Atomic Step Organization in Homoepitaxial Growth on GaAs(111)B Substrates

When homoepitaxial growth is performed on exactly oriented (singular) (111) GaAs substrates, while maintaining the √19 x √19 surface reconstruction, the originally flat surface spontaneously evolves vicinal (111) facets that are tilted approximately 2.5° toward the \u3c 211 \u3e azimuthal directions. These facets form pyramid-like structures where the distance between adjacent peaks can be varied from as little as 1 μm to tens of μm. When these surfaces are observed with atomic force microscopy (AFM), we find that they are extremely smooth with the observed tilt resulting from atomic steps which are spaced at approximately 7.5 nm. We have also studied growth on vicinal GaAs(111) substrates. Our results are interpreted as indicating that the 2.5° vicinal (111) surface has a minimum free energy for the √19 x √19 reconstruction (i.e., that 10 nm spacing of \u3c 011 \u3e steps is thermodynamically preferred). Exactly oriented (111) facets are only observed when their facet width is less than a couple of micrometers implying a minimum nucleation size. This is a surprising result since conventional wisdom argues the surfaces with low Miller indexes are preferred. A possible explanation is an anisotropy in the surface in the two degenerate phases of √19 x √19 reconstruction which are rotated ±23° from the unreconstructed surface

The 2020 UV emitter roadmap

Solid state UV emitters have many advantages over conventional UV sources. The (Al,In,Ga)N material system is best suited to produce LEDs and laser diodes from 400 nm down to 210 nm—due to its large and tuneable direct band gap, n- and p-doping capability up to the largest bandgap material AlN and a growth and fabrication technology compatible with the current visible InGaN-based LED production. However AlGaN based UV-emitters still suffer from numerous challenges compared to their visible counterparts that become most obvious by consideration of their light output power, operation voltage and long term stability. Most of these challenges are related to the large bandgap of the materials. However, the development since the first realization of UV electroluminescence in the 1970s shows that an improvement in understanding and technology allows the performance of UV emitters to be pushed far beyond the current state. One example is the very recent realization of edge emitting laser diodes emitting in the UVC at 271.8 nm and in the UVB spectral range at 298 nm. This roadmap summarizes the current state of the art for the most important aspects of UV emitters, their challenges and provides an outlook for future developments

The 2020 UV emitter roadmap

Solid state UV emitters have many advantages over conventional UV sources. The (Al,In,Ga)N material system is best suited to produce LEDs and laser diodes from 400 nm down to 210 nm - due to its large and tuneable direct band gap, n- and p-doping capability up to the largest bandgap material AlN and a growth and fabrication technology compatible with the current visible InGaN-based LED production. However AlGaN based UV-emitters still suffer from numerous challenges compared to their visible counterparts that become most obvious by consideration of their light output power, operation voltage and long term stability. Most of these challenges are related to the large bandgap of the materials. However, the development since the first realization of UV electroluminescence in the 1970s shows that an improvement in understanding and technology allows the performance of UV emitters to be pushed far beyond the current state. One example is the very recent realization of edge emitting laser diodes emitting in the UVC at 271.8 nm and in the UVB spectral range at 298 nm. This roadmap summarizes the current state of the art for the most important aspects of UV emitters, their challenges and provides an outlook for future developments. © 2020 IOP Publishing Ltd