Design, Characterization and Analysis of Component Level Electrostatic Discharge (ESD) Protection Solutions

Electrostatic Discharges (ESD) is a significant hazard to electronic components and systems. Based on a specific process technology, a given circuit application requires a customized ESD consideration that meets all the requirements such as the core circuit\u27s operating condition, maximum accepted leakage current, breakdown conditions for the process and overall device sizes. In every several years, there will be a new process technology becomes mature, and most of those new technology requires custom design of effective ESD protection solution. And usually the design window will shrinks due to the evolving of the technology becomes smaller and smaller. The ESD related failure is a major IC reliability concern and results in a loss of millions dollars each year in the semiconductor industry. To emulate the real word stress condition, several ESD stress models and test methods have been developed. The basic ESD models are Human Body model (HBM), Machine Mode (MM), and Charge Device Model (CDM). For the system-level ESD robustness, it is defined by different standards and specifications than component-level ESD requirements. International Electrotechnical Commission (IEC) 61000-4-2 has been used for the product and the Human Metal Model (HMM) has been used for the system at the wafer level. Increasingly stringent design specifications are forcing original equipment manufacturers (OEMs) to minimize the number of off-chip components. This is the case in emerging multifunction mobile, industrial, automotive and healthcare applications. It requires a high level of ESD robustness and the integrated circuit (IC) level, while finding ways to streamline the ESD characterization during early development cycle. To enable predicting the ESD performance of IC\u27s pins that are directly exposed to a system-level stress condition, a new the human metal model (HMM) test model has been introduced. In this work, a new testing methodology for product-level HMM characterization is introduced. This testing framework allows for consistently identifying ESD-induced failures in a product, substantially simplifying the testing process, and significantly reducing the product evaluation time during development cycle. It helps eliminates the potential inaccuracy provided by the conventional characterization methodology. For verification purposes, this method has been applied to detect the failures of two different products. Addition to the exploration of new characterization methodology that provides better accuracy, we also have looked into the protection devices itself. ICs for emerging high performance precision data acquisition and transceivers in industrial, automotive and wireless infrastructure applications require effective and ESD protection solutions. These circuits, with relatively high operating voltages at the Input/Output (I/O) pins, are increasingly being designed in low voltage Complementary Metal-Oxide-Semiconductor (CMOS) technologies to meet the requirements of low cost and large scale integration. A new dual-polarity SCR optimized for high bidirectional blocking voltages, high trigger current and low capacitance is realized in a sub 3-V, 180-nm CMOS process. This ESD device is designed for a specific application where the operating voltage at the I/O is larger than that of the core circuit. For instance, protecting high voltage swing I/Os in CMOS data acquisition system (DAS) applications. In this reference application, an array of thin film resistors voltage divider is directly connected to the interface pin, reducing the maximum voltage that is obtained at the core device input down to ± 1-5 V. Its ESD characteristics, including the trigger voltage and failure current, are compared against those of a typical CMOS-based SCR. Then, we have looked into the ESD protection designs into more advanced technology, the 28-nm CMOS. An ESD protection design builds on the multiple discharge-paths ESD cell concept and focuses the attention on the detailed design, optimization and realization of the in-situ ESD protection cell for IO pins with variable operation voltages. By introducing different device configurations fabricated in a 28-nm CMOS process, a greater flexibility in the design options and design trade-offs can be obtained in the proposed topology, thus achieving a higher integration and smaller cell size definition for multi-voltage compatibility interface ESD protection applications. This device is optimized for low capacitance and synthesized with the circuit IO components for in-situ ESD protection in communication interface applications developed in a 28-nm, high-k, and metal-gate CMOS technology. ESD devices have been used in different types of applications and also at different environment conditions, such as high temperature. At the last section of this research work, we have performed an investigation of several different ESD devices\u27 performance under various temperature conditions. And it has been shown that the variations of the device structure can results different ESD performance, and some devices can be used at the high temperature and some cannot. And this investigation also brings up a potential threat to the current ESD protection devices that they might be very vulnerable to the latch-up issue at the higher temperature range

Transient Safe Operating Area (tsoa) For Esd Applications

A methodology to obtain design guidelines for gate oxide input pin protection and high voltage output pin protection in Electrostatic Discharge (ESD) time frame is developed through measurements and Technology Computer Aided Design (TCAD). A set of parameters based on transient measurements are used to define Transient Safe Operating Area (TSOA). The parameters are then used to assess effectiveness of protection devices for output and input pins. The methodology for input pins includes establishing ESD design targets under Charged Device Model (CDM) type stress in low voltage MOS inputs. The methodology for output pins includes defining ESD design targets under Human Metal Model (HMM) type stress in high voltage Laterally Diffused MOS (LDMOS) outputs. First, the assessment of standalone LDMOS robustness is performed, followed by establishment of protection design guidelines. Secondly, standalone clamp HMM robustness is evaluated and a prediction methodology for HMM type stress is developed based on standardized testing. Finally, LDMOS and protection clamp parallel protection conditions are identifie

Chip- and System-Level Reliability on SiC-based Power Modules

The blocking voltage, switching frequency and temperature tolerance of power devices have been greatly improved due to the revolution of wide bandgap (WBG) materials, such as silicon carbide (SiC) and gallium nitride (GaN). Owing to the development of SiC-based power devices, the power rating, operating voltage, and power density of power modules have been significantly improved. However, the reliability of SiC-based power modules has not been fully explored yet. Thus, this dissertation focuses on the chip- and system-level reliability on SiC-based power modules. For chip-level reliability, this work focuses on on-chip SiC ESD protection devices for SiC-based integrated circuits (ICs). In order to develop SiC ESD protection devices, SiC-based Ohmic contact and ion implantation have been studied. Nickel/Titanium/Aluminum (Ni/Ti/Al) metal stacks were deposited on SiC substrates to form Ohmic contact. Circular transfer length method (CTLM) structures were fabricated to characterize contact resistivity. Ion implantation was designed and simulated by Sentraurus technology computer aided design (TCAD) software. Secondary-ion mass spectrometry (SIMS) results show a good match with the simulation results. In addition, SiC ESD protection devices, such as N-type metal-oxide-semiconductor (NMOS), laterally diffused metal-oxide-semiconductor (LDMOS), high-voltage silicon controlled rectifier (HV-SCR) and low-voltage silicon controlled rectifier (LV-SCR), have been designed. Transmission line pulse (TLP) and very fast TLP (VF-TLP) measurements were carried out to characterize their ESD performance. The proposed SiC-based HV-SCR shows the highest failure current on TLP measurement and can be used as an area-efficient ESD protection device. On the other hand, for system-level reliability, this dissertation focuses on the galvanic isolation of high-temperature SiC power modules. Low temperature co-fired ceramics (LTCC) based high-temperature optocouplers were designed and fabricated as galvanic isolators. The LTCC-based high-temperature optocouplers show promising driving capability and steady response speed from 25 ºC to 250 ºC. In order to verify the performance of the high-temperature optocouplers at the system level, LTCC-based gate drivers that utilize the high-temperature optocouplers as galvanic isolators were designed and integrated into a high-temperature SiC-based power module. Finally, the high-temperature power module with integrated LTCC-based gate drivers was characterized by DPTs from 25 ºC to 200 ºC. The power module shows reliable switching performance at elevated temperatures

Chip- and System-Level Reliability on SiC-based Power Modules

The blocking voltage, switching frequency and temperature tolerance of power devices have been greatly improved due to the revolution of wide bandgap (WBG) materials, such as silicon carbide (SiC) and gallium nitride (GaN). Owing to the development of SiC-based power devices, the power rating, operating voltage, and power density of power modules have been significantly improved. However, the reliability of SiC-based power modules has not been fully explored yet. Thus, this dissertation focuses on the chip- and system-level reliability on SiC-based power modules. For chip-level reliability, this work focuses on on-chip SiC ESD protection devices for SiC-based integrated circuits (ICs). In order to develop SiC ESD protection devices, SiC-based Ohmic contact and ion implantation have been studied. Nickel/Titanium/Aluminum (Ni/Ti/Al) metal stacks were deposited on SiC substrates to form Ohmic contact. Circular transfer length method (CTLM) structures were fabricated to characterize contact resistivity. Ion implantation was designed and simulated by Sentraurus technology computer aided design (TCAD) software. Secondary-ion mass spectrometry (SIMS) results show a good match with the simulation results. In addition, SiC ESD protection devices, such as N-type metal-oxide-semiconductor (NMOS), laterally diffused metal-oxide-semiconductor (LDMOS), high-voltage silicon controlled rectifier (HV-SCR) and low-voltage silicon controlled rectifier (LV-SCR), have been designed. Transmission line pulse (TLP) and very fast TLP (VF-TLP) measurements were carried out to characterize their ESD performance. The proposed SiC-based HV-SCR shows the highest failure current on TLP measurement and can be used as an area-efficient ESD protection device. On the other hand, for system-level reliability, this dissertation focuses on the galvanic isolation of high-temperature SiC power modules. Low temperature co-fired ceramics (LTCC) based high-temperature optocouplers were designed and fabricated as galvanic isolators. The LTCC-based high-temperature optocouplers show promising driving capability and steady response speed from 25 ºC to 250 ºC. In order to verify the performance of the high-temperature optocouplers at the system level, LTCC-based gate drivers that utilize the high-temperature optocouplers as galvanic isolators were designed and integrated into a high-temperature SiC-based power module. Finally, the high-temperature power module with integrated LTCC-based gate drivers was characterized by DPTs from 25 ºC to 200 ºC. The power module shows reliable switching performance at elevated temperatures

Design of Low-Capacitance Electrostatic Discharge (ESD) Protection Devices in Advanced Silicon Technologies.

Electrostatic discharge (ESD) related failure is a major IC reliability concern and this is particularly true as technology continues shrink to nano-metric dimensions. ESD design window research shows that ESD robustness of victim devices keep decreasing from 350nm bulk technology to 7nm FinFET technologies. In the meantime, parasitic capacitance of ESD diode with same It2 in FinFET technologies is approximately 3X compared with that in planar technologies. Thus transition from planar to FinFET technology requires more robust ESD protection however the large parasitic capacitance of ESD protection cell is problematic in high-speed interface design. To reduce the parasitic capacitance, a dual diode silicon controlled rectifier (DD-SCR) is presented in this dissertation. This design can exhibit good trade-offs between ESD robustness and parasitic capacitance characteristics. Besides, different bounding materials lead to performance variations in DD-SCRs are compared. Radio frequency (RF) technology is also demanded low capacitance ESD protection. To address this concern, a ?-network is presented, providing robust ESD protection for 10-60 GHz RF circuit. Like a low pass ? filter, the network can reflect high frequency RF signals and transmit low frequency ESD pulses. Given proper inductor value, networks can work as robust ESD solutions at a certain Giga Hertz frequency range, making this design suitable for broad band protection in RF input/outputs (I/Os). To increase the holding voltage and reduce snapback, a resistor assist triggering heterogeneous stacking structure is presented in this dissertation, which can increase the holding voltage and also keep the trigger voltage nearly as same as a single SCR device

Design And Characterization Of Noveldevices For New Generation Of Electrostaticdischarge (esd) Protection Structures

The technology evolution and complexity of new circuit applications involve emerging reliability problems and even more sensitivity of integrated circuits (ICs) to electrostatic discharge (ESD)-induced damage. Regardless of the aggressive evolution in downscaling and subsequent improvement in applications\u27 performance, ICs still should comply with minimum standards of ESD robustness in order to be commercially viable. Although the topic of ESD has received attention industry-wide, the design of robust protection structures and circuits remains challenging because ESD failure mechanisms continue to become more acute and design windows less flexible. The sensitivity of smaller devices, along with a limited understanding of the ESD phenomena and the resulting empirical approach to solving the problem have yielded time consuming, costly and unpredictable design procedures. As turnaround design cycles in new technologies continue to decrease, the traditional trial-and-error design strategy is no longer acceptable, and better analysis capabilities and a systematic design approach are essential to accomplish the increasingly difficult task of adequate ESD protection-circuit design. This dissertation presents a comprehensive design methodology for implementing custom on-chip ESD protection structures in different commercial technologies. First, the ESD topic in the semiconductor industry is revised, as well as ESD standards and commonly used schemes to provide ESD protection in ICs. The general ESD protection approaches are illustrated and discussed using different types of protection components and the concept of the ESD design window. The problem of implementing and assessing ESD protection structures is addressed next, starting from the general discussion of two design methods. The first ESD design method follows an experimental approach, in which design requirements are obtained via fabrication, testing and failure analysis. The second method consists of the technology computer aided design (TCAD)-assisted ESD protection design. This method incorporates numerical simulations in different stages of the ESD design process, and thus results in a more predictable and systematic ESD development strategy. Physical models considered in the device simulation are discussed and subsequently utilized in different ESD designs along this study. The implementation of new custom ESD protection devices and a further integration strategy based on the concept of the high-holding, low-voltage-trigger, silicon controlled rectifier (SCR) (HH-LVTSCR) is demonstrated for implementing ESD solutions in commercial low-voltage digital and mixed-signal applications developed using complementary metal oxide semiconductor (CMOS) and bipolar CMOS (BiCMOS) technologies. This ESD protection concept proposed in this study is also successfully incorporated for implementing a tailored ESD protection solution for an emerging CMOS-based embedded MicroElectroMechanical (MEMS) sensor system-on-a-chip (SoC) technology. Circuit applications that are required to operate at relatively large input/output (I/O) voltage, above/below the VDD/VSS core circuit power supply, introduce further complications in the development and integration of ESD protection solutions. In these applications, the I/O operating voltage can extend over one order of magnitude larger than the safe operating voltage established in advanced technologies, while the IC is also required to comply with stringent ESD robustness requirements. A practical TCAD methodology based on a process- and device- simulation is demonstrated for assessment of the device physics, and subsequent design and implementation of custom P1N1-P2N2 and coupled P1N1-P2N2//N2P3-N3P1 silicon controlled rectifier (SCR)-type devices for ESD protection in different circuit applications, including those applications operating at I/O voltage considerably above/below the VDD/VSS. Results from the TCAD simulations are compared with measurements and used for developing technology- and circuit-adapted protection structures, capable of blocking large voltages and providing versatile dual-polarity symmetric/asymmetric S-type current-voltage characteristics for high ESD protection. The design guidelines introduced in this dissertation are used to optimize and extend the ESD protection capability in existing CMOS/BiCMOS technologies, by implementing smaller and more robust single- or dual-polarity ESD protection structures within the flexibility provided in the specific fabrication process. The ESD design methodologies and characteristics of the developed protection devices are demonstrated via ESD measurements obtained from fabricated stand-alone devices and on-chip ESD protections. The superior ESD protection performance of the devices developed in this study is also successfully verified in IC applications where the standard ESD protection approaches are not suitable to meet the stringent area constraint and performance requirement

ELECTROSTATIC DISCHARGE AND ELECTRICAL OVERSTRESS FAILURES OF NON-SILICON DEVICES

Electrostatic discharge (ESD) causes a significant percentage of the failures in the electronics industry. The shrinking size of semiconductor circuits, thinner gate oxides, complex chips with multiple power supplies and mixed-signal blocks, larger chip capacitance and faster circuit operation, all contribute to increased ESD sensitivity of advanced semiconductor devices. Therefore, understanding and controlling ESD is indispensable for higher quality and reliability of advanced device technologies. This thesis provides a comprehensive understanding of ESD and EOS failures in GaAs and SiGe devices. In the first part of this thesis, characteristics of internal damage caused by several ESD test models and EOS stress in non-silicon devices (GaAs and SiGe) are identified. Failure signatures are correlated with field failures using various failure analysis techniques. The second part of this thesis discusses the effects of ESD latent damage in GaAs devices. Depending on the stress level, ESD voltage can causes latent failures if the device is repeatedly stressed under low ESD voltage conditions, and can cause premature damage leading eventually to catastrophic failures. Electrical degradation due to ESD-induced latent damage in GaAs MESFETs after cumulative low-level ESD stress is studied. Using failure analysis, combined with electrical characterization, the failure modes and signatures of EOS stressed devices with and without prior low-level ESD stress are compared. To predict the power-to-failure level of GaAs and silicon devices, an ESD failure model using a thermal RC network was developed. A correlation method of the real ESD stress and square wave pulse has been developed. The equivalent duration of the square pulse is calculated and proposed for the HBM ESD stress. The dependence of this value on the ESD stress level and material properties is presented as well

Analysis and modeling methods for predicting functional robustness of integrated circuits during fast transient events

La miniaturisation des circuits intégrés se poursuit de nos jours avec le développement de technologies toujours plus fines et denses. Elle permet une intégration des circuits toujours plus massive, avec des performances plus élevées et une réduction des coûts de production. La réduction de taille des circuits s'accompagne aussi d'une augmentation de leur sensibilité électrique. L'électronique automobile est un acteur majeur dans la nouvelle tendance des véhicules autonomes. Ce type d'application a besoin d'analyser des données et d'appliquer des actions sur le véhicule en temps réel. L'objectif à terme est d'améliorer la sécurité des usagers. Il est donc vital de garantir que ces modules électroniques pourront effectuer leurs tâches correctement malgré toutes les perturbations auxquelles ils seront exposés. Néanmoins, l'environnement automobile est particulièrement sévère pour l'électronique. Parmi tous les stress rencontrés, les décharges électrostatiques (ESD - Electrostatic Discharge) sont une importante source d'agression électrique. Ce type d'évènement très bref est suffisamment violent pour détruire des composants électroniques ou les perturber pendant leur fonctionnement. Les recherches présentées ici se concentrent sur l'analyse des défaillances fonctionnelles. À cause des ESD, des fonctions électroniques peuvent cesser temporairement d'être opérantes. Des méthodes d'analyse et de prédiction sont requises au niveau-circuit intégré afin de détecter des points de faiblesses susceptibles de générer des fautes fonctionnelles pendant l'exposition à un stress électrostatique. Différentes approches ont été proposées dans ce but. Une méthode hiérarchique de modélisation a été mise au point afin d'être capable de reproduire la forme d'onde ESD jusqu'à l'entrée du circuit intégré. Avec cette approche, chaque élément du système est modélisé individuellement puis son modèle ajouté au schéma complet. Un cas d'étude réaliste de défaillance fonctionnelle d'un circuit intégré a été analysé à l'aide d'outils de simulation. Afin d'obtenir plus de données sur cette faute, une puce de test a été développée, contenant des structures de surveillance et de mesure directement intégrées dans la puce. La dernière partie de ce travail de recherche est concentrée sur le développement de méthodes d'analyse dans le but d'identifier efficacement des fautes par simulation. Une des techniques développées consiste à modéliser chaque bloc d'une fonction individuellement puis permet de chaîner ces modèles afin de déterminer la robustesse de la fonction complète. La deuxième méthode tente de construire un modèle équivalent dit boite-noire d'une fonction de haut-niveau d'un circuit intégré. Ces travaux de recherche ont mené à la mise au point de prototypes matériels et logiciels et à la mise en évidence de points bloquants qui pourront constituer une base pour de futurs travaux.Miniaturization of electronic circuits continues nowadays with the more recent technology nodes being applied to diverse fields of application such as automotive. Very dense and small integrated circuits are interesting for economic reasons, because they are cheaper to manufacture in mass and can pack more functionalities with elevated performances. The counterpart of size reduction is integrated circuits becoming more fragile electrically. In the automotive world, the new trend of fully autonomous driving is seeing tremendous progress recently. Autonomous vehicles must take decisions and perform critical actions such as braking or steering the wheel. Those decisions are taken by electronic modules, that have now very high responsibilities with regards of our safety. It is important to ensure that those modules will operate no matter the kind of disturbances they can be exposed to. The automotive world is a quite harsh environment for electronic systems. A major source of electrical stress is called the Electrostatic Discharge (ESD). It is a very sudden flow of electricity of large amplitude capable of destroying electronic components, or disturb them during their normal operation. This research focuses on functional failures where functionality can be temporarily lost after an ESD with various impact on the vehicle. To guarantee before manufacturing that a module and its components will perform their duty correctly, new analysis and prediction methods are required against soft-failures caused by electrostatic discharges. In this research, different approaches have been explored and proposed towards that goal. First, a modelling method for reproducing the ESD waveforms from the test generator up to the integrated circuit input is presented. It is based on a hierarchical approach where each element of the system is modelled individually, then added to the complete setup model. A practical case of functional failure at silicon-level is analyzed using simulation tools. To acquire more data on this fault, a testchip has been designed. It contains on-chip monitoring structures to measure voltage and current, and monitor function behavior directly at silicon-level. The last part of this research details different analysis methods developed for identifying efficiently functional weaknesses. The methods rely heavily on simulation tools, and prototypes have been implemented to prove the initial concepts. The first method models each function inside the chip individually, using behavioral models, then enables to connect the models together to deduce the full function's robustness. It enables hierarchical analysis of complex integrated circuit designs, to identify potential weak spots inside the circuit that could require more shielding or protection. The second method is focused on constructing equivalent electrical black box models of integrated circuit functions. The goal is to model the IC with a behavioral, black-box model capable of reproducing waveforms in powered conditions during the ESD. In summary, this research work has led to the development of several hardware and software prototypes. It has also highlighted important modelling challenges to solve in future works to achieve better functional robustness against electrostatic discharges

Different failure signatures of multiple TLP and HBM Stresses in an ESD robust protection structure

International audienc