157 research outputs found

    The Development of Novel Nanostructured Catalyst for Production of Environment-Conscious Alternative Energy instead of Oil

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    この論文は国立情報学研究所の学術雑誌公開支援事業により電子化されまし

    Controlled Synthesis of Nano- and Micro-sized Carbon Materials and Their Uses

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    Nagasaki Symposium on Nano-Dynamics 2008 (NSND2008) 平成20年1月29日(火)於長崎大学 Invited Lectur

    Tryptophan-based carbon dots as fluorescent probe for detection of Pb2+ and Fe3+ ions

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    A Probe for metal ions based on carbon dots (CDs) has been prepared. A one-step method has been developed to synthesize the probe using tryptophan as the recognizing group. The synthesized probe has been evaluated for metal ions’ detection. The results show increase in fluorescence in the presence of Pb2+, over other 14 metal ions, illustrating the selective and sensitive detection of Pb2+

    A Bayesian Network Method for Quantitative Evaluation of Defects in Multilayered Structures from Eddy Current NDT Signals

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    Accurate evaluation and characterization of defects in multilayered structures from eddy current nondestructive testing (NDT) signals are a difficult inverse problem. There is scope for improving the current methods used for solving the inverse problem by incorporating information of uncertainty in the inspection process. Here, we propose to evaluate defects quantitatively from eddy current NDT signals using Bayesian networks (BNs). BNs are a useful method in handling uncertainty in the inspection process, eventually leading to the more accurate results. The domain knowledge and the experimental data are used to generate the BN models. The models are applied to predict the signals corresponding to different defect characteristic parameters or to estimate defect characteristic parameters from eddy current signals in real time. Finally, the estimation results are analyzed. Compared to the least squares regression method, BNs are more robust with higher accuracy and have the advantage of being a bidirectional inferential mechanism. This approach allows results to be obtained in the form of full marginal conditional probability distributions, providing more information on the defect. The feasibility of BNs presented and discussed in this paper has been validated

    Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Films by Dielectric Barrier Discharge in TiCl4/O-2/N-2 Gas Mixtures

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    National Natural Science Foundation of China [10875025, 20803007]; Fundamental Research Funds for Central Universities of China [DC12010116, DC13010106]; Program for Liaoning Excellent Talents in University [LJQ20l3128]Low-pressure dielectric barrier discharge (DBD) TiCl4/O-2 and N-2 plasmas have been used to deposit titanium oxide films at different power supply driving frequencies. A home-made large area low pressure DBD reactor was applied, characterized by the simplicity of the experimental set-up and a low consumption of feed gas and electric power, as well as being easy to operate. Atomic force microscopy, scanning electron microscopy, energy dispersive spectroscopy, and contact angle measurements have been used to characterize the deposited films. Experimental results show all deposited films are uniform and hydrophilic with a contact angle of about 15 degrees. Compared to titanium oxide films deposited in TiCl4/O-2 gas mixtures, those in TiCl4/O-2/N-2 gas mixtures are much more stable. The contact angle of titanium oxide films in TiCl4/O-2/N-2 gas mixtures with the addition of 50% N-2 and 20% TiCl4 is still smaller than 20 degrees, while that of undoped titanium oxide films is larger than 640 when they are measured after one week. The low-pressure TiCl4/O-2 plasmas consist of pulsed glow-like discharges with peak widths of several microseconds, which leads to the uniform deposition of titanium oxide films. Increasing a film thickness over several hundreds of nm leads to the film's fragmentation due to the over-high film stress. Optical emission spectra (OES) of TiCl4/O-2 DBD plasmas at various power supply driving frequencies are presented

    Plasma-assisted chemical vapor deposition of titanium oxide films by dielectric barrier discharge in TiCl4/O2/N2 gas mixtures

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    Low-pressure dielectric barrier discharge (DBD) TiCl4/O2 and N2 plasmas have been used to deposit titanium oxide films at different power supply driving frequencies. A homemade large area low pressure DBD reactor was applied, characterized by the simplicity of the experimental set-up and a low consumption of feed gas and electric power, as well as being easy to operate. Atomic force microscopy, scanning electron microscopy, energy dispersive spectroscopy, and contact angle measurements have been used to characterize the deposited films. Experimental results show all deposited films are uniform and hydrophilic with a contact angle of about 15°. Compared to titanium oxide films deposited in TiCl4/O2 gas mixtures, those in TiCl4/O2/N2 gas mixtures are much more stable. The contact angle of titanium oxide films in TiCl4/O2/N2 gas mixtures with the addition of 50% N2 and 20% TiCl4 is still smaller than 20°, while that of undoped titanium oxide films is larger than 64° when they are measured after one week. The low-pressure TiCl4/O2 plasmas consist of pulsed glow-like discharges with peak widths of several microseconds, which leads to the uniform deposition of titanium oxide films. Increasing a film thickness over several hundreds of nm leads to the film's fragmentation due to the over-high film stress. Optical emission spectra (OES) of TiCl4/O2 DBD plasmas at various power supply driving frequencies are presented
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