandwidth. Two TIA front-end topologies with 133 GHz bandwidth, a CB and a CE with shunt-shunt feedback, based on a 130 nm InP DHBT technology are designed and compared

Low-Leakage ESD Power Supply Clamps in General Purpose 65 nm CMOS Technology

Electrostatic discharge (ESD) is a well-known contributor that reduces the reliability and yield of the integrated circuits (ICs). As ICs become more complex, they are increasingly susceptible to such failures due to the scaling of physical dimensions of devices and interconnect on a chip [1]. These failures are caused by excessive electric field and/or excessive current densities and result in the dielectric breakdown, electromigration of metal lines and contacts. ESD can affect the IC in its different life stages, from wafer fabrication process to failure in the field. Furthermore, ESD events can damage the integrated circuit permanently (hard failure), or cause a latent damage (soft failure) [2]. ESD protection circuits consisting of I/O protection and ESD power supply clamps are routinely used in ICs to protect them against ESD damage. The main objective of the ESD protection circuit is to provide a low-resistive discharge path between any two pins of the chip to harmlessly discharge ESD energy without damaging the sensitive circuits. The main target of this thesis is to design ESD power supply clamps that have the lowest possible leakage current without degrading the ESD protection ability in general purpose TSMC 65 nm CMOS technology. ESD clamps should have a very low-leakage current and should be stable and immune to the power supply noise under the normal operating conditions of the circuit core. Also, the ESD clamps must be able to handle high currents under an ESD event. All designs published in the general purpose 65 nm CMOS technology have used the SCR as the clamping element since the SCR has a higher current carrying capability compared to an MOS transistor of the same area [3]. The ESD power supply clamp should provide a low-resistive path in both directions to be able to deal with both PSD and NDS zapping modes. The SCR based design does not provide the best ESD protection for the NDS zapping mode (positive ESD stress at VSS with grounded VDD node) since it has two parasitic resistances (RNwell and RPsub) and one parasitic diode (the collector to base junction diode of the PNP transistor) in the path from the VSS to VDD. Furthermore, SCR-based designs are not suitable for application that exposed to hot switching or ionizing radiation [2]. In GP process, the gate oxide thickness of core transistors is reduced compared with LP process counterpart to achieve higher performance designs for high-frequency applications using 1 V core transistors and 2.5 V I/O option. The thinner gate oxide layer results in higher leakage current due to gate tunneling [4]. Therefore, using large thin oxide MOS transistors as clamping elements will result in a huge leakage. In this thesis, four power supply ESD clamps are proposed in which thick oxide MOS transistors are used as the main clamping element. Therefore, the low-leakage current feature is achieved without significantly degrading the ESD performance. In addition, the parasitic diode of the MOS transistors provides the protection against NSD-mode. In this thesis, two different ESD power supply clamp architectures are proposed: standalone ESD power supply clamps and hybrid ESD power supply clamps. Two standalone clamps are proposed: a transient PMOS based ESD clamp with thyristor delay element (PTC), and a static diode triggered power supply (DTC). The standalone clamps were designed to protect the circuit core against ±125 V CDM stress by limiting the voltage between the two power rails to less than the oxide breakdown voltage of the core transistors, BVOXESD = 5 V. The large area of this architecture was the price for maintaining the low-leakage current and an adequate ESD protection. The hybrid clamp architecture was proposed to provide a higher ESD protection, against ±300 V CDM stress, while reducing the layout area and maintaining the low-leakage feature. In the hybrid clamp structure, two clamps are connected in parallel between the two power supply rails, a static clamp, and a transient clamp. The static clamp triggers first and starts to sink the ESD energy and then an RC network triggers the primary transient clamp to sink most of the ESD stress. Two hybrid designs were proposed: PMOS ESD power supply clamp with thyristor delay element and diodes (PTDC), and NMOS ESD power supply clamp with level shifter delay element and diode (NLDC). Simulation results show that the proposed clamps are capable of protecting the circuit core against ±1.5 kV HBM and at least against ±125 V CDM stresses. The measurement results show that all of the proposed clamps are immune against false triggering, and transient induced latch-up. Furthermore, all four designs have responded favorably to the 4 V ESD-like pulse voltage under both chip powered and not powered conditions and after the stress ends the designs turned off. Finally, TLP measurement results show that all four proposed designs meet the minimum design requirement of the ESD protection circuit in the 65 nm CMOS technology (i.e. HBM protection level of ±1.5 kV )

Solid State Circuits Technologies

The evolution of solid-state circuit technology has a long history within a relatively short period of time. This technology has lead to the modern information society that connects us and tools, a large market, and many types of products and applications. The solid-state circuit technology continuously evolves via breakthroughs and improvements every year. This book is devoted to review and present novel approaches for some of the main issues involved in this exciting and vigorous technology. The book is composed of 22 chapters, written by authors coming from 30 different institutions located in 12 different countries throughout the Americas, Asia and Europe. Thus, reflecting the wide international contribution to the book. The broad range of subjects presented in the book offers a general overview of the main issues in modern solid-state circuit technology. Furthermore, the book offers an in depth analysis on specific subjects for specialists. We believe the book is of great scientific and educational value for many readers. I am profoundly indebted to the support provided by all of those involved in the work. First and foremost I would like to acknowledge and thank the authors who worked hard and generously agreed to share their results and knowledge. Second I would like to express my gratitude to the Intech team that invited me to edit the book and give me their full support and a fruitful experience while working together to combine this book

Modeling and simulation of full-component integrated circuits in transient ESD events

This thesis presents a methodology to model and simulate transient electrostatic discharge (ESD) responses of integrated circuits (IC). To obtain valid simulation results, the IC component must be represented by a circuit netlist composed of device models that are valid under the ESD conditions. Models of the nonlinear devices that make up the ESD protection network of the IC must have transient I-V responses calibrated against measurements that emulate ESD events. Interconnects, power distribution networks, and the silicon substrate on the chip die as well as on the IC package must be faithfully constructed to emulate the fact that ESD current flows in a distributed manner across the entire IC component. The resultant equivalent circuit model therefore contains a huge number of nodes and devices, and the simulation runtime may be prohibitively long. Techniques must be devised to make the numerical simulation process more efficient without sacrifice of accuracy. These techniques include reasonable abstraction of the distributed full-component circuit netlist, dynamic piecewise-linear device models, and customized efficient transient circuit simulator. With the simulation streamlining techniques set up properly, comprehensive and predictive transient ESD simulation can be carried out efficiently to investigate the weakest link in the target IC, and the design can be fine-tuned to achieve optimal performance in both functionality and ESD reliability