Estimating and Explaining the Prevalence of Tuberculosis for Asylum Seekers Upon Their Arrival in Germany

Up until recently incidences of tuberculosis (TB) had been declining for many years in Germany. The rise in TB cases coincided with a large increase in the number of people applying for asylum. We combine data from various sources to estimate the at-entry prevalence of TB for asylum seekers from 18 countries of origin and rely on survey data to explain the varying risk of suffering from TB. Our results reveal that asylum seekers from Eastern Africa show a much higher risk of suffering from TB than asylum seekers from Afghanistan, Syria, or Iraq. The survey data suggests that asylum seekers from Africa were by far more underprivileged in their respective countries of origin and experienced a higher risk of contracting TB on their way to Germany. Information about the socio-economic situation and the circumstances of the journey to Germany may help to improve TB surveillance

Influence of Coupling Forces and Body Posture on the Rotational Hand–Arm Impedance in yh_{h} Direction

This manuscript investigates the rotational mechanical impedance of the human hand–arm system with respect to vibration excitation around the gripping axis of the hand under the influence of body posture, gripping force, and push force. Knowledge of rotational mechanical impedance is required for deriving models of hand–arm biodynamics. These models are used in the validation of power tools to predict further vibrational human–machine interactions. In the current state of research, such models exist for translational but not rotational vibration excitation. Consequently, this study investigates the properties of a hand–arm system with respect to rotational vibration excitation. In the study, the rotational impedance of the hand–arm systems of 13 adults was measured at various gripping and push forces applied in different body postures. The setup of the test used in this study consisted of a shaker that applied rotational vibrations at certain frequencies to the subjects’ hand–arm systems via a cylindrical handle. The results of the study indicate a spring–damper dynamic of the hand–arm system. The gripping force strongly influences the magnitude of rotational impedance across the frequency spectrum. Regarding push force and posture, no corresponding influence could be determined. The results suggest that the frictional contact between the hand and handle might confer a damping effect

Chemotherapy-induced peripheral neuropathy in cancer patients : a four-arm randomized trial on the effectiveness of electroacupuncture

Purpose. Chemotherapy-induced peripheral neuropathy (CIPN) is a common and dose-limiting side effect of cytostatic drugs. Since there are no proven therapeutic procedures against CIPN, we were interested to define the role of electroacupuncture (EA) from which preliminary data showed promising results. Methods. In a randomized trial with a group sequential adaptive design in patients with CIPN, we compared EA (LV3, SP9, GB41, GB34, LI4, LI11, SI3, and HT3; n=14) with hydroelectric baths (HB, n=14), vitamin B1/B6 capsules (300/300 mg daily; VitB, n=15), and placebo capsules (n=17). The statistical power in this trial was primarily calculated for proving EA only, so results of HB and VitB are pilot data. Results. CIPN complaints improved by 0.8 +- 1.2 (EA), 1.7 +- 1.7 (HB), 1.6 +- 2.0 (VitB), and 1.3 +- 1.3 points (placebo) on a 10-point numeric rating scale without significant difference between treatment groups or placebo. In addition no significant differences in sensory nerve conduction studies or quality of life (EORTC QLQ-C30) were found. Conclusions. The used EA concept, HB, and VitB were not superior to placebo. Since, contrary to our results, studies with different acupuncture concepts showed a positive effect on CIPN, the effect of acupuncture on CIPN remains unclear. Further randomized, placebo controlled studies seem necessary. This trial is registered with DRKS00004448

Light scattering of optical components at 193 nm and 13.5 nm

Die aktuellen Entwicklungen auf dem Gebiet der Halbleiterlithographie ziehen enorme Herausforderungen an optische Komponenten für 193 nm und 13,5 nm nach sich. Insbesondere Streulicht an optischen Oberflächen, Schichtsystemen und in Bulkmaterialien stellt einen kritischen Faktor dar. Hauptgegenstand dieser Arbeit war die Entwicklung eines Messinstrumentariums, das sowohl effektive Systeme zur sensitiven Streulichtmessung bei 193 nm und 13,5 nm als auch deren Verknüpfung mit theoretischen Analysewerkzeugen umfasste, um die relevanten Streulichtmechanismen bei beiden Wellenlängen zu untersuchen. Ein System zur Messung des totalen Streulichts (TS) und des winkelaufgelösten Streulichts (ARS) bei 193 nm wird beschrieben. Das TS-System weist eine Sensitivität von besser als 10{}^{-6} auf. Das ARS-System ermöglicht Messungen bei beliebigen Einfalls- und Streuwinkeln mit einem Dynamikbereich von mehr als 12 Größenordnungen. Für Untersuchungen bei 13,5 nm wurde ein System für winkelaufgelöste Streulicht- und Reflexionsmessungen mit einem Dynamikbereich von 6 Größenordnungen entwickelt. Es konnte gezeigt werden, dass existierende Theorien zur Beschreibung von rauheitsinduziertem Streulicht im sichtbaren und im Röntgen-Spektralbereich gültig bei 193 nm und 13,5 nm sind und Grenzflächenrauheit die wesentliche Streulichtursache sowohl bei DUV- als auch bei EUV-Schichtsystemen ist. Eine neuartige Methode zur Charakterisierung von Vielschichtsystemen durch Kombination von Streulicht- und Rauheitsmessungen wurde vorgestellt. Dabei werden die relevanten strukturellen Eigenschaften durch zwei anschauliche Parameter beschrieben: Der Skalierungsexponent \beta beschreibt die Rauheitsentwicklung im Schichtsystem und \delta beschreibt Schichtdickenabweichungen.The recent developments in semiconductor lithography place challenging demands on optical components for 193 nm and 13.5 nm. In particular light scattering from optical surfaces, thin film coatings, and bulk materials becomes crucially important. This thesis concentrates on the development of a complete methodology, comprising effective instruments for sensitive scattering measurements at 193 nm and 13.5 nm as well as the link to theoretical modeling and analysis tools in order to investigate the relevant scattering mechanisms at both wavelengths. A system for total scattering (TS) and angle resolved scattering (ARS) measurements at 193 nm is described. The TS set-up exhibits a sensitivity of better than 10{}^{-6}. The set-up for ARS enables measurements at arbitrary angles of incidence and scattering with a dynamic range of 12 orders of magnitude. For investigations at 13.5 nm, an instrument for angle resolved scatter and reflectance measurements has been developed. The dynamic range exceeds 6 orders of magnitude. Existing theories for roughness-induced scattering in the visible and X-ray spectral ranges proved to be valid at both 193 nm and 13.5 nm, and interface roughness was found to be the main source of scattering for both DUV and EUV coatings. A novel procedure for the characterization of multilayer coatings which combines scattering and roughness measurement and modeling was presented. The relevant structural properties are expressed by two descriptive parameters. The scaling exponent \beta describes the roughness evolution in the multilayer, and \delta describes optical layer thickness deviations

Linear and nonlinear absorption of titanium dioxide films produced by plasma ion-assisted electron beam evaporation: Modeling and experiments

Titanium dioxide films were prepared by plasma ion-assisted electron beam evaporation. Linear optical properties were investigated in terms of spectrophotometry using the beta-distributed oscillator (ss_do) model as a parametrized dispersion law. The nonlinear two-photon absorption coecient of titanium dioxide was determined by means of the laser-induced deflection technique at a wavelength of 800 nm. The obtained values of (2-5) x 10-11 cm/W were consistent with published experimental values for rutile as well as for simulations performed in the frames of the ss_do and Sheik-Bahae models. © 2020 by the authors

Draft genome sequence of actinobacterial strain Kineosporia sp. R_H_3, a neutrophilic iron-depositing bacterium

The draft genome sequence of a neutrophilic iron-depositing actinobacterial strain, Kineosporia sp. R_H_3, is reported here. Detailed analysis of the genome can elucidate the role of specific cytochromes for Fe oxidation and how this organism might receive energy from Fe oxidation. To date, this is the second publicly available genome sequence of a Kineosporia strain.DFG, 325093850, Open Access Publizieren 2017 - 2018 / Technische Universität Berli

Total integrated scatter from surfaces with arbitrary roughness, correlation widths, and incident angles

Surface scatter effects from residual optical fabrication errors can severely degrade optical performance. The total integrated scatter (TIS) from a given mirror surface is determined by the ratio of the spatial frequency band-limited relevant root-mean-square surface roughness to the wavelength of light. For short-wavelength (extreme-ultraviolet/x-ray) applications, even state-of-the-art optical surfaces can scatter a significant fraction of the total reflected light. In this paper we first discuss how to calculate the band-limited relevant roughness from surface metrology data, then present parametric plots of the TIS for optical surfaces with arbitrary roughness, surface correlation widths, and incident angles. Surfaces with both Gaussian and ABC or K-correlation power spectral density functions have been modeled. These parametric TIS predictions provide insight that is useful in determining realistic optical fabrication tolerances necessary to satisfy specific optical performance requirements