Recommended Practice for Use of Emissive Probes in Electric Propulsion Testing

Peer Reviewedhttps://deepblue.lib.umich.edu/bitstream/2027.42/143022/1/1.B35697.pd

The use of paraphrasing in investigative interviews

Objective Young children’s descriptions of maltreatment are often sparse thus creating the need for techniques that elicit lengthier accounts. One technique that can be used by interviewers in an attempt to increase children’s reports is ‘paraphrasing’, or repeating information children have disclosed. Although we currently have a general understanding of how paraphrasing may influence children’s reports, we do not have a clear description of how paraphrasing is actually used in the field. Method The present study assessed the use of paraphrasing in 125 interviews of children aged 4 to 16 years conducted by police officers and social workers. All interviewer prompts were coded into four different categories of paraphrasing. All children’s reports were coded for the number of details in response to each paraphrasing statement. Results ‘Expansion paraphrasing’ (e.g., “you said he hit you. Tell me more about when he hit you”) was used significantly more often and elicited significantly more details, while ‘yes/no paraphrasing’ (e.g., “he hit you?”) resulted in shorter descriptions from children, compared to other paraphrasing styles. Further, interviewers more often distorted children’s words when using yes/no paraphrasing, and children rarely corrected interviewers when they paraphrased inaccurately. Conclusions and Practical Implications Investigative interviewers in this sample frequently used paraphrasing with children of all ages and, though children’s responses differed following the various styles of paraphrasing, the effects did not differ by the age of the child witness. The results suggest that paraphrasing affects the quality of statements by child witnesses. Implications for investigative interviewers will be discussed and recommendations offered for easy ways to use paraphrasing to increase the descriptiveness of children’s reports of their experiences

The NICHD protocol:a review of an internationally-used evidence-based tool for training child forensic interviewers

PurposeThis article reviews an evidence-based tool for training child forensic interviewers called the NICHD Protocol, with a specific focus on how the Protocol is being adapted in various countries.Design/methodology/approachWe include international contributions from experienced trainers, practitioners, and scientists, who are already using the Protocol or whose national or regional procedures have been directly influenced by the NICHD Protocol research (Canada, Finland, Israel, Japan, Korea, Norway, Portugal, Scotland, and United States). Throughout the review, these experts comment on: How and when the Protocol was adopted in their country; who uses it; training procedures; challenges to implementation and translation; and other pertinent aspects. We aim to further promote good interviewing practice by sharing the experiences of these international experts.FindingsThe NICHD Protocol can be easily incorporated into existing training programs worldwide and is available for free. It was originally developed in English and Hebrew and is available in several other languages.Originality/valueThis article reviews an evidence-based tool for training child forensic interviewers called the NICHD Protocol. It has been extensively studied and reviewed over the past 20 years. This article is unique in the it is the first to bring together practitioners who are actually responsible for training forensic interviewers and conducting forensic interviews from all around the world

Language of lies:Urgent issues and prospects in verbal lie detection research

Since its introduction into the field of deception detection, the verbal channel has become a rapidly growing area of research. The basic assumption is that liars differ from truth tellers in their verbal behaviour, making it possible to classify them by inspecting their verbal accounts. However, as noted in conferences and in private communication between researchers, the field of verbal lie detection faces several challenges that merit focused attention. The first author therefore proposed a workshop with the mission of promoting solutions for urgent issues in the field. Nine researchers and three practitioners with experience in credibility assessments gathered for 3 days of discussion at Bar‐Ilan University (Israel) in the first international verbal lie detection workshop. The primary session of the workshop took place the morning of the first day. In this session, each of the participants had up to 10 min to deliver a brief message, using just one slide. Researchers were asked to answer the question: ‘In your view, what is the most urgent, unsolved question/issue in verbal lie detection?’ Similarly, practitioners were asked: ‘As a practitioner, what question/issue do you wish verbal lie detection research would address?’ The issues raised served as the basis for the discussions that were held throughout the workshop. The current paper first presents the urgent, unsolved issues raised by the workshop group members in the main session, followed by a message to researchers in the field, designed to deliver the insights, decisions, and conclusions resulting from the discussions

Real-Time Measurement of Thin Film Thickness During Plasma Processing

An in situ single point two-color laser interferometer is used to monitor in real-time the thickness of thin transparent films during processing. The instantaneous change of film thickness is determined by comparing the measured laser reflection interference to that calculated by a model. The etch or deposition rates of the film are determined within 1–2 seconds. The film thickness is also determined in real-time from the phase difference of the reflected laser intensity between the two laser colors. Use of two-color laser interferometry improves the accuracy of the calculated etch or growth rates of the film considerably. Moreover, the two colors provide a clear distinction between film etching and deposition, which may often occur during the same process, and can not be determined by a single color interferometer. The uniformity of the film's etch or deposition rates across the substrate is monitored by an in situ full-wafer image interferometer. The combined use of these two sensors provide instantaneous information of the film thickness, etch or growth rates, as well as time averaged uniformity of the process rates. This diagnostic setup is very useful for process development and monitoring, which is also suitable for manufacturing environment, and can be used for real-time process control.Peer Reviewedhttp://deepblue.lib.umich.edu/bitstream/2027.42/45461/1/11088_2004_Article_412642.pd