Surface heterogeneous nucleation-mediated release of beta-carotene from porous silicon

We demonstrate that the release of a poorly soluble molecule from nanoporous carriers is a complex process that undergoes heterogeneous surface nucleation events even under significantly diluted release conditions, and that those events heavily affect the dynamics of release. Using beta-carotene and porous silicon as loaded molecule and carrier model, respectively, we show that the cargo easily nucleates at the pore surface during the release, forming micro-to macroscopic solid particles at the pores surface. These particles dissolve at a much slower pace, compared to the rate of dissolution of pure beta-carotene in the same solvent, and they negatively affect the reproducibility of the release experiments, possibly because their solubility depends on their size distribution. We propose to exploit this aspect to use release kinetics as a better alternative to the induction time method, and to thereby detect heterogenous nucleation during release experiments. In fact, release dynamics provide much higher sensitivity and reproducibility as they average over the entire sample surface instead of depending on statistical analysis over a small area to find clusters.</p

Будущее – за интеллектуалами

Inspired by the homogeneous catalyst tris­(pentafluorophenyl) borane [B­(C₆F₅)₃], which acts as a promotor of Si–H bond activation, we developed and studied a method of modifying silicon oxide surfaces using hydrosilanes with B­(C₆F₅)₃ as the catalyst. This dedihydrosiloxanation reaction yields complete surface coverage within 10 min at room temperature. Organic monolayers derived from hydrosilanes with varying carbon chain lengths (C₈–C₁₈) were prepared on oxidized Si(111) surfaces, and the thermal and hydrolytic stabilities of the obtained monolayers were investigated in acidic (pH 3) medium, basic (pH 11) medium, phosphate-buffered saline (PBS), and deionized water (neutral conditions) for up to 30 days. DFT calculations were carried out to gain insight into the mechanism, and the computational results support a mechanism involving silane activation with B­(C₆F₅)₃. This catalyzed reaction path proceeds through a low-barrier-height transition state compared to the noncatalyzed reaction path

One-Step Generation of Reactive Superhydrophobic Surfaces via SiHCl₃-Based Silicone Nanofilaments

Superhydrophobic surfaces gain ever-growing attention because of their applicability in many (consumer) products/materials as they often display, among others, antifouling, anti-icing, and/or self-cleaning properties. A simple way to achieve superhydrophobicity is through the growth of silicone nanofilaments. These nanofilaments, however, are very often nonreactive and thus difficult to utilize in subsequent chemistries. In response, we have developed a single-step procedure to grow (SiHCl3-based) silicone nanofilaments with selective reactivity that are intrinsically superhydrophobic. The silicone nanofilaments could be further functionalized via Pt-catalyzed hydrosilylation of exposed Si-H moieties. These surfaces are easily obtained using mild conditions and are stable under hydrolytic conditions (neutral water, 24 h at 80 °C) while remaining highly transparent, which makes them well suited for optical and photochemical experiments.</p

Mild and Selective C-H Activation of COC Microfluidic Channels Allowing Covalent Multifunctional Coatings

Plastics, such as cyclic olefin copolymer (COC), are becoming an increasingly popular material for microfluidics. COC is used, in part, because of its (bio)-chemical resistance. However, its inertness and hydrophobicity can be a major downside for many bioapplications. In this paper, we show the first example of a surface-bound selective C-H activation of COC into alcohol C-OH moieties under mild aqueous conditions at room temperature. The nucleophilic COC-OH surface allows for subsequent covalent attachments, such as of a H-terminated silane. The resulting hybrid material (COC-Si-H) was then modified via a photolithographic hydrosilylation in the presence of ω-functionalized 1-alkenes to form a new highly stable, solvent-resistant hybrid surface.</p

Light-Activated Electroactive Molecule-Based Memory Microcells Confined on a Silicon Surface

International audienceUltrahigh-capacity molecular AND gates provide the potential for the next-generation dynamic random access memory. The ferrocene-terminated monolayer on oxide-free silicon system allows a highly stable and independent switching with both light and potential, yielding precisely such an AND gate

One-Pot Gram-Scale Synthesis of Hydrogen-Terminated Silicon Nanoparticles

Silicon nanoparticles (Si NPs) are highly attractive materials for typical quantum dots functions, such as in light-emitting and bioimaging applications, owing to silicon's intrinsic merits of minimal toxicity, low cost, high abundance, and easy and highly stable functionalization. Especially nonoxidized Si NPs with a covalently bound coating serve well in these respects, given the minimization of surface defects upon hydrosilylation of H-terminated Si NPs. However, to date, methods to obtain such H-terminated Si NPs are still not easy. Herein, we report a new synthetic method to produce size-tunable robust, highly crystalline H-terminated Si NPs (4-9 nm) using microwave irradiation within 5 min at temperatures between 25 and 200 °C and their further covalent functionalization. The key step to obtain highly fluorescent (quantum yield of 7-16%) green-red Si NPs in one simple step is the reduction of triethoxysilane and (+)-sodium l-ascorbate, yielding routinely ∼1 g of H-Si NPs via a highly scalable route in 5-15 min. Subsequent functionalization via hydrosilylation yielded Si NPs with an emission quantum yield of 12-14%. This approach can be used to easily produce high-quality H-Si NPs in gram-scale quantities, which brings the application of functionalized Si NPs significantly closer.</p

One-Pot Gram-Scale Synthesis of Hydrogen-Terminated Silicon Nanoparticles

Silicon nanoparticles (Si NPs) are highly attractive materials for typical quantum dots functions, such as in light-emitting and bioimaging applications, owing to silicon's intrinsic merits of minimal toxicity, low cost, high abundance, and easy and highly stable functionalization. Especially nonoxidized Si NPs with a covalently bound coating serve well in these respects, given the minimization of surface defects upon hydrosilylation of H-terminated Si NPs. However, to date, methods to obtain such H-terminated Si NPs are still not easy. Herein, we report a new synthetic method to produce size-tunable robust, highly crystalline H-terminated Si NPs (4-9 nm) using microwave irradiation within 5 min at temperatures between 25 and 200 °C and their further covalent functionalization. The key step to obtain highly fluorescent (quantum yield of 7-16%) green-red Si NPs in one simple step is the reduction of triethoxysilane and (+)-sodium l-ascorbate, yielding routinely ∼1 g of H-Si NPs via a highly scalable route in 5-15 min. Subsequent functionalization via hydrosilylation yielded Si NPs with an emission quantum yield of 12-14%. This approach can be used to easily produce high-quality H-Si NPs in gram-scale quantities, which brings the application of functionalized Si NPs significantly closer.</p

Surface etching, chemical modification and characterization of silicon nitride and silicon oxide - Selective functionalization of Si₃N₄ and SiO₂

The ability to selectively chemically functionalize silicon nitride (Si3N4) or silicon dioxide (SiO2) surfaces after cleaning would open interesting technological applications. In order to achieve this goal, the chemical composition of surfaces needs to be carefully characterized so that target chemical reactions can proceed on only one surface at a time. While wet-chemically cleaned silicon dioxide surfaces have been shown to be terminated with surficial Si-OH sites, chemical composition of the HF-etched silicon nitride surfaces is more controversial. In this work, we removed the native oxide under various aqueous HF-etching conditions and studied the chemical nature of the resulting Si3N4 surfaces using infrared absorption spectroscopy (IRAS), x-ray photoelectron spectroscopy (XPS), low energy ion scattering (LEIS), and contact angle measurements. We find that HF-etched silicon nitride surfaces are terminated by surficial Si-F and Si-OH bonds, with slightly subsurface Si-OH, Si-O-Si, and Si-NH2 groups. The concentration of surficial Si-F sites is not dependent on HF concentration, but the distribution of oxygen and Si-NH2 displays a weak dependence. The Si-OH groups of the etched nitride surface are shown to react in a similar manner to the Si-OH sites on SiO2, and therefore no selectivity was found. Chemical selectivity was, however, demonstrated by first reacting the -NH2 groups on the etched nitride surface with aldehyde molecules, which do not react with the Si-OH sites on a SiO2 surface, and then using trichloro-organosilanes for selective reaction only on the SiO2 surface (no reactivity on the aldehyde-terminated Si3N4 surface).</p

CCDC 2114205: Experimental Crystal Structure Determination

FATSEC : (R,R)-N,N-((1S,4S)-cyclohexane-1,4-diyldicarbonyl)bis(4-methylbenzene-1-sulfonimidoyl fluoride