104 research outputs found
RRAM serial configuration for the generation of random bits
Peer ReviewedPostprint (published version
Exploring Conductance Quantization Effects in Electroformed Filaments for Their Potential Application to a Resistance Standard
Altres ajuts: acords transformatius de la UABThe ballistic conduction through narrow constrictions connecting charge reservoirs exhibits conductance quantization effects. Since the quantum of conductance (Formula presented.) is only related to fundamental constants of nature, these effects might allow the implementation of a standard of resistance, fulfilling the requirements of the 2019 revised International System of Units. Moreover, this standard would be able to work at room temperature and without a magnetic field, thus allowing its on-chip implementation. In this work, the authors propose that breakdown filaments in thin oxide layers might be useful to this purpose. In particular, conductance quantization effects in nanolaminate AlO/HfO dielectrics are reported and the role of intrinsic values of conductance and extrinsic parasitic elements are analyzed. The fact that breakdown filaments are irreversible is an advantage due to their expected stability and to the lack of cycle-to-cycle variations (as compared to resistive switching devices). Although the reported sample-to-sample variations are still too large for a real application, there is room for improving the controlover breakdown filaments through material design and electroforming conditions. Provided that this control is achieved, an on-chip implementation of a resistance standard for the realization of self-calibrating electrical systems and equipment with zero-chain traceability would be possible
Impact of laser attacks on the switching behavior of RRAM devices
The ubiquitous use of critical and private data in electronic format requires reliable and secure embedded systems for IoT devices. In this context, RRAMs (Resistive Random Access
Memories) arises as a promising alternative to replace current memory technologies. However,
their suitability for this kind of application, where the integrity of the data is crucial, is still under
study. Among the different typology of attacks to recover information of secret data, laser attack
is one of the most common due to its simplicity. Some preliminary works have already addressed
the influence of laser tests on RRAM devices. Nevertheless, the results are not conclusive since
different responses have been reported depending on the circuit under testing and the features of
the test. In this paper, we have conducted laser tests on individual RRAM devices. For the set of
experiments conducted, the devices did not show faulty behaviors. These results contribute to the
characterization of RRAMs and, together with the rest of related works, are expected to pave the way for the development of suitable countermeasures against external attacks.Postprint (published version
Modeling and simulation of successive breakdown events in thin gate dielectrics using standard reliability growth models
Altres ajuts: acords transformatius de la UABThe application of constant electrical stress to a metal-insulator-semiconductor (MOS) or metal-insulator-metal (MIM) structure can generate multiple breakdown events in the dielectric film. Very often, these events are detected as small jumps in the current-time characteristic of the device under test and can be treated from the stochastic viewpoint as a counting process. In this letter, a wide variety of standard reliability growth models for this process are assessed in order to determine which option provides the best simulation results compatible with the experimental observations. For the generation of the breakdown event arrivals, two alternative stochastic methods for the power-law Poisson process are investigated: first, the inversion algorithm for the cumulative distribution function and second, an on-the-fly method based on the so-called rejection algorithm. Though both methods are equivalent, the first one is more appropriate for data analysis using spreadsheet calculations while the second one is highly suitable for circuit simulation environments like LTSpice. The connection of the selected nonhomogeneous Poisson process with the Weibull model for dielectric breakdown is also discussed
Assessment of the variability of the I-V characteristic of HfO2-based resistive switching devices and its simulation using the quasi-static memdiode model
Altres ajuts: acords transformatius de la UABVariability of the conduction characteristics of filamentary-type resistive switching devices or resistive RAMs (RRAMs) is a hot research topic both in academia and industry because it is currently considered one of the major showstoppers for the successful development and application of this technology. In this work, we thoroughly investigate the statistics of the cycle-to-cycle (C2C) variability observed in the experimental current-voltage (I-V) curves of HfO-based memristive structures using the fitdistrplus package for the R language. This exploratory analysis allows us to identify which parametric probability distributions are the most suitable candidates for describing our data. This study involves graphical tools such as the density, skewness-kurtosis (S-K), and quantile-quantile (Q-Q) plots. The analysis is completed with the aid of goodness-of-fit statistics (Kolmogorov-Smirnov, Cramer-von Mises, Anderson-Darling) and criteria (Akaike's and Bayesian). The selected distributions are incorporated into the SPICE script of the quasi-static memdiode model for resistive switching devices and used for simulating uncorrelated C2C variability. Finally, a one-way sensitivity analysis is carried out in order to test the impact of the model parameters variation in the output characteristics of the device
Unpredictable bits generation based on RRAM parallel configuration
In this letter a cell with the parallel combination of two TiN/Ti/HfO2/W resistive random access memory (RRAM) devices is studied for the generation of unpredictable bits. Measurements confirm that a simultaneous parallel SET operation in which one of the two RRAMs switches to the low resistance state (LRS) is an unpredictable process showing random properties for different sets of cells. Furthermore, given a device pair, the same device switches during subsequent write operations. The proposed cell is also analyzed under different current compliances and pulse widths with the same persistent behavior being observed. The features of the proposed cell, which provide data obfuscation without compromising reliability, pave the way for its application in Physical Unclonable Functions (PUFs) for hardware security purposes.Peer ReviewedPostprint (author's final draft
True random number generator based on RRAM-bias current starved ring oscillator
This work presents a RRAM-bias current starved ring oscillator (CSRO) as TRNG, where the cycle-to-cycle variability of a RRAM device is exploited as source of randomness. A simple voltage divider composed of this RRAM and a resistor is considered to bias the gate terminal of the extra transistor of every current starved (CS) inverter of the RO. In this way, the delay of the inverters is modified, deriving an unpredictable oscillation frequency every time the RRAM switches to the HRS. The oscillation frequency is finally leveraged to extract the sequence of random bits. The design is simple and add low area overhead. Experimental measurements are performed to analyze the cycle-to-cycle variability in the HRS. The very same measurements are subsequently used to validate the TRNG by means of electrical simulations. The obtained results passed all the NIST tests without the need for post-processing.This work was supported by the Spanish MCIN/AEI/10.13039/501100011033 under Project PID2019-103869RB-C33. The work of M. B. González was supported by the Ramón y Cajal under Grant RYC2020-030150-I.Peer ReviewedPostprint (published version
Electrical characterization of atomic-layer-deposited hafnium oxide films from hafnium tetrakis(dimethylamide) and water/ozone: Effects of growth temperature, oxygen source, and postdeposition annealing
The electrical properties of HfO2-based metal-insulator- semiconductor capacitors have been systematically investigated by means of I-V and C-V characteristics, admittance spectroscopy, deep level transient spectroscopy, conductance transient, and flat band voltage transient techniques. Attention is also given to the study of the temperature dependence of the leakage current. HfO2 films were grown on p-type silicon substrates by atomic layer deposition using hafnium tetrakis(dimethylamide) as hafnium precursor, and ozone or water as oxygen precursors. The growth temperature ranged from 150 to 350 °C. Low growth temperatures prevent decomposition and high growth rate, as well as high contamination levels. As a result, the leakage current is lower for lower deposition temperatures. Some of the deposited samples were submitted to a postdeposition annealing at 650 °C in N2 atmosphere, showing a decrease in the leakage current and an increase in the equivalent oxide thickness (EOT), whereas interfacial state density increases and defect density inside the dielectric bulk decreases. Regarding dielectric reliability, in our experimental conditions, HfO 2 layers grown at 150 °C exhibit the largest EOT and breakdown voltage. The electrical behaviour is clearly linked with structural properties, and especially with the formation of an interfacial layer between the HfO 2 layer and the silicon substrate, as well as with the presence of several impurities. © 2013 American Vacuum Society.Peer Reviewe
True random number generator based on the variability of the high resistance state of RRAMs
Hardware-based security primitives like True Random Number Generators (TRNG) have become a crucial part in protecting data over communication channels. With the growth of internet and cloud storage, TRNGs are required in numerous cryptographic operations. On the other hand, the inherently dense structure and low power characteristics of emerging nanoelectronic technologies such as resistive-switching memories (RRAM) make them suitable elements in designing hardware security modules integrated in CMOS ICs. In this paper, a memristor based TRNG is presented by leveraging the high stochasticity of RRAM resistance value in OFF (High Resistive) state. In the proposal, one or two devices can be used depending on whether the objective is focused on saving area or obtaining a higher random bit frequency generation. The generated bits, based on a combination of experimental measurements and SPICE simulations, passed all 15 National Institute of Standards and Technology (NIST) tests and achieved a throughput of tens of MHz.Postprint (published version
Non-homogeneuos conduction of conductive filaments in Ni/HfO2/Si resistive switching structures observed with CAFM
Altres ajuts: ERDF/TEC2011-2792-C02-02Conductive filaments (CFs) in Ni/HfO₂/Si resistive switching structures are analysed at the nanoscale by means of Conductive Atomic Force Microscopy (CAFM). Differences in the CF conductivity are measured depending on the resistive state of the device. Moreover, for both resistance states, non-homogeneous conduction across the CF area is observed, in agreement with a tree-shaped CF
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